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Studies Of Gas Phase Reactions Nucleation And Growth Mechanisms Of Plasma Promoted Chemical Vapor Deposition Of Aluminum Using Dimethylethylamine Alane As Source Precursor
Download Studies Of Gas Phase Reactions Nucleation And Growth Mechanisms Of Plasma Promoted Chemical Vapor Deposition Of Aluminum Using Dimethylethylamine Alane As Source Precursor full books in PDF, epub, and Kindle. Read online Studies Of Gas Phase Reactions Nucleation And Growth Mechanisms Of Plasma Promoted Chemical Vapor Deposition Of Aluminum Using Dimethylethylamine Alane As Source Precursor ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 1998 with total page 726 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Nano-Energetic Materials by : Shantanu Bhattacharya
Download or read book Nano-Energetic Materials written by Shantanu Bhattacharya and published by Springer. This book was released on 2018-11-09 with total page 297 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents the latest research on the area of nano-energetic materials, their synthesis, fabrication, patterning, application and integration with various MEMS systems and platforms. Keeping in mind the applications for this field in aerospace and defense sectors, the articles in this volume contain contributions by leading researchers in the field, who discuss the current challenges and future perspectives. This volume will be of use to researchers working on various applications of high-energy research.
Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Book Synopsis The Delivery of Nanoparticles by : Abbass A. Hashim
Download or read book The Delivery of Nanoparticles written by Abbass A. Hashim and published by BoD – Books on Demand. This book was released on 2012-05-16 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoparticle is a general challenge for today's technology and the near future observations of science. Nanoparticles cover mostly all types of sciences and manufacturing technologies. The properties of this particle are flying over today scientific barriers and have passed the limitations of conventional sciences. This is the reason why nanoparticles have been evaluated for the use in many fields. InTech publisher and the contributing authors of this book in nanoparticles are all overconfident to invite all scientists to read this new book. The book's potential was held until it was approached by the art of exploring the most advanced research in the field of nano-scale particles, preparation techniques and the way of reaching their destination. 25 reputable chapters were framed in this book and there were alienated into four altered sections; Toxic Nanoparticles, Drug Nanoparticles, Biological Activities and Nano-Technology.
Book Synopsis Atomic Layer Deposition of Nanostructured Materials by : Nicola Pinna
Download or read book Atomic Layer Deposition of Nanostructured Materials written by Nicola Pinna and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 463 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Book Synopsis Chemistry of Aluminium, Gallium, Indium and Thallium by : A.J. Downs
Download or read book Chemistry of Aluminium, Gallium, Indium and Thallium written by A.J. Downs and published by Springer Science & Business Media. This book was released on 1993-05-31 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: Boron has all the best tunes. That may well be the first impression of the Group 13 elements. The chemical literature fosters the impression not only in the primary journals, but also in asteady outflowofbooks focussing more or less closely on boron and its compounds. The same preoccupation with boron is apparent in the coverage received by the Group 13 elements in the comprehensive and regularly updated volume of the Gmelin Handbook. Yet such an imbalance cannot be explained by any inherent lack ofvariety, interest or consequence in the 'heavier elements. Aluminium is the most abundant metal in the earth's crust; in the industrialised world the metal is second only to iron in its usage, and its compounds can justifiably be said to touch our lives daily - to the potential detriment of those and other lives, some would argue. From being chemical curios, gallium and indium have now gained considerably prominence as sources of compound semiconductors like gallium arsenide and indium antimonide. Nor is there any want ofincident in the chemistriesofthe heavier Group 13 elements. In their redox, coordination and structural properties, there is to be found music indeed, notable not always for its harmony but invariably for its richness and variety. Thisbook seeks to redress the balance with a definitive, wide-rangingand up-to-date review of the chemistry of the Group 13 metals aluminium, gallium, indium and thallium.
Book Synopsis Laser Ablation in Liquids by : Guowei Yang
Download or read book Laser Ablation in Liquids written by Guowei Yang and published by CRC Press. This book was released on 2012-02-22 with total page 1166 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on the fundamental concepts and physical and chemical aspects of pulsed laser ablation of solid targets in liquid environments and its applications in the preparation of nanomaterials and fabrication of nanostructures. The areas of focus include basic thermodynamic and kinetic processes of laser ablation in liquids, and its applic
Book Synopsis Energetic Nanomaterials by : Vladimir E Zarko
Download or read book Energetic Nanomaterials written by Vladimir E Zarko and published by Elsevier. This book was released on 2016-01-21 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt: Energetic Nanomaterials: Synthesis, Characterization, and Application provides researchers in academia and industry the most novel and meaningful knowledge on nanoenergetic materials, covering the fundamental chemical aspects from synthesis to application. This valuable resource fills the current gap in book publications on nanoenergetics, the energetic nanomaterials that are applied in explosives, gun and rocket propellants, and pyrotechnic devices, which are expected to yield improved properties, such as a lower vulnerability towards shock initiation, enhanced blast, and environmentally friendly replacements of currently used materials. The current lack of a systematic and easily available book in this field has resulted in an underestimation of the input of nanoenergetic materials to modern technologies. This book is an indispensable resource for researchers in academia, industry, and research institutes dealing with the production and characterization of energetic materials all over the world. - Written by high-level experts in the field of nanoenergetics - Covers the hot topic of energetic nanomaterials, including nanometals and their applications in nanoexplosives - Fills a gap in energetic nanomaterials book publications
Book Synopsis Atomic Layer Epitaxy by : T. Suntola
Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 2011-09-20 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.
Book Synopsis Metallic Nanostructures by : Yujie Xiong
Download or read book Metallic Nanostructures written by Yujie Xiong and published by Springer. This book was released on 2014-10-31 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book details the design for creation of metal nanomaterials with optimal functionality for specific applications. The authors describe how to make desired metal nanomaterials in a wet lab. They include an overview of applications metal nanomaterials can be implemented in and address the fundamentals in the controlled synthesis of metal nanostructures.
Book Synopsis Photoacoustic Tomography by : Minghua Xu
Download or read book Photoacoustic Tomography written by Minghua Xu and published by CRC PressI Llc. This book was released on 2014-09-30 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Organometallic Vapor-Phase Epitaxy by : Gerald B. Stringfellow
Download or read book Organometallic Vapor-Phase Epitaxy written by Gerald B. Stringfellow and published by Elsevier. This book was released on 2012-12-02 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and the special structures required for device applications. In addition, a comprehensive summary detailing the OMVPE results observed to date in a wide range of III-V and II-VI semiconductors is provided. This includes a comparison of results obtained through the use of other epitaxial techniques such as molecular beam epitaxy (MBE), liquid-phase epitaxy (LPE), and vapor phase epitaxy using halide transport.
Download or read book Adhesion written by Wulff Possart and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 608 pages. Available in PDF, EPUB and Kindle. Book excerpt: Emphasizing the most recent developments this book addresses both the basic and applied aspects of adhesion. The authors present the latest results on fundamental aspects, adhesion in biology, chemistry for adhesive formulation, surface chemistry and the pretreatment of adherends, mechanical issues, non-destructive testing and the durability of adhesive joints, as well as advanced technical applications of adhesive joints. Prominent scientists review the current level of knowledge concerning the role of chemical bonds in adhesion, new resins and nanocomposites for adhesives, and about the role played by macromolecular architecture in the properties of hot melt and pressure sensitive adhesives. Written by 34 acknowledged experts from academic and industrial research facilities, this is a valuable source of information for chemists, physicists, biologists and engineers, as well as graduate students interested in fundamental and practical adhesion.
Book Synopsis Diffusion Phenomena in Thin Films and Microelectronic Materials by : Devendra Gupta
Download or read book Diffusion Phenomena in Thin Films and Microelectronic Materials written by Devendra Gupta and published by William Andrew. This book was released on 1988 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of diffusion phenomena in thin films and microelectronic materials -- theory and technology.
Book Synopsis Oxide Semiconductors: Volume 1633 by : Steve Durbin
Download or read book Oxide Semiconductors: Volume 1633 written by Steve Durbin and published by Materials Research Society. This book was released on 2014-07-14 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Symposium R, "Oxide Semiconductors" was held December 1-6 at the 2013 MRS Fall Meeting in Boston, Massachusetts. Oxide semiconductors are poised to take a more active role in modern electronics, particularly in the field of thin film transistors. While many advances have been made in terms of our understanding of fundamental optical and electronic characteristics, there remain many questions in terms of defects, doping, and optimal growth/synthesis conditions. This symposium proceedings volume represents recent advances in growth and characterization of a number of different oxide semiconductors, as well as device fabrication.
Book Synopsis Ionized Physical Vapor Deposition by :
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
Book Synopsis Chemical Vapor Deposition of Aluminum for Electronic Materials by : Michael G. Simmonds
Download or read book Chemical Vapor Deposition of Aluminum for Electronic Materials written by Michael G. Simmonds and published by . This book was released on 1993 with total page 442 pages. Available in PDF, EPUB and Kindle. Book excerpt: