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Ultra Clean Processing Of Semiconductor Surfaces Xi
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Book Synopsis Ultra Clean Processing of Semiconductor Surfaces XI by : Paul Mertens
Download or read book Ultra Clean Processing of Semiconductor Surfaces XI written by Paul Mertens and published by Trans Tech Publications Ltd. This book was released on 2012-12-27 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: Selected, peer reviewed papers from the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 17-19, 2012, Gent, Belgium
Book Synopsis Ultra Clean Processing of Semiconductor Surfaces Xi by : Paul Mertens
Download or read book Ultra Clean Processing of Semiconductor Surfaces Xi written by Paul Mertens and published by . This book was released on 2013 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: Annotation This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing).
Book Synopsis Ultraclean Surface Processing of Silicon Wafers by : Takeshi Hattori
Download or read book Ultraclean Surface Processing of Silicon Wafers written by Takeshi Hattori and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Book Synopsis Ultra Clean Processing of Silicon Surfaces IV by : Marc Heyns
Download or read book Ultra Clean Processing of Silicon Surfaces IV written by Marc Heyns and published by Trans Tech Publications Ltd. This book was released on 1998-11-21 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98), held in Ostend, Belgium, September 1998
Book Synopsis Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 by : Takeshi Hattori
Download or read book Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10 written by Takeshi Hattori and published by The Electrochemical Society. This book was released on 2007 with total page 497 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
Book Synopsis Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11 by : Takeshi Hattori
Download or read book Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11 written by Takeshi Hattori and published by The Electrochemical Society. This book was released on 2009-09 with total page 407 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions includes papers presented during the 11th International Symposium on Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing held during the ECS Fall Meeting in Vienna, Austria, October 4-9, 2009.
Download or read book CleanRooms written by and published by . This book was released on 2008-06 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt: A central resource of technology and methods for environments where the control of contamination is critical.
Book Synopsis Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing by : Jerzy Rużyłło
Download or read book Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing written by Jerzy Rużyłło and published by The Electrochemical Society. This book was released on 1998 with total page 668 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book CleanRooms written by and published by . This book was released on 2008-07 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt: A central resource of technology and methods for environments where the control of contamination is critical.
Book Synopsis Advanced Gate Stacks for High-Mobility Semiconductors by : Athanasios Dimoulas
Download or read book Advanced Gate Stacks for High-Mobility Semiconductors written by Athanasios Dimoulas and published by Springer Science & Business Media. This book was released on 2008-01-01 with total page 397 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive monograph on gate stacks in semiconductor technology. It covers the major latest developments and basics and will be useful as a reference work for researchers, engineers and graduate students alike. The reader will get a clear view of what has been done so far, what is the state-of-the-art and which are the main challenges ahead before we come any closer to a viable Ge and III-V MOS technology.
Book Synopsis Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing by : Richard E. Novak
Download or read book Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing written by Richard E. Novak and published by The Electrochemical Society. This book was released on 1996 with total page 642 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ultra-Clean Technology Handbook by : Ohmi
Download or read book Ultra-Clean Technology Handbook written by Ohmi and published by Routledge. This book was released on 2017-11-01 with total page 948 pages. Available in PDF, EPUB and Kindle. Book excerpt: Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int
Book Synopsis Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing by : Tadahiro Ohmi
Download or read book Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing written by Tadahiro Ohmi and published by CRC Press. This book was released on 2018-10-03 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt: As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
Book Synopsis Silicon Materials Science and Technology by :
Download or read book Silicon Materials Science and Technology written by and published by . This book was released on 1998 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Materials Science and Technology by : Howard R. Huff
Download or read book Silicon Materials Science and Technology written by Howard R. Huff and published by The Electrochemical Society. This book was released on 1998 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Physics and Technology of High-k Gate Dielectrics 5 by : Samares Kar
Download or read book Physics and Technology of High-k Gate Dielectrics 5 written by Samares Kar and published by The Electrochemical Society. This book was released on 2007 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 1720 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
