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Author : Kevin M. Monahan
Publisher :
ISBN 13 :
Total Pages : 476 pages
Book Rating : 4.:/5 (318 download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control II written by Kevin M. Monahan and published by . This book was released on 1988 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 476 pages
Book Rating : 4.3/5 (91 download)
Download or read book Integrated Circuit Metrology, Inspection, and Process Control written by and published by . This book was released on 1988 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author : Kevin M. Monahan
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 376 pages
Book Rating : 4.:/5 (318 download)
Download or read book Handbook of Critical Dimension Metrology and Process Control written by Kevin M. Monahan and published by SPIE-International Society for Optical Engineering. This book was released on 1994 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author : Alain C. Diebold
Publisher : CRC Press
ISBN 13 : 0203904540
Total Pages : 703 pages
Book Rating : 4.2/5 (39 download)
Download or read book Handbook of Silicon Semiconductor Metrology written by Alain C. Diebold and published by CRC Press. This book was released on 2001-06-29 with total page 703 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
Author : Abraham Landzberg
Publisher : Springer Science & Business Media
ISBN 13 : 1461520290
Total Pages : 663 pages
Book Rating : 4.4/5 (615 download)
Download or read book Microelectronics Manufacturing Diagnostics Handbook written by Abraham Landzberg and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 663 pages. Available in PDF, EPUB and Kindle. Book excerpt: The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.
Author : United States. National Bureau of Standards
Publisher :
ISBN 13 :
Total Pages : 116 pages
Book Rating : 4.F/5 ( download)
Download or read book Semiconductor Measurement Technology written by United States. National Bureau of Standards and published by . This book was released on 1988 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : ASM International
ISBN 13 : 9780871702852
Total Pages : 1234 pages
Book Rating : 4.7/5 (28 download)
Download or read book Electronic Materials Handbook written by and published by ASM International. This book was released on 1989-11-01 with total page 1234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume 1: Packaging is an authoritative reference source of practical information for the design or process engineer who must make informed day-to-day decisions about the materials and processes of microelectronic packaging. Its 117 articles offer the collective knowledge, wisdom, and judgement of 407 microelectronics packaging experts-authors, co-authors, and reviewers-representing 192 companies, universities, laboratories, and other organizations. This is the inaugural volume of ASMAs all-new ElectronicMaterials Handbook series, designed to be the Metals Handbook of electronics technology. In over 65 years of publishing the Metals Handbook, ASM has developed a unique editorial method of compiling large technical reference books. ASMAs access to leading materials technology experts enables to organize these books on an industry consensus basis. Behind every article. Is an author who is a top expert in its specific subject area. This multi-author approach ensures the best, most timely information throughout. Individually selected panels of 5 and 6 peers review each article for technical accuracy, generic point of view, and completeness.Volumes in the Electronic Materials Handbook series are multidisciplinary, to reflect industry practice applied in integrating multiple technology disciplines necessary to any program in advanced electronics. Volume 1: Packaging focusing on the middle level of the electronics technology size spectrum, offers the greatest practical value to the largest and broadest group of users. Future volumes in the series will address topics on larger (integrated electronic assemblies) and smaller (semiconductor materials and devices) size levels.
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 140 pages
Book Rating : 4.3/5 ( download)
Download or read book Semiconductor Measurement Technology written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1990 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Laszlo Monostori
Publisher : Springer
ISBN 13 : 3030181804
Total Pages : 259 pages
Book Rating : 4.0/5 (31 download)
Download or read book Proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing written by Laszlo Monostori and published by Springer. This book was released on 2019-04-30 with total page 259 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gathers the proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing (AMP 2019), held in Belgrade, Serbia, on 3–6 June 2019. The event marks the latest in a series of high-level conferences that bring together experts from academia and industry to exchange knowledge, ideas, experiences, research findings, and information in the field of manufacturing. The book addresses a wide range of topics, including: design of smart and intelligent products, developments in CAD/CAM technologies, rapid prototyping and reverse engineering, multistage manufacturing processes, manufacturing automation in the Industry 4.0 model, cloud-based products, and cyber-physical and reconfigurable manufacturing systems. By providing updates on key issues and highlighting recent advances in manufacturing engineering and technologies, the book supports the transfer of vital knowledge to the next generation of academics and practitioners. Further, it will appeal to anyone working or conducting research in this rapidly evolving field.
Author : Sanghamitra Bandyopadhyay
Publisher : Springer Science & Business Media
ISBN 13 : 3540305068
Total Pages : 831 pages
Book Rating : 4.5/5 (43 download)
Download or read book Pattern Recognition and Machine Intelligence written by Sanghamitra Bandyopadhyay and published by Springer Science & Business Media. This book was released on 2005-12-09 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book constitutes the refereed proceedings of the First International Conference on Pattern Recognition and Machine Intelligence, PReMI 2005, held in Kolkata, India in December 2005. The 108 revised papers presented together with 6 keynote talks and 14 invited papers were carefully reviewed and selected from 250 submissions. The papers are organized in topical sections on clustering, feature selection and learning, classification, neural networks and applications, fuzzy logic and applications, optimization and representation, image processing and analysis, video processing and computer vision, image retrieval and data mining, bioinformatics application, Web intelligence and genetic algorithms, as well as rough sets, case-based reasoning and knowledge discovery.
Author : Anant G. Sabnis
Publisher :
ISBN 13 :
Total Pages : 268 pages
Book Rating : 4.3/5 (91 download)
Download or read book Manufacturing Process Control for Microelectronic Devices and Circuits written by Anant G. Sabnis and published by . This book was released on 1994 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gordon S. Kino
Publisher : Academic Press
ISBN 13 : 008052978X
Total Pages : 353 pages
Book Rating : 4.0/5 (85 download)
Download or read book Confocal Scanning Optical Microscopy and Related Imaging Systems written by Gordon S. Kino and published by Academic Press. This book was released on 1996-09-18 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers. The book concentrates mainly on two instruments: the Confocal Scanning Optical Microscope (CSOM), and the Optical Interference Microscope (OIM). A comprehensive discussion of the theory and design of the Near-Field Scanning Optical Microscope (NSOM) is also given. The text discusses the practical aspects of building a confocal scanning optical microscope or optical interference microscope, and the applications of these microscopes to phase imaging, biological imaging, and semiconductor inspection and metrology.A comprehensive theoretical discussion of the depth and transverse resolution is given with emphasis placed on the practical results of the theoretical calculations and how these can be used to help understand the operation of these microscopes. - Provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers - Explains many practical applications of scanning optical and interference microscopy in such diverse fields as biology and semiconductor metrology - Discusses in theoretical terms the origin of the improved depth and transverse resolution of scanning optical and interference microscopes with emphasis on the practical results of the theoretical calculations - Considers the practical aspects of building a confocal scanning or interference microscope and explores some of the design tradeoffs made for microscopes used in various applications - Discusses the theory and design of near-field optical microscopes - Explains phase imaging in the scanning optical and interference microscopes
Author : Peter W. Hawkes
Publisher : Elsevier
ISBN 13 : 0080490107
Total Pages : 605 pages
Book Rating : 4.0/5 (84 download)
Download or read book Advances in Imaging and Electron Physics written by Peter W. Hawkes and published by Elsevier. This book was released on 2004-12-18 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: * A special volume devoted principally to therole of the late Sir Charles Oatley in the development of the scanning electron microscopeings* It contains historical articles and reminiscences by most of the scientists who have worked on the scanning electron microscope in Oatley's laboratory * Emphasizes broad and in depth article collaborations between world-renowned scientists in the field of image and electron physicsAlthough the scanning electron microscope had a prehistory in Germany and the USA, its real champion was Charles Oatley, who launched his projectin the Cambridge University Engineering Department shortly after the end of World War II. A first microscope was built successfully by D. McMullan, oneof the Guest Editors of this volume and a succession of progressively improved instruments followed. One in particular, built by K.C.A. Smith was commissioned specially for the Canadian Pulp and Paper Research Institute for use in their Montreal laboratories. All these efforts culminated in the commercial model built by the Cambridge Instrument Company and marketed in 1965 under the trade name, Stereoscan.Although this story has been told on several occasions, in particular in these Advances, it seemed appropriate, in the centenary year of the birth of Sir Charles Oatley, that more details should be published to celebrate these achievements. This volume is the result. It contains not only historical articles and reminiscences by most of the scientists who have worked on the scanning electron microscope in Oatley's laboratory but also full or partial reproductions of many of the key publications, beginning with McMullan's early paper of 1953 and including Oatley's own "Early history of the scanning electron microscope" (1982). A website has been created, in which supplementary material is collected.This volume is a tribute to a bold pioneering scientist and a vivid record of the creation of the first commercial scanning electron microscopes and of subsequent developments. * A special volume devoted principally to therole of the late Sir Charles Oatley in the development of the scanning electron microscopeings* It contains historical articles and reminiscences by most of the scientists who have worked on the scanning electron microscope in Oatley's laboratory* Emphasizes broad and in depth article collaborations between world-renowned scientists in the field of image and electron physics
Author : John N. Helbert
Publisher : William Andrew
ISBN 13 : 0815517807
Total Pages : 1025 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author : John N. Helbert
Publisher : Cambridge University Press
ISBN 13 : 0080946801
Total Pages : 1026 pages
Book Rating : 4.0/5 (89 download)
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author : Christoffel Kotze
Publisher : Springer Nature
ISBN 13 : 3030157660
Total Pages : 127 pages
Book Rating : 4.0/5 (31 download)
Download or read book A Broadband Apparatus for Underserviced Remote Communities written by Christoffel Kotze and published by Springer Nature. This book was released on 2019-09-03 with total page 127 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book investigates how broadband internet can be provided to remote and isolated communities through the use of satellite and other enabling technologies, in the form of a self-contained broadband apparatus. It discusses how the proposed design can help bridge the digital divide by removing one of the main hurdles to adopting technologies: infrastructure. In turn, the book explores how the lack of infrastructure, especially with regard to connectivity and electricity, can be addressed by exploiting new technological advances in a number of fields, notably the newly proposed large broadband satellite constellations. In closing, it uses concrete examples to demonstrate the potential positive impacts of a “broadband ecosystem” on economics, governance and society, and on achieving the United Nations’ Sustainable Development Goals.
