Read Books Online and Download eBooks, EPub, PDF, Mobi, Kindle, Text Full Free.
Download Surface Diffusion Kinetics On Amorphous Silicon full books in PDF, epub, and Kindle. Read online Surface Diffusion Kinetics On Amorphous Silicon ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Download or read book Surface Diffusion Kinetics on Amorphous Silicon written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Diana Llera-Hurlburt
Publisher :
ISBN 13 :
Total Pages : 144 pages
Book Rating : 4.:/5 (482 download)
Download or read book Surface Diffusion Knetics on Amorphous Silicon written by Diana Llera-Hurlburt and published by . This book was released on 2001 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Robert H. Doremus
Publisher : John Wiley & Sons
ISBN 13 : 9780471385455
Total Pages : 320 pages
Book Rating : 4.3/5 (854 download)
Download or read book Diffusion of Reactive Molecules in Solids and Melts written by Robert H. Doremus and published by John Wiley & Sons. This book was released on 2001-12-03 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: Die Verteilung reaktiver Moleküle in Festkörpern und Schmelzen wird hier mit Hilfe eines Diffusions-Reaktions-Modells beschrieben. Klar und präzise stellt der Autor, ein anerkannter Spezialist auf diesem Gebiet, die physikalischen und mathematischen Grundlagen von Diffusionsreaktionen dar und illustriert sie am Beispiel spezieller Werkstoffe.
Download or read book Surface Mechanisms in Low-Temperature Plasma Deposition of Silicon written by and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Dynamic scaling of surface roughness evolution during plasma deposition of amorphous silicon is utilized to characterize surface transport mechanisms. Different surface transport mechanisms leave distinct imprints in the surface that can be distinguished through fractal analysis. Surface roughness is characterized using atomic force microscopy (AFM) and the static and dynamic scaling coefficients a and b and the lateral correlation length Lc are extracted from the evolution of surface roughness and are used to identify surface mechanisms. Values of a = 1.0 and b = 0.3 have been obtained, which reveal that surfaces are smoothed through surface diffusion during film growth. Temperature dependence of the Lc is used to calculate diffusion barriers with values around 0.2 eV, consistent with the diffusion of a weakly bound physisorbed species. The effects of process conditions such as substrate temperature, diluent gases composition, process pressure, RF power density, and reactor configuration on the scaling parameters have been investigated. An amorphous silicon kinetic growth model has been developed that incorporates surface coverage dependent diffusion barriers. The model reproduces most experimentally observed results, although some deposition conditions are identified where the model is not valid.
Author : David J. Fisher
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3038130311
Total Pages : 218 pages
Book Rating : 4.0/5 (381 download)
Download or read book Diffusion in Silicon - A Seven-Year Retrospective written by David J. Fisher and published by Trans Tech Publications Ltd. This book was released on 2005-07-15 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt: This collection of abstracts of experimental and theoretical papers on the subject of diffusion in silicon is intended to complement earlier volumes (DDF153-155) which covered the previous decades work on the same topic. The abstracts are grouped according to the diffusing species in question. The latter comprise Ag, Al, As, Au, B, Ba, Be, C, Ca, Cl, Co, Cr, Cu, Er, F, Fe, Ge, H, He, Hf, In, Ir, K, Mg, Mn, Mo, N, Na, Nb, Ni, O, P, Pb, Pt, Rb, Sb, Se, Si, SiH3, Sn, Ti, V, Yb and Zn with regard to bulk diffusion, Ag, Au, Ba, Cl, Cu, Er, F, Ga, Ge, In, O, Pb, Sb, Si, SiH3, Sn and Y with regard to surface diffusion, H with regard to grain-boundary diffusion, and self-diffusion in liquid Si.
Author : Brent Andrew Sperling
Publisher :
ISBN 13 :
Total Pages : 127 pages
Book Rating : 4.:/5 (5 download)
Download or read book Kinetic Roughening During Hot-wire Chemical Vapor Deposition of Hydrogenated Amorphous Silicon written by Brent Andrew Sperling and published by . This book was released on 2006 with total page 127 pages. Available in PDF, EPUB and Kindle. Book excerpt: Despite the widespread use of hydrogenated amorphous silicon (a-Si:H), the fundamental surface processes during film growth are not well understood. One approach to studying these mechanisms is to analyze the surface morphology that results from their action. In this dissertation, hot-wire chemical vapor deposition is used to deposit a-Si:H thin films. Both post-deposition atomic force microscopy (AFM) and in situ spectroscopic ellipsometry (SE) are used to characterize the surface morphology and its dynamics. Results of this work indicate that the surface morphology is shaped by geometric shadowing of growth particles and thermally-activated smoothening mechanisms. For films grown at low temperature, the local slope of the surface is found to exhibit power law scaling with time that is consistent with anomalous roughening behavior also observed in models that include shadowing. A temperature-dependent transition in roughening behavior is observed, and an activation energy is extracted that agrees with previous estimates for SiH3 surface diffusion. Additionally, a-Si:H grown on rough substrates is examined. Smoothening at short lateral length scales is observed simultaneously with global roughening. Behavior is found to generally agree with deterministic models in the literature. This work also explores the difference between SE and AFM in how roughness is measured. Rayleigh-Rice theory (vector perturbation theory) is used to calculate ellipsometric data that is subsequently compared to the usual method of using an effective medium layer to approximate roughness. SE measurements are found to critically depend on both the vertical extent of roughness and the root-mean-squared slope of the surface.
Author : Pio Capezzuto
Publisher : Elsevier
ISBN 13 : 0080539106
Total Pages : 339 pages
Book Rating : 4.0/5 (85 download)
Download or read book Plasma Deposition of Amorphous Silicon-Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author : Hellmut Fritzsche
Publisher : World Scientific
ISBN 13 : 9789971506193
Total Pages : 742 pages
Book Rating : 4.5/5 (61 download)
Download or read book Amorphous Silicon and Related Materials written by Hellmut Fritzsche and published by World Scientific. This book was released on 1989-01-01 with total page 742 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.
Author :
Publisher :
ISBN 13 :
Total Pages : 127 pages
Book Rating : 4.:/5 (944 download)
Download or read book Surface Diffusion of Amorphous Organic Solids written by and published by . This book was released on 2016 with total page 127 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface mobility is important in many processes including catalysis, sintering, crystal growth and vapor deposition. The understanding of surface diffusion on amorphous organic solids will help to understand phenomena that have been observed for amorphous organic solids, but apparently uncommon for other materials, for example, fast surface crystal growth and formation of stable glasses by vapor deposition. Surface diffusion coefficients of amorphous ortho-terphenyl (OTP) were measured by surface-grating decay monitored by a laser diffraction system built in this thesis. For 1000 nm wavelength surface gratings, the decay kinetics is controlled by viscous flow above Tg + 11 K, and by surface diffusion below this temperature. Surface diffusion coefficients were calculated from grating decay constants. Surface diffusion of OTP is 100 million times faster than its bulk diffusion at Tg and the ratio increases with decrease of temperature. Compared with previously studied systems, at the same bulk mobility, surface diffusion decreases with increase of intermolecular forces. The surface crystal growth rate of amorphous solids is proportional to their surface diffusion coefficient, indicating that these two processes have a common kinetic barrier. Surface diffusion of low-molecular-weight polystyrenes (PS) was studied via surface-grating decay. For 1000 nm wavelength gratings, above Tg, viscous flow controls surface-grating decay and below Tg, surface diffusion does so for two low-molecular-weight PS fractions. Surface diffusion of PS is 100 thousand times faster than its bulk diffusion at Tg, but the enhancement ratio is smaller than that of small-molecule glasses, which is attributed to the sharp surface mobility gradient and the deep penetration of PS chains. Surface-grating decay of amorphous OTP containing 1 wt % PS was studied to understand the polymer additive effect on surface mobility of molecular glasses. When viscous flow controls surface-grating decay, PS additives have no effect on the decay kinetics of OTP. However, when surface diffusion controls grating decay, with PS additives, the decay kinetics of OTP significantly slows down and becomes non-exponential. The effect becomes greater with the increase of PS molecular weight or the decrease of temperature. The results are consistent with the segregation of PS from OTP during the surface-grating decay.
Author : David J. Fisher
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3038133817
Total Pages : 230 pages
Book Rating : 4.0/5 (381 download)
Download or read book Diffusivity in Silicon 1953 to 2009 written by David J. Fisher and published by Trans Tech Publications Ltd. This book was released on 2010-04-21 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work is essentially an update of previous compilations of information on the diffusivity of elements in semiconductor-grade silicon. It subsumes the data contained in B.L.Sharmas monograph on Diffusion in Semiconductors (Trans Tech Publications, 1970), plus the data contained in Diffusion and Defect Data (Diffusion in Silicon) Volume 45 (1986), Defect and Diffusion Forum (Diffusion in Silicon - 10 years of Research) Volumes 153-155 (1998), Defect and Diffusion Forum (Diffusion in Silicon - a Seven-Year Retrospective) Volume 241 (2005) and the latest data from recent Semiconductor Retrospectives: Defect and Diffusion Forum, Volumes 245-246, Volumes 261-262, Volume 272 and Volume 282. In addition, the resultant 400 items of data were analysed in the hope of finding some unifying correlation. It was indeed found that all of the points (each the average of many independent measurements) seemed to fall on a number of distinct straight lines passing through the origin of a plot of activation energy versus atomic radius. However, it remained unclear how these correlations could be explained.
Author : Andrzej Plonka
Publisher : Springer Science & Business Media
ISBN 13 : 9401596581
Total Pages : 238 pages
Book Rating : 4.4/5 (15 download)
Download or read book Dispersive Kinetics written by Andrzej Plonka and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Dynamical processes in which many timescales coexist are called dispersive. The rate coefficients for dispersive processes depend on time. In the case of a chemical reaction, the time dependence of the rate coefficient, k(t), termed the specific reaction rate, is rationalized in the following way. Reactions by their very nature have to disturb reactivity distributions of the reactants in condensed media, as the more reactive species are the first ones to disappear from the system. The extent of this disturbance depends on the ratio of the rates of reactions to the rate of internal rearrangements (mixing) in the system restoring the initial distribution in reactivity of reactants. If the rates of chemical reactions exceed the rates of internal rearrangements, then the initial distributions in reactant reactivity are not preserved during the course of reactions and the specific reaction rates depend on time. Otherwise the extent of disturbance is negligible and classical kinetics, with a constant specific reaction rate, k, termed the reaction rate constant, may be valid as an approximation. In condensed media dispersive dynamical processes are endemic and this is the first monograph devoted to these processes.
Author : Michael O. Thompson
Publisher :
ISBN 13 :
Total Pages : 500 pages
Book Rating : 4.3/5 (91 download)
Download or read book Kinetics of Phase Transformations: Volume 205 written by Michael O. Thompson and published by . This book was released on 1992-02-28 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Kenneth A. Jackson
Publisher : John Wiley & Sons
ISBN 13 : 3527327363
Total Pages : 459 pages
Book Rating : 4.5/5 (273 download)
Download or read book Kinetic Processes written by Kenneth A. Jackson and published by John Wiley & Sons. This book was released on 2010-08-09 with total page 459 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this completely revised edition, all the chapters have been updated to reflect the current state of crystal growth kinetics. At the same time, fifteen percent additional content now allows coverage of computer-assisted modeling of second-order phase changes, microstructure development, novel data and images of coarsening mechanisms, with the most significant single addition being breakthrough results on spinodal decomposition -- published here for the first time in book form. The refined didactical approach with a streamlined presentation now allows readers to grasp the kinetic concepts even more easily, coherently introducing the field of kinetic processes, especially those involved in crystal growth, and explaining such phenomena as diffusion, nucleation, segregation and phase transitions at a level accessible to graduate students. In addition to the basic kinetic concepts, the textbook presents modern applications where these processes play a major role, including ion implantation, plasma deposition and rapid thermal processing.
Author :
Publisher :
ISBN 13 :
Total Pages : 946 pages
Book Rating : 4.3/5 (91 download)
Download or read book Amorphous Silicon Technology written by and published by . This book was released on 1996 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Hari Singh Nalwa
Publisher : Elsevier
ISBN 13 : 0080533825
Total Pages : 1915 pages
Book Rating : 4.0/5 (85 download)
Download or read book Handbook of Surfaces and Interfaces of Materials, Five-Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 2001-10-26 with total page 1915 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook brings together, under a single cover, all aspects of the chemistry, physics, and engineering of surfaces and interfaces of materials currently studied in academic and industrial research. It covers different experimental and theoretical aspects of surfaces and interfaces, their physical properties, and spectroscopic techniques that have been applied to a wide class of inorganic, organic, polymer, and biological materials. The diversified technological areas of surface science reflect the explosion of scientific information on surfaces and interfaces of materials and their spectroscopic characterization. The large volume of experimental data on chemistry, physics, and engineering aspects of materials surfaces and interfaces remains scattered in so many different periodicals, therefore this handbook compilation is needed.The information presented in this multivolume reference draws on two decades of pioneering research on the surfaces and interfaces of materials to offer a complete perspective on the topic. These five volumes-Surface and Interface Phenomena; Surface Characterization and Properties; Nanostructures, Micelles, and Colloids; Thin Films and Layers; Biointerfaces and Applications-provide multidisciplinary review chapters and summarize the current status of the field covering important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniques with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source long due for the scientific community. The complete reference on the topic of surfaces and interfaces of materialsThe information presented in this multivolume reference draws on two decades of pioneering researchProvides multidisciplinary review chapters and summarizes the current status of the fieldCovers important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniquesContributions from internationally recognized experts from all over the world
Author :
Publisher :
ISBN 13 :
Total Pages : 842 pages
Book Rating : 4.E/5 ( download)
Download or read book Diffusion and Defect Data written by and published by . This book was released on 2003 with total page 842 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Mark Donald Allendorf
Publisher : The Electrochemical Society
ISBN 13 : 9781566772785
Total Pages : 826 pages
Book Rating : 4.7/5 (727 download)
Download or read book CVD XV written by Mark Donald Allendorf and published by The Electrochemical Society. This book was released on 2000 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt:
