Author : Henning Döscher
Publisher : Springer Science & Business Media
ISBN 13 : 3319028804
Total Pages : 155 pages
Book Rating : 4.3/5 (19 download)
Book Synopsis GaP Heteroepitaxy on Si(100) by : Henning Döscher
Download or read book GaP Heteroepitaxy on Si(100) written by Henning Döscher and published by Springer Science & Business Media. This book was released on 2013-11-29 with total page 155 pages. Available in PDF, EPUB and Kindle. Book excerpt: Epitaxial integration of III-V semiconductors on silicon substrates has been desired over decades for high application potential in microelectronics, photovoltaics, and beyond. The performance of optoelectronic devices is still severely impaired by critical defect mechanisms driven by the crucial polar-on-nonpolar heterointerface. This thesis reports almost lattice-matched growth of thin gallium phosphide films as a viable model system for III-V/Si(100) interface investigations. The impact of antiphase disorder on the heteroepitaxial growth surface provides quantitative optical in situ access to one of the most notorious defect mechanisms, even in the vapor phase ambient common for compound semiconductor technology. Precise control over the surface structure of the Si(100) substrates prior to III-V nucleation prevents the formation of antiphase domains. The hydrogen-based process ambient enables the preparation of anomalous double-layer step structures on Si(100), highly beneficial for subsequent III-V integration.