Soviet Radio Frequency Discharge Research

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Publisher :
ISBN 13 :
Total Pages : 204 pages
Book Rating : 4.:/5 ( download)

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Book Synopsis Soviet Radio Frequency Discharge Research by : Valery A. Godyak

Download or read book Soviet Radio Frequency Discharge Research written by Valery A. Godyak and published by . This book was released on 1986 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physics of Radiofrequency Capacitive Discharge

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Publisher : CRC Press
ISBN 13 : 0429894228
Total Pages : 462 pages
Book Rating : 4.4/5 (298 download)

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Book Synopsis Physics of Radiofrequency Capacitive Discharge by : V. P. Savinov

Download or read book Physics of Radiofrequency Capacitive Discharge written by V. P. Savinov and published by CRC Press. This book was released on 2018-05-23 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book describes the physical mechanism of high-frequency (radio-frequency) capacitive discharge (RFCD) of low and medium pressure and the properties of discharge plasma in detail. The main properties and characteristics of RFCD, the features of electric breakdown in a high-frequency field are also investigated. The properties of near-electrode layers of a spatial discharge, the nature of the electric field in them, and the processes of charge transport to electrodes are explored. The work is intended for scientists engaged in gas discharge physics and low-temperature plasmas, graduate students and students of physics, physical chemistry, and relevant specialties.

Radio-Frequency Capacitive Discharges

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Publisher : CRC Press
ISBN 13 : 1351419951
Total Pages : 308 pages
Book Rating : 4.3/5 (514 download)

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Book Synopsis Radio-Frequency Capacitive Discharges by : Yuri P. Raizer

Download or read book Radio-Frequency Capacitive Discharges written by Yuri P. Raizer and published by CRC Press. This book was released on 2017-12-14 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.

Physics of Radio-Frequency Plasmas

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Publisher : Cambridge University Press
ISBN 13 : 1139494686
Total Pages : 395 pages
Book Rating : 4.1/5 (394 download)

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Book Synopsis Physics of Radio-Frequency Plasmas by : Pascal Chabert

Download or read book Physics of Radio-Frequency Plasmas written by Pascal Chabert and published by Cambridge University Press. This book was released on 2011-02-24 with total page 395 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.

Encyclopedia of Plasma Technology - Two Volume Set

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Publisher : CRC Press
ISBN 13 : 1351204939
Total Pages : 3082 pages
Book Rating : 4.3/5 (512 download)

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Book Synopsis Encyclopedia of Plasma Technology - Two Volume Set by : J. Leon Shohet

Download or read book Encyclopedia of Plasma Technology - Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 3082 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]

Electron Kinetics and Applications of Glow Discharges

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Publisher : Springer
ISBN 13 : 0306470764
Total Pages : 557 pages
Book Rating : 4.3/5 (64 download)

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Book Synopsis Electron Kinetics and Applications of Glow Discharges by : Uwe Kortshagen

Download or read book Electron Kinetics and Applications of Glow Discharges written by Uwe Kortshagen and published by Springer. This book was released on 2006-04-11 with total page 557 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.

Principles of Plasma Discharges and Materials Processing

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Publisher : John Wiley & Sons
ISBN 13 : 0471724246
Total Pages : 795 pages
Book Rating : 4.4/5 (717 download)

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Book Synopsis Principles of Plasma Discharges and Materials Processing by : Michael A. Lieberman

Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 795 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

A plasma chemistry study on global model for argon gas as a propellant to electrostatic gridded ion thruster

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Publisher : Editora Dialética
ISBN 13 : 6527011768
Total Pages : 90 pages
Book Rating : 4.5/5 (27 download)

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Book Synopsis A plasma chemistry study on global model for argon gas as a propellant to electrostatic gridded ion thruster by : Bernardo Vieira Magaldi

Download or read book A plasma chemistry study on global model for argon gas as a propellant to electrostatic gridded ion thruster written by Bernardo Vieira Magaldi and published by Editora Dialética. This book was released on 2024-07-31 with total page 90 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electric propulsion optimizes propellant mass and meets new propulsion device demands. These devices adjust satellite orbits and enable long missions. Among various thrusters, electrostatic ones have well-defined physics, simplifying operational parameter optimization. This study developed a global model for an Inductively Coupled Plasma (ICP) cylindrical ion thruster with an output polarized grid system. Argon propellant is injected into the chamber, and ICP plasma is generated by a radiofrequency current. Neutral and excited species are accelerated out by diffusion, while ionized species are accelerated via the polarized grids' electric field. The polarized grid system was optimized for better plasma sheath use. The model considers single and multi-step ionization, the Electron Energy Distribution Function (EEDF), neutral gas, and electron power balance equations. Excited species influence ionization energy, but not ionic density. However, the ion substitution rate increases, essential for thrust and specific impulse. The model determines the neutral gas temperature by considering the power balance and interactions with other species.

Low Pressure Plasmas and Microstructuring Technology

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Publisher : Springer Science & Business Media
ISBN 13 : 3540858490
Total Pages : 743 pages
Book Rating : 4.5/5 (48 download)

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Book Synopsis Low Pressure Plasmas and Microstructuring Technology by : Gerhard Franz

Download or read book Low Pressure Plasmas and Microstructuring Technology written by Gerhard Franz and published by Springer Science & Business Media. This book was released on 2009-04-09 with total page 743 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].

Numerical Simulation of Radio Frequency Gas Discharges

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Publisher :
ISBN 13 :
Total Pages : 550 pages
Book Rating : 4.:/5 (33 download)

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Book Synopsis Numerical Simulation of Radio Frequency Gas Discharges by : Timothy Eric Nitschke

Download or read book Numerical Simulation of Radio Frequency Gas Discharges written by Timothy Eric Nitschke and published by . This book was released on 1995 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Principles of Vapor Deposition of Thin Films

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Publisher : Elsevier
ISBN 13 : 9780080480312
Total Pages : 1176 pages
Book Rating : 4.4/5 (83 download)

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Book Synopsis Principles of Vapor Deposition of Thin Films by : Professor K.S. K.S Sree Harsha

Download or read book Principles of Vapor Deposition of Thin Films written by Professor K.S. K.S Sree Harsha and published by Elsevier. This book was released on 2005-12-16 with total page 1176 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Microwave Discharges

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Publisher : Springer Science & Business Media
ISBN 13 : 1489911308
Total Pages : 556 pages
Book Rating : 4.4/5 (899 download)

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Book Synopsis Microwave Discharges by : Carlos M. Ferreira

Download or read book Microwave Discharges written by Carlos M. Ferreira and published by Springer Science & Business Media. This book was released on 2013-11-21 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992

Plasma Chemistry

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Publisher : Cambridge University Press
ISBN 13 : 1139471732
Total Pages : pages
Book Rating : 4.1/5 (394 download)

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Book Synopsis Plasma Chemistry by : Alexander Fridman

Download or read book Plasma Chemistry written by Alexander Fridman and published by Cambridge University Press. This book was released on 2008-05-05 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.

Plasma Sources for Thin Film Deposition and Etching

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Publisher : Academic Press
ISBN 13 : 0080925138
Total Pages : 343 pages
Book Rating : 4.0/5 (89 download)

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Book Synopsis Plasma Sources for Thin Film Deposition and Etching by : Maurice H. Francombe

Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination

Nonequilibrium Processes in Partially Ionized Gases

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Publisher : Springer Science & Business Media
ISBN 13 : 1461537800
Total Pages : 682 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Nonequilibrium Processes in Partially Ionized Gases by : M. Capitelli

Download or read book Nonequilibrium Processes in Partially Ionized Gases written by M. Capitelli and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 682 pages. Available in PDF, EPUB and Kindle. Book excerpt: The NATO . Advanced Research Insti tute on Nonequilibrium Processes in Partially Ionized Gases was held at Acquafredda di Maratea during 4-17 June 1989. The Institute considered the interconnections between scattering and transport theories and modeling of nonequilibrium systems generated by electrical discharges, emphasizing the importance of microscopic processes in affecting the bulk properties of plasmas. The book tries to reproduce these lines. In particular several contributions describe scattering cross sections involving electrons interacting with atoms and molecules in both ground and excited states (from theoretical and experimental point of view), of energy transfer processes as well as reactive ones involving excited molecules colliding with atoms and molecules as well as with metallic surfaces. Other contributions deal with the basis of transport theories (Boltzmann and Monte Carlo methods) for describing the bulk properties of non equilibrium plasmas as well as with the modeling of complicated systems emphasizing in particular the strong coupling between the Boltzmann equation and excited state kinetics. Finally the book contains several contributions describing applications in different fields such as Excimer Lasers, Negative Ion Production, RF Discharges, Plasma Chemistry, Atmospheric Processes and Physics of Lamps. The Organizing Committee gratefully acknowledges the generous financial support provided by the NATO Science Committee as well as by Azienda Autonoma di Soggiorno e Turismo of Maratea, by University of Bari, by C. N. R. (Centro di Studio per la Chimica dei Plasmi and Comitato per la Chimica), by ENEA, by Lawrence Livermore Laboratory and by US Army Research Office.

Plasma Physics and Engineering

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Publisher : CRC Press
ISBN 13 : 1498772226
Total Pages : 725 pages
Book Rating : 4.4/5 (987 download)

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Book Synopsis Plasma Physics and Engineering by : Alexander Fridman

Download or read book Plasma Physics and Engineering written by Alexander Fridman and published by CRC Press. This book was released on 2021-02-25 with total page 725 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Physics and Engineering presents basic and applied knowledge on modern plasma physics, plasma chemistry, and plasma engineering for senior undergraduate and graduate students as well as for scientists and engineers working in academia; research labs; and industry with plasmas, laser and, combustion systems. This is a unique book providing a clear fundamental introduction to all aspects of modern plasma science, describing all electric discharges applied today from vacuum to atmospheric pressure and higher, from thermal plasma sources to essentially cold non-equilibrium discharges. A solutions manual is available for adopting professors, which is helpful in relevant university courses. Provides a lucid introduction to virtually all aspects of modern plasma science and technology Contains an extensive database on plasma kinetics and thermodynamics Includes many helpful numerical formulas for practical calculations, as well as numerous problems and concepts This revised edition includes new material on atmospheric pressure discharges, micro discharges, and different types of discharges in liquids Prof. Alexander Fridman is Nyheim Chair Professor of Drexel University and Director of C. & J. Nyheim Plasma Institute. His research focuses on plasma approaches to biology and medicine, to material treatment, fuel conversion, and environmental control. Prof. Fridman has almost 50 years of plasma research in national laboratories and universities of Russia, France, and the United States. He has published 8 books, and received numerous honors for his work, including Stanley Kaplan Distinguished Professorship in Chemical Kinetics and Energy Systems, George Soros Distinguished Professorship in Physics, the State Prize of the USSR, Plasma Medicine Award, Kurchatov Prize, Reactive Plasma Award, and Plasma Chemistry Award. Prof. Lawrence A. Kennedy is Dean of Engineering Emeritus and Professor of Mechanical Engineering Emeritus at the University of Illinois at Chicago and Professor of Mechanical Engineering Emeritus at the Ohio State University. His research focuses on chemically reacting flows and plasma processes. He is the author of more than 300 archival publications and 2 books, the editor of three monographs and served as Editor–in-Chief of the International Journal of Experimental Methods in Thermal and Fluid Science. Professor Kennedy was the Ralph W. Kurtz Distinguished Professor of Mechanical Engineering at OSU and the Stanley Kaplan University Scholar in Plasma Physics at UIC. Prof. Kennedy is also the recipient of numerous awards such as the American Society of Mechanical Engineers Heat Transfer Memorial Award (2008), and the Ralph Coats Roe Award from ASEE (1993). He is a Fellow of the American Society of Mechanical Engineers, the American Physical Society, the American Institute of Aeronautics and Astronautics and the American Association for the Advancement of Science.

Sheath Heating in Low Pressure Capacitive Radio Frequency Discharges

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Publisher :
ISBN 13 :
Total Pages : 320 pages
Book Rating : 4.:/5 (33 download)

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Book Synopsis Sheath Heating in Low Pressure Capacitive Radio Frequency Discharges by : Blake Philip Wood

Download or read book Sheath Heating in Low Pressure Capacitive Radio Frequency Discharges written by Blake Philip Wood and published by . This book was released on 1991 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: