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Author : Chee Hong Tan
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (688 download)
Download or read book Direct Simulation Monte Carlo Method of Deposition Processes written by Chee Hong Tan and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Brandon D. Morrison
Publisher :
ISBN 13 :
Total Pages : 57 pages
Book Rating : 4.:/5 (512 download)
Download or read book Direct Simulation Monte Carlo Modeling of Effusion Source Vapor Plumes Used in Thin-film Deposition Processes written by Brandon D. Morrison and published by . This book was released on 2002 with total page 57 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gang Chen
Publisher :
ISBN 13 :
Total Pages : 460 pages
Book Rating : 4.E/5 ( download)
Download or read book Direct Simulation Monte Carlo Modeling of Silicon Thin Film Deposition Using Supersonic Beams written by Gang Chen and published by . This book was released on 1998 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 139 pages
Book Rating : 4.:/5 (429 download)
Download or read book Enabling the Direct Simulation (Monte Carlo) of Physical Vapor Deposition written by and published by . This book was released on 2008 with total page 139 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Robert Charles Buxton
Publisher :
ISBN 13 :
Total Pages : 450 pages
Book Rating : 4.:/5 (71 download)
Download or read book Direct Simulation Monte Carlo Modelling of Physical Vapour Deposition written by Robert Charles Buxton and published by . This book was released on 2005 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Husain Ali Al-Mohssen
Publisher :
ISBN 13 :
Total Pages : 69 pages
Book Rating : 4.:/5 (546 download)
Download or read book Chemical Vapor Deposition Modeling Using Direct Simulation Monte Carlo with Non-linear Chemistry and Level Set Profile Evolution written by Husain Ali Al-Mohssen and published by . This book was released on 2003 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Y. Pauleau
Publisher : Springer Science & Business Media
ISBN 13 : 940100353X
Total Pages : 372 pages
Book Rating : 4.4/5 (1 download)
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Author :
Publisher :
ISBN 13 :
Total Pages : 57 pages
Book Rating : 4.:/5 (227 download)
Download or read book Direct Simulation Monte Carlo Study of H/H2 and H/H2/CO Mixtures for Diamond Chemical Vapor Deposition written by and published by . This book was released on 1996 with total page 57 pages. Available in PDF, EPUB and Kindle. Book excerpt: One dimensional direct simulation Monte Carlo calculations have been carried out on H/H2 and H/H2/CO mixtures under operating conditions typical of diffusion-dominated diamond chemical vapor deposition processes. Mechanisms have been included in the model for the adsorption and recombination of hydrogen atoms on the diamond surface and the dissociation of molecular hydrogen at the interior of the reactor. Hydrogen atom fluxes and recombinative and conductive heat fluxes to the diamond surface are calculated as a function of pressure, gas composition, hydrogen dissociation and surface reaction probabilities, reactor temperature, and distance between the activating source and substrate. The numerical calculations are shown to be in excellent agreement with analytical results in the limiting regimes of free-streaming particles at low pressures and continuum hydrodynamics at high pressures.
Author :
Publisher : Academic Press
ISBN 13 : 008057582X
Total Pages : 447 pages
Book Rating : 4.0/5 (85 download)
Download or read book Transport Phenomena in Materials Processing written by and published by Academic Press. This book was released on 1996-06-25 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials processing and manufacturing are fields of growing importance whereby transport phenomena play a central role in many of the applications. This volume is one of the first collections of contributions on thesubject. The five papers cover a wide variety of applications
Author : Alfred Kersch
Publisher : Birkhäuser
ISBN 13 : 303489080X
Total Pages : 235 pages
Book Rating : 4.0/5 (348 download)
Download or read book Transport Simulation in Microelectronics written by Alfred Kersch and published by Birkhäuser. This book was released on 2012-12-06 with total page 235 pages. Available in PDF, EPUB and Kindle. Book excerpt: Computer simulation of semiconductor processing equipment and devices requires the use of a wide variety of numerical methods. Of these methods, the Monte Carlo approach is perhaps most fundamentally suited to mod eling physical events occurring on microscopic scales which are intricately connected to the particle structure of nature. Here physical phenomena can be simulated by following simulation particles (such as electrons, molecules, photons, etc. ) through a statistical sampling of scattering events. Monte Carlo is, however, generally looked on as a last resort due to the extremely slow convergence of these methods. It is of interest, then, to examine when in microelectronics it is necessary to use Monte Carlo methods, how such methods may be improved, and what are the alternatives. This book ad dresses three general areas of simulation which frequently arise in semicon ductor modeling where Monte Carlo methods playa significant role. In the first chapter the basic mathematical theory of the Boltzmann equation for particle transport is presented. The following chapters are devoted to the modeling of the transport processes and the associated Monte Carlo meth ods. Specific examples of industrial applications illustrate the effectiveness and importance of these methods. Two of these areas concern simulation of physical particles which may be assigned a time dependent position and velocity. This includes the molecules of a dilute gas used in such processing equipment as chemi cal vapor decomposition reactors and sputtering reactors. We also consider charged particles moving within a semiconductor lattice.
Author : John Lewis Smith
Publisher :
ISBN 13 :
Total Pages : 58 pages
Book Rating : 4.:/5 (951 download)
Download or read book Combining Monte Carlo Transport and Level Set Surface Evolution for Modeling Vapor Phase Deposition of Thin Films Over Sub-micron Features written by John Lewis Smith and published by . This book was released on 2014 with total page 58 pages. Available in PDF, EPUB and Kindle. Book excerpt: A hybrid scheme is used to model the vapor phase deposition of thin films at the feature scale. The transport of the chemical species to the substrate surface is modeled with a Collisionless Direct Simulation Monte Carlo (DSMC) method. The Level Set Method is used to model the growth of the thin-film on the substrate. The convergence criteria for these methods were not found in literature. The governing equations for the Level Set Method are, in general, non-linear partial differential equations. The coupling of the DSMC Method with the Level Set Method results in a set of non-Gaussian stochastic non-linear partial differential equations. Developing general convergence criteria proved exceedingly difficult, and only qualitative results are presented to support our convergence criteria. Simulation results are in qualitative agreement with experiments and other results from literature.
Author : J. Hammersley
Publisher : Springer Science & Business Media
ISBN 13 : 9400958196
Total Pages : 184 pages
Book Rating : 4.4/5 (9 download)
Download or read book Monte Carlo Methods written by J. Hammersley and published by Springer Science & Business Media. This book was released on 2013-03-07 with total page 184 pages. Available in PDF, EPUB and Kindle. Book excerpt: This monograph surveys the present state of Monte Carlo methods. we have dallied with certain topics that have interested us Although personally, we hope that our coverage of the subject is reasonably complete; at least we believe that this book and the references in it come near to exhausting the present range of the subject. On the other hand, there are many loose ends; for example we mention various ideas for variance reduction that have never been seriously appli(:d in practice. This is inevitable, and typical of a subject that has remained in its infancy for twenty years or more. We are convinced Qf:ver theless that Monte Carlo methods will one day reach an impressive maturity. The main theoretical content of this book is in Chapter 5; some readers may like to begin with this chapter, referring back to Chapters 2 and 3 when necessary. Chapters 7 to 12 deal with applications of the Monte Carlo method in various fields, and can be read in any order. For the sake of completeness, we cast a very brief glance in Chapter 4 at the direct simulation used in industrial and operational research, where the very simplest Monte Carlo techniques are usually sufficient. We assume that the reader has what might roughly be described as a 'graduate' knowledge of mathematics. The actual mathematical techniques are, with few exceptions, quite elementary, but we have freely used vectors, matrices, and similar mathematical language for the sake of conciseness.
Author : Fethi Khelfaoui
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (139 download)
Download or read book How to Use the Monte Carlo Simulation Technique? Application written by Fethi Khelfaoui and published by . This book was released on 2018 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many physical phenomena can be modeled using Monte Carlo simulation (MCS) because it is a powerful tool to study thermodynamic properties. MCS can be used to simulate interactions between several particles or bodies in the presence of local or external fields. The main idea is to create a high number of different random configurations; statistics can be taken according to appropriate algorithms (Metropolis algorithm). In this chapter, we present basic techniques of MCS as the choice of potential, reaction rates, simulation cell, random configurations, and algorithms. We present some principal ideas of MCS used to study particle-particle collisions in the gas and in plasmas. Other MCS techniques are presented briefly. A numerical application is presented for collisions in gas phase during thin film deposition by plasma-enhanced chemical vapor deposition (PECVD) processes. Parameters and results of the simulation are studied according to a chosen reactor and mixture.
Author :
Publisher :
ISBN 13 :
Total Pages : 356 pages
Book Rating : 4.3/5 (91 download)
Download or read book Transport Phenomena in Materials Processing and Manufacturing written by and published by . This book was released on 1996 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : S.N. Atluri
Publisher : Springer Science & Business Media
ISBN 13 : 3642796540
Total Pages : 3181 pages
Book Rating : 4.6/5 (427 download)
Download or read book Computational Mechanics ’95 written by S.N. Atluri and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 3181 pages. Available in PDF, EPUB and Kindle. Book excerpt: AI!, in the earlier conferences (Tokyo, 1986; Atlanta, 1988, Melbourne, 1991; and Hong Kong, 1992) the response to the call for presentations at ICES-95 in Hawaii has been overwhelming. A very careful screening of the extended abstracts resulted in about 500 paper being accepted for presentation. Out of these, written versions of about 480 papers reached the conference secretariat in Atlanta in time for inclusion in these proceedings. The topics covered at ICES-95 range over the broadest spectrum of computational engineering science. The editors thank the international scientific committee, for their advice and encouragement in making ICES-95 a successful scientific event. Special thanks are expressed to the International Association for Boundary Elements Methods for hosting IABEM-95 in conjunction with ICES-95. The editors here express their deepest gratitude to Ms. Stacy Morgan for her careful handling of a myriad of details of ICES-95, often times under severe time constraints. The editors hope that the readers of this proceedings will find a kaleidoscopic view of computational engineering in the year 1995, as practiced in various parts of the world. Satya N. Atluri Atlanta, Georgia, USA Genki Yagawa Tokyo,Japan Thomas A. Cruse Nashville, TN, USA Organizing Committee Professor Genki Yagawa, University of Tokyo, Japan, Chair Professor Satya Atluri, Georgia Institute of Technology, U.S.A.
Author :
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (946 download)
Download or read book Monte Carlo Modeling of YBCO Vapor Deposition written by and published by . This book was released on 2000 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A three dimensional electron beam physical vapor deposition process of super-conducting films of YBa2Cu3O7-(sub delta) in a vacuum chamber is investigated both computationally and experimentally. The numerical analysis employs the direct simulation Monte Carlo (DSMC) method. Some important modeling issues such as atomic collision cross-sections for metal vapors and hyperfine electronic structure of the atomic absorption spectra are addressed. Film deposition thickness profiles and atomic absorption spectra given by the DSMC method and experiment for pure yttrium evaporation are in excellent agreement. Interaction between the vapor jets is found to have a significant effect on the film growth rate and species molar ratio that are key factors of the film technology.
Author : Karl E. Spear
Publisher :
ISBN 13 :
Total Pages : 762 pages
Book Rating : 4.E/5 ( download)
Download or read book CVD-XI written by Karl E. Spear and published by . This book was released on 1990 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:
