Read Books Online and Download eBooks, EPub, PDF, Mobi, Kindle, Text Full Free.
Process Optimization For Fabrication Of Nano Scale Resist Patterns Using Electron Beam Lithography
Download Process Optimization For Fabrication Of Nano Scale Resist Patterns Using Electron Beam Lithography full books in PDF, epub, and Kindle. Read online Process Optimization For Fabrication Of Nano Scale Resist Patterns Using Electron Beam Lithography ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Process Optimization for Fabrication of Nano Scale Resist Patterns Using Electron Beam Lithography by : Thomas L. Mulcahy
Download or read book Process Optimization for Fabrication of Nano Scale Resist Patterns Using Electron Beam Lithography written by Thomas L. Mulcahy and published by . This book was released on 2005 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Nanostructure Engineering Using Electron Beam Lithography by : Paul Bernard Fischer
Download or read book Nanostructure Engineering Using Electron Beam Lithography written by Paul Bernard Fischer and published by . This book was released on 1993 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Ph. D. thesis addresses nanostructure fabrication techniques based on electron beam lithography and their application to: the creation of ultra-fast metal-semiconductor-metal photodetectors and quantum effect transistors, the investigation of light emission from silicon, and the enhancement of resolution in magnetic force microscopy. Specifically, this thesis covers the following topics. (1) The implementation and characterization of an ultra-high resolution electron beam lithography (EBL) system created by modifying a scanning electron microscope. (2) The exploration of minimum achievable feature sizes using ultra-high resolution EBL and a lift-off process with polymethyl-methacrylate resists. 10 nm features, which are among the smallest ever achieved using EBL, have been obtained using a double shadow evaporation technique, a ultra-high resolution EBL technique, and a technique utilizing EBL, reactive ion etching, and subsequent wet etching. (3) The application of ultra-high resolution EBL technology to the fabrication of ultra-fast metal-semiconductor-metal (MSM) photodetectors. The fastest response time reported to date has been achieved in this project. (4) The fabrication and characterization of modulation doped field effect transistors. Quantum effects have been observed in a point contact device. (5) The fabrication of sub-50 nm Si structures using EBL, reactive ion etching (RIE) and subsequent wet etching for the study of photoluminescence (PL) from Si. PL has been observed from an array of 20 nm diameter pillars. And finally, (6) the application of high resolution EBL to the study of magnetic materials. Single domain magnetic particles and novel MFM tips have been fabricated.
Book Synopsis Nanofabrication by : Maria Stepanova
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Book Synopsis Nanofabrication Using Electron Beam Lithography by : Arwa Abbas
Download or read book Nanofabrication Using Electron Beam Lithography written by Arwa Abbas and published by . This book was released on 2013 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R & D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development process, as well as pattern transfer procedure after lithography. Specifically, this thesis investigates the following topics that are related to either electron beam resists, their development, or pattern transfer process after electron beam lithography: (1) The dry thermal development (contrary to conventional solvent development) of negative electron beam resists polystyrene (PS) to achieve reasonably high contrast and resolution. (2) The solvent development for polycarbonate electron beam resist, which is more desirable than the usual hot aqueous solution of NaOH developer, to achieve a low contrast that is ideal for grayscale lithography. (3) The fabrication of metal nanostructure by electron beam lithography and dry liftoff (contrary to the conventional liftoff using a strong solvent or aqueous solution), to achieved down to ~50 nm resolution. (4) The study a novel electron beam resist poly(sodium 4-styrenesulfonate) (sodium PSS) that is water soluble and water developable, to fabricate the feature size down to ~ 40 nm. And finally, (5) The fabrication of gold nanostructure on a thin membrane, which will be used as an object for novel x-ray imaging, where we developed the fabrication process for silicon nitride membrane, electroplating of gold, and pattern transfer after electron beam lithography using single layer resist and tri-layer resist stack.
Book Synopsis Nanoimprint Lithography: An Enabling Process for Nanofabrication by : Weimin Zhou
Download or read book Nanoimprint Lithography: An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Book Synopsis Methodologies to Enhance the Resolution of Electron Beam Lithography for Nanostructure Fabrication by :
Download or read book Methodologies to Enhance the Resolution of Electron Beam Lithography for Nanostructure Fabrication written by and published by . This book was released on 2007 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron beam lithography, benefiting from the electron's shorter wavelength, is believed to be the next generation of lithography that will be used for manufacturing of ultra-large scale integrated circuits. In this dissertation, we investigated methodologies to enhance the resolution of electron beam lithography for nanostructure fabrication. The research was conducted at a writing voltage of 15 kV in order to demonstrate technologies that can be readily adapted to the future generations of commercialized electron beam lithography tools. It is expected that these new instrument will use low writing voltages in order to minimize the substrate damage and to reduce the instrument cost. Based on the studies presented in this dissertation, we demonstrate sub-10 nm linewidth isolated patterns and sub-10 nm linewidth dense patterns writing at a voltage of 15 kV. In addition, we successfully demonstrated a nano-pattern transfer process by using electron beam direct writing on a "modified" resist (in our case, a mixture of nanoparticles and PMMA photo resist). The successful demonstration of the electron beam direct writing on a modified resist can potentially open a new window of resist modification engineering for lithographic applications. The details of the development of novel methodologies will be presented in this thesis. We also demonstrate a 5 nm gold nano-gap, which can be used to study the electronic properties of nanoparticles trapped in the gap. Metal molds with minimum linewidths of 10 nm can be used for nanoimprint lithography was also demonstrated. In addition, silicon nanowires with a minimum linewidth of 10 nm that can be used for the fabrication of single electron transistor working at a high temperature were demonstrated. Finally, a 5 nm gold nanoparticle confined in a 30 nm resist island, which can be used for the single/multiple dot spectroscopy study was fabricated.
Book Synopsis Superconductors at the Nanoscale by : Roger Wördenweber
Download or read book Superconductors at the Nanoscale written by Roger Wördenweber and published by Walter de Gruyter GmbH & Co KG. This book was released on 2017-09-11 with total page 590 pages. Available in PDF, EPUB and Kindle. Book excerpt: By covering theory, design, and fabrication of nanostructured superconducting materials, this monograph is an invaluable resource for research and development. Examples are energy saving solutions, healthcare, and communication technologies. Key ingredients are nanopatterned materials which help to improve the superconducting critical parameters and performance of superconducting devices, and lead to novel functionalities. Contents Tutorial on nanostructured superconductors Imaging vortices in superconductors: from the atomic scale to macroscopic distances Probing vortex dynamics on a single vortex level by scanning ac-susceptibility microscopy STM studies of vortex cores in strongly confined nanoscale superconductors Type-1.5 superconductivity Direct visualization of vortex patterns in superconductors with competing vortex-vortex interactions Vortex dynamics in nanofabricated chemical solution deposition high-temperature superconducting films Artificial pinning sites and their applications Vortices at microwave frequencies Physics and operation of superconducting single-photon devices Josephson and charging effect in mesoscopic superconducting devices NanoSQUIDs: Basics & recent advances Bi2Sr2CaCu2O8 intrinsic Josephson junction stacks as emitters of terahertz radiation| Interference phenomena in superconductor-ferromagnet hybrids Spin-orbit interactions, spin currents, and magnetization dynamics in superconductor/ferromagnet hybrids Superconductor/ferromagnet hybrids
Book Synopsis Nanofabrication by : Ampere A. Tseng
Download or read book Nanofabrication written by Ampere A. Tseng and published by World Scientific. This book was released on 2008 with total page 583 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Book Synopsis A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems by :
Download or read book A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems written by and published by . This book was released on 2007 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's semiconductor industry has been significantly changing in its techniques and processes for the fabrication of devices and accordingly, there has been dramatic increase in performance and a reduction in cost. To obtain still higher device performances and still further cost reduction, the dimensions of patterns in integrated circuits should be as small as possible and the 3-dimensional accuracy of multidimensional semiconductor structures should be also achieved as well. The manufacturing of smaller feature dimensions and 3-dimensional devices has been enabled by developments in lithography - the technology which transfers designed patterns onto the silicon wafer. Especially, electron beam lithography is widely adapted in the nano fabrication technology due to its ability to achieve nanometer-scale resolution. The aim of this work is to fabricate test devices by the electron beam lithography possesses and apply them to the test of electron optical systems. In this thesis, we first develop methods to fabricate a high resolution nano scale Fresnel zone plate and 3-dimenstional stair case structure by E-beam lithography. To optimize the fabrication we optimized the lithographic process and the subsequent process steps accounted for proximity effects via a correction program and controlled pattern transfer through reactive ion etching (RIE). The completed devices were tested in a Scanning Electron Microscopy (SEM) and the accuracy of feature parameters were examined by Fast Fourier Transformation methods (FFT). Finally, the application of these structures to the calibration and testing of e-beam systems was explored.
Book Synopsis Electron Beam Lithography for Nano-antenna Fabrication by : Parinaz Emami
Download or read book Electron Beam Lithography for Nano-antenna Fabrication written by Parinaz Emami and published by . This book was released on 2015 with total page 63 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography methods have been used for patterning of small features for decades; there are different kinds of lithography methods such as Photolithography, Nanosphere Lithography, X-Ray Lithography, Focused Ion Beam (FIB) lithography, and Electron Beam Lithography (EBL). Each of these methods is suitable for a specific purpose of patterning; between all of these methods EBL provides a better result for patterning small features as compared with other methods. In this research project, I examined EBL for fabrication of nano-antennas and then parameterized EBL variables to improve patterning. I overcame difficulties in some steps of this method to make the process easier and faster. In this experiment I analyzed the relationship between the variation of pattern size and tuning the correct irradiation dose for that pattern. According to my observations, a doubling of the physical size of pattern results in a 10 to 15% reduction in the required dose. This result helps save time by eliminating unnecessary and challenging steps. I also examined the effect of varying resist composition in three different sizes of pattern to find which resist would provide the best result: sharper edges and easier fabrication. For instance, MMA(8.5)MAA would be a good choice if the pattern features are larger than 15 microns whereas SU-8 would be great choice for patterning really small features on a nanometer scale. This research also demonstrated that Cr would be a better choice as a metallic coating as compared with Cu. Pt can also be used but by considering its price, I believed it would not be applicable for all purposes. Furthermore for metal deposition methods, sputter coating would be a better method in comparison with PVD, because it gives a less damaged device during lift-off and also Cr’s lift-off time is much less than other metals in this experiment which also saves a lot of time. Finally, I worked on developing EBL multilayer patterning processes. This method is very helpful for fabrication of complicated devices. I developed an aligninment method for multilayer patterning to make sure that my second layer of patterning would be placed in the exact spot that I wanted. Obtaining successful multilayer patterns of small features is helpful for fabricating the small complex facets of rectenna such as fabrication of metal-insulator-metal (MIM) diodes.
Book Synopsis Nanofluidics and Microfluidics by : Shaurya Prakash
Download or read book Nanofluidics and Microfluidics written by Shaurya Prakash and published by William Andrew. This book was released on 2014-01-16 with total page 313 pages. Available in PDF, EPUB and Kindle. Book excerpt: To provide an interdisciplinary readership with the necessary toolkit to work with micro- and nanofluidics, this book provides basic theory, fundamentals of microfabrication, advanced fabrication methods, device characterization methods and detailed examples of applications of nanofluidics devices and systems. Case studies describing fabrication of complex micro- and nanoscale systems help the reader gain a practical understanding of developing and fabricating such systems. The resulting work covers the fundamentals, processes and applied challenges of functional engineered nanofluidic systems for a variety of different applications, including discussions of lab-on-chip, bio-related applications and emerging technologies for energy and environmental engineering. The fundamentals of micro- and nanofluidic systems and micro- and nanofabrication techniques provide readers from a variety of academic backgrounds with the understanding required to develop new systems and applications. Case studies introduce and illustrate state-of-the-art applications across areas, including lab-on-chip, energy and bio-based applications. Prakash and Yeom provide readers with an essential toolkit to take micro- and nanofluidic applications out of the research lab and into commercial and laboratory applications.
Book Synopsis Micro/Nanolithography by : Jagannathan Thirumalai
Download or read book Micro/Nanolithography written by Jagannathan Thirumalai and published by BoD – Books on Demand. This book was released on 2018-05-02 with total page 136 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.
Book Synopsis Handbook of Microscopy for Nanotechnology by : Nan Yao
Download or read book Handbook of Microscopy for Nanotechnology written by Nan Yao and published by Springer Science & Business Media. This book was released on 2006-07-12 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanostructured materials take on an enormously rich variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure-composition-processing-property relationships for these sub 100 nm-sized materials can only be understood by employing an array of modern microscopy and microanalysis tools. Handbook of Microscopy for Nanotechnology aims to provide an overview of the basics and applications of various microscopy techniques for nanotechnology. This handbook highlights various key microcopic techniques and their applications in this fast-growing field. Topics to be covered include the following: scanning near field optical microscopy, confocal optical microscopy, atomic force microscopy, magnetic force microscopy, scanning turning microscopy, high-resolution scanning electron microscopy, orientational imaging microscopy, high-resolution transmission electron microscopy, scanning transmission electron microscopy, environmental transmission electron microscopy, quantitative electron diffraction, Lorentz microscopy, electron holography, 3-D transmission electron microscopy, high-spatial resolution quantitative microanalysis, electron-energy-loss spectroscopy and spectral imaging, focused ion beam, secondary ion microscopy, and field ion microscopy.
Book Synopsis Micro and Nano Fabrication by : Hans H. Gatzen
Download or read book Micro and Nano Fabrication written by Hans H. Gatzen and published by Springer. This book was released on 2015-01-02 with total page 537 pages. Available in PDF, EPUB and Kindle. Book excerpt: For Microelectromechanical Systems (MEMS) and Nanoelectromechanical Systems (NEMS) production, each product requires a unique process technology. This book provides a comprehensive insight into the tools necessary for fabricating MEMS/NEMS and the process technologies applied. Besides, it describes enabling technologies which are necessary for a successful production, i.e., wafer planarization and bonding, as well as contamination control.
Book Synopsis Characterization of Processes Used in Nanofabrication of Digital Electrostatic E-beam Array Lithography (DEAL) Devices by : Ryan Benjamine Rucker
Download or read book Characterization of Processes Used in Nanofabrication of Digital Electrostatic E-beam Array Lithography (DEAL) Devices written by Ryan Benjamine Rucker and published by . This book was released on 2006 with total page 121 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ultimate goal of this research was to nanofabricate an advanced field emission electron beam lithography platform using an electron beam induced deposition process (EBID) to deposit tungsten (W) nanofibers cathodes. In order to fabricate the devices, it was necessary to characterize the reactive ion etching (RIE) processes for the fabrication of the Digital Electrostatic e-beam Array Lithography (DEAL) device. To optimize the reactive ion etch processes of the silicon and silicon dioxide layers, a JMP desktop statistical discovery software from SAS® was employed to design a set of experiments. The design of experiments (DOE) employed variable conditions of R.F. power, gas pressure, and gas ratios. Specifically for the silicon etch DOE the R.F. power ranged from 100 to 400 (W), the gas pressure ranged from 75 To 400 (mTorr) and a SF6/O2 gas flow ratio varied from 2 to 10. Single crystal silicon wafers were used due to the thickness of the n polycrystalline silicon film and the effectiveness of characterizing such a thin film. The responses that were measured included the silicon etch rate, the silicon to silicon dioxide etch selectivity, the silicon to photoresist etch selectivity, and the silicon etch profile. For the silicon oxide etch DOE, the R.F. power ranged from 200 to 300, the gas pressure ranged from 30 to 70 and a CF4/CHF3 gas flow ratio varied from 0.34 to 1.34. The responses that were measured included the silicon oxide etch rate, the silicon oxide to silicon etch selectivity, and the silicon oxide to photoresist etch selectivity. The results from both experimental designs adequately optimized the etch processes for the n polycrystalline silicon and silicon oxide and will be used for v subsequent nanofabrication of DEAL devices. A DOE for the growth of tungsten nanopillars via electron beam induced deposition (EBID) was also performed as a method to deposit nanoscale field emission cathodes. The goal was to correlate the growth parameters to the nanopillar structure and ultimately the structure to the field emission properties. The DOE varied the precursor pressure, beam energy, and specimen current, and the responses were growth rate, nanopillar width, and the sharpness of the nanopillar tip. An optimum high growth rate, sharp pillar process was determined, however field emission the field emission measurements could not be made.
Book Synopsis Nanofabrication by : José María de Teresa
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Book Synopsis Low Temperature Chemical Nanofabrication by : Omer Nur
Download or read book Low Temperature Chemical Nanofabrication written by Omer Nur and published by William Andrew. This book was released on 2020-01-18 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low Temperature Chemical Nanofabrication: Recent Progress, Challenges and Emerging Technologies offers a thorough and theoretical background to nanoscale fabrication phenomena, also covering important practical applications. It covers the conventional top down and the newly emerging bottom up processing methods. The latter has proven to be feasible for obtaining device quality material and can either be performed using high or low temperature processing. Low temperature (?100 oC), in particular, is becoming increasingly used due to its simplicity and varied applications, with huge benefits for developing new devices and flexible non-conventional substrates. This important resource is ideal for researchers seeking to learn more about the fundamental theories related to nanoscale phenomena and nanofabrication. Provides extensive coverage of nanofabrication techniques, allowing researchers to learn different nanofabrication techniques Explores different applications for low-temperature chemical nanofabrication Cogently explains how low-temperature chemical nanofabrication differs from other nanofabrication techniques, assessing the pros and cons of each
