Halogens on Semiconductor Surfaces

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ISBN 13 :
Total Pages : 206 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Halogens on Semiconductor Surfaces by : Frank Stepniak

Download or read book Halogens on Semiconductor Surfaces written by Frank Stepniak and published by . This book was released on 1994 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Halogen Reactions with III-V Semiconductor Surfaces

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ISBN 13 :
Total Pages : 262 pages
Book Rating : 4.3/5 (121 download)

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Book Synopsis Halogen Reactions with III-V Semiconductor Surfaces by : Wei Wang

Download or read book Halogen Reactions with III-V Semiconductor Surfaces written by Wei Wang and published by . This book was released on 2000 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Hydrogen-Halogen Chemistry on Semiconductor Surfaces

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ISBN 13 :
Total Pages : 12 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Hydrogen-Halogen Chemistry on Semiconductor Surfaces by :

Download or read book Hydrogen-Halogen Chemistry on Semiconductor Surfaces written by and published by . This book was released on 1992 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt: The chemistry of coadsorbed H and X (X=Cl, Br) on semiconductor surfaces is important in epitaxial growth of silicon from chlorosilanes and of Si(x)Ge(1-x) alloys, in hydrogenating/halogenating cycles in atomic layer epitaxy, and also provides an interesting model system, yet has received little attention to date. We have investigated the interaction of H, HCl, and HBr with Ge(100) by temperature-programmed desorption, and find that H2, HCl, and HBr each absorb with near-first-order kinetics near 570-580 K, and the GECL2 and GeBr2 desorb with second-order kinetics near 680 K and 710 K, respectively. Trends in the chemistry and kinetics can be rationalized by viewing the dimer atoms on clean Ge(100)-(2x1) as being linked by a strained double bond and adsorption, decomposition, and desorption as being analogous to addition, rearrangement, and elimination reactions of molecular germanium compounds. The near-first-order desorption kinetics are attributed to pairing on surface dimers induced by the pi bond on unoccupied dimers. We infer a pairing enthalpy for H+H (=the pi bond strength of dimerized Ge(100) surface atoms) of 4-5 kcal/mol.

Orientational Epitaxy of Semimetal Thin Films on Semiconductor Surfaces and Halogen Etching of Semiconductor Surfaces Studied by Scanning Tunneling Microscopy

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ISBN 13 :
Total Pages : 234 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Orientational Epitaxy of Semimetal Thin Films on Semiconductor Surfaces and Halogen Etching of Semiconductor Surfaces Studied by Scanning Tunneling Microscopy by : John Charles Patrin

Download or read book Orientational Epitaxy of Semimetal Thin Films on Semiconductor Surfaces and Halogen Etching of Semiconductor Surfaces Studied by Scanning Tunneling Microscopy written by John Charles Patrin and published by . This book was released on 1993 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Functionalization of Semiconductor Surfaces

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Publisher : John Wiley & Sons
ISBN 13 : 1118199804
Total Pages : 456 pages
Book Rating : 4.1/5 (181 download)

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Book Synopsis Functionalization of Semiconductor Surfaces by : Franklin Tao

Download or read book Functionalization of Semiconductor Surfaces written by Franklin Tao and published by John Wiley & Sons. This book was released on 2012-03-16 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents both fundamental knowledge and latest achievements of this rapidly growing field in the last decade. It presents a complete and concise picture of the the state-of-the-art in the field, encompassing the most active international research groups in the world. Led by contributions from leading global research groups, the book discusses the functionalization of semiconductor surface. Dry organic reactions in vacuum and wet organic chemistry in solution are two major categories of strategies for functionalization that will be described. The growth of multilayer-molecular architectures on the formed organic monolayers will be documented. The immobilization of biomolecules such as DNA on organic layers chemically attached to semiconductor surfaces will be introduced. The patterning of complex structures of organic layers and metallic nanoclusters toward sensing techniques will be presented as well.

Semiconductor Surfaces and Interfaces

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Publisher : Springer Science & Business Media
ISBN 13 : 3662044595
Total Pages : 548 pages
Book Rating : 4.6/5 (62 download)

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Book Synopsis Semiconductor Surfaces and Interfaces by : Winfried Mönch

Download or read book Semiconductor Surfaces and Interfaces written by Winfried Mönch and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: This third edition has been thoroughly revised and updated. In particular it now includes an extensive discussion of the band lineup at semiconductor interfaces. The unifying concept is the continuum of interface-induced gap states.

Etching Chemistry of III-V Semiconductors and the Development of Surface Roughness

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ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (946 download)

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Book Synopsis Etching Chemistry of III-V Semiconductors and the Development of Surface Roughness by :

Download or read book Etching Chemistry of III-V Semiconductors and the Development of Surface Roughness written by and published by . This book was released on 1998 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This research addresses the need for fundamental information concerning halogen etching of III-V semiconductors. The reactions of halogens with semiconductor surfaces are the fundamental chemical interactions in processes employed for device manufacture. In this work, the reactions of XeF2, Cl2 and I2 with III-V semiconductor surfaces were investigated with synchrotron-based soft x-ray photoelectron spectroscopy, low energy electron diffraction and scanning tunneling microscopy. Fluorine reaction grows films of group III fluorides, which can be used as dielectric materials. Chlorine is the most widely used halogen for dry etching, while iodine has been proposed for use as a "gentle" etchant. We found that, for all of the halogen reactions, the initial adsorption depends on the surface reconstruction, stoichiometry and condition. Some surfaces passivate, while others spontaneously etch at room temperature. The passivated surfaces are well-ordered and covered with approximately one monolayer of adsorbed halogen. The etched surfaces, on the other hand, are considerably rough and atomically disordered. A microscopic model is proposed which assumes that halogen atoms preferentially adsorb onto a group III atom if the surface is initially well-ordered. This microscopic model can explain why certain surfaces etch, while others form ordered overlayers.

Halogen-Induced Semiconductor Surface Modifications

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (932 download)

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Book Synopsis Halogen-Induced Semiconductor Surface Modifications by :

Download or read book Halogen-Induced Semiconductor Surface Modifications written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Physics of Digital Etching

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ISBN 13 :
Total Pages : 6 pages
Book Rating : 4.:/5 (455 download)

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Book Synopsis Chemical Physics of Digital Etching by : Andrew Kummel

Download or read book Chemical Physics of Digital Etching written by Andrew Kummel and published by . This book was released on 1998 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: We have investigated the Chemisorption of halogens on semiconductor surfaces in order to develop a better understanding of passivation and etching of these surfaces. We have shown that halogen chemisorption occurs onto both Si(111) and GaAs(100) via both dissociative chemisorption and abstraction. In abstractive chemisorption of a diatomic molecular halogen, one halogen atoms sticks to the surface while the other is ejected back into the gas phase. The abstraction process can be chemically selectivity for one of the two atoms in an interhalogen such as ICl. Furthermore, both abstraction and dissociation can be chemically selective for the Ga atoms on the GaAs(100) surface. The chemisorption of halogens can passivate the surface both chemically and electronically. Passivation occurs when a stable homogeneous monolayer of surface monohalide is formed. For GaAs(100), passivation can unpin the Fermi level; this is a critical step in developing a CMOS technology of GaAs. We are now studying the deposition of insulators on GaAs for use in high speed low power wireless communication and satellite technology with support from DoD.

Laser-Induced Reactions of Semiconductor Surfaces with Chlorine

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ISBN 13 :
Total Pages : 3 pages
Book Rating : 4.:/5 (228 download)

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Book Synopsis Laser-Induced Reactions of Semiconductor Surfaces with Chlorine by : Qi Zong Qin

Download or read book Laser-Induced Reactions of Semiconductor Surfaces with Chlorine written by Qi Zong Qin and published by . This book was released on 1992 with total page 3 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser-induced chemical reaction of semiconductor with halogen and halogen compounds has attracted much attention in recent years due to its potential application in fabrication of microelectronic devices. We have reported UV and visible laser-induced reactions of Si and GaAs surfaces with chlorine using a CW molecular beam technique coupled with time-resolved mass spectrometry. This paper will present recent studies in our laboratory on laser-induced reactions of Ge(111), Si(111), GaAs(100) and InP(100) surfaces with chlorine molecules under 355-, 560-, and 1064-nm laser irradiations. We are particularly interested in the use of near infrared (1064-nm) laser photons as well as the promotion of reaction by raising the incident chlorine molecules' translational energy. The objective is to achieve a better understanding of the mechanism of laser-induced reaction and its potential application in the chemical etching of semiconductor.

Fundamental Studies of Halogenated Semiconductor Surfaces

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ISBN 13 :
Total Pages : 564 pages
Book Rating : 4.3/5 (121 download)

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Book Synopsis Fundamental Studies of Halogenated Semiconductor Surfaces by : William C. Simpson

Download or read book Fundamental Studies of Halogenated Semiconductor Surfaces written by William C. Simpson and published by . This book was released on 1995 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Reactive Scattering of Atomic and Molecular Gases from Clean Elemental Semiconductor Surfaces

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ISBN 13 :
Total Pages : 598 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Reactive Scattering of Atomic and Molecular Gases from Clean Elemental Semiconductor Surfaces by : Alfred Akpoveta Susu

Download or read book Reactive Scattering of Atomic and Molecular Gases from Clean Elemental Semiconductor Surfaces written by Alfred Akpoveta Susu and published by . This book was released on 1971 with total page 598 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Studies of the Reactions of Halogens with the Surfaces of III-V Semiconductors

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ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.3/5 (121 download)

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Book Synopsis Studies of the Reactions of Halogens with the Surfaces of III-V Semiconductors by : Patrick Ronald Varekamp

Download or read book Studies of the Reactions of Halogens with the Surfaces of III-V Semiconductors written by Patrick Ronald Varekamp and published by . This book was released on 1995 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physics Of Semiconductors, The - Proceedings Of The 22nd International Conference (In 3 Volumes)

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Publisher : World Scientific
ISBN 13 : 9814550159
Total Pages : 2858 pages
Book Rating : 4.8/5 (145 download)

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Book Synopsis Physics Of Semiconductors, The - Proceedings Of The 22nd International Conference (In 3 Volumes) by : David J Lockwood

Download or read book Physics Of Semiconductors, The - Proceedings Of The 22nd International Conference (In 3 Volumes) written by David J Lockwood and published by World Scientific. This book was released on 1995-01-20 with total page 2858 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings review the progress in most aspects of semiconductor physics, including those related to materials, processing and devices. The conference continues the tradition of the ICPS series and these volumes include state-of-the-art lectures. The plenary and invited papers address areas of major interest.These volumes will serve as excellent material for researchers in semiconductor physics and related fields.

Halogen Chemisorption Upon Silicon and Gallium-arsenide Surfaces

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ISBN 13 :
Total Pages : 642 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Halogen Chemisorption Upon Silicon and Gallium-arsenide Surfaces by : Daniel John David Sullivan

Download or read book Halogen Chemisorption Upon Silicon and Gallium-arsenide Surfaces written by Daniel John David Sullivan and published by . This book was released on 1993 with total page 642 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Nano- and Micromaterials

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Publisher : Springer Science & Business Media
ISBN 13 : 3540745572
Total Pages : 344 pages
Book Rating : 4.5/5 (47 download)

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Book Synopsis Nano- and Micromaterials by : Kaoru Ohno

Download or read book Nano- and Micromaterials written by Kaoru Ohno and published by Springer Science & Business Media. This book was released on 2008-01-24 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: The future focus of nanotechnology will be on realizing new functions over greater scales. This book describes the creation of nano- and microscale structures and functions by controlling temperature, light, pressure, or carrier injections. It includes novel nano-integration technologies such as self-organization of surface nanostructures, quantum well structures, microlithography and micromachines, as well as new techniques of laser spectroscopy and new computational methods.

The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis

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Publisher : Elsevier
ISBN 13 : 0444601309
Total Pages : 489 pages
Book Rating : 4.4/5 (446 download)

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Book Synopsis The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis by : D.A. King

Download or read book The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis written by D.A. King and published by Elsevier. This book was released on 2012-12-02 with total page 489 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface Properties of Electronic Materials is the fifth volume of the series, The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis. This volume indicates the present state of some basic properties of semiconductor surfaces. Chapter one summarizes the general problems in electronic materials and the areas affected by the surface science methods. The next two chapters illustrate the existing perception of the electronic and structural properties of elemental and compound semiconductor surfaces. This volume also deals with the properties of adsorption of semiconductors relating to both relevant gas phase species and metals. Chapters four to six of this volume explore compound semiconductors and elemental semiconductors. The remaining chapters of this volume explore the adsorption of metals on elemental semiconductors; aspects of growth kinetics and dynamics involved in molecular beam epitaxy; molecular beam epitaxy of silicon; insulators; and metastable phases. The last chapter covers the surface chemistry of dry etching processes.