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Author : Xinye Liu
Publisher :
ISBN 13 :
Total Pages : 436 pages
Book Rating : 4.:/5 (438 download)
Download or read book Chemical Vapor Deposition of Metal Oxide, Titanium Nitride and Niobium Nitride Thin Films written by Xinye Liu and published by . This book was released on 1999 with total page 436 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jeffrey Thomas Barton
Publisher :
ISBN 13 :
Total Pages : 276 pages
Book Rating : 4.:/5 (576 download)
Download or read book Chemical Vapor Deposition and Atomic Layer Deposition of Metal Oxide and Nitride Thin Films written by Jeffrey Thomas Barton and published by . This book was released on 2003 with total page 276 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Edward Thomas Norton (Jr.)
Publisher :
ISBN 13 :
Total Pages : 66 pages
Book Rating : 4.:/5 (415 download)
Download or read book Chemical Vapor Deposition Studies of Titanium-silicon-nitride Thin Films for Use as Diffusion Barriers written by Edward Thomas Norton (Jr.) and published by . This book was released on 1997 with total page 66 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Renaud Fix
Publisher :
ISBN 13 :
Total Pages : 390 pages
Book Rating : 4.:/5 (256 download)
Download or read book Chemical Vapor Deposition of Early Transition-metal Nitride Thin Films written by Renaud Fix and published by . This book was released on 1991 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : David Christopher Gilmer
Publisher :
ISBN 13 :
Total Pages : 314 pages
Book Rating : 4.:/5 (319 download)
Download or read book Chemical Vapor Deposition and Characterization of Titanium Dioxide Thin Films written by David Christopher Gilmer and published by . This book was released on 1998 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Sri Prikash Rangarajan
Publisher :
ISBN 13 :
Total Pages : 330 pages
Book Rating : 4.:/5 (34 download)
Download or read book I. Plasma Enhanced Chemical Vapor Deposition of Main Group Nitride Thin Films written by Sri Prikash Rangarajan and published by . This book was released on 1994 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Filipe Vaz
Publisher : Bentham Science Publishers
ISBN 13 : 1608051560
Total Pages : 363 pages
Book Rating : 4.6/5 (8 download)
Download or read book Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Processes, Properties and Applications written by Filipe Vaz and published by Bentham Science Publishers. This book was released on 2013-06-21 with total page 363 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.
Download or read book Chemical Vapor Deposition (CVD) of Transition Metal and Metal Oxide Thin Films written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Polly Wanda Chu
Publisher :
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.E/5 ( download)
Download or read book Ultrahigh Vacuum Metalorganic Chemical Vapor Deposition and in Situ Characterization of Nanoscale Titanium Dioxide Films written by Polly Wanda Chu and published by . This book was released on 1994 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Author : Anthony C. Jones
Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)
Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Author : Sameer Narsinha Dharmadhikari
Publisher :
ISBN 13 :
Total Pages : 110 pages
Book Rating : 4.:/5 (428 download)
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Titanium Nitride written by Sameer Narsinha Dharmadhikari and published by . This book was released on 1999 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium tetrachioride and ammonia were used as precursors in a Jow pressure chemical vapor deposition process to deposit titanium nitride films on silicon wafers. The process was carried out at temperatures from 450 to 850°C and the activation energy for the reaction was determined. The order of the reaction, with respect to the partial pressures of the reactant gases, was determined by carrying out the reaction at varying partial pressures of the reactant gases. The following rate equation was established for the reaction: rate = 4.35*10-5exp( -5150/T)*(PNH3)1.37(PTicl4)-0.42 The titanium nitride thin films deposited were characterized for properties like resistivity, stress, hardness, and density. The effects of varying the process parameters (temperature, flow ratio, etc.) on these film properties were studied.
Author : Sadanand Vinayak Deshpande
Publisher :
ISBN 13 :
Total Pages : 302 pages
Book Rating : 4.3/5 (91 download)
Download or read book Hot Filament Activated Chemical Vapor Deposition of Nitride and Carbide Thin Films written by Sadanand Vinayak Deshpande and published by . This book was released on 1994 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael Robert Hilton
Publisher :
ISBN 13 :
Total Pages : 430 pages
Book Rating : 4.:/5 (7 download)
Download or read book Plasma Assisted Synthesis and Physical Chemical Characterization of Titanium Nitride Films written by Michael Robert Hilton and published by . This book was released on 1987 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Fabian I. Ezema
Publisher : Springer Nature
ISBN 13 : 3030684628
Total Pages : 926 pages
Book Rating : 4.0/5 (36 download)
Download or read book Chemically Deposited Nanocrystalline Metal Oxide Thin Films written by Fabian I. Ezema and published by Springer Nature. This book was released on 2021-06-26 with total page 926 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.
Author : B.D. Sartwell
Publisher : Elsevier
ISBN 13 : 0444601104
Total Pages : 1129 pages
Book Rating : 4.4/5 (446 download)
Download or read book Metallurgical Coatings and Thin Films 1990 written by B.D. Sartwell and published by Elsevier. This book was released on 2012-12-02 with total page 1129 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metallurgical Coatings and Thin Films 1990 presents the Proceedings of the 17th International Conference on Metallurgical Coatings and 8th International Conference on Thin Films, held in San Diego, California on April 2-6, 1990. It contains 219 papers covering a wide range of topics related to metallurgical coatings and thin films, including high temperature coatings, hard coatings, diamond films, tribology, and ion beam modification. Organized into 99 chapters, this volume begins with a discussion of a thermochemical model for diamond growth from the vapor phase and an experiment in large area diamond coating using a combustion flame torch in its traversing mode. It then explores the properties of diamond films, preparation of diamond-like carbon films using various ion-beam-assisted techniques, deposition of diamond-like films by laser ablation, and coating of cubic BN films on different substrates. The book examines surface processes and rate-determining steps in plasma-induced chemical vapor deposition, and addition of rare earths to improve scale adherence on heat-resisting alloys and coatings. The reader is introduced to high temperature wear and clearance control coatings, thermal barrier coatings, and corrosion resistant coatings. The book also discusses modification of coatings/surfaces to reduce friction; the mechanics of the tribology of thin films systems; mechanochemical interactions in the tribological behavior of materials; analysis and micromechanical testing of tribological coatings; surface modification using directed ion beams; and industrial equipment and processes. This book is a valuable resource for students and researchers interested in metallurgical coatings and thin films.
Author : Sarah R. Kurtz
Publisher :
ISBN 13 :
Total Pages : 254 pages
Book Rating : 4.:/5 (162 download)
Download or read book Atmospheric Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon, Titanium Nitride, and Titanium Dioxide Thin Films written by Sarah R. Kurtz and published by . This book was released on 1985 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.3/5 (91 download)
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1992 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive overview of chemical vapor deposition (CVD), an extremely versatile process for manufacturing coatings, powders, fibers, and monolithic components.
