Ion Implantation Technology 2012

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ISBN 13 :
Total Pages : 446 pages
Book Rating : 4.:/5 (818 download)

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Book Synopsis Ion Implantation Technology 2012 by :

Download or read book Ion Implantation Technology 2012 written by and published by . This book was released on 2012 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Physics of Dusty Plasmas

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Publisher : Springer
ISBN 13 : 3030202607
Total Pages : 237 pages
Book Rating : 4.0/5 (32 download)

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Book Synopsis Physics of Dusty Plasmas by : André Melzer

Download or read book Physics of Dusty Plasmas written by André Melzer and published by Springer. This book was released on 2019-06-13 with total page 237 pages. Available in PDF, EPUB and Kindle. Book excerpt: Colloidal plasmas - a still emerging field of plasma physics - enable the study of basic plasma properties on a microscopic kinetic level and allow the visualization of collective plasma phenomena, like oscillations and waves. Moreover, a vast number of novel phenomena are found in these systems, ranging from Coulomb crystallization to new types of forces and waves. Last but not least, they shed a new light on various traditional aspects of plasma physics such as shielding or the mechanism of acoustic waves in plasmas, thus providing new insight into the basic foundations of plasma physics.These course-based and self-contained lecture notes provide a general introduction to this active and growing field to students and nonspecialists, requiring only basic prior knowledge in plasma physics. ​

Plasma Assisted Decontamination of Biological and Chemical Agents

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Publisher : Springer Science & Business Media
ISBN 13 : 1402084390
Total Pages : 306 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis Plasma Assisted Decontamination of Biological and Chemical Agents by : Selçuk Güçeri

Download or read book Plasma Assisted Decontamination of Biological and Chemical Agents written by Selçuk Güçeri and published by Springer Science & Business Media. This book was released on 2011-10-12 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma decontamination is a rapidly expanding area of modern science and engineering. An increasing number of engineers are using plasma methods for decontamination of chemical and biological agents. Plasma decontamination is effectively applied today to clean and sterilize different surfaces, high volume air and water streams, industrial exhausts, and even living tissue of animals and humans. This book provides a fundamental introduction to virtually all aspects of modern plasma decontamination, as well as the most recent technological achievements in the area. The book is segmented into four specific sections of modern plasma decontamination: (1) plasma bio-decontamination, including disinfection and sterilization of surfaces, water and air streams; (2) plasma decontamination of chemical agents, including cleaning of air, water, and industrial exhaust gases from different pollutants and especially volatile organic compounds VOC; (3) plasma treatment of living tissue, including different subjects of plasma medicine from skin sterilization to tissue engineering; (4) major electric discharges applied for the plasma-assisted decontamination of chemical and biological agents.

Ion Implantation in Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 3642806600
Total Pages : 519 pages
Book Rating : 4.6/5 (428 download)

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Book Synopsis Ion Implantation in Semiconductors by : Ingolf Ruge

Download or read book Ion Implantation in Semiconductors written by Ingolf Ruge and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 519 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. It would be impos sible not to note the growing interest in this field, both by research groups and those directly concerned with production of devices. Furthermore, as several papers have pointed out, ion implantation and its associated technologies promise exciting advances in the development of new kinds of devices and provide power ful new tools for materials investigations. It was, therefore, appropriate to arrange the II. International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in 1970 in Thousand Oaks, California. Although ori ginally planned on a small scale with a very limited number of participants, more than two hundred scientists from 15 countries participated in the Conference which was held May 24 - 28, 1971 at the Congress Center in Garmisch-Partenkirchen. This volume contains the papers that were presented at the Conference. Due to the tremendous volume of research presented, publication here of all the works in full detail was not possible. Many authors therefore graciously agreed to submit abbreviated versions of their papers.

2021 IEEE International Conference on Plasma Science (ICOPS)

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Publisher :
ISBN 13 : 9781665432283
Total Pages : pages
Book Rating : 4.4/5 (322 download)

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Book Synopsis 2021 IEEE International Conference on Plasma Science (ICOPS) by : IEEE Staff

Download or read book 2021 IEEE International Conference on Plasma Science (ICOPS) written by IEEE Staff and published by . This book was released on 2021-09-12 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: IEEE International Conference on Plasma Science (ICOPS) is an annual conference coordinated by the Plasma Science and Application Committee (PSAC) of the IEEE Nuclear & Plasma Sciences Society

Strongly Coupled Coulomb Systems

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Publisher : Springer Science & Business Media
ISBN 13 : 0306470861
Total Pages : 699 pages
Book Rating : 4.3/5 (64 download)

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Book Synopsis Strongly Coupled Coulomb Systems by : Gabor J. Kalman

Download or read book Strongly Coupled Coulomb Systems written by Gabor J. Kalman and published by Springer Science & Business Media. This book was released on 2006-03-11 with total page 699 pages. Available in PDF, EPUB and Kindle. Book excerpt: The International Conference on Strongly Coupled Coulomb Systems was held on the campus of Boston College in Newton, Massachusetts, August 3–10, 1997. Although this conference was the first under a new name, it was the continuation of a series of international meetings on strongly coupled plasmas and other Coulomb systems that started with the NATO Summer Institute on Strongly Coupled Plasmas, almost exactly twenty years prior to this conference, in July of 1977 in Orleans la Source, France. Over the intervening period the field of strongly coupled plasmas has developed vigorously. In the 1977 meeting the emphasis was on computer (Monte Carlo and molecular dynamics) simulations which provided, for the first time, insight into the rich and new physics of strongly coupled fully ionizedplasmas. While theorists scrambled to provide a theoretical underpinning for these results, there was also a dearth of real experimental input to reinforce the computer simulations. Over the past few years this situation has changed drastically and a variety of direct experiments on classical, pure, strongly correlated plasma systems (charged particle traps, dusty plasmas, electrons on the surface of liquid helium, etc. ) have become available. Even more importantly, entire new area of experimental interest in condensed matter physics have opened up through developments in nano-technology and the fabrication of low-dimensional systems, where the physical behavior, in many ways, is similar to that in classical plasmas. Strongly coupled plasma physics has always been an interdisciplinaryactivity.

Complex Plasmas

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Publisher : Springer Science & Business Media
ISBN 13 : 3319054376
Total Pages : 495 pages
Book Rating : 4.3/5 (19 download)

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Book Synopsis Complex Plasmas by : Michael Bonitz

Download or read book Complex Plasmas written by Michael Bonitz and published by Springer Science & Business Media. This book was released on 2014-04-09 with total page 495 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides the reader with an introduction to the physics of complex plasmas, a discussion of the specific scientific and technical challenges they present and an overview of their potential technological applications. Complex plasmas differ from conventional high-temperature plasmas in several ways: they may contain additional species, including nano meter- to micrometer-sized particles, negative ions, molecules and radicals and they may exhibit strong correlations or quantum effects. This book introduces the classical and quantum mechanical approaches used to describe and simulate complex plasmas. It also covers some key experimental techniques used in the analysis of these plasmas, including calorimetric probe methods, IR absorption techniques and X-ray absorption spectroscopy. The final part of the book reviews the emerging applications of microcavity and microchannel plasmas, the synthesis and assembly of nanomaterials through plasma electrochemistry, the large-scale generation of ozone using microplasmas and novel applications of atmospheric-pressure non-thermal plasmas in dentistry. Going beyond the scope of traditional plasma texts, the presentation is very well suited for senior undergraduate, graduate students and postdoctoral researchers specializing in plasma physics.

Ion Implantation Technology--96

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Publisher : Institute of Electrical & Electronics Engineers(IEEE)
ISBN 13 : 9780780332898
Total Pages : 832 pages
Book Rating : 4.3/5 (328 download)

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Book Synopsis Ion Implantation Technology--96 by : Emi Ishida

Download or read book Ion Implantation Technology--96 written by Emi Ishida and published by Institute of Electrical & Electronics Engineers(IEEE). This book was released on 1996-01-01 with total page 832 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains the proceedings of the 11th International Conference on Ion Implantation Technology. The 11th conference was concerned with the subject of electron devices."

Theory of Fusion Plasmas

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Publisher : American Institute of Physics
ISBN 13 : 9780735406001
Total Pages : 400 pages
Book Rating : 4.4/5 (6 download)

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Book Synopsis Theory of Fusion Plasmas by : Olivier Sauter

Download or read book Theory of Fusion Plasmas written by Olivier Sauter and published by American Institute of Physics. This book was released on 2008-12-02 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Joint Varenna-Lausanne International Workshop on Theory of Fusion Plasmas takes place every other year in a place particularly favorable for informal and in depth discussions. Invited and contributed papers present state-of-the art researches in theoretical plasma physics, covering all domains relevant to fusion plasmas. This workshop always allows a fruitful mix of experienced researchers and students, to allow for a better understanding of the key theoretical physics models and applications, such as: Theoretical issues related to burning plasmas; Anomalous Transport (Turbulence, Coherent Structures, Microinstabilities) RF Heating and Current Drive; Macroinstabilities; Plasma-Edge Physics and Divertors; Fast particles instabilities.

Ion Implantation Technology

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Publisher : American Institute of Physics
ISBN 13 : 9780735405974
Total Pages : 582 pages
Book Rating : 4.4/5 (59 download)

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Book Synopsis Ion Implantation Technology by : Edmund G. Seebauer

Download or read book Ion Implantation Technology written by Edmund G. Seebauer and published by American Institute of Physics. This book was released on 2008-12-11 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).

Ion Implantation and Plasma Assisted Processes

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ISBN 13 :
Total Pages : 252 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Ion Implantation and Plasma Assisted Processes by : Robert Francis Hochman

Download or read book Ion Implantation and Plasma Assisted Processes written by Robert Francis Hochman and published by . This book was released on 1988 with total page 252 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ion implantation technology : selected papers of the Ninth International Conference on Ion Implantation Technology (IIT'92) ; Gainesville, FL, USA, September 20 - 24, 1992

Download Ion implantation technology : selected papers of the Ninth International Conference on Ion Implantation Technology (IIT'92) ; Gainesville, FL, USA, September 20 - 24, 1992 PDF Online Free

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Publisher :
ISBN 13 :
Total Pages : 615 pages
Book Rating : 4.:/5 (263 download)

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Book Synopsis Ion implantation technology : selected papers of the Ninth International Conference on Ion Implantation Technology (IIT'92) ; Gainesville, FL, USA, September 20 - 24, 1992 by : Daniel F. Downey

Download or read book Ion implantation technology : selected papers of the Ninth International Conference on Ion Implantation Technology (IIT'92) ; Gainesville, FL, USA, September 20 - 24, 1992 written by Daniel F. Downey and published by . This book was released on 1993 with total page 615 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Ion Implantation in Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 1468421514
Total Pages : 716 pages
Book Rating : 4.4/5 (684 download)

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Book Synopsis Ion Implantation in Semiconductors by : Susumu Namba

Download or read book Ion Implantation in Semiconductors written by Susumu Namba and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.

Zirconium in the Nuclear Industry

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Publisher : ASTM International
ISBN 13 : 0803124066
Total Pages : 907 pages
Book Rating : 4.8/5 (31 download)

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Book Synopsis Zirconium in the Nuclear Industry by : George P. Sabol

Download or read book Zirconium in the Nuclear Industry written by George P. Sabol and published by ASTM International. This book was released on 1996 with total page 907 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Vacuum, electron and ion technologies

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Publisher :
ISBN 13 :
Total Pages : 176 pages
Book Rating : 4.:/5 (236 download)

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Book Synopsis Vacuum, electron and ion technologies by : International School on Vacuum, Electron and Ion Technologies

Download or read book Vacuum, electron and ion technologies written by International School on Vacuum, Electron and Ion Technologies and published by . This book was released on 1991 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Laboratory Astrophysics

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Publisher : Springer
ISBN 13 : 331990020X
Total Pages : 237 pages
Book Rating : 4.3/5 (199 download)

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Book Synopsis Laboratory Astrophysics by : Guillermo M. Muñoz Caro

Download or read book Laboratory Astrophysics written by Guillermo M. Muñoz Caro and published by Springer. This book was released on 2018-10-11 with total page 237 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on the most recent, relevant, comprehensive and significant aspects in the well-established multidisciplinary field Laboratory Astrophysics. It focuses on astrophysical environments, which include asteroids, comets, the interstellar medium, and circumstellar and circumplanetary regions. Its scope lies between physics and chemistry, since it explores physical properties of the gas, ice, and dust present in those systems, as well as chemical reactions occurring in the gas phase, the bare dust surface, or in the ice bulk and its surface. Each chapter provides the necessary mathematical background to understand the subject, followed by a case study of the corresponding system. The book provides adequate material to help interpret the observations, or the computer models of astrophysical environments. It introduces and describes the use of spectroscopic tools for laboratory astrophysics. This book is mainly addressed to PhD graduates working in this field or observers and modelers searching for information on ice and dust processes.

Ion Implantation Technology - 94

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Publisher : Newnes
ISBN 13 : 044459972X
Total Pages : 1031 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Ion Implantation Technology - 94 by : S. Coffa

Download or read book Ion Implantation Technology - 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.