Handbook of Photomask Manufacturing Technology

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Publisher : CRC Press
ISBN 13 : 1420028782
Total Pages : 730 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Handbook of Photomask Manufacturing Technology by : Syed Rizvi

Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 730 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

Computational Lithography

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Publisher : John Wiley & Sons
ISBN 13 : 111804357X
Total Pages : 225 pages
Book Rating : 4.1/5 (18 download)

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Book Synopsis Computational Lithography by : Xu Ma

Download or read book Computational Lithography written by Xu Ma and published by John Wiley & Sons. This book was released on 2011-01-06 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.

Advances in FDTD Computational Electrodynamics

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Publisher : Artech House
ISBN 13 : 1608071707
Total Pages : 640 pages
Book Rating : 4.6/5 (8 download)

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Book Synopsis Advances in FDTD Computational Electrodynamics by : Allen Taflove

Download or read book Advances in FDTD Computational Electrodynamics written by Allen Taflove and published by Artech House. This book was released on 2013 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in photonics and nanotechnology have the potential to revolutionize humanitys ability to communicate and compute. To pursue these advances, it is mandatory to understand and properly model interactions of light with materials such as silicon and gold at the nanoscale, i.e., the span of a few tens of atoms laid side by side. These interactions are governed by the fundamental Maxwells equations of classical electrodynamics, supplemented by quantum electrodynamics. This book presents the current state-of-the-art in formulating and implementing computational models of these interactions. Maxwells equations are solved using the finite-difference time-domain (FDTD) technique, pioneered by the senior editor, whose prior Artech House books in this area are among the top ten most-cited in the history of engineering. This cutting-edge resource helps readers understand the latest developments in computational modeling of nanoscale optical microscopy and microchip lithography, as well as nanoscale plasmonics and biophotonics.

Progress in Optics

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Publisher : Elsevier
ISBN 13 : 0444594221
Total Pages : 378 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Progress in Optics by : Emil Wolf

Download or read book Progress in Optics written by Emil Wolf and published by Elsevier. This book was released on 2012-09-05 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the 50 years since the first volume of Progress in Optics was published, optics has become one of the most dynamic fields of science. The volumes in this series that have appeared up to now contain more than 300 review articles by distinguished research workers, which have become permanent records for many important developments, helping optical scientists and optical engineers stay abreast of their fields. Comprehensive, in-depth reviews Edited by the leading authority in the field

Transport in Laser Microfabrication

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Author :
Publisher : Cambridge University Press
ISBN 13 : 052182172X
Total Pages : 413 pages
Book Rating : 4.5/5 (218 download)

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Book Synopsis Transport in Laser Microfabrication by : Costas P. Grigoropoulos

Download or read book Transport in Laser Microfabrication written by Costas P. Grigoropoulos and published by Cambridge University Press. This book was released on 2009-07-30 with total page 413 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides researchers and practitioners with the technical background to understand transport phenomena in laser microfabrication applications.

Lithography

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Publisher : John Wiley & Sons
ISBN 13 : 1118621182
Total Pages : 311 pages
Book Rating : 4.1/5 (186 download)

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Book Synopsis Lithography by : Stefan Landis

Download or read book Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.

Optical and EUV Lithography

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Publisher :
ISBN 13 : 9781510639010
Total Pages : pages
Book Rating : 4.6/5 (39 download)

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Book Synopsis Optical and EUV Lithography by : Andreas Erdmann

Download or read book Optical and EUV Lithography written by Andreas Erdmann and published by . This book was released on 2021-02 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Dissertation Abstracts International

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Publisher :
ISBN 13 :
Total Pages : 960 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Dissertation Abstracts International by :

Download or read book Dissertation Abstracts International written by and published by . This book was released on 2007 with total page 960 pages. Available in PDF, EPUB and Kindle. Book excerpt:

EMLC 2005

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Author :
Publisher : Margret Schneider
ISBN 13 : 3800728753
Total Pages : 301 pages
Book Rating : 4.8/5 (7 download)

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Book Synopsis EMLC 2005 by : Uwe Behringer

Download or read book EMLC 2005 written by Uwe Behringer and published by Margret Schneider. This book was released on 2005 with total page 301 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Modeling Innovations in EUV and Nanoimprint Lithography

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Author :
Publisher :
ISBN 13 :
Total Pages : 326 pages
Book Rating : 4.:/5 (35 download)

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Book Synopsis Modeling Innovations in EUV and Nanoimprint Lithography by : Yunfei Deng

Download or read book Modeling Innovations in EUV and Nanoimprint Lithography written by Yunfei Deng and published by . This book was released on 2005 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Laser Ablation and Its Applications

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Publisher : Springer Science & Business Media
ISBN 13 : 0387304525
Total Pages : 598 pages
Book Rating : 4.3/5 (873 download)

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Book Synopsis Laser Ablation and Its Applications by : Claude Phipps

Download or read book Laser Ablation and Its Applications written by Claude Phipps and published by Springer Science & Business Media. This book was released on 2007 with total page 598 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser ablation describes the interaction of intense optical fields with matter, in which atoms are selectively driven off by thermal or nonthermal mechanisms. The field of laser ablation physics is advancing so rapidly that its principal results are seen only in specialized journals and conferences. This is the first book that combines the most recent results in this rapidly advancing field with authoritative treatment of laser ablation and its applications, including the physics of high-power laser-matter interaction. Many practical applications exist, ranging from inertial confinement fusion to propulsion of aerostats for pollution monitoring to laser ignition of hypersonic engines to laser cleaning nanoscale contaminants in high-volume computer hard drive manufacture to direct observation of the electronic or dissociative states in atoms and molecules, to studying the properties of materials during 200kbar shocks developed in 200fs. Selecting topics which are representative of such a broad field is difficult. Laser Ablation and its Applications emphasizes the wide range of these topics rather than - as is so often the case in advanced science – focusing on one specialty or discipline. The book is divided into four sections: theory and modeling, ultrafast interactions, material processing and laser-matter interaction in novel regimes. The latter range from MALDI to ICF, SNOM’s and femtosecond nanosurgery to laser space propulsion. The book arose from the SPIE series of High Power Laser Ablation Symposia which began in 1998. It is intended for a graduate course in laser interactions with plasmas and materials, but it should be accessible to anyone with a graduate degree in physics or engineering. It is also intended as a major reference work to familiarize scientists just entering the field with laser ablation and its applications.

EMC 2004

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Author :
Publisher : Margret Schneider
ISBN 13 : 3800728117
Total Pages : 258 pages
Book Rating : 4.8/5 (7 download)

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Book Synopsis EMC 2004 by :

Download or read book EMC 2004 written by and published by Margret Schneider. This book was released on 2004 with total page 258 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Emerging Lithographic Technologies

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Publisher :
ISBN 13 :
Total Pages : 644 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Emerging Lithographic Technologies by :

Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2005 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Microlithography

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Publisher : CRC Press
ISBN 13 : 1351643444
Total Pages : 913 pages
Book Rating : 4.3/5 (516 download)

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Book Synopsis Microlithography by : Bruce W. Smith

Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2020-05-01 with total page 913 pages. Available in PDF, EPUB and Kindle. Book excerpt: The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Applied Engineering Failure Analysis

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Publisher : CRC Press
ISBN 13 : 1482222191
Total Pages : 358 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Applied Engineering Failure Analysis by : Hock-Chye Qua

Download or read book Applied Engineering Failure Analysis written by Hock-Chye Qua and published by CRC Press. This book was released on 2015-03-25 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book fills the gap between failure analysis theory and the actual conducts of the failure cases. The book demonstrates the main methodologies that have evolved over time and includes examples from the 1970s to date. Engineering calculations and estimation of system stresses and strengths are given in the relevant chapters. It presents a wide range of cases studies, ranging from mechanical engineering, metallurgy, mining, civil/structural engineering, electrical power systems, and radiation damage.

Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography

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Author :
Publisher : SPIE Press
ISBN 13 : 9780819423788
Total Pages : 780 pages
Book Rating : 4.4/5 (237 download)

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Book Synopsis Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography by : P. Rai-Choudhury

Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.

Memorandum

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Publisher :
ISBN 13 :
Total Pages : 442 pages
Book Rating : 4.:/5 (35 download)

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Book Synopsis Memorandum by :

Download or read book Memorandum written by and published by . This book was released on 2002 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt: