Electrical Characterization of Hafnium Oxide (HfO2) Thin Films Deposited by RF Sputtering

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ISBN 13 :
Total Pages : 288 pages
Book Rating : 4.:/5 (72 download)

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Book Synopsis Electrical Characterization of Hafnium Oxide (HfO2) Thin Films Deposited by RF Sputtering by : Pratap Murali

Download or read book Electrical Characterization of Hafnium Oxide (HfO2) Thin Films Deposited by RF Sputtering written by Pratap Murali and published by . This book was released on 2006 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physical and Electrical Characterization of Hafnium Oxide Thin Films Deposited by Pulsed Laser Deposition Technique

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ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.:/5 (574 download)

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Book Synopsis Physical and Electrical Characterization of Hafnium Oxide Thin Films Deposited by Pulsed Laser Deposition Technique by : Bhanu P. Dharmaiahgari

Download or read book Physical and Electrical Characterization of Hafnium Oxide Thin Films Deposited by Pulsed Laser Deposition Technique written by Bhanu P. Dharmaiahgari and published by . This book was released on 2004 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Microstructure and Electrical Performance of Sputter-deposited Hafnium Oxide (HfO2) Thin Films

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (68 download)

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Book Synopsis Microstructure and Electrical Performance of Sputter-deposited Hafnium Oxide (HfO2) Thin Films by : Brandon A. Aguirre

Download or read book Microstructure and Electrical Performance of Sputter-deposited Hafnium Oxide (HfO2) Thin Films written by Brandon A. Aguirre and published by . This book was released on 2009 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Physics of Semiconductor Devices

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Publisher : Springer
ISBN 13 : 3319976044
Total Pages : 1299 pages
Book Rating : 4.3/5 (199 download)

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Book Synopsis The Physics of Semiconductor Devices by : R. K. Sharma

Download or read book The Physics of Semiconductor Devices written by R. K. Sharma and published by Springer. This book was released on 2019-01-31 with total page 1299 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book disseminates the current knowledge of semiconductor physics and its applications across the scientific community. It is based on a biennial workshop that provides the participating research groups with a stimulating platform for interaction and collaboration with colleagues from the same scientific community. The book discusses the latest developments in the field of III-nitrides; materials & devices, compound semiconductors, VLSI technology, optoelectronics, sensors, photovoltaics, crystal growth, epitaxy and characterization, graphene and other 2D materials and organic semiconductors.

Hafnium Oxide And Hafnium Silicate For High-k Application

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ISBN 13 : 9783838333885
Total Pages : 232 pages
Book Rating : 4.3/5 (338 download)

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Book Synopsis Hafnium Oxide And Hafnium Silicate For High-k Application by : Harish Bhandari

Download or read book Hafnium Oxide And Hafnium Silicate For High-k Application written by Harish Bhandari and published by . This book was released on 2010-04 with total page 232 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physics and Technology of High-k Gate Dielectrics II

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Publisher : The Electrochemical Society
ISBN 13 : 9781566774055
Total Pages : 512 pages
Book Rating : 4.7/5 (74 download)

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Book Synopsis Physics and Technology of High-k Gate Dielectrics II by : Samares Kar

Download or read book Physics and Technology of High-k Gate Dielectrics II written by Samares Kar and published by The Electrochemical Society. This book was released on 2004 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.

Electrical, Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass, Pet and Polycarbonate Substrates by Rf Sputtering

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ISBN 13 :
Total Pages : 140 pages
Book Rating : 4.:/5 (375 download)

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Book Synopsis Electrical, Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass, Pet and Polycarbonate Substrates by Rf Sputtering by : Teck-Shiun Lim

Download or read book Electrical, Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass, Pet and Polycarbonate Substrates by Rf Sputtering written by Teck-Shiun Lim and published by . This book was released on 199? with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:

RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application

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Publisher : LAP Lambert Academic Publishing
ISBN 13 : 9783659539350
Total Pages : 176 pages
Book Rating : 4.5/5 (393 download)

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Book Synopsis RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application by : Anil Kumar Gadipelly

Download or read book RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application written by Anil Kumar Gadipelly and published by LAP Lambert Academic Publishing. This book was released on 2015-02-04 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

Pulsed Laser Deposition of Thin Films

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Publisher : John Wiley & Sons
ISBN 13 : 0470052112
Total Pages : 754 pages
Book Rating : 4.4/5 (7 download)

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Book Synopsis Pulsed Laser Deposition of Thin Films by : Robert Eason

Download or read book Pulsed Laser Deposition of Thin Films written by Robert Eason and published by John Wiley & Sons. This book was released on 2007-12-14 with total page 754 pages. Available in PDF, EPUB and Kindle. Book excerpt: Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Controlling Opto-electric Properties of Cadmium Stannate Thin Films Deposited by RF Sputtering

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (792 download)

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Book Synopsis Controlling Opto-electric Properties of Cadmium Stannate Thin Films Deposited by RF Sputtering by : Evan Kimberly

Download or read book Controlling Opto-electric Properties of Cadmium Stannate Thin Films Deposited by RF Sputtering written by Evan Kimberly and published by . This book was released on 2011 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: In this research, the optical and electrical properties of cadmium stannate thin films were studied in order to determine how these properties depend on the deposition and heat treatment conditions used during film formation. Trends in band gap energy, transmittance, mobility, resistivity and carrier density were studied, as well as the growth rate and the indices of refraction and extinction. Optical data was primarily measured using variable angle spectroscopic ellipsometry. In the process of acquiring this data, a procedure for accurately determining the optical properties using variable angle spectroscopic ellipsometry was developed. Ultimately, samples achieved the highest quality when deposited in 5% atmospheric oxygen at room temperature and heat treated at 600 °C in contact with a cadmium sulfide layer in an argon atmosphere. It was found that oxygen content and film thickness may affect the heat treatment process, while temperature treatments below 600 °C will not sufficiently induce crystallization. Further study should be given to controlling the cadmium sulfide diffusion rate in order to optimize carrier density and mobility.

The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media

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ISBN 13 :
Total Pages : 624 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media by : Jong-Kai Lin

Download or read book The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media written by Jong-Kai Lin and published by . This book was released on 1986 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Deposition and Characterization of HfO2 Thin Films

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ISBN 13 :
Total Pages : 142 pages
Book Rating : 4.:/5 (36 download)

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Book Synopsis Deposition and Characterization of HfO2 Thin Films by : Shubing Zou

Download or read book Deposition and Characterization of HfO2 Thin Films written by Shubing Zou and published by . This book was released on 1994 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ferroelectricity in Doped Hafnium Oxide

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Publisher : Woodhead Publishing
ISBN 13 : 0081024312
Total Pages : 570 pages
Book Rating : 4.0/5 (81 download)

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Book Synopsis Ferroelectricity in Doped Hafnium Oxide by : Uwe Schroeder

Download or read book Ferroelectricity in Doped Hafnium Oxide written by Uwe Schroeder and published by Woodhead Publishing. This book was released on 2019-03-27 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face

Characterization of Inert Gas RF Plasma-treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering

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ISBN 13 :
Total Pages : 48 pages
Book Rating : 4.:/5 (1 download)

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Book Synopsis Characterization of Inert Gas RF Plasma-treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering by : Amber Nicole Reed

Download or read book Characterization of Inert Gas RF Plasma-treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering written by Amber Nicole Reed and published by . This book was released on 2008 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Reactive Radio Frequency Sputtering of Iron Oxide Thin Films for Electrical Resistivity Characterization

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ISBN 13 :
Total Pages : 112 pages
Book Rating : 4.:/5 (219 download)

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Book Synopsis Reactive Radio Frequency Sputtering of Iron Oxide Thin Films for Electrical Resistivity Characterization by : Cullen Lee Hackler

Download or read book Reactive Radio Frequency Sputtering of Iron Oxide Thin Films for Electrical Resistivity Characterization written by Cullen Lee Hackler and published by . This book was released on 1974 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Material Science and Engineering

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Publisher : CRC Press
ISBN 13 : 1315638886
Total Pages : 711 pages
Book Rating : 4.3/5 (156 download)

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Book Synopsis Material Science and Engineering by : Ping Chen

Download or read book Material Science and Engineering written by Ping Chen and published by CRC Press. This book was released on 2016-03-18 with total page 711 pages. Available in PDF, EPUB and Kindle. Book excerpt: Material Science and Engineering presents novel and fundamental advances in the field of material science and engineering. This proceedings collects the comprehensive and worldwide research results on Metallic Materials and Applications, Chemical Materials, Electronic Materials, Nanomaterials, Composite and Polymer Materials, Bio and Medical Materi

The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (861 download)

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Book Synopsis The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films by : John Gerald Kavanagh

Download or read book The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films written by John Gerald Kavanagh and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An investigation was made into the effect of rf magnetron deposition parameters on the resulting properties of chromium oxide thin films. The films were sputtered in an argon/ oxygen plasma environment with the main deposition parameters being the argon and oxygen flow rate, chamber pressure, deposition-time and the deposition power (forward and back). Tire effect of the sputter deposition regime which is controlled by the sputtering hysteresis phenomenon i.e. the reactive and metallic regimes, are expected to have a significant effect on the properties of the sputtered films and will have to be taken into account. The films were deposited on a range of substrates such as silicon, glass micro-slides and stainless steel 304 and the composition of the mainly amorphous sputtered films was determined through XPS, EDX and XRD. Optical characterisation and determination of optical constants was undertaken by transmission/reflection spectrophotometry, ellipsometry and Raman and FTIR analysis. Two designs of a solar thermal absorber (multilayer interference and tandem absorber) were designed and fabricated based on the optical constants measured by the methods previously stated and their performance analysed. The surface energy was calculated through measurement of the contact angle with three different liquids and the corrosion resistance of the films measured by OCP, linear sweep and EIS analysis in 3.5wt% NaCI solution. The mechanical properties were measured by nanoindentation, from which the hardness and elastic modulus of the samples could be obtained. The electrical properties were measured using a four point probe to calculate the thin film resistivity and the Kelvin probe analysis was used to measure the work function of the samples.