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Electron Beam Technology In Microelectronic Fabrication
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Book Synopsis Electron-Beam Technology in Microelectronic Fabrication by : George Brewer
Download or read book Electron-Beam Technology in Microelectronic Fabrication written by George Brewer and published by Elsevier. This book was released on 2012-12-02 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Book Synopsis Beam Technologies for Integrated Processing by : National Research Council
Download or read book Beam Technologies for Integrated Processing written by National Research Council and published by National Academies Press. This book was released on 1992-02-01 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam technologies play an important role in microelectronic component fabrication and offer opportunities for application in other manufacturing schemes. Emerging beam technologies that incorporate potential for sensors, control, and information processing have created new opportunities for integrated processing of materials and components. This volume identifies various beam technologies and their applications in electronics and other potential manufacturing processes. Recommendations for research and development to enhance the understanding, capabilities, and applications of beam technologies are presented.
Book Synopsis Methods and Materials in Microelectronic Technology by : Joachim Bargon
Download or read book Methods and Materials in Microelectronic Technology written by Joachim Bargon and published by Springer. This book was released on 1984-11-30 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt: The papers collected in this volume were presented at the International Symposium on Methods and Materials in Microelectronic Technology. This symposium was sponsored by IBM Germany, and it was held September 29 - October 1, 1982, in Bad Neuenahr, West Germany. The progress of semiconductor and microelectronic technology has become so rapid and the field so sophisticated that it is imperative to exchange the latest insight gained as frequently as it can be accomplished. In addition, it is peculiar for this field that the bulk of the investigations are carried out at industrial research and development laboratories, which makes some of the results less readily accessible. Because of these circumstances, the academic community, which among other things, is supposed to communicate the prog ress in this field to students of different disciplines, finds it rather difficult to stay properly informed. It was the intent of this IBM sponsored symposium to bring together key scientists from academic institutions, primarily from Europe, with principal investigators of the industrial scene. Accordingly, this symposium exposed technologists to scientists and vice versa. Scientific advances often lead directly to technological innovations. In turn, new technologies are often arrived at empirically and, because of that, are initially poorly understood. Scientific inquiry then attempts to probe these processes and phenomena in order to achieve a better understanding. Thus science and technology are intricately interconnected, and it is important that technical exchange between technolo gists and scientists is facilitated, since the problems are typically interdiscipli nary in nature.
Book Synopsis The Physics of Microfabrication by : Ivor Brodie
Download or read book The Physics of Microfabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Physical Electronics Department of SRI International (formerly Stanford Research Institute) has been pioneering the development of devices fabricated to submicron tolerances for well over 20 years. In 1961, a landmark paper on electron-beam lithography and its associated technologies was published by K. R. Shoulderst (then at SRI), which set the stage for our subsequent efforts in this field. He had the foresight to believe that the building of such small devices was actually within the range of human capabilities. As a result of this initial momentum, our experience in the technologies associated with microfabrication has become remarkably comprehensive, despite the relatively small size of our research activity. We have frequently been asked to deliver seminars or provide reviews on various aspects of micro fabrication. These activities made us aware of the need for a comprehensive overview of the physics of microfabrication. We hope that this book will fill that need.
Book Synopsis Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology by : Saburo Nonogaki
Download or read book Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology written by Saburo Nonogaki and published by CRC Press. This book was released on 2018-10-08 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Book Synopsis Nanofabrication by : Maria Stepanova
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Book Synopsis Electron Beam Techniques for Microelectronic Device Fabrication by : Richard Andrew Harris
Download or read book Electron Beam Techniques for Microelectronic Device Fabrication written by Richard Andrew Harris and published by . This book was released on 1973 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Beam Processing Technologies by : Norman G. Einspruch
Download or read book Beam Processing Technologies written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 559 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.
Book Synopsis Electron Beam Lithography Process Optimization by : Rohan Handa
Download or read book Electron Beam Lithography Process Optimization written by Rohan Handa and published by GRIN Verlag. This book was released on 2011-12 with total page 37 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical Report from the year 2011 in the subject Design (Industry, Graphics, Fashion), University of Southern California, language: English, abstract: Currently, nanowires have aroused intensive attention due to their interesting electric and optical properties as well as potentially wide application (For example, nanowires can be used as a promising structure for transistor channels). For compound semiconductor nanowires, Nanoscale Selective Area MOCVD (Metalorganic Chemical Vapor Deposition), or NS‐SAG, is a very attractive growth technique for the fabrication of sophisticated nanowire structure, because by using this technique, diameter and location of wires are controllable, with no incorporation of unwanted metals. It is achieved by deposition of a nano‐openingarray ‐patterned dielectric mask above the substrate. Since crystals cannot be formed on dielectric mask, nanowire growth only occurs at openings, with desired diameters and locations, as shown in Fig 1. Pattern of nano opening arrays is of vital importance since it governs the size, location and density of nanowires as wells as growth rate and behavior.
Book Synopsis Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography by : P. Rai-Choudhury
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Book Synopsis The Physics of Micro/Nano-Fabrication by : Ivor Brodie
Download or read book The Physics of Micro/Nano-Fabrication written by Ivor Brodie and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 661 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.
Book Synopsis The Science and Engineering of Microelectronic Fabrication by : Stephen A. Campbell
Download or read book The Science and Engineering of Microelectronic Fabrication written by Stephen A. Campbell and published by Oxford University Press, USA. This book was released on 1996 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Science and Engineering of Microelectronic Fabrication provides an introduction to microelectronic processing. Geared towards a wide audience, it may be used as a textbook for both first year graduate and upper level undergraduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, nonoptical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The book also makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest.
Download or read book Fine Line Lithography written by R Newman and published by Elsevier. This book was released on 2012-12-02 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.
Book Synopsis Integrated Circuit Fabrication by : Shubham Kumar
Download or read book Integrated Circuit Fabrication written by Shubham Kumar and published by CRC Press. This book was released on 2021-04-28 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers theoretical and practical aspects of all major steps in the fabrication sequence. This book can be used conveniently in a semester length course on integrated circuit fabrication. This text can also serve as a reference for practicing engineer and scientist in the semiconductor industry. IC Fabrication are ever demanding of technology in rapidly growing industry growth opportunities are numerous. A recent survey shows that integrated circuit currently outnumber humans in UK, USA, India and China. The spectacular advances in the development and application of integrated circuit technology have led to the emergence of microelectronic process engineering as an independent discipline. Integrated circuit fabrication text books typically divide the fabrication sequence into a number of unit processes that are repeated to form the integrated circuit. The effect is to give the book an analysis flavor: a number of loosely related topics each with its own background material. Note: T& F does not sell or distribute the Hardback in India, Pakistan, Nepal, Bhutan, Bangladesh and Sri Lanka.
Book Synopsis Micro/nanoscale Fabrication and Testing of Small-scale Structures Using Focused Ion and Electron Beam Technology by : Cheng Choo Nikki Lee
Download or read book Micro/nanoscale Fabrication and Testing of Small-scale Structures Using Focused Ion and Electron Beam Technology written by Cheng Choo Nikki Lee and published by . This book was released on 2013 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electron-beam, X-ray, and Ion-beam Technology by : Arnold W. Yanof
Download or read book Electron-beam, X-ray, and Ion-beam Technology written by Arnold W. Yanof and published by . This book was released on 1989 with total page 404 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Large Scale Integrated Circuits Technology: State of the Art and Prospects by : Leo Esaki
Download or read book Large Scale Integrated Circuits Technology: State of the Art and Prospects written by Leo Esaki and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: A NATO Advanced Study Institute on "Large Scale Integrated Circuits Technology: State of the Art and Prospects" was held at Ettore Majorana Centre for Scientific Culture, Erice (Italy) on July 15-27, 1981, the first course of the International School of Solid-State Device Research. This volume contains the School Proceedings: fundamentals as well as up-to-date information on each subject presented by qualified authors. The material covered in this volume has been arranged in self-consistent chapters. Therefore, the Proceedings may be used as a suitable textbook or authoritative review for research workers and advanced students in the relevant field. The nascent information society is based on advanced technologies which will revolutionize human abilities to manipulate and communicate information. One of the most important underpinnings for developing such an information society lies in innovations in semiconductor microelectronics. Such innova tions, indeed, are dramatically reducing the cost of transmitting, storing, and processing information with improved performance, ushering in an era charac terized by large scale integration -the subject of this book.
