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Rf Sputtered Aluminum Oxide Films On Silicon
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Book Synopsis Rf Sputtered Aluminum Oxide Films on Silicon by : C. A. T. Salama
Download or read book Rf Sputtered Aluminum Oxide Films on Silicon written by C. A. T. Salama and published by . This book was released on 1970 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical and electrical properties of aluminum oxide films deposited on silicon by rf sputtering from an alumina target in an argon atmosphere were investigated as a function of sputtering power density in the range from 0.5 to 3 W/sq cm. The deposition rates ranged from 20 to 80 A/min. The density, index of refraction, and dielectric constant of the films increased while the etch rate decreased with increasing power density. The surface charge at the aluminum oxide-silicon interface was typically larger than 10 to the 12th. This charge increased with increasing sputtering power density and could be reduced to 7-8 x 10 to the 11th e/sq cm by annealing. The films exhibited trapping instabilities at room temperature but no polarization was observed under biastemperature stress. The characteristics of composite layers of thermally grown silicon dioxide and sputtered aluminum oxide layers on silicon were also investigated and found to exhibit low surface charge densities, no hysteresis, and a 'contact potential' as well as charge stored at the interface between the two insulators. (Author).
Book Synopsis The Characteristics of Dc Reactively Sputtered Aluminum Oxide Films on Silicon by : Robert B. Cavanagh
Download or read book The Characteristics of Dc Reactively Sputtered Aluminum Oxide Films on Silicon written by Robert B. Cavanagh and published by . This book was released on 1971 with total page 198 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Dielectric Characteristics of Rf Sputtered Oxide Films by : I. H. Pratt
Download or read book Dielectric Characteristics of Rf Sputtered Oxide Films written by I. H. Pratt and published by . This book was released on 1969 with total page 42 pages. Available in PDF, EPUB and Kindle. Book excerpt: Results of a study on the deposition of thin-film dielectrics by RF sputtering are discussed. Source materials were silicon dioxide, aluminum oxide, tantalum oxide, and hafnium oxide, each of which was deposited onto metal electrodes and counterelectroded to complete the metal oxide metal capacitor structures for evaluation purposes. Depositions were conducted normally at 0.002 torr pressure utilizing a triode type sputtering system. Comparative rates of deposition of the dielectric materials ranged from 60 to 225 A/min for the maximum available power. The deposited films were amorphous in structure, although crystallites were dispersed in the hafnium oxide. Generally, the films displayed electrical and physical characteristics comparable to their counterparts formed by other processes, indicating that the sputtering process has the potential for translating the source materials to the substrates in a form suitable for thin-film dielectric applications. Yield study results are included in terms of non-shortened capacitors and their capability to withstand predetermined dielectric field strengths as a function of electrode areas ranging from 200 to 30,000 sq mil. (Author).
Book Synopsis Preparation of Thin-film Silicon Dioxide by Rf Sputtering by : I. H. Pratt
Download or read book Preparation of Thin-film Silicon Dioxide by Rf Sputtering written by I. H. Pratt and published by . This book was released on 1968 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt: The results of a study on the deposition of thin-film silicon dioxide by RF sputtering are discussed. The dielectric source material was quartz which was sputtered and deposited onto aluminum electrodes and counterelectroded to complete the metal-oxide-metal capacitive structures. Depositions were conducted at pressures from 1-20 x 10 to the -3 power torr utilizing a triode type sputtering system wherein the processes of ionization of the gas and bombardment of the material are separated essentially. An electron beam is used to ionize the gas and produce the plasma. Application of an RF voltage (13.560 MHz) to a conducting plate placed behind the dielectric (quartz) plate translates the RF power by displacement current through the insulating source material. Interaction of RF voltage and plasma results in the establishment of a dc field between source and plasma which allows for the sputtering of the insulator. The capacitors were utilized to evaluate the dielectric, the device characteristics, and related process parameters. The effect of gas sputtering pressure, magnetic field strength, source-to-substrate distance, and power density on the rate of deposition is shown. Increased film thickness uniformity over a 3 in x 3 in area by optimum substrate positioning is indicated. Dielectric constant, dissipation factor, dielectric breakdown strength, insulation resistance, heat treatment, capacitance and dissipation factor over the range 400 Hz to 5 MHz, and effect of coating on thin-film resistive elements are reported. (Author).
Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar
Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Book Synopsis The Formation, Characterization, and Application of Sputtered Al203 and Gamma-Fe202 Thin Films by : Ga-Lane Chen
Download or read book The Formation, Characterization, and Application of Sputtered Al203 and Gamma-Fe202 Thin Films written by Ga-Lane Chen and published by . This book was released on 1985 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Analysis of Aluminum Oxide Films on Silicon by : Mototaka Kamoshida
Download or read book Analysis of Aluminum Oxide Films on Silicon written by Mototaka Kamoshida and published by . This book was released on 1972 with total page 56 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum oxide exhibits novel and useful properties as a passivating layer on silicon surfaces. The study was concerned with the properties of hydrolytically grown aluminum oxide films on silicon. The study covered the influence of deposition temperature, of subsequent heat treatment and of anodization. The principal tool of measurement was MeV He(+) ion backscattering technique; in addition etch rates were measured and electron diffraction patterns were taken. Aluminum oxide films deposited onto silicon substrates by hydrolysis of AlCl3 show marked differences in etch rates, electron diffraction patterns and chlorine content between films grown below 700C and above 800C. However, both film types are stoichiometric. (Author).
Book Synopsis Electrical Properties of Sputtered Aluminum-oxide Films by : Pratul Kumar Ajmera
Download or read book Electrical Properties of Sputtered Aluminum-oxide Films written by Pratul Kumar Ajmera and published by . This book was released on 1971 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Preparation and Properties of Thin Films of Aluminum Oxide and Iron Oxide on Silicon Substrates by : Carolyn Hannigan
Download or read book Preparation and Properties of Thin Films of Aluminum Oxide and Iron Oxide on Silicon Substrates written by Carolyn Hannigan and published by . This book was released on 1991 with total page 32 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Preparation of Aluminum Oxide Films by Electron Bombardment by : Paul J. Tallerico
Download or read book Preparation of Aluminum Oxide Films by Electron Bombardment written by Paul J. Tallerico and published by . This book was released on 1961 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Formation, Characterization, and Application of Sputtered Aluminum Oxide and Gamma-iron Oxide Thin Films by : Ga-Lane Chen
Download or read book The Formation, Characterization, and Application of Sputtered Aluminum Oxide and Gamma-iron Oxide Thin Films written by Ga-Lane Chen and published by . This book was released on 1987 with total page 504 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis High-speed Deposition of Protective Films of Aluminium Oxide by the Method of Reactive Magnetron Sputtering by : S Bugaev
Download or read book High-speed Deposition of Protective Films of Aluminium Oxide by the Method of Reactive Magnetron Sputtering written by S Bugaev and published by . This book was released on 2001 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Studies of the Coincident Interfacial Structure and the Desorption Kinetics of Ultrathin Films of Aluminum Oxide on Silicon (111) by : Luke Andre Emmert
Download or read book Studies of the Coincident Interfacial Structure and the Desorption Kinetics of Ultrathin Films of Aluminum Oxide on Silicon (111) written by Luke Andre Emmert and published by . This book was released on 2000 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Symposium on the Deposition of Thin Films by Sputtering by : Consolidated Vacuum Corporation
Download or read book Symposium on the Deposition of Thin Films by Sputtering written by Consolidated Vacuum Corporation and published by . This book was released on 1966 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Deposition of Silicon Dioxide Films by Rf Sputtering by : Elisée Rastefano
Download or read book Deposition of Silicon Dioxide Films by Rf Sputtering written by Elisée Rastefano and published by . This book was released on 1978 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Papers Presented at the Symposium on the Deposition of Thin Films by Sputtering by :
Download or read book Papers Presented at the Symposium on the Deposition of Thin Films by Sputtering written by and published by . This book was released on 1966 with total page 116 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electrical and Structural Characterisation of Rapid Thermal Annealed RF Sputtered Silicon Oxide Films by : King Kwang Han
Download or read book Electrical and Structural Characterisation of Rapid Thermal Annealed RF Sputtered Silicon Oxide Films written by King Kwang Han and published by . This book was released on 1998 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt:
