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Electrical Conduction In Tantalum Oxide Thin Films
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Book Synopsis Electrical Conduction in Tantalum Oxide Thin Films by : M. W. Jones
Download or read book Electrical Conduction in Tantalum Oxide Thin Films written by M. W. Jones and published by . This book was released on 1974 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Conduction Mechanisms in Amorphous and Crystalline Tantalum Oxide Thin Films by : Brian Anthony Bontempo
Download or read book Conduction Mechanisms in Amorphous and Crystalline Tantalum Oxide Thin Films written by Brian Anthony Bontempo and published by . This book was released on 2010 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt: Capacitors provide energy storage for a number of devices, from pacemakers to railguns. Researchers are pursuing new materials to construct capacitors in an attempt to create higher power, higher energy storage devices with less loss in energy in the charged state. This research initiative explores tantalum pentoxide (Ta2O5) capacitors of approximately 1.5 micrometer thickness deposited via pulsed-dc reactive sputtering. Relative permittivity and dielectric loss were explored for the tantalum oxide films. Current was measured for both amorphous and crystalline samples as a function of voltage, temperature, and time. Analyzing these data revealed that at low electric fields conduction was ohmic. Nonlinear behavior at high fields was fitted for Schottky and Poole-Frenkel mechanisms. It appears that both amorphous and crystalline samples were dominated by Poole-Frenkel conduction. However amorphous samples had a leakage current that was several orders of magnitude lower than the polycrystalline samples. The AC conductivity was measured for amorphous and crystalline samples across a range of frequencies, and compared to the DC values. At low frequencies, amorphous samples had conductivities approaching the DC values, but crystalline samples remained much higher than their DC values.
Book Synopsis Study of the Conduction Mechanism of Amorphous Tantalum Oxide Thin Films by : Hsüeh-ming Wu
Download or read book Study of the Conduction Mechanism of Amorphous Tantalum Oxide Thin Films written by Hsüeh-ming Wu and published by . This book was released on 1993 with total page 90 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1976 with total page 612 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Temperature Independent Electrical Conduction in Some Oxide Thin Films by : Robert William Frankson
Download or read book Temperature Independent Electrical Conduction in Some Oxide Thin Films written by Robert William Frankson and published by . This book was released on 1970 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Synthesis and Characterization of Sol-gel Derived Tantalum Oxide, Tantalum Nitride, and Nickel-alumina Thin Films by : Gerald Thomas Kraus
Download or read book Synthesis and Characterization of Sol-gel Derived Tantalum Oxide, Tantalum Nitride, and Nickel-alumina Thin Films written by Gerald Thomas Kraus and published by . This book was released on 1997 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Materials and Electrical Characterization of Sputtered Tantalum Oxide Thin Films by : Andrea Pons
Download or read book Materials and Electrical Characterization of Sputtered Tantalum Oxide Thin Films written by Andrea Pons and published by . This book was released on 2006 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Conduction Mechanism in Tantalum Pentoxide Thin Films as a Function of Mode of Fabrication, Temperature, Oxygen Partial Pressure and Structure by : Andreas Gerhard Hegedus
Download or read book The Conduction Mechanism in Tantalum Pentoxide Thin Films as a Function of Mode of Fabrication, Temperature, Oxygen Partial Pressure and Structure written by Andreas Gerhard Hegedus and published by . This book was released on 1979 with total page 54 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Tantalum Oxide Thin Films for Microelectronic Applications by : Fang-Xing Jiang
Download or read book Tantalum Oxide Thin Films for Microelectronic Applications written by Fang-Xing Jiang and published by . This book was released on 1995 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: "There is a critical demand for new dielectric films having higher dielectric constants, higher dielectric strengths and lower leakage currents for applications such as charge storage capacitors for DRAMs in ULSI and low-inductance decoupling capacitors for the control of simultaneous switching noise (SSN) in high-speed switching ULSI chips. Among these candidates for insulators, tantalum pentoxide has received considerable attention. As earlier as in the 1960's, tantalum oxide has been used as the dielectric in discrete capacitors. Recently, several papers have been reported on the electrical properties of Ta205 films grown by various techniques. It has been reported that the electrical properties, e.g. dielectric constant, leakage current, dielectric strength as well as the nature of the Ta2Os/Si interface, are extremely sensitive to the annealing conditions. At the present time, however, the role of the as-deposited Ta2Os/Si interface is not fully understood. In the present study, a two-step process, consisting two separate depositions and annealing, has been developed to improve the physical and electrical characteristics of reactivity sputtered Ta2Os films. The reactive ion etching (RE) selectivity of Ta2Os to Si, Si02 and Ta in CHF3, CF4 and SF6 with fractions of 02, H2 and Ar has been investigated for IC process applications. The tantalum oxide films were deposited on Si wafers by reactive DC sputtering. The films were characterized for thickness and refractive index using an ellipsometer and their phase was identified using an X-ray diffractometer. The annealing effect on Ta2Oj in oxygen ambient at 800C shows that the Ta205 films crystallize into an orthorhombic phase, condensed with a decrease of thickness and an increase of refractive index. Various capacitor configurations, such as MTM (Al/Ta205/Al) and MIS (Al/Ta20$/p-Si, Al/Ta205/n-Si and Al/Ta2Os/n+-Si), were fabricated to study the nature of Ta2Os/Si interface and the I-V and C-V characteristics. The as-deposited Ta2Os film on p-type Si substrate can sustain an electric field of 3 MV/cm at a current density of 1 u.A/cm2 in the accumulation mode, which is an order higher than that on n-type substrate. The value of apparent dielectric constant of as-deposited Ta2Os film estimated from the Al/Ta205/Al capacitor is 16, however, the value varies from 6 to 10 in MIS capacitors. This shows a evidence strongly that there is a substrate sensitivity for tantalum oxide films. As a result of the two-step process, the dielectric constant of Al/Ta2Os/n+-Si capacitor increases to 21. This value is considerably close to 24 for bulk Ta2Oj. To investigate the RIE selectivity of Ta2Os to Ta, Si and Si02, the Ta2Os film was deposited onto a wafer with three other films, DC sputtered Ta, LPCVD polysilicon, and thermally grown Si02. It is revealed that in SF6 with various fractions of 20% hydrogen or argon, the Ta2Os film shows extremely low etch rate as compared with Si, Ta and Si02, and in CF4 with various fractions of 30% hydrogen or oxygen, the Ta205 film shows a lower etch rate. However, in CHF3 the etch rates of Si and Ta2Os are comparable. The absorption spectrum of deposited tantalum oxide films was also measured. This material can be used for phase shift and attenuation masks, sunglasses and light filters. The as-deposited tantalum oxide films show a high absorbency peak at 217 nm and an additional small peak. at 416 nm with two subpeaks at 286 and 510 nm using spectrophotometer. The high peak becomes broadened and the long wavelength side of the small peak is shifted to short wavelength through annealing. A model of free volume like defect and oxygen vacancy like defect is proposed to explain the change of the absorbency spectrum."--Abstract.
Book Synopsis Physics of Thin Films by : Maurice H. Francombe
Download or read book Physics of Thin Films written by Maurice H. Francombe and published by Elsevier. This book was released on 2013-10-22 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects are also considered. The next chapter examines studies on size-dependent electrical conduction in thin metal films and wires, paying particular attention to both classical and quantum size effects and some of the anisotropic characteristics of epitaxial metal films. The reader is then introduced to the optical properties of metal films and interactions in multilayer magnetic films. This text concludes with a chapter that looks at diffusion in metallic films and presents experimental results for phase-forming systems, miscible systems, and lateral diffusion. This monograph will be of value to students and practitioners of physics, especially those interested in thin films.
Book Synopsis Thin Films and Coatings by : B. M. Caruta
Download or read book Thin Films and Coatings written by B. M. Caruta and published by Nova Publishers. This book was released on 2005 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: The broad field of thin film technology is based first of all on the film growth processes in general. The concepts of crystal structure and defects in crystalline thin films such as grain boundaries, dislocations and vacancies are examined. The general nature of film growth from atoms equilibrating with the service, through the initial stages of growth to film coalescence and zone models is also within the scope of this book as are evaporation, sputter deposition and chemical vapour deposition. Thin films are widely used in microelectronics, chemistry and a wide array of related fields. This book offers new research in this exploding field.
Book Synopsis The Physics of Semiconductor Devices by : R. K. Sharma
Download or read book The Physics of Semiconductor Devices written by R. K. Sharma and published by Springer. This book was released on 2019-01-31 with total page 1299 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book disseminates the current knowledge of semiconductor physics and its applications across the scientific community. It is based on a biennial workshop that provides the participating research groups with a stimulating platform for interaction and collaboration with colleagues from the same scientific community. The book discusses the latest developments in the field of III-nitrides; materials & devices, compound semiconductors, VLSI technology, optoelectronics, sensors, photovoltaics, crystal growth, epitaxy and characterization, graphene and other 2D materials and organic semiconductors.
Book Synopsis Conduction Characteristics of Tantalum Oxide Films by : Lyle D. Feisel
Download or read book Conduction Characteristics of Tantalum Oxide Films written by Lyle D. Feisel and published by . This book was released on 1964 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Groups IV, V, and VI Transition Metals and Compounds by : T. F. Connolly
Download or read book Groups IV, V, and VI Transition Metals and Compounds written by T. F. Connolly and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 219 pages. Available in PDF, EPUB and Kindle. Book excerpt: responsibility.) To Betty Edwards and Emily Copenhaver my thanks for what must have seemed endless typing, retyping and correcting of these bibliographies over a span of years. Availability of Documents U. S. Government contractor reports, usually identified by an alpha-numeric report number, can be purchased from National Technical Information Service U. S. Department of Commerce Springfield, Virginia 22151 and, often, on request from the issuing installation. USAEC reports are also available from International Atomic Energy Agency Kaerntnerring A 1010 Vienna, Austria National Lending Library Boston Spa England Monographs and reports of the National Bureau of Standards are for sale by Superintendent of Documents U. S. Government Printing Office Washington, D. C. 20402 Theses, listed as Dissertation Abstracts + number, are available in North or South America from University Microfilms Dissertation Copies P. O. Box 1764 Ann Arbor, Michigan 48106 and elsewhere from University Microfilms, Ltd. St. John's Road Tylers Green Penn, Buckinghamshire England Other Information Centers and New Journals New journals Information centers Field and and other sources serials Ultra purification 4, 8, 11, 13, 15, 16,19, 20, 9,11,15, 24, 31, 32 and 21, 28, 30, 32, 33, 42, 58, 59 crystal growth ix Preface Field Information centers New journals and and other -sources serials Characterization Miscellaneous 3,4, 8, 11, 13, 16, 19, 20, 1,3,4,8,11,15,17, 21, 26, 28, 30, 31, 32, 33, 35, 24, 25, 28, 29, 30, 31, 37, 38, 39, 40, 42, 46, 53, 56, 32 58, 60, 61, 62
Book Synopsis Tantalum Thin Films by : William Dickson Westwood
Download or read book Tantalum Thin Films written by William Dickson Westwood and published by . This book was released on 1975 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Effects of Annealing Temperature and Deposition Parameters on the Mechanical and Electrical Properties of Tantalum Oxide Thin Films by : Jaya Murli Purswani
Download or read book The Effects of Annealing Temperature and Deposition Parameters on the Mechanical and Electrical Properties of Tantalum Oxide Thin Films written by Jaya Murli Purswani and published by . This book was released on 2004 with total page 180 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Characterization of Amorphous and Crystalline Rough Surface -- Principles and Applications by :
Download or read book Characterization of Amorphous and Crystalline Rough Surface -- Principles and Applications written by and published by Elsevier. This book was released on 2000-10-23 with total page 437 pages. Available in PDF, EPUB and Kindle. Book excerpt: The structure of a growth or an etch front on a surface is not only a subject of great interest from the practical point of view but also is of fundamental scientific interest. Very often surfaces are created under non-equilibrium conditions such that the morphology is not always smooth. In addition to a detailed description of the characteristics of random rough surfaces, Experimental Methods in the Physical Sciences, Volume 37, Characterization of Amorphous and Crystalline Rough Surface-Principles and Applications will focus on the basic principles of real and diffraction techniques for quantitative characterization of the rough surfaces. The book thus includes the latest development on the characterization and measurements of a wide variety of rough surfaces. The complementary nature of the real space and diffraction techniques is fully displayed. Key Features * An accessible description of quantitative characterization of random rough surfaces and growth/etch fronts * A detailed description of the principles, experimentation, and limitations of advanced real-space imaging techniques (such as atomic force microscopy) and diffraction techniques (such as light scattering, X-ray diffraction, and electron diffraction) * Characterization of a variety of rough surfaces (e.g., self-affine, mounded, anisotropic, and two-level surfaces) accompanied by quantitative examples to illustrate the essence of the principles * An insightful description of how rough surfaces are formed * Presentation of the most recent examples of the applications of rough surfaces in various areas