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Author : Michael Trainor
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (599 download)
Download or read book Studies of Low Pressure Chemical Vapour Deposition (LPCVD) of Polysilicon written by Michael Trainor and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael Trainor
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (141 download)
Download or read book Studies of Low Pressure Chemical Vapour (LPCVD) of Polysilicon written by Michael Trainor and published by . This book was released on 1990 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gary L. Allman
Publisher :
ISBN 13 :
Total Pages : 46 pages
Book Rating : 4.:/5 (216 download)
Download or read book Low Pressure Chemical Vapor Deposition System for Polysilicon written by Gary L. Allman and published by . This book was released on 1977 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Arthur Sherman
Publisher : William Andrew
ISBN 13 :
Total Pages : 240 pages
Book Rating : 4.3/5 (91 download)
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author : Jianwen Zhu
Publisher :
ISBN 13 :
Total Pages : 172 pages
Book Rating : 4.:/5 (285 download)
Download or read book Design and Implementation of a Low Pressure Chemical Vapor Deposition System for Polysilicon and Silicon Nitride written by Jianwen Zhu and published by . This book was released on 1992 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Sabine Le Marquis
Publisher :
ISBN 13 :
Total Pages : 234 pages
Book Rating : 4.:/5 (238 download)
Download or read book Low Pressure Chemical Vapor Deposition of Polycrystalline Silicon and Silicon Nitride written by Sabine Le Marquis and published by . This book was released on 1990 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : George Henry Prueger
Publisher :
ISBN 13 :
Total Pages : 178 pages
Book Rating : 4.:/5 (19 download)
Download or read book Equipment Model for the Low Pressure Chemical Vapor Deposition of Polysilicon written by George Henry Prueger and published by . This book was released on 1988 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt: An equipment model has been developed for the low pressure chemical vapor deposition (LPCVD) of polycrystalline silicon in a horizontal tube furnace. The model predicts the wafer-to-wafer deposition rate down the length of the tube. Inputs to the model include: silane flow rates from three injectors, injector locations, locations of and temperatures at three thermocouples, operating pressure, the number of wafers, wafer diameter, the location of the wafer load, and other physical dimensions of the furnace such as tube length and inner diameter. The model is intended to aid the process engineer in the operation of equipment, including the selection of optimum process parameters and process control based on measured deposition thickness. The model is also flexible enough to aid in the design of new equipment. The one dimensional finite difference model encompasses the convective and diffusive fluxes of silane and hydrogen in the annular space between the wafer load and tube walls. The reaction of silane is modeled with full account taken of the generation and transport of hydrogen. Kinetic and injection parameters in the model were calibrated using a series of nine statistically designed experiments which varied four parameters over three levels. The model accurately predicts the axial deposition profile over the full range of experimentation and demonstrates good extrapolation beyond the range of experimental calibration. The model was used to predict a set of process parameters that would result in the least variation of deposition rate down the tube. Keywords: Semiconductors.
Author : Karl Frederick Roenigk
Publisher :
ISBN 13 :
Total Pages : 726 pages
Book Rating : 4.:/5 (319 download)
Download or read book Analysis of Low Pressure Chemical Vapor Deposition Processes written by Karl Frederick Roenigk and published by . This book was released on 1987 with total page 726 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ara Philipossian
Publisher :
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.:/5 (141 download)
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Dioxide at High Temperatures written by Ara Philipossian and published by . This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. High Temperature Materials Division
Publisher :
ISBN 13 :
Total Pages : 1296 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Daniel D. Pates
Publisher :
ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.:/5 (819 download)
Download or read book Low-pressure Chemical Vapor Deposition by Thermolysis of Disilane for Low-temperature Fabrication of Pn Junction Solar Cells written by Daniel D. Pates and published by . This book was released on 2006 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: A low-pressure chemical vapor deposition (LPCVD) reactor was built in order to implement a low-temperature process to deposit thin-films of silicon and fabricate pn junction photovoltaic devices using disilane as the source gas. This work represents the first reported work on using disilane for fabrication of photovoltaic devices. Films doped with diborane showed high growth rates of approximately 45-150 Å/min for temperatures ranging from 450 to 550 °C. Undoped films were grown and found to have significantly lower growth rates and were not practical at temperatures less than 500 °C. The films were completely amorphous for growth temperatures of less than 500 °C, and crystallinity increased sharply above 500 °C. The optical properties of the films exhibited low optical bandgaps of approximately 1.4-1.1 eV. The conductivity of the doped films was found to be on the order of 10−3 S/cm. Devices were fabricated by depositing p-type layers on n-type crystalline silicon substrates to form pn junctions. Diodes and pn junction photovoltaic devices were fabricated, exhibiting modest but promising performance, and were limited by parasitic series resistance. This research represents the first reported work on fabricating pn junction photovoltaic devices in a low-temperature LPCVD process using disilane, and serves as a solid foundation for future work to improve the process and fabricate novel device structures.
Author : Y.I. Nissim
Publisher : Elsevier
ISBN 13 : 0444596933
Total Pages : 173 pages
Book Rating : 4.4/5 (445 download)
Download or read book Single Chamber Processing written by Y.I. Nissim and published by Elsevier. This book was released on 1993-02-15 with total page 173 pages. Available in PDF, EPUB and Kindle. Book excerpt: Single chamber processing has attracted the attention of a number of researchers as well as industries as an alternative processing "philosophy" to complement or even replace the stringent environment of micro- and optoelectronics device fabrication. Up till now single chamber processing has been an elusive manufacturing objective throughout the history of integrated circuit technology. With the emergence of integrated processing tools in recent years, significant segments for continuous fabrication processes have been successfully realised and their potential has already innovated the industry. The 14 papers in this volume cover topics such as: The background of this approach and up-dated status; Design and concepts of relevant cluster tools equipment; Specific process modules such as deposition chambers (CVD, RTCVD, UVCVD, ...) annealing or etching reactors; and Standardization efforts. The work will provide both a stimulus for future research in this field, as well as useful reference material on the new technology trends in microelectronic device manufacturing technology.
Author : S Neralla
Publisher : BoD – Books on Demand
ISBN 13 : 9535125729
Total Pages : 292 pages
Book Rating : 4.5/5 (351 download)
Download or read book Chemical Vapor Deposition written by S Neralla and published by BoD – Books on Demand. This book was released on 2016-08-31 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Author : Theodore M. Besmann
Publisher : The Electrochemical Society
ISBN 13 : 9781566771559
Total Pages : 922 pages
Book Rating : 4.7/5 (715 download)
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : A. Figueras
Publisher :
ISBN 13 :
Total Pages : 686 pages
Book Rating : 4.:/5 (318 download)
Download or read book Proceedings of the Twelfth European Conference on Chemical Vapour Deposition written by A. Figueras and published by . This book was released on 1999 with total page 686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Konstantinos Zekentes
Publisher : Materials Research Forum LLC
ISBN 13 : 1945291842
Total Pages : 250 pages
Book Rating : 4.9/5 (452 download)
Download or read book Advancing Silicon Carbide Electronics Technology I written by Konstantinos Zekentes and published by Materials Research Forum LLC. This book was released on 2018-09-25 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt: The rapidly advancing Silicon Carbide technology has a great potential in high temperature and high frequency electronics. High thermal stability and outstanding chemical inertness make SiC an excellent material for high-power, low-loss semiconductor devices. The present volume presents the state of the art of SiC device fabrication and characterization. Topics covered include: SiC surface cleaning and etching techniques; electrical characterization methods and processing of ohmic contacts to silicon carbide; analysis of contact resistivity dependence on material properties; limitations and accuracy of contact resistivity measurements; ohmic contact fabrication and test structure design; overview of different metallization schemes and processing technologies; thermal stability of ohmic contacts to SiC, their protection and compatibility with device processing; Schottky contacts to SiC; Schottky barrier formation; Schottky barrier inhomogeneity in SiC materials; technology and design of 4H-SiC Schottky and Junction Barrier Schottky diodes; Si/SiC heterojunction diodes; applications of SiC Schottky diodes in power electronics and temperature/light sensors; high power SiC unipolar and bipolar switching devices; different types of SiC devices including material and technology constraints on device performance; applications in the area of metal contacts to silicon carbide; status and prospects of SiC power devices.
