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Author : Kevin M. Monahan
Publisher :
ISBN 13 :
Total Pages : 556 pages
Book Rating : 4.:/5 (318 download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control III written by Kevin M. Monahan and published by . This book was released on 1989 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 576 pages
Book Rating : 4.3/5 (91 download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control written by and published by . This book was released on 1994 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kevin M. Monahan
Publisher :
ISBN 13 :
Total Pages : 476 pages
Book Rating : 4.:/5 (318 download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control II written by Kevin M. Monahan and published by . This book was released on 1988 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Kevin M. Monahan
Publisher :
ISBN 13 :
Total Pages : 340 pages
Book Rating : 4.E/5 ( download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control written by Kevin M. Monahan and published by . This book was released on 1987 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 140 pages
Book Rating : 4.3/5 ( download)
Download or read book Semiconductor Measurement Technology written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1990 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : United States. National Bureau of Standards
Publisher :
ISBN 13 :
Total Pages : 116 pages
Book Rating : 4.F/5 ( download)
Download or read book Semiconductor Measurement Technology written by United States. National Bureau of Standards and published by . This book was released on 1988 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kevin Harding
Publisher : Taylor & Francis
ISBN 13 : 1439854823
Total Pages : 497 pages
Book Rating : 4.4/5 (398 download)
Download or read book Handbook of Optical Dimensional Metrology written by Kevin Harding and published by Taylor & Francis. This book was released on 2016-04-19 with total page 497 pages. Available in PDF, EPUB and Kindle. Book excerpt: Due to their speed, data density, and versatility, optical metrology tools play important roles in today's high-speed industrial manufacturing applications. Handbook of Optical Dimensional Metrology provides useful background information and practical examples to help readers understand and effectively use state-of-the-art optical metrology methods
Author : Gordon S. Kino
Publisher : Academic Press
ISBN 13 : 008052978X
Total Pages : 353 pages
Book Rating : 4.0/5 (85 download)
Download or read book Confocal Scanning Optical Microscopy and Related Imaging Systems written by Gordon S. Kino and published by Academic Press. This book was released on 1996-09-18 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers. The book concentrates mainly on two instruments: the Confocal Scanning Optical Microscope (CSOM), and the Optical Interference Microscope (OIM). A comprehensive discussion of the theory and design of the Near-Field Scanning Optical Microscope (NSOM) is also given. The text discusses the practical aspects of building a confocal scanning optical microscope or optical interference microscope, and the applications of these microscopes to phase imaging, biological imaging, and semiconductor inspection and metrology.A comprehensive theoretical discussion of the depth and transverse resolution is given with emphasis placed on the practical results of the theoretical calculations and how these can be used to help understand the operation of these microscopes. - Provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers - Explains many practical applications of scanning optical and interference microscopy in such diverse fields as biology and semiconductor metrology - Discusses in theoretical terms the origin of the improved depth and transverse resolution of scanning optical and interference microscopes with emphasis on the practical results of the theoretical calculations - Considers the practical aspects of building a confocal scanning or interference microscope and explores some of the design tradeoffs made for microscopes used in various applications - Discusses the theory and design of near-field optical microscopes - Explains phase imaging in the scanning optical and interference microscopes
Author : Michael T. Postek
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 716 pages
Book Rating : 4.0/5 ( download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control VI written by Michael T. Postek and published by SPIE-International Society for Optical Engineering. This book was released on 1992 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : I.C. Parmee
Publisher : Springer Science & Business Media
ISBN 13 : 0857293389
Total Pages : 385 pages
Book Rating : 4.8/5 (572 download)
Download or read book Adaptive Computing in Design and Manufacture VI written by I.C. Parmee and published by Springer Science & Business Media. This book was released on 2011-06-27 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Adaptive Computing in Design and Manufacture conference series has become a well-established, largely application-oriented meeting recognised by several UK Engineering Institutions and the International Society of Genetic and Evolutionary Computing. The main theme of the series relates to the integration of evolutionary and adaptive computing technologies with design and manufacturing processes whilst also taking into account complementary advanced computing technologies. Evolutionary and adaptive computing techniques continue to increase their penetration of industrial and commercial practice as awareness of their powerful search, exploration and optimisation capabilities becomes ever more prevalent, and increasing desk-top computational capability renders stochastic population-based search a far more viable proposition. There has been a significant increase in the development and integration of commercial software tools utilising adaptive computing technologies and the emergence of related commercial research and consultancy organisations supporting the introduction of best practice in terms of industrial utilisation. The book is comprised of selected papers that cover a diverse set of industrial application areas including engineering design and design environments and manufacturing process design, scheduling and control. Various aspects of search, exploration and optimisation are investigated in the context of integration with industrial processes including multi-objective and constraint satisfaction, development and utilization of meta-models, algorithm and strategy development and human-centric evolutionary approaches. The role of agent-based and neural net technologies in terms of supporting search processes and providing an alternative simulation environment is also explored. This collection of papers will be of particular interest to both industrial researchers and practitioners in addition to the academic research communities across engineering, operational research and computer science.
Author : L.F Pau
Publisher : Springer Science & Business Media
ISBN 13 : 1461305071
Total Pages : 324 pages
Book Rating : 4.4/5 (613 download)
Download or read book Computer Vision for Electronics Manufacturing written by L.F Pau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt: DEFECT PROPORTION OF DETECTION INITIAL RATE DETECTION RATE INSPECTOR 3 COMPLEXITY OF TIMES PAN OF PERFORMING o~ ________________________ o~ ______________________ __ -;. INSPECTION TASK -;. VISUAL INSPECTION Fagure 1. Trends in relations between the complexity of inspection tasks, defect detection rates (absolute and relative), and inspection time. Irrespective of the necessities described above, and with the excep tion of specific generic application systems (e.g., bare-board PCB inspection, wafer inspection, solder joint inspection, linewidth measure ment), vision systems are still not found frequently in today's electronics factories. Besides cost, some major reasons for this absence are: 1. The detection robustness or accuracy is still insufficient. 2. The total inspection time is often too high, although this can frequently be attributed to mechanical handling or sensing. 3. There are persistent gaps among process engineers, CAD en gineers, manufacturing engineers, test specialists, and computer vision specialists, as problems dominate the day-to-day interac tions and prevent the establishment of trust. 4. Computer vision specialists sometimes still believe that their contributions are universal, so that adaptation to each real problem becomes tedious, or stumbles over the insufficient availabIlity of multidisciplinary expertise. Whether we like it or not, we must still use appropriate sensors, lighting, and combina tions of algorithms for each class of applications; likewise, we cannot design mechanical handling, illumination, and sensing in isolation from each other.
Author : Peter W. Hawkes
Publisher : Elsevier
ISBN 13 : 0080490107
Total Pages : 605 pages
Book Rating : 4.0/5 (84 download)
Download or read book Advances in Imaging and Electron Physics written by Peter W. Hawkes and published by Elsevier. This book was released on 2004-12-18 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: * A special volume devoted principally to therole of the late Sir Charles Oatley in the development of the scanning electron microscopeings* It contains historical articles and reminiscences by most of the scientists who have worked on the scanning electron microscope in Oatley's laboratory * Emphasizes broad and in depth article collaborations between world-renowned scientists in the field of image and electron physicsAlthough the scanning electron microscope had a prehistory in Germany and the USA, its real champion was Charles Oatley, who launched his projectin the Cambridge University Engineering Department shortly after the end of World War II. A first microscope was built successfully by D. McMullan, oneof the Guest Editors of this volume and a succession of progressively improved instruments followed. One in particular, built by K.C.A. Smith was commissioned specially for the Canadian Pulp and Paper Research Institute for use in their Montreal laboratories. All these efforts culminated in the commercial model built by the Cambridge Instrument Company and marketed in 1965 under the trade name, Stereoscan.Although this story has been told on several occasions, in particular in these Advances, it seemed appropriate, in the centenary year of the birth of Sir Charles Oatley, that more details should be published to celebrate these achievements. This volume is the result. It contains not only historical articles and reminiscences by most of the scientists who have worked on the scanning electron microscope in Oatley's laboratory but also full or partial reproductions of many of the key publications, beginning with McMullan's early paper of 1953 and including Oatley's own "Early history of the scanning electron microscope" (1982). A website has been created, in which supplementary material is collected.This volume is a tribute to a bold pioneering scientist and a vivid record of the creation of the first commercial scanning electron microscopes and of subsequent developments. * A special volume devoted principally to therole of the late Sir Charles Oatley in the development of the scanning electron microscopeings* It contains historical articles and reminiscences by most of the scientists who have worked on the scanning electron microscope in Oatley's laboratory* Emphasizes broad and in depth article collaborations between world-renowned scientists in the field of image and electron physics
Author : John N. Helbert
Publisher : William Andrew
ISBN 13 : 0815517807
Total Pages : 1025 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author : United States. National Bureau of Standards
Publisher :
ISBN 13 :
Total Pages : 668 pages
Book Rating : 4.:/5 (42 download)
Download or read book Publications of the National Bureau of Standards ... Catalog written by United States. National Bureau of Standards and published by . This book was released on 1980 with total page 668 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Wolfgang Osten
Publisher : CRC Press
ISBN 13 : 1420019163
Total Pages : 524 pages
Book Rating : 4.4/5 (2 download)
Download or read book Optical Inspection of Microsystems written by Wolfgang Osten and published by CRC Press. This book was released on 2018-10-03 with total page 524 pages. Available in PDF, EPUB and Kindle. Book excerpt: Where conventional testing and inspection techniques fail at the micro-scale, optical techniques provide a fast, robust, and relatively inexpensive alternative for investigating the properties and quality of microsystems. Speed, reliability, and cost are critical factors in the continued scale-up of microsystems technology across many industries, and optical techniques are in a unique position to satisfy modern commercial and industrial demands. Optical Inspection of Microsystems is the first comprehensive, up-to-date survey of the most important and widely used full-field optical metrology and inspection technologies. Under the guidance of accomplished researcher Wolfgang Osten, expert contributors from industrial and academic institutions around the world share their expertise and experience with techniques such as image correlation, light scattering, scanning probe microscopy, confocal microscopy, fringe projection, grid and moiré techniques, interference microscopy, laser Doppler vibrometry, holography, speckle metrology, and spectroscopy. They also examine modern approaches to data acquisition and processing. The book emphasizes the evaluation of various properties to increase reliability and promote a consistent approach to optical testing. Numerous practical examples and illustrations reinforce the concepts. Supplying advanced tools for microsystem manufacturing and characterization, Optical Inspection of Microsystems enables you to reach toward a higher level of quality and reliability in modern micro-scale applications.
Author : John N. Helbert
Publisher : Cambridge University Press
ISBN 13 : 0080946801
Total Pages : 1026 pages
Book Rating : 4.0/5 (89 download)
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
