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Author : William C. Simpson
Publisher :
ISBN 13 :
Total Pages : 564 pages
Book Rating : 4.3/5 (121 download)
Download or read book Fundamental Studies of Halogenated Semiconductor Surfaces written by William C. Simpson and published by . This book was released on 1995 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Franklin Tao
Publisher : John Wiley & Sons
ISBN 13 : 1118199804
Total Pages : 456 pages
Book Rating : 4.1/5 (181 download)
Download or read book Functionalization of Semiconductor Surfaces written by Franklin Tao and published by John Wiley & Sons. This book was released on 2012-03-16 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents both fundamental knowledge and latest achievements of this rapidly growing field in the last decade. It presents a complete and concise picture of the the state-of-the-art in the field, encompassing the most active international research groups in the world. Led by contributions from leading global research groups, the book discusses the functionalization of semiconductor surface. Dry organic reactions in vacuum and wet organic chemistry in solution are two major categories of strategies for functionalization that will be described. The growth of multilayer-molecular architectures on the formed organic monolayers will be documented. The immobilization of biomolecules such as DNA on organic layers chemically attached to semiconductor surfaces will be introduced. The patterning of complex structures of organic layers and metallic nanoclusters toward sensing techniques will be presented as well.
Author :
Publisher : Academic Press
ISBN 13 : 0128117281
Total Pages : 385 pages
Book Rating : 4.1/5 (281 download)
Download or read book Semiconductors for Photocatalysis written by and published by Academic Press. This book was released on 2017-06-30 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors for Photocatalysis, Volume 97 covers the latest breakthrough research and exciting developments in semiconductor photocatalysts and electrodes for water splitting and CO2 reduction. It includes a broad range of materials such as metal-oxides, metal-nitrides, silicon, III-V semiconductors, and the emerging layered compounds. New to this volume are chapters covering the Fundamentals of Semiconductor Photoelectrodes, Charge Carrier Dynamics in Metal Oxide Photoelectrodes for Water Oxidation, Photophysics and Photochemistry at the Semiconductor/Electrolyte Interface for Solar Water Splitting, V Semiconductor Photoelectrodes, III-Nitride Semiconductor Photoelectrodes, and Rare Earth Containing Materials for Photoelectrochemical Water Splitting Applications. In addition, the design and modeling of photocatalysts and photoelectrodes and the fundamental mechanisms of water splitting and CO2 reduction is also discussed. - Features the latest breakthroughs and research and development in semiconductor photocatalysis, solar fuels, and artificial photosynthesis - Covers a broad range of topics, including a wide variety of materials and many important aspects of solar fuels - Includes in-depth discussions on materials design, growth and synthesis, engineering, characterization, and photoelectrochemical studies
Author : R. Mohan Sankaran
Publisher : CRC Press
ISBN 13 : 1351832948
Total Pages : 433 pages
Book Rating : 4.3/5 (518 download)
Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Author : Wei Wang
Publisher :
ISBN 13 :
Total Pages : 262 pages
Book Rating : 4.3/5 (121 download)
Download or read book Halogen Reactions with III-V Semiconductor Surfaces written by Wei Wang and published by . This book was released on 2000 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Anders Nilsson
Publisher : Elsevier
ISBN 13 : 0080551912
Total Pages : 533 pages
Book Rating : 4.0/5 (85 download)
Download or read book Chemical Bonding at Surfaces and Interfaces written by Anders Nilsson and published by Elsevier. This book was released on 2011-08-11 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular surface science has made enormous progress in the past 30 years. The development can be characterized by a revolution in fundamental knowledge obtained from simple model systems and by an explosion in the number of experimental techniques. The last 10 years has seen an equally rapid development of quantum mechanical modeling of surface processes using Density Functional Theory (DFT). Chemical Bonding at Surfaces and Interfaces focuses on phenomena and concepts rather than on experimental or theoretical techniques. The aim is to provide the common basis for describing the interaction of atoms and molecules with surfaces and this to be used very broadly in science and technology. The book begins with an overview of structural information on surface adsorbates and discusses the structure of a number of important chemisorption systems. Chapter 2 describes in detail the chemical bond between atoms or molecules and a metal surface in the observed surface structures. A detailed description of experimental information on the dynamics of bond-formation and bond-breaking at surfaces make up Chapter 3. Followed by an in-depth analysis of aspects of heterogeneous catalysis based on the d-band model. In Chapter 5 adsorption and chemistry on the enormously important Si and Ge semiconductor surfaces are covered. In the remaining two Chapters the book moves on from solid-gas interfaces and looks at solid-liquid interface processes. In the final chapter an overview is given of the environmentally important chemical processes occurring on mineral and oxide surfaces in contact with water and electrolytes. - Gives examples of how modern theoretical DFT techniques can be used to design heterogeneous catalysts - This book suits the rapid introduction of methods and concepts from surface science into a broad range of scientific disciplines where the interaction between a solid and the surrounding gas or liquid phase is an essential component - Shows how insight into chemical bonding at surfaces can be applied to a range of scientific problems in heterogeneous catalysis, electrochemistry, environmental science and semiconductor processing - Provides both the fundamental perspective and an overview of chemical bonding in terms of structure, electronic structure and dynamics of bond rearrangements at surfaces
Author : Patrick Ronald Varekamp
Publisher :
ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.3/5 (121 download)
Download or read book Studies of the Reactions of Halogens with the Surfaces of III-V Semiconductors written by Patrick Ronald Varekamp and published by . This book was released on 1995 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Dragan Uskoković
Publisher : Institute of Technical Sciences of the Serbian Academy of Sciences and Arts
ISBN 13 : 8680321257
Total Pages : 270 pages
Book Rating : 4.6/5 (83 download)
Download or read book Programme and The Book of Abstracts / Twelfth Annual Conference YUCOMAT 2010 written by Dragan Uskoković and published by Institute of Technical Sciences of the Serbian Academy of Sciences and Arts. This book was released on 2010-08-01 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: The First Conference on materials science and engineering, including physics, physical chemistry, condensed matter chemistry, and technology in general, was held in September 1995, in Herceg Novi. An initiative to establish Yugoslav Materials Research Society was born at the conference and, similar to other MR societies in the world, the programme was made and objectives determined. The Yugoslav Materials Research Society (Yu-MRS), a nongovernment and non-profit scientific association, was founded in 1997 to promote multidisciplinary goal-oriented research in materials science and engineering. The main task and objective of the Society has been to encourage creativity in materials research and engineering to reach a harmonic coordination between achievements in this field in our country and analogous activities in the world with an aim to include our country into global international projects. Until 2003, Conferences were held every second year and then they grew into Annual Conferences that were traditionally held in Herceg Novi in September of every year. In 2007 Yu-MRS formed two new MRS: MRS-Serbia (official successor of Yu-MRS) and MRS-Montenegro (in founding). In 2008, MRS – Serbia became a member of FEMS (Federation of European Materials Societies). The Twelfth Annual Conference YUCOMAT 2010 was held on September 6-10, 2010 in Heceg Novi, Montenegro
Author :
Publisher :
ISBN 13 :
Total Pages : 834 pages
Book Rating : 4.:/5 (334 download)
Download or read book Research in Progress written by and published by . This book was released on 1978 with total page 834 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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Author :
Publisher : Allied Publishers
ISBN 13 : 9788170239987
Total Pages : 800 pages
Book Rating : 4.2/5 (399 download)
Download or read book Proceedings of the Tenth International Workshop on the Physics of Semiconductor Devices : (December 14 - 18, 1999) [New Delhi]. 2(2000) written by and published by Allied Publishers. This book was released on 2000 with total page 800 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kaoru Ohno
Publisher : Springer Science & Business Media
ISBN 13 : 3540745572
Total Pages : 344 pages
Book Rating : 4.5/5 (47 download)
Download or read book Nano- and Micromaterials written by Kaoru Ohno and published by Springer Science & Business Media. This book was released on 2008-01-24 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: The future focus of nanotechnology will be on realizing new functions over greater scales. This book describes the creation of nano- and microscale structures and functions by controlling temperature, light, pressure, or carrier injections. It includes novel nano-integration technologies such as self-organization of surface nanostructures, quantum well structures, microlithography and micromachines, as well as new techniques of laser spectroscopy and new computational methods.
Author :
Publisher :
ISBN 13 :
Total Pages : 456 pages
Book Rating : 4.:/5 (3 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author : Franklin Tao
Publisher : John Wiley & Sons
ISBN 13 : 0470562943
Total Pages : 456 pages
Book Rating : 4.4/5 (75 download)
Download or read book Functionalization of Semiconductor Surfaces written by Franklin Tao and published by John Wiley & Sons. This book was released on 2012-04-10 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents both fundamental knowledge and latest achievements of this rapidly growing field in the last decade. It presents a complete and concise picture of the the state-of-the-art in the field, encompassing the most active international research groups in the world. Led by contributions from leading global research groups, the book discusses the functionalization of semiconductor surface. Dry organic reactions in vacuum and wet organic chemistry in solution are two major categories of strategies for functionalization that will be described. The growth of multilayer-molecular architectures on the formed organic monolayers will be documented. The immobilization of biomolecules such as DNA on organic layers chemically attached to semiconductor surfaces will be introduced. The patterning of complex structures of organic layers and metallic nanoclusters toward sensing techniques will be presented as well.
Author : David J Lockwood
Publisher : World Scientific
ISBN 13 : 9814550159
Total Pages : 2858 pages
Book Rating : 4.8/5 (145 download)
Download or read book Physics Of Semiconductors, The - Proceedings Of The 22nd International Conference (In 3 Volumes) written by David J Lockwood and published by World Scientific. This book was released on 1995-01-20 with total page 2858 pages. Available in PDF, EPUB and Kindle. Book excerpt: These proceedings review the progress in most aspects of semiconductor physics, including those related to materials, processing and devices. The conference continues the tradition of the ICPS series and these volumes include state-of-the-art lectures. The plenary and invited papers address areas of major interest.These volumes will serve as excellent material for researchers in semiconductor physics and related fields.
Author : N. Miura
Publisher : Springer
ISBN 13 :
Total Pages : 960 pages
Book Rating : 4.:/5 (318 download)
Download or read book Proceedings of the 25th International Conference on the Physics of Semiconductors Part I written by N. Miura and published by Springer. This book was released on 2001-05-17 with total page 960 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the proceedings of the most important and prestigious conference in the field of semiconductor physics, this book contains the latest information on the progress of semiconductor physics. Almost 1000 contributed papers address the full range of current topics. The special symposium deals with the interface between the fundamentals and device applications and tries to predict the developments in semiconductor physics, semiconductor materials and device applications in the 21st century. A wide range of contributions represent the forefront of academic and industrial research.
Author : E.F. Krimmel
Publisher : Elsevier
ISBN 13 : 0444596364
Total Pages : 744 pages
Book Rating : 4.4/5 (445 download)
Download or read book Photon, Beam and Plasma Assisted Processing written by E.F. Krimmel and published by Elsevier. This book was released on 1989-02-01 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author : A.J. van Roosmalen
Publisher : Springer Science & Business Media
ISBN 13 : 148992566X
Total Pages : 247 pages
Book Rating : 4.4/5 (899 download)
Download or read book Dry Etching for VLSI written by A.J. van Roosmalen and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
