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Author : John Hopkins
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (61 download)
Download or read book The Laser Induced Chemical Vapour Deposition of Gallium Arsenide written by John Hopkins and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Shirley S. Chu
Publisher :
ISBN 13 :
Total Pages : 60 pages
Book Rating : 4.:/5 (227 download)
Download or read book Laser Induced Chemical Vapor Deposition of Gallium Arsenide Films written by Shirley S. Chu and published by . This book was released on 1987 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of this project is to investigate the epitaxial growth of device quality III-V semiconductor films by the free electron laser-induced epitaxial growth technique at low temperatures. Major efforts have been directed to (1) the design and construction of a low pressure reaction chamber and control system, and (2) the laser induced deposition and characterization of epitaxial gallium aresenide films by computer controlled MOCVD. Gallium arsenide films have been deposited by the ArF laser-induced MOCVD over a wide range of process parameters. Device quality homoepitaxial GaAs films with specular mirror smooth surface have been obtained in the substrate temperature range of 425-500 C. Keywords: Excimer laser, Laser induced, Epitaxial growth, Doping concentration, Mobility, Gallium arsenides.
Author : Shirley S. Chu
Publisher :
ISBN 13 :
Total Pages : 30 pages
Book Rating : 4.:/5 (227 download)
Download or read book Laser Induced Chemical Vapor Epitaxial Growth of Gallium Arsenide Films written by Shirley S. Chu and published by . This book was released on 1988 with total page 30 pages. Available in PDF, EPUB and Kindle. Book excerpt: The objective of this project is to investigate the epitaxial growth of device quality III-V semiconductor films by the free electron laser-induced epitaxial growth technique at low temperatures. Efforts during the past year has been focused to the homo- and heteroepitaxial growth and characterization of gallium arsenide (GaAs) films on GaAs and silicon (Si) substrates by laser-induced metalorganic chemical vapor deposition (LIMOCVD). ArF excimer laser (193 nm) was used before the free electron laser is available. The reaction between trimethylgallium and arsine in hydrogen under reduced pressure was used for the epitaxial growth of GaAs. Homoepitaxial GaAs films deposited by LIMOCVD at 425 - 500 C are similar to conventional homoepitaxial GaAs films (at 700 C) in properties. Heteroepitaxial GaAs films on Si substrates of (100) orientation have been deposited at 500 C by LIMOCVD with emphasis on the cleanliness of the substrate surface. Transmission electron microscopy and Raman spectra indicated that the heteroepitaxial GaAs films are presumably of a (111) orientation and that their crystalline perfection is superior to those deposited by other techniques. Keywords: Epitaxial growth; Chemical vapor deposition; Excimer; Homoepitaxial growth; Heteroepitaxial growth; Dislocation; Doping concentration.
Author : Imran A. Qureshi
Publisher :
ISBN 13 :
Total Pages : 222 pages
Book Rating : 4.:/5 (281 download)
Download or read book UV-visible Laser-induced Fluorescence Studies on Triethylgallium (TEG) for Gallium Arsenide Chemical Vapor Deposition written by Imran A. Qureshi and published by . This book was released on 1991 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : James Howard Edgar
Publisher :
ISBN 13 :
Total Pages : 338 pages
Book Rating : 4.:/5 (185 download)
Download or read book The Selective Deposition of Gallium Arsenide and Aluminum Gallium Arsenide by Laser-enhanced Metalorganic Chemical Vapor Deposition written by James Howard Edgar and published by . This book was released on 1987 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gregory Costrini
Publisher :
ISBN 13 :
Total Pages : 196 pages
Book Rating : 4.:/5 (191 download)
Download or read book Metalorganic Chemical Vapor Deposition of Gallium Arsenide/aluminum Gallium Arsenide Thin-layer Superlattices and Laser Structures written by Gregory Costrini and published by . This book was released on 1986 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Dieter Bäuerle
Publisher : Springer Science & Business Media
ISBN 13 :
Total Pages : 808 pages
Book Rating : 4.3/5 (91 download)
Download or read book Laser Processing and Chemistry written by Dieter Bäuerle and published by Springer Science & Business Media. This book was released on 2000 with total page 808 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This third edition has been revised and enlarged to cover new topics such as the synthesis of nanoclusters and nanocrystalline films, ultrashort-pulse laser processing, laser polishing, cleaning, and lithography.Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.
Author : Vilnis Guntis Kreismanis
Publisher :
ISBN 13 :
Total Pages : 352 pages
Book Rating : 4.E/5 ( download)
Download or read book Epitaxial Growth of Gallium Arsenide Materials and Devices of Metalorganic Chemical Vapor Deposition written by Vilnis Guntis Kreismanis and published by . This book was released on 1984 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Calvin Chung-Fu Jean
Publisher :
ISBN 13 :
Total Pages : 198 pages
Book Rating : 4.:/5 (229 download)
Download or read book Plasma Assisted Metalorganic Chemical Vapour Deposition of Gallium Arsenide on Gallium Arsenide Substrate written by Calvin Chung-Fu Jean and published by . This book was released on 1990 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kevin John Beernink
Publisher :
ISBN 13 :
Total Pages : 106 pages
Book Rating : 4.:/5 (253 download)
Download or read book Design and Characterization of Indium Gallium Arsenide-gallium Arsenide-aluminum Gallium Arsenide Strained-layer Lasers Grown by Metalorganic Chemical Vapor Deposition written by Kevin John Beernink and published by . This book was released on 1991 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Xiu-Tian Yan
Publisher : Springer Science & Business Media
ISBN 13 : 1848828942
Total Pages : 352 pages
Book Rating : 4.8/5 (488 download)
Download or read book Chemical Vapour Deposition written by Xiu-Tian Yan and published by Springer Science & Business Media. This book was released on 2010-03-23 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.
Author : Ven Johan Van de
Publisher :
ISBN 13 :
Total Pages : 230 pages
Book Rating : 4.:/5 (246 download)
Download or read book Defect studies and metalorganic chemical vapour deposition of Gallium Arsenide written by Ven Johan Van de and published by . This book was released on 1986 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bing Zhou
Publisher :
ISBN 13 :
Total Pages : 398 pages
Book Rating : 4.:/5 (222 download)
Download or read book Ultraviolet Laser and Remote Plasma Enhancement in Low-temperature Chemical Vapour Deposition of Gallium Nitride written by Bing Zhou and published by . This book was released on 1996 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : I.W. Boyd
Publisher : Elsevier
ISBN 13 : 0444596801
Total Pages : 552 pages
Book Rating : 4.4/5 (445 download)
Download or read book Laser Surface Processing and Characterization written by I.W. Boyd and published by Elsevier. This book was released on 1992-03-09 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
Author : Hossein Rabiee Golgir
Publisher :
ISBN 13 : 9780355139907
Total Pages : 0 pages
Book Rating : 4.1/5 (399 download)
Download or read book Laser-assisted Metal Organic Chemical Vapor Deposition of Gallium Nitride written by Hossein Rabiee Golgir and published by . This book was released on 2017 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The m-plane-oriented gallium nitride nanoplates were successfully grown on silicon substrates at 450 °C, using CO2 laser-assisted metal organic chemical vapor deposition with perpendicular geometries.
Author : Michael Eugene Givens
Publisher :
ISBN 13 :
Total Pages : 100 pages
Book Rating : 4.:/5 (199 download)
Download or read book The Growth of Aluminum Gallium Arsenide/gallium Arsenide Graded Barrier Quantum Well Heterostructure Lasers with Various Buffer Layer Structures by Metalorganic Chemical Vapor Deposition written by Michael Eugene Givens and published by . This book was released on 1988 with total page 100 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : C.E. Morosanu
Publisher : Elsevier
ISBN 13 : 1483291731
Total Pages : 720 pages
Book Rating : 4.4/5 (832 download)
Download or read book Thin Films by Chemical Vapour Deposition written by C.E. Morosanu and published by Elsevier. This book was released on 2016-06-22 with total page 720 pages. Available in PDF, EPUB and Kindle. Book excerpt: The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.
