Time-dependent dielectric breakdown of chemical-vapor deposited and thermal silicon oxynitrides prepared by rapid thermal processing

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ISBN 13 :
Total Pages : 86 pages
Book Rating : 4.:/5 (222 download)

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Book Synopsis Time-dependent dielectric breakdown of chemical-vapor deposited and thermal silicon oxynitrides prepared by rapid thermal processing by : Ping-Chung Li

Download or read book Time-dependent dielectric breakdown of chemical-vapor deposited and thermal silicon oxynitrides prepared by rapid thermal processing written by Ping-Chung Li and published by . This book was released on 1989 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The chemical and electrical characteristics of chemical-vapor deposited silicon oxynitrides prepared by rapid thermal processing

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ISBN 13 :
Total Pages : 104 pages
Book Rating : 4.:/5 (218 download)

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Book Synopsis The chemical and electrical characteristics of chemical-vapor deposited silicon oxynitrides prepared by rapid thermal processing by : Wenchi Ting

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Advances in Rapid Thermal Processing

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Publisher : The Electrochemical Society
ISBN 13 : 9781566772327
Total Pages : 470 pages
Book Rating : 4.7/5 (723 download)

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Book Synopsis Advances in Rapid Thermal Processing by : Fred Roozeboom

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Masters Theses in the Pure and Applied Sciences

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Publisher : Springer Science & Business Media
ISBN 13 : 1461534747
Total Pages : 421 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Masters Theses in the Pure and Applied Sciences by : Wade H. Shafer

Download or read book Masters Theses in the Pure and Applied Sciences written by Wade H. Shafer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 421 pages. Available in PDF, EPUB and Kindle. Book excerpt: Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS) * at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna tional publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 34 (thesis year 1989) a total of 13,377 theses titles from 26 Canadian and 184 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work. While Volume 34 reports theses submitted in 1989, on occasion, certain univer sities do report theses submitted in previous years but not reported at the time.

Rapid Thermal Processing of Semiconductors

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Publisher : Boom Koninklijke Uitgevers
ISBN 13 : 9780306450549
Total Pages : 384 pages
Book Rating : 4.4/5 (55 download)

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Book Synopsis Rapid Thermal Processing of Semiconductors by : Victor E. Borisenko

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Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146

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ISBN 13 :
Total Pages : 544 pages
Book Rating : 4.:/5 (2 download)

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Book Synopsis Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 by : David Hodul

Download or read book Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 written by David Hodul and published by . This book was released on 1989-11-03 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Rapid Thermal and Other Short-time Processing Technologies II

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Publisher : The Electrochemical Society
ISBN 13 : 9781566773157
Total Pages : 458 pages
Book Rating : 4.7/5 (731 download)

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Book Synopsis Rapid Thermal and Other Short-time Processing Technologies II by : Dim-Lee Kwong

Download or read book Rapid Thermal and Other Short-time Processing Technologies II written by Dim-Lee Kwong and published by The Electrochemical Society. This book was released on 2001 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."

Extended Abstracts

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ISBN 13 :
Total Pages : 918 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis Extended Abstracts by : Electrochemical Society

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Rapid Thermal Processing of Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 1489918043
Total Pages : 374 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis Rapid Thermal Processing of Semiconductors by : Victor E. Borisenko

Download or read book Rapid Thermal Processing of Semiconductors written by Victor E. Borisenko and published by Springer Science & Business Media. This book was released on 2013-11-22 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Rapid Thermal and Integrated Processing

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ISBN 13 :
Total Pages : 416 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Rapid Thermal and Integrated Processing by :

Download or read book Rapid Thermal and Integrated Processing written by and published by . This book was released on 1996 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt:

A Study of Silicon Oxynitride as an Alternative Gate Dielectric Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition

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Publisher :
ISBN 13 :
Total Pages : 130 pages
Book Rating : 4.:/5 (326 download)

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Book Synopsis A Study of Silicon Oxynitride as an Alternative Gate Dielectric Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition by : Winford Lee Hill

Download or read book A Study of Silicon Oxynitride as an Alternative Gate Dielectric Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition written by Winford Lee Hill and published by . This book was released on 1994 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook for Cleaning for Semiconductor Manufacturing

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Publisher : John Wiley & Sons
ISBN 13 : 1118099516
Total Pages : 596 pages
Book Rating : 4.1/5 (18 download)

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Book Synopsis Handbook for Cleaning for Semiconductor Manufacturing by : Karen A. Reinhardt

Download or read book Handbook for Cleaning for Semiconductor Manufacturing written by Karen A. Reinhardt and published by John Wiley & Sons. This book was released on 2011-04-12 with total page 596 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.

Rapid Thermal and Integrated Processing III: Volume 342

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ISBN 13 :
Total Pages : 472 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Rapid Thermal and Integrated Processing III: Volume 342 by : Jimmie J. Wortman

Download or read book Rapid Thermal and Integrated Processing III: Volume 342 written by Jimmie J. Wortman and published by . This book was released on 1994-08-02 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII

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Publisher : The Electrochemical Society
ISBN 13 : 9781566774598
Total Pages : 606 pages
Book Rating : 4.7/5 (745 download)

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Book Synopsis Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII by : Ram Ekwal Sah

Download or read book Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII written by Ram Ekwal Sah and published by The Electrochemical Society. This book was released on 2005 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physics Briefs

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ISBN 13 :
Total Pages : 812 pages
Book Rating : 4.3/5 (91 download)

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Download or read book Physics Briefs written by and published by . This book was released on 1992 with total page 812 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Scientific and Technical Aerospace Reports

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ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)

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Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Engineering Index Annual

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ISBN 13 :
Total Pages : 2264 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis The Engineering Index Annual by :

Download or read book The Engineering Index Annual written by and published by . This book was released on 1992 with total page 2264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.