Rapid Thermal Processing

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Publisher : Academic Press
ISBN 13 : 0323139809
Total Pages : 441 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Rapid Thermal Processing by : Richard B. Fair

Download or read book Rapid Thermal Processing written by Richard B. Fair and published by Academic Press. This book was released on 2012-12-02 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.

Reduced Thermal Processing for ULSI

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Publisher : Springer Science & Business Media
ISBN 13 : 1461305411
Total Pages : 444 pages
Book Rating : 4.4/5 (613 download)

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Book Synopsis Reduced Thermal Processing for ULSI by : R.A. Levy

Download or read book Reduced Thermal Processing for ULSI written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt: As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first area focuses on the subject of rapid thermal processing (RTP), a technology that allows minimization of processing time while relaxing the constraints on high temperature. Initially developed to limit dopant redistribution, current applications of RTP are shown here to encompass annealing, oxidation, nitridation, silicidation, glass reflow, and contact sintering. In a second but complementary area, advances in equipment design and performance of rapid thermal processing equipment are presented in conjunction with associated issues of temperature measurement and control. Defect mechanisms are assessed together with the resulting properties of rapidly deposited and processed films. The concept of RTP integration for a full CMOS device process is also examined together with its impact on device characteristics.

ULSI Science and Technology/1987

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Publisher :
ISBN 13 :
Total Pages : 874 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis ULSI Science and Technology/1987 by : S. Broydo

Download or read book ULSI Science and Technology/1987 written by S. Broydo and published by . This book was released on 1987 with total page 874 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Silicon Components and Processes Self Study

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Publisher : Springer Nature
ISBN 13 : 3031592190
Total Pages : 637 pages
Book Rating : 4.0/5 (315 download)

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Book Synopsis Silicon Components and Processes Self Study by : Badih El-Kareh

Download or read book Silicon Components and Processes Self Study written by Badih El-Kareh and published by Springer Nature. This book was released on 2024 with total page 637 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is one of a series of five volumes forming an integrated, self-study course on silicon device physics, modes of operation, characterization, and fabrication. The series is based on many years of the author’s experience in academic and industrial teaching of semiconductors. The books are suitable for both class-teaching and self-study. The authors have designed the content to enable readers to be introduced gradually to semiconductors, in particular silicon components. The presentation includes many illustrations, practical examples, review questions and problems at the end of each chapter. Answers to review questions and solutions to problems will be provided for “self-check”. Complements courses covering silicon device physics, mode of components, characterization, and fabrication; Enables comprehensive, self-study in semiconductors, aimed at practicing engineers or university students; Includes many illustrations, practical examples, review questions and problems at the end of each chapter.

Proceedings of the Symposium on Reduced Temperature Processing for VLSI

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Publisher :
ISBN 13 :
Total Pages : 634 pages
Book Rating : 4.:/5 (2 download)

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Book Synopsis Proceedings of the Symposium on Reduced Temperature Processing for VLSI by : Rafael Reif

Download or read book Proceedings of the Symposium on Reduced Temperature Processing for VLSI written by Rafael Reif and published by . This book was released on 1986 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Rapid Thermal and Integrated Processing

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Publisher :
ISBN 13 :
Total Pages : 534 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Rapid Thermal and Integrated Processing by :

Download or read book Rapid Thermal and Integrated Processing written by and published by . This book was released on 1991 with total page 534 pages. Available in PDF, EPUB and Kindle. Book excerpt:

ULSI Science and Technology, 1989

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Publisher :
ISBN 13 :
Total Pages : 804 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis ULSI Science and Technology, 1989 by : C. M. Osburn

Download or read book ULSI Science and Technology, 1989 written by C. M. Osburn and published by . This book was released on 1989 with total page 804 pages. Available in PDF, EPUB and Kindle. Book excerpt:

BiCMOS Technology and Applications

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Publisher : Springer Science & Business Media
ISBN 13 : 1461532183
Total Pages : 412 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis BiCMOS Technology and Applications by : Antonio R. Alvarez

Download or read book BiCMOS Technology and Applications written by Antonio R. Alvarez and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: BiCMOS Technology and Applications, Second Edition provides a synthesis of available knowledge about the combination of bipolar and MOS transistors in a common integrated circuit - BiCMOS. In this new edition all chapters have been updated and completely new chapters on emerging topics have been added. In addition, BiCMOS Technology and Applications, Second Edition provides the reader with a knowledge of either CMOS or Bipolar technology/design a reference with which they can make educated decisions regarding the viability of BiCMOS in their own application. BiCMOS Technology and Applications, Second Edition is vital reading for practicing integrated circuit engineers as well as technical managers trying to evaluate business issues related to BiCMOS. As a textbook, this book is also appropriate at the graduate level for a special topics course in BiCMOS. A general knowledge in device physics, processing and circuit design is assumed. Given the division of the book, it lends itself well to a two-part course; one on technology and one on design. This will provide advanced students with a good understanding of tradeoffs between bipolar and MOS devices and circuits.

Handbook of Semiconductor Manufacturing Technology

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Publisher : CRC Press
ISBN 13 : 9780824787837
Total Pages : 1186 pages
Book Rating : 4.7/5 (878 download)

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Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi

Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2000-08-09 with total page 1186 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."

Dissertation Abstracts International

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Author :
Publisher :
ISBN 13 :
Total Pages : 640 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Dissertation Abstracts International by :

Download or read book Dissertation Abstracts International written by and published by . This book was released on 1988 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Fundamentals of Semiconductor Processing Technology

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Publisher : Springer Science & Business Media
ISBN 13 : 1461522099
Total Pages : 605 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Fundamentals of Semiconductor Processing Technology by : Badih El-Kareh

Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.

Rapid Thermal Processing: Volume 52

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Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 512 pages
Book Rating : 4.:/5 (41 download)

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Book Synopsis Rapid Thermal Processing: Volume 52 by : Thomas O. Sedgwick

Download or read book Rapid Thermal Processing: Volume 52 written by Thomas O. Sedgwick and published by Mrs Proceedings. This book was released on 1986-04-15 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146

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Publisher :
ISBN 13 :
Total Pages : 544 pages
Book Rating : 4.:/5 (2 download)

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Book Synopsis Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 by : David Hodul

Download or read book Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 written by David Hodul and published by . This book was released on 1989-11-03 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

VLSI Metallization

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Publisher : Academic Press
ISBN 13 : 1483217817
Total Pages : 491 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis VLSI Metallization by : Norman G. Einspruch

Download or read book VLSI Metallization written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 491 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Electronics Microstructure Science, Volume 15: VLSI Metallization discusses the various issues and problems related to VLSI metallization. It details the available solutions and presents emerging trends. This volume is comprised of 10 chapters. The two introductory chapters, Chapter 1 and 2 serve as general references for the electrical and metallurgical properties of thin conducting films. Subsequent chapters review the various aspects of VLSI metallization. The order of presentation has been chosen to follow the common processing sequence. In Chapter 3, some relevant metal deposition techniques are discussed. Chapter 4 presents the methods of VLSI lithography and etching. Conducting films are first deposited at the gate definition step; therefore, the issues related to gate metallization are discussed next in Chapter 5.In Chapter 6, contact metallization is elaborated, and Chapter 7 is devoted to multilevel metallization schemes. Long-time reliability is the subject of Chapter 8, which discusses the issues of contact and interconnect electromigration. GaAs metallization is tackled in Chapter 9. The volume concludes with a general discussion of the functions of interconnect systems in VLSI. Materials scientists, processing and design engineers, and device physicists will find the book very useful.

Metallic Films for Electronic, Optical and Magnetic Applications

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Publisher : Woodhead Publishing
ISBN 13 : 085709629X
Total Pages : 671 pages
Book Rating : 4.8/5 (57 download)

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Book Synopsis Metallic Films for Electronic, Optical and Magnetic Applications by : Katayun Barmak

Download or read book Metallic Films for Electronic, Optical and Magnetic Applications written by Katayun Barmak and published by Woodhead Publishing. This book was released on 2014-02-13 with total page 671 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metallic films play an important role in modern technologies such as integrated circuits, information storage, displays, sensors, and coatings. Metallic Films for Electronic, Optical and Magnetic Applications reviews the structure, processing and properties of metallic films. Part one explores the structure of metallic films using characterization methods such as x-ray diffraction and transmission electron microscopy. This part also encompasses the processing of metallic films, including structure formation during deposition and post-deposition reactions and phase transformations. Chapters in part two focus on the properties of metallic films, including mechanical, electrical, magnetic, optical, and thermal properties. Metallic Films for Electronic, Optical and Magnetic Applications is a technical resource for electronics components manufacturers, scientists, and engineers working in the semiconductor industry, product developers of sensors, displays, and other optoelectronic devices, and academics working in the field. - Explores the structure of metallic films using characterization methods such as x-ray diffraction and transmission electron microscopy - Discusses processing of metallic films, including structure formation during deposition and post-deposition reactions and phase transformations - Focuses on the properties of metallic films, including mechanical, electrical, magnetic, optical, and thermal properties

Electrical & Electronics Abstracts

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Publisher :
ISBN 13 :
Total Pages : 1860 pages
Book Rating : 4.3/5 (243 download)

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Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 1860 pages. Available in PDF, EPUB and Kindle. Book excerpt:

ESSDERC '85

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Publisher :
ISBN 13 :
Total Pages : 368 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis ESSDERC '85 by :

Download or read book ESSDERC '85 written by and published by . This book was released on 1985 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: