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Rapid Thermal And Integrated Processing
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Book Synopsis Advances in Rapid Thermal and Integrated Processing by : F. Roozeboom
Download or read book Advances in Rapid Thermal and Integrated Processing written by F. Roozeboom and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Book Synopsis Rapid Thermal and Integrated Processing V: Volume 429 by : J. C. Gelpey
Download or read book Rapid Thermal and Integrated Processing V: Volume 429 written by J. C. Gelpey and published by . This book was released on 1996-10-14 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Book Synopsis Rapid Thermal and Integrated Processing by :
Download or read book Rapid Thermal and Integrated Processing written by and published by . This book was released on 1998 with total page 914 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Advances in Rapid Thermal and Integrated Processing by : F. Roozeboom
Download or read book Advances in Rapid Thermal and Integrated Processing written by F. Roozeboom and published by . This book was released on 2014-01-15 with total page 580 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 by : David Hodul
Download or read book Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 written by David Hodul and published by . This book was released on 1989-11-03 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Rapid Thermal and Integrated Processing III: Volume 342 by : Jimmie J. Wortman
Download or read book Rapid Thermal and Integrated Processing III: Volume 342 written by Jimmie J. Wortman and published by . This book was released on 1994-08-02 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Rapid Thermal and Integrated Processing II: Volume 303 by : Jeffrey C. Gelpey
Download or read book Rapid Thermal and Integrated Processing II: Volume 303 written by Jeffrey C. Gelpey and published by Mrs Proceedings. This book was released on 1993-07-28 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Rapid Thermal and Integrated Processing IV: Volume 387 by : Steven R. J. Brueck
Download or read book Rapid Thermal and Integrated Processing IV: Volume 387 written by Steven R. J. Brueck and published by Materials Research Society. This book was released on 1995-10-27 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fourth in a continuing series on rapid thermal processing (RTP), this volume addresses work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in integrated processes. The primary focus, however, is the manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs. Emphasis is placed on process and equipment modelling and the critical aspects of RTP, such as temperature measurement, uniformity and control. Topics include: modelling, sensors and control; integrated processing and manufacturing; dielectrics; epitaxy, polysilicon and devices; and junctions, metallization and contacts.
Book Synopsis Rapid Thermal and Integrated Processing VI by :
Download or read book Rapid Thermal and Integrated Processing VI written by and published by . This book was released on 1997 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Rapid Thermal and Integrated Processing IV: Volume 470 by : Jeffrey C. Gelpey
Download or read book Rapid Thermal and Integrated Processing IV: Volume 470 written by Jeffrey C. Gelpey and published by Materials Research Society. This book was released on 1998-01-09 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, this book in the series clearly indicates that the science of RTP is increasingly better understood and that equipment simulation and engineering have matured. With the so-called 'second generation' equipment vendors are providing useful and production-worthy solutions to the most pertinent problems within RTP - temperature measurement and reproducability. For that reason, the issues of temperature calibration and metrology, along with the International Temperature Scale, are featured. The evaluation and modelling of furnace, mini-bath and single-wafer RTP furnaces as the thermal method of choice are also addressed. Interesting developments are reported in the processing of dielectrics. Applications outside the field of silicon semiconductors are also presented. Topics include: measurement; RTCVD; modelling and manufacturing; integrated processing; silicides; annealing and defects; dielectrics; and RTP of III-V materials and other novel applications.
Book Synopsis Rapid Thermal and Integrated Processing VII: by : Mehmet C. Öztürk
Download or read book Rapid Thermal and Integrated Processing VII: written by Mehmet C. Öztürk and published by Cambridge University Press. This book was released on 2014-06-05 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, thisvolume in the series presents work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in novel modelling and integrated processes. Papers on equipment issues illustrate that problems such as temperature uniformity and measurement, traditionally viewed as limitations for RTP technology, are well on the way to being resolved. Manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs are also addressed. Topics include: RTP equipment - modelling and new concepts; temperature measurement and control in RTP equipment; MOSFET gate stack engineering; MOSFET channel and source/drain engineering; silicides; and new applications of rapid thermal processing.
Book Synopsis Rapid Thermal and Integrated Processing, II, Symposium Held 1993, San Francisco, California, U.S.A. by : Materials Research Society
Download or read book Rapid Thermal and Integrated Processing, II, Symposium Held 1993, San Francisco, California, U.S.A. written by Materials Research Society and published by . This book was released on 1993 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Rapid Thermal and Integrated Processing by :
Download or read book Rapid Thermal and Integrated Processing written by and published by . This book was released on 1991 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Rapid Thermal Processing by : Richard B. Fair
Download or read book Rapid Thermal Processing written by Richard B. Fair and published by Academic Press. This book was released on 2012-12-02 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Book Synopsis Rapid Thermal and Integrated Processing: by : Jeffrey C. Gelpey
Download or read book Rapid Thermal and Integrated Processing: written by Jeffrey C. Gelpey and published by Cambridge University Press. This book was released on 2014-06-05 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Rapid Thermal Processing of Semiconductors by : Victor E. Borisenko
Download or read book Rapid Thermal Processing of Semiconductors written by Victor E. Borisenko and published by Springer Science & Business Media. This book was released on 2013-11-22 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Book Synopsis Rapid Thermal and Integrated Processing II: by : Jeffrey C. Gelpey
Download or read book Rapid Thermal and Integrated Processing II: written by Jeffrey C. Gelpey and published by Cambridge University Press. This book was released on 2014-06-05 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
