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Chemical Vapor Deposition Of Copper
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Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Book Synopsis Chemical Vapor Deposition of Copper by : Johnny Yit-Siang Boey
Download or read book Chemical Vapor Deposition of Copper written by Johnny Yit-Siang Boey and published by . This book was released on 1998 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper Thin Films by : Raman Thiruvenkatachari
Download or read book Chemical Vapor Deposition of Copper Thin Films written by Raman Thiruvenkatachari and published by . This book was released on 2000 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper Thin Films by : Wing-Cheong Gilbert Lai
Download or read book Chemical Vapor Deposition of Copper Thin Films written by Wing-Cheong Gilbert Lai and published by . This book was released on 1991 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper Thin Films by : Reginald Bernard Little
Download or read book Chemical Vapor Deposition of Copper Thin Films written by Reginald Bernard Little and published by . This book was released on 1992 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper Films by : Narendra Shamkant Borgharkar
Download or read book Chemical Vapor Deposition of Copper Films written by Narendra Shamkant Borgharkar and published by . This book was released on 1997 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). by : Do-Heyoung Kim
Download or read book Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). written by Do-Heyoung Kim and published by . This book was released on 1990 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors by : Patrick Michael Jeffries
Download or read book Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors written by Patrick Michael Jeffries and published by . This book was released on 1992 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-organic chemical vapor deposition (MOCVD) from the tetrameric precursor copper(I) tert-butoxide, (Cu(O-t-Bu)) $\sb4$, results in the deposition of pure copper(I) oxide whiskers at 510 K and of copper metal with $\sim$2% oxygen contamination at 670 K. Quantitative analyses of the gaseous byproducts generated during the deposition, electron energy loss spectroscopy, and temperature programmed desorption experiments indicate that copper(I) oxide is formed by an elimination mechanism and copper metal is formed by deoxygenation of an initially deposited copper(I) oxide phase. New volatile monomeric Cu$\sp{\rm II}$ alkoxides have been synthesized with the general formula Cu(OR)$\sb2$L, where OR is OCH(CF$\sb3)\sb2$ or OC(CH$\sb3$)(CF$\sb3)\sb2$ and L is a bidentate amine. These compounds were prepared by the reaction of Cu(OMe)$\sb2$ with HOR and the amine in diethyl ether. The degree of distortion from square planar geometry for these compounds was measured by EPR spectroscopy, UV-vis spectroscopy, and X-ray crystallography. At 570 K, these compounds are MOCVD precursors for the deposition of pure copper metal. The surface chemistry of copper(I) and copper(II) $\beta$-diketonate complexes has been examined under ultrahigh vacuum conditions on copper single crystals by temperature programmed desorption studies, electron energy loss spectroscopy, infrared spectroscopy, and Auger spectroscopy. Above 200 K, the $\beta$-diketonate ligands migrate from the adsorbed copper compound to the copper surface. At $\sim$375 K, the ligands begin to fragment to give trifluoromethyl and ketenylidene surface species. Decarbonylation of the ketenylidene groups at $\sim$525 K leads to a carbon overlayer. Silver films have been prepared by MOCVD from (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ at 550 K. Studies of the deposition mechanism reveal that (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ initially deposits AgF by an elimination reaction and AgF then loses fluorine to produce silver metal. The crystal structure of (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ was determined and shows that the compound is a tetramer that consists of a square plane of silver atoms in which each edge is bridged by a perfluorobutenyl ligand. The ruthenium alkyl complexes (Li(tmed)) $\sb2$(($\eta\sp4$-C$\sb 7$H$\sb8$)RuMe$\sb4$) and (Li(tmed)) $\sb2(\eta\sp5$-C$\sb8$H$\sb{11}$)RuMe$\sb4$) have also been prepared and characterized.
Book Synopsis The Low Temperature Chemical Vapor Deposition of Copper Using Atom Reactions by : Peter S. Locke
Download or read book The Low Temperature Chemical Vapor Deposition of Copper Using Atom Reactions written by Peter S. Locke and published by . This book was released on 1996 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper and Copper Oxides by : Jorge Ramírez-Ortiz
Download or read book Chemical Vapor Deposition of Copper and Copper Oxides written by Jorge Ramírez-Ortiz and published by LAP Lambert Academic Publishing. This book was released on 2012-08 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) is a very versatile process widely used in the production of thin solid films and surface coating. It is also used to produce powders, fibers and monolithic components. In addition, the majority of chemical elements in the periodic table has been deposited, as well as compounds such as carbides, nitrides, oxides, intermetallic and many others. Chemical vapor deposition has been a critical technology in silicon microelectronics processes, fabrication of thin films of metals, semiconductors, and insulators. With increasing packing density in microelectronic devices, copper is used as an interconnecting metal due to its superior electrical conductivity and excellent resistance against electromigration. One of the advantages of chemcial vapor deposition is that selective deposition onto one surface, often defined as the growth surface, in the presence of another surface, often defined as non-growth surface is possible. The high optical absorption coefficient and low cost of production of Cu2O thin films have they made good candidates for electrochromic devices, solar cells and oxygen sensors.
Book Synopsis Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate by : D. Temple
Download or read book Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate written by D. Temple and published by . This book was released on 1990 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper by : Tony Ping-chen Chiang
Download or read book Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper written by Tony Ping-chen Chiang and published by . This book was released on 1996 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Precursors for Copper Chemical Vapor Deposition by : Muna BuFaroosha
Download or read book Precursors for Copper Chemical Vapor Deposition written by Muna BuFaroosha and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds by : Mehul B. Naik
Download or read book Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds written by Mehul B. Naik and published by . This book was released on 1995 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Copper Metal Using Cu(hfac)2 Alcohol Adducts by : Hui Fan
Download or read book Chemical Vapor Deposition of Copper Metal Using Cu(hfac)2 Alcohol Adducts written by Hui Fan and published by . This book was released on 2000 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition of Copper Films from CU(I)(HFAC)(TMVS) by : Wei-Shang King
Download or read book Low Pressure Chemical Vapor Deposition of Copper Films from CU(I)(HFAC)(TMVS) written by Wei-Shang King and published by . This book was released on 1995 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis A Study of Low Pressure Chemical Vapor Deposition of Copper from (hexafluoracetylacetonate) Copper(I) Compounds for Applications in Integrated Circuits by : Ajay Jain
Download or read book A Study of Low Pressure Chemical Vapor Deposition of Copper from (hexafluoracetylacetonate) Copper(I) Compounds for Applications in Integrated Circuits written by Ajay Jain and published by . This book was released on 1993 with total page 162 pages. Available in PDF, EPUB and Kindle. Book excerpt: