Quasineutral Particle Simulation of Magnetized Plasma Discharges: General Formalism and Application to ECR Discharges

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Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (946 download)

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Book Synopsis Quasineutral Particle Simulation of Magnetized Plasma Discharges: General Formalism and Application to ECR Discharges by :

Download or read book Quasineutral Particle Simulation of Magnetized Plasma Discharges: General Formalism and Application to ECR Discharges written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: In quasineutral plasmas it is difficult and inefficient to calculate the electrostatic field from Poisson's equation. We have developed a particle-in-cell/Monte Carlo (PIC/MC) simulation method for magnetized discharges, in which internal electric fields and sheath potentials are determined directly from the requirement of quasineutrality. Sheaths are treated as thin potential barriers, and the Bohm criterion for ion flux into the sheath is imposed as a boundary condition. Electron plasma oscillations do not appear in the model, and the Debye length is essentially set to zero. Thus time steps and spatial gridding can be chosen to represent the macroscopic time and space scales of interest, greatly enhancing numerical efficiency. The simulation technique correctly represents kinetic features such as Landau damping. We believe it is applicable generally to a wide variety of phenomena in plasmas that may be magnetized or unmagnetized, bounded or unbounded, collisional or collisionless.

A Simple Scheme for Implementing Wave Absorption in Quasi-Neutral PIC Simulations of ECR Plasma

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ISBN 13 :
Total Pages : 28 pages
Book Rating : 4.:/5 (455 download)

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Book Synopsis A Simple Scheme for Implementing Wave Absorption in Quasi-Neutral PIC Simulations of ECR Plasma by : Wallace Manheimer

Download or read book A Simple Scheme for Implementing Wave Absorption in Quasi-Neutral PIC Simulations of ECR Plasma written by Wallace Manheimer and published by . This book was released on 1998 with total page 28 pages. Available in PDF, EPUB and Kindle. Book excerpt: A simple scheme is formulated here for describing the absorption of electron cyclotron waves in ECR plasma reactors. We particularly focus on quasi-neutral particle simulation schemes, where short times like the inverse electron plasma and cyclotron frequencies are not resolved. The formulation here implements a wave kinetic equation for propagation along the magnetic field and the self consistent quasi-linear response of the electrons. The velocity dependence of the wave deposition is correctly described, maxwell electrons are not assumed so the tail of the electron distribution can be either overpopulated or depopulated, depending on the dominant physical processes present. The computer time to solve the problem and the human time to code it up are both minimized.

Transport Phenomena in Partially Ionized Plasma

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Publisher : CRC Press
ISBN 13 : 9780415271875
Total Pages : 496 pages
Book Rating : 4.2/5 (718 download)

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Book Synopsis Transport Phenomena in Partially Ionized Plasma by : V.A. Rozhansky

Download or read book Transport Phenomena in Partially Ionized Plasma written by V.A. Rozhansky and published by CRC Press. This book was released on 2001-11-22 with total page 496 pages. Available in PDF, EPUB and Kindle. Book excerpt: Transport phenomena in plasmas are the relatively slow processes of particle momentum and energy transport systems in a state of mechanical equilibrium. In contrast to neutral gases, these phenomena in plasmas are greatly influenced by self-consistent fields, in particular electric fields. These can produce particle and energy fluxes, in addition to those generated by the inhomogeneity of the plasma composition and temperature. As a result, the physical effects accompanying transport phenomena in plasmas are far more numerous and complicated than those in neutral gases, and the solution of corresponding problems is more difficult. The effects, however, are usually far more interesting and sometimes surprising. This book presents a systematic survey and analysis of the main mechanisms of transport phenomena in plasma and gives examples of gradually increasing complexity to illustrate these mechanisms and the relationships between them. The author pays special attention to the analysis of experimental measurements and considers the relevant processes analytically as well as qualitatively. The majority of problems dealt with in this book are of considerable practical interest, and the phenomena described often determine the main characteristics of processes and devices. Transport Phenomena in Partially Ionized Plasma will be of interest to researchers who need to know the properties of real, specific systems, as well as to engineers and advanced students in the physics of plasmas, semiconductors, various types of gas discharges and the ionosphere.

Computer Simulation Using Particles

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Publisher : CRC Press
ISBN 13 : 9781439822050
Total Pages : 566 pages
Book Rating : 4.8/5 (22 download)

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Book Synopsis Computer Simulation Using Particles by : R.W Hockney

Download or read book Computer Simulation Using Particles written by R.W Hockney and published by CRC Press. This book was released on 2021-03-24 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: Computer simulation of systems has become an important tool in scientific research and engineering design, including the simulation of systems through the motion of their constituent particles. Important examples of this are the motion of stars in galaxies, ions in hot gas plasmas, electrons in semiconductor devices, and atoms in solids and liquids. The behavior of the system is studied by programming into the computer a model of the system and then performing experiments with this model. New scientific insight is obtained by observing such computer experiments, often for controlled conditions that are not accessible in the laboratory. Computer Simulation using Particles deals with the simulation of systems by following the motion of their constituent particles. This book provides an introduction to simulation using particles based on the NGP, CIC, and P3M algorithms and the programming principles that assist with the preparations of large simulation programs based on the OLYMPUS methodology. It also includes case study examples in the fields of astrophysics, plasmas, semiconductors, and ionic solids as well as more detailed mathematical treatment of the models, such as their errors, dispersion, and optimization. This resource will help you understand how engineering design can be assisted by the ability to predict performance using the computer model before embarking on costly and time-consuming manufacture.

Computational Plasma Physics

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Publisher : CRC Press
ISBN 13 : 0429981104
Total Pages : 428 pages
Book Rating : 4.4/5 (299 download)

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Book Synopsis Computational Plasma Physics by : Toshi Tajima

Download or read book Computational Plasma Physics written by Toshi Tajima and published by CRC Press. This book was released on 2018-03-14 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physics of plasmas is an extremely rich and complex subject as the variety of topics addressed in this book demonstrates. This richness and complexity demands new and powerful techniques for investigating plasma physics. An outgrowth from his graduate course teaching, now with corrections, Tajima's text provides not only a lucid introduction to computational plasma physics, but also offers the reader many examples of the way numerical modeling, properly handled, can provide valuable physical understanding of the nonlinear aspects so often encountered in both laboratory and astrophysical plasmas. Included here are computational methods for modern nonlinear physics as applied to hydrodynamic turbulence, solitons, fast reconnection of magnetic fields, anomalous transports, dynamics of the sun, and more. The text contains examples of problems now solved using computational techniques including those concerning finite-size particles, spectral techniques, implicit differencing, gyrokinetic approaches, and particle simulation.

Handbook of Thin Film Technology

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Publisher : Springer Science & Business Media
ISBN 13 : 3642054307
Total Pages : 385 pages
Book Rating : 4.6/5 (42 download)

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Book Synopsis Handbook of Thin Film Technology by : Hartmut Frey

Download or read book Handbook of Thin Film Technology written by Hartmut Frey and published by Springer Science & Business Media. This book was released on 2015-05-06 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: “Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Beam Acceleration In Crystals And Nanostructures - Proceedings Of The Workshop

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Publisher :
ISBN 13 : 9811217130
Total Pages : 269 pages
Book Rating : 4.8/5 (112 download)

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Book Synopsis Beam Acceleration In Crystals And Nanostructures - Proceedings Of The Workshop by : Gerard Mourou

Download or read book Beam Acceleration In Crystals And Nanostructures - Proceedings Of The Workshop written by Gerard Mourou and published by . This book was released on 2020 with total page 269 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ionized Physical Vapor Deposition

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Publisher : Academic Press
ISBN 13 : 008054293X
Total Pages : 268 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Ionized Physical Vapor Deposition by :

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes

Stellarator and Heliotron Devices

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Publisher : Oxford University Press, USA
ISBN 13 : 9780195078312
Total Pages : 462 pages
Book Rating : 4.0/5 (783 download)

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Book Synopsis Stellarator and Heliotron Devices by : Masahiro Wakatani

Download or read book Stellarator and Heliotron Devices written by Masahiro Wakatani and published by Oxford University Press, USA. This book was released on 1998 with total page 462 pages. Available in PDF, EPUB and Kindle. Book excerpt: This monograph describes plasma physics for magnetic confinement of high temperature plasmas in nonaxisymmetric toroidal magnetic fields or stellarators. The techniques are aimed at controlling nuclear fusion for continuous energy production. While the focus is on the nonaxisymmetric toroidal field, or heliotron, developed at Kyoto University, the physics applies equally to other stellarators and axisymmetric tokamaks. The author covers all aspects of magnetic confinement, formation of magnetic surfaces, magnetohydrodynamic equilibrium and stability, single charged particle confinement, neoclassical transport and plasma heating. He also reviews recent experiments and the prospects for the next generation of devices.

Industrial Plasma Engineering

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Publisher : CRC Press
ISBN 13 : 9781420050868
Total Pages : 572 pages
Book Rating : 4.0/5 (58 download)

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Book Synopsis Industrial Plasma Engineering by : J Reece Roth

Download or read book Industrial Plasma Engineering written by J Reece Roth and published by CRC Press. This book was released on 1995-01-01 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book will provide the necessary theoretical background and a description of plasma-related devices and processes that are used industrially for physicists and engineers. It is a self-contained introduction to the principles of plasma engineering with comprehensive references. This volume also includes the terminology, jargon and acronyms used in the field of industrial plasma engineering - indexed when they first appear in the text - along with their definitions and a discussion of their meaning. It is aimed at assisting the student in learning key terminology and concepts, and providing the in-service engineer or scientist with a technical glossary. An extensive index and appendices enhance the value of this book as a key reference source. These incorporate a list of the nomenclature used in mathematical expressions in the text, physical constants, and often-used plasma formulae. SI units are used throughout. Intended for students from all engineering and physical science disciplines, and as a reference source by in-service engineers. Coverage: * basic information on plasma physics and the physical processes important in industrial plasmas * sources of ion and electron beams and ionizing radiation used in industrial applications * physics and technology of DC and RF electrical discharges.

Introduction to Plasma Physics and Controlled Fusion

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Publisher : Springer Science & Business Media
ISBN 13 : 1475755953
Total Pages : 427 pages
Book Rating : 4.4/5 (757 download)

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Book Synopsis Introduction to Plasma Physics and Controlled Fusion by : Francis F. Chen

Download or read book Introduction to Plasma Physics and Controlled Fusion written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 427 pages. Available in PDF, EPUB and Kindle. Book excerpt: TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.

Industrial Plasma Engineering

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Publisher : CRC Press
ISBN 13 : 9780750305440
Total Pages : 1320 pages
Book Rating : 4.3/5 (54 download)

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Book Synopsis Industrial Plasma Engineering by : J Reece Roth

Download or read book Industrial Plasma Engineering written by J Reece Roth and published by CRC Press. This book was released on 2001-08-25 with total page 1320 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.

Multiple Time Scales

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Publisher : Academic Press
ISBN 13 : 1483257568
Total Pages : 457 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis Multiple Time Scales by : Jeremiah U. Brackbill

Download or read book Multiple Time Scales written by Jeremiah U. Brackbill and published by Academic Press. This book was released on 2014-05-10 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: Multiple Time Scales presents various numerical methods for solving multiple-time-scale problems. The selection first elaborates on considerations on solving problems with multiple scales; problems with different time scales; and nonlinear normal-mode initialization of numerical weather prediction models. Discussions focus on analysis of observations, nonlinear analysis, systems of ordinary differential equations, and numerical methods for problems with multiple scales. The text then examines the diffusion-synthetic acceleration of transport iterations, with application to a radiation hydrodynamics problem and implicit methods in combustion and chemical kinetics modeling. The publication ponders on molecular dynamics and Monte Carlo simulations of rare events; direct implicit plasma simulation; orbit averaging and subcycling in particle simulation of plasmas; and hybrid and collisional implicit plasma simulation models. Topics include basic moment method, electron subcycling, gyroaveraged particle simulation, and the electromagnetic direct implicit method. The selection is a valuable reference for researchers interested in pursuing further research on the use of numerical methods in solving multiple-time-scale problems.

Advanced Technologies Based on Wave and Beam Generated Plasmas

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Publisher : Springer Science & Business Media
ISBN 13 : 9780792356424
Total Pages : 592 pages
Book Rating : 4.3/5 (564 download)

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Book Synopsis Advanced Technologies Based on Wave and Beam Generated Plasmas by : H. Schlüter

Download or read book Advanced Technologies Based on Wave and Beam Generated Plasmas written by H. Schlüter and published by Springer Science & Business Media. This book was released on 1999-02-28 with total page 592 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas

The Materials Science of Thin Films

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Publisher : Academic Press
ISBN 13 : 9780125249904
Total Pages : 744 pages
Book Rating : 4.2/5 (499 download)

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Book Synopsis The Materials Science of Thin Films by : Milton Ohring

Download or read book The Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 1992 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Flexible Spacecraft Dynamics, Control and Guidance

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Publisher : Springer
ISBN 13 : 3319255401
Total Pages : 372 pages
Book Rating : 4.3/5 (192 download)

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Book Synopsis Flexible Spacecraft Dynamics, Control and Guidance by : Leonardo Mazzini

Download or read book Flexible Spacecraft Dynamics, Control and Guidance written by Leonardo Mazzini and published by Springer. This book was released on 2015-10-27 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an up-to-date compendium on spacecraft attitude and orbit control (AOC) that offers a systematic and complete treatment of the subject with the aim of imparting the theoretical and practical knowledge that is required by designers, engineers, and researchers. After an introduction on the kinematics of the flexible and agile space vehicles, the modern architecture and functions of an AOC system are described and the main AOC modes reviewed with possible design solutions and examples. The dynamics of the flexible body in space are then considered using an original Lagrangian approach suitable for the control applications of large space flexible structures. Subsequent chapters address optimal control theory, attitude control methods, and orbit control applications, including the optimal orbital transfer with finite and infinite thrust. The theory is integrated with a description of current propulsion systems, with the focus especially on the new electric propulsion systems and state of the art sensors and actuators.

Lecture Notes on Principles of Plasma Processing

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Publisher : Springer Science & Business Media
ISBN 13 : 1461501814
Total Pages : 213 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Lecture Notes on Principles of Plasma Processing by : Francis F. Chen

Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.