Design And Performance Of Capping Layers For Euv Multilayer Mirrors

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EUV Lithography

Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 0819469645
Total Pages : 704 pages
Book Rating : 4.8/5 (194 download)

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Book Synopsis EUV Lithography by : Vivek Bakshi

Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Principles of Lithography

Author : Harry J. Levinson
Publisher : SPIE Press
ISBN 13 : 9780819456601
Total Pages : 446 pages
Book Rating : 4.4/5 (566 download)

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Book Synopsis Principles of Lithography by : Harry J. Levinson

Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Handbook of Photomask Manufacturing Technology

Author : Syed Rizvi
Publisher : CRC Press
ISBN 13 : 1420028782
Total Pages : 728 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Handbook of Photomask Manufacturing Technology by : Syed Rizvi

Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

EUV Sources for Lithography

Author : Vivek Bakshi
Publisher : SPIE Press
ISBN 13 : 9780819458452
Total Pages : 1104 pages
Book Rating : 4.4/5 (584 download)

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Book Synopsis EUV Sources for Lithography by : Vivek Bakshi

Download or read book EUV Sources for Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2006 with total page 1104 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

Modeling of Complex Interfaces: From Surface Chemistry to Nano Chemistry

Author : Frederik Tielens
Publisher : MDPI
ISBN 13 : 3039361945
Total Pages : 166 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis Modeling of Complex Interfaces: From Surface Chemistry to Nano Chemistry by : Frederik Tielens

Download or read book Modeling of Complex Interfaces: From Surface Chemistry to Nano Chemistry written by Frederik Tielens and published by MDPI. This book was released on 2020-12-02 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Introducing the interdisciplinary field of interface chemistry modelling across a wide range of academic disciplines and industry sectors. Ten original research articles are presented that bridge knowledge acquisition and practical work, providing a starting point for the research and development of applications. The book describes the characterization of interfaces at the nanoscale, using a wide range of key nanomaterials, such as graphene, TiO2, zeolites, semimetals, and organic polymers; and the study of their different physical chemical properties, such as catalysis, adsorption, friction, diffusion, and the characterization of nanocomposites and heterojunctions, with many different industrial applications. The resulting collection of papers is equally relevant for advanced students (senior and graduate) and for engineers and scientists from a variety of different academic backgrounds working in the multidisciplinary field of nanotechnology.

Lithography

Author : Stefan Landis
Publisher : John Wiley & Sons
ISBN 13 : 1118621182
Total Pages : 311 pages
Book Rating : 4.1/5 (186 download)

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Book Synopsis Lithography by : Stefan Landis

Download or read book Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.

X-Rays and Extreme Ultraviolet Radiation

Author : David Attwood
Publisher : Cambridge University Press
ISBN 13 : 1316810666
Total Pages : pages
Book Rating : 4.3/5 (168 download)

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Book Synopsis X-Rays and Extreme Ultraviolet Radiation by : David Attwood

Download or read book X-Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2017-02-16 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.

Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications

Author : Ali M. Khounsary
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 : 9780819450661
Total Pages : 240 pages
Book Rating : 4.4/5 (56 download)

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Book Synopsis Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications by : Ali M. Khounsary

Download or read book Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications written by Ali M. Khounsary and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Damage to VUV, EUV, and X-ray Optics

Author : Libor Juha
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 246 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Damage to VUV, EUV, and X-ray Optics by : Libor Juha

Download or read book Damage to VUV, EUV, and X-ray Optics written by Libor Juha and published by SPIE-International Society for Optical Engineering. This book was released on 2007 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Emerging Lithographic Technologies

Author :
Publisher :
ISBN 13 :
Total Pages : 644 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Emerging Lithographic Technologies by :

Download or read book Emerging Lithographic Technologies written by and published by . This book was released on 2005 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advances in X-ray/EUV Optics, Components, and Applications

Author :
Publisher :
ISBN 13 :
Total Pages : 406 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Advances in X-ray/EUV Optics, Components, and Applications by :

Download or read book Advances in X-ray/EUV Optics, Components, and Applications written by and published by . This book was released on 2006 with total page 406 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Synchrotron Radiation Instrumentation

Author : Jae-Young Choi
Publisher : American Institute of Physics
ISBN 13 :
Total Pages : 1154 pages
Book Rating : 4.7/5 (6 download)

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Book Synopsis Synchrotron Radiation Instrumentation by : Jae-Young Choi

Download or read book Synchrotron Radiation Instrumentation written by Jae-Young Choi and published by American Institute of Physics. This book was released on 2007-02-27 with total page 1154 pages. Available in PDF, EPUB and Kindle. Book excerpt: The SRI2006 Proceedings features the most recent developments in present synchrotron radiation sources. It also features up-to-date free electron lasers atphoton energies from the infrared to hard X-rays, beamline instrumentation to transport the radiation to the experiments, as well as experimental techniques to utilize it. Further included are recent experimental results in synchrotron radiation sciences.

Journal of Micro/nanolithography, MEMS, and MOEMS

Author :
Publisher :
ISBN 13 :
Total Pages : 688 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Journal of Micro/nanolithography, MEMS, and MOEMS by :

Download or read book Journal of Micro/nanolithography, MEMS, and MOEMS written by and published by . This book was released on 2008 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Predicting Overlay Errors on Device Wafers Due to the Interaction of Optical and EUV Lithography Fabrication Processes

Author : Liang Zheng
Publisher :
ISBN 13 :
Total Pages : 198 pages
Book Rating : 4.:/5 (89 download)

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Book Synopsis Predicting Overlay Errors on Device Wafers Due to the Interaction of Optical and EUV Lithography Fabrication Processes by : Liang Zheng

Download or read book Predicting Overlay Errors on Device Wafers Due to the Interaction of Optical and EUV Lithography Fabrication Processes written by Liang Zheng and published by . This book was released on 2006 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Optimization Algorithms

Author : Ozgur Baskan
Publisher : BoD – Books on Demand
ISBN 13 : 9535125923
Total Pages : 326 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Optimization Algorithms by : Ozgur Baskan

Download or read book Optimization Algorithms written by Ozgur Baskan and published by BoD – Books on Demand. This book was released on 2016-09-21 with total page 326 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers state-of-the-art optimization methods and their applications in wide range especially for researchers and practitioners who wish to improve their knowledge in this field. It consists of 13 chapters divided into two parts: (I) Engineering applications, which presents some new applications of different methods, and (II) Applications in various areas, where recent contributions of state-of-the-art optimization methods to diverse fields are presented.

Optical Thin Films and Coatings

Author : Angela Piegari
Publisher : Woodhead Publishing
ISBN 13 : 0081020996
Total Pages : 862 pages
Book Rating : 4.0/5 (81 download)

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Book Synopsis Optical Thin Films and Coatings by : Angela Piegari

Download or read book Optical Thin Films and Coatings written by Angela Piegari and published by Woodhead Publishing. This book was released on 2018-06-19 with total page 862 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical Thin Films and Coatings: From Materials to Applications, Second Edition, provides an overview of thin film materials and their properties, design and manufacture across a wide variety of application areas. Sections explore their design and manufacture and their unconventional features, including the scattering properties of random structures in thin films, optical properties at short wavelengths, thermal properties and color effects. Other chapters focus on novel materials, including organic optical coatings, surface multiplasmonics, optical thin films containing quantum dots, and optical coatings, including laser components, solar cells, displays and lighting, and architectural and automotive glass. The book presents a technical resource for researchers and engineers working with optical thin films and coatings. It is also ideal for professionals in the security, automotive, space and other industries who need an understanding of the topic. - Provides thorough review of applications of optical coatings including laser components, solar cells, glazing, displays and lighting - One-stop reference that addresses deposition techniques, properties, and applications of optical thin films and coatings - Novel methods, suggestions for analysis, and applications makes this a valuable resource for experts in the field as well

Optical Constants of Materials for UV and X-ray Wavelengths

Author : John F. Seely
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 190 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Optical Constants of Materials for UV and X-ray Wavelengths by : John F. Seely

Download or read book Optical Constants of Materials for UV and X-ray Wavelengths written by John F. Seely and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.