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Author :
Publisher :
ISBN 13 :
Total Pages : 600 pages
Book Rating : 4.:/5 (217 download)
Download or read book Polycrystalline Silicon, Metal Silicides, and CVD Metals for Integrated-circuit Applications written by and published by . This book was released on 1987 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ted Kamins
Publisher : Springer Science & Business Media
ISBN 13 : 1461316812
Total Pages : 302 pages
Book Rating : 4.4/5 (613 download)
Download or read book Polycrystalline Silicon for Integrated Circuit Applications written by Ted Kamins and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor mance. As device performance improves, however, some of the proper ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili con also need to be better understood to minimize potential degradation of circuit behavior.
Author : Shyam P. Murarka
Publisher : Academic Press
ISBN 13 : 0080570569
Total Pages : 213 pages
Book Rating : 4.0/5 (85 download)
Download or read book Silicides for VLSI Applications written by Shyam P. Murarka and published by Academic Press. This book was released on 2012-12-02 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.
Author : Karen Maex
Publisher : Institution of Electrical Engineers
ISBN 13 :
Total Pages : 358 pages
Book Rating : 4.3/5 (91 download)
Download or read book Properties of Metal Silicides written by Karen Maex and published by Institution of Electrical Engineers. This book was released on 1995 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt: The properties of silicon alloyed with metals are presented here for silicides of both transition and rare earth metals.
Author : Francois D'heurle
Publisher : World Scientific
ISBN 13 : 9814492183
Total Pages : 390 pages
Book Rating : 4.8/5 (144 download)
Download or read book Silicides: Fundamentals & Applications written by Francois D'heurle and published by World Scientific. This book was released on 2000-12-18 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications.The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.
Author : Howard R. Huff
Publisher :
ISBN 13 :
Total Pages : 1076 pages
Book Rating : 4.E/5 ( download)
Download or read book Semiconductor Silicon 1981 written by Howard R. Huff and published by . This book was released on 1981 with total page 1076 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : D. Widmann
Publisher : Springer Science & Business Media
ISBN 13 : 366204160X
Total Pages : 355 pages
Book Rating : 4.6/5 (62 download)
Download or read book Technology of Integrated Circuits written by D. Widmann and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 355 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first book to comprehensively record the authors’ authoritative knowledge and practical experience of IC manufacturing, including the tremendous developments of recent years. With its strong application orientation, this is a must-have book for professionals in semiconductor industries.
Author : F. Roozeboom
Publisher : The Electrochemical Society
ISBN 13 : 1566778638
Total Pages : 377 pages
Book Rating : 4.5/5 (667 download)
Download or read book Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2011-04-25 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ECS Transactions covers emerging materials, process and technology options for large-area silicon wafers to enhance advanced IC performance or to enable revolutionary device structures with entirely new functionalities. Topics : high-mobility channel materials, (e.g. strained Si/Ge, compound semiconductors and graphene), high-performance gate stacks and low-resistivity junctions and contacts on new, Si-compatible materials; new materials and processes for 3-D (TSV) integration ; synthesis of nano-structures including wires, pores and membranes of Si-compatible materials; novel MEMS/NEMS structures and their integration with the mainstream Si-IC technology.
Author : Munir H. Nayfeh
Publisher : Elsevier
ISBN 13 : 044318674X
Total Pages : 568 pages
Book Rating : 4.4/5 (431 download)
Download or read book Integrated Silicon-Metal Systems at the Nanoscale written by Munir H. Nayfeh and published by Elsevier. This book was released on 2023-04-12 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated Silicon-Metal Systems at the Nanoscale: Applications in Photonics, Quantum Computing, Networking, and Internet is a comprehensive guide to the interaction, materials and functional integration at the nanoscale of the silicon-metal binary system and a variety of emerging and next-generation advanced device applications, from energy and electronics, to sensing, quantum computing and quantum internet networks. The book guides the readers through advanced techniques and etching processes, combining underlying principles, materials science, design, and operation of metal-Si nanodevices. Each chapter focuses on a specific use of integrated metal-silicon nanostructures, including storage and resistive next-generation nano memory and transistors, photo and molecular sensing, harvest and storage device electrodes, phosphor light converters, and hydrogen fuel cells, as well as future application areas, such as spin transistors, quantum computing, hybrid quantum devices, and quantum engineering, networking, and internet. Provides detailed coverage of materials, design and operation of metal-Si nanodevices Offers a step-by-step approach, supported by principles, methods, illustrations and equations Explores a range of cutting-edge emerging applications across electronics, sensing and quantum computing
Author : C.E. Morosanu
Publisher : Elsevier
ISBN 13 : 1483291731
Total Pages : 720 pages
Book Rating : 4.4/5 (832 download)
Download or read book Thin Films by Chemical Vapour Deposition written by C.E. Morosanu and published by Elsevier. This book was released on 2016-06-22 with total page 720 pages. Available in PDF, EPUB and Kindle. Book excerpt: The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.
Author : Gregory C. Smith
Publisher : Mrs Conference Proceedings
ISBN 13 :
Total Pages : 422 pages
Book Rating : 4.0/5 ( download)
Download or read book Tungsten and Other Advanced Metals for ULSI Applications in 1990: Volume 6 written by Gregory C. Smith and published by Mrs Conference Proceedings. This book was released on 1991-03 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Electrochemical Society. High Temperature Materials Division
Publisher :
ISBN 13 :
Total Pages : 1296 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Victor A. Wells
Publisher :
ISBN 13 :
Total Pages : 456 pages
Book Rating : 4.F/5 ( download)
Download or read book Tungsten and Other Refractory Metals for VLSI Applications III written by Victor A. Wells and published by . This book was released on 1988 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : S. Mahajan
Publisher : Elsevier
ISBN 13 : 1483286576
Total Pages : 607 pages
Book Rating : 4.4/5 (832 download)
Download or read book Concise Encyclopedia of Semiconducting Materials & Related Technologies written by S. Mahajan and published by Elsevier. This book was released on 2013-10-22 with total page 607 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of electronic materials and particularly advances in semiconductor technology have played a central role in the electronics revolution by allowing the production of increasingly cheap and powerful computing equipment and advanced telecommunications devices. This Concise Encyclopedia, which incorporates relevant articles from the acclaimed Encyclopedia of Materials Science and Engineering as well as newly commissioned articles, emphasizes the materials aspects of semiconductors and the technologies important in solid-state electronics. Growth of bulk crystals and epitaxial layers are discussed in the volume and coverage is included of defects and their effects on device behavior. Metallization and passivation issues are also covered. Over 100 alphabetically arranged articles, written by world experts in the field, are each intended to serve as the first source of information on a particular aspect of electronic materials. The volume is extensively illustrated with photographs, diagrams and tables. A bibliography is provided at the end of each article to guide the reader to recent literature. A comprehensive system of cross-references, a three-level subject index and an alphabetical list of articles are included to aid readers in the abstraction of information.
Author :
Publisher :
ISBN 13 :
Total Pages : 456 pages
Book Rating : 4.0/5 ( download)
Download or read book Tungsten and Other Refractory Metals for VLSI Applications written by and published by . This book was released on 1987 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : S. P. Murarka
Publisher :
ISBN 13 :
Total Pages : 200 pages
Book Rating : 4.:/5 (131 download)
Download or read book Silicides for VLSI Applications written by S. P. Murarka and published by . This book was released on 1983 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ram Kossowsky
Publisher : CRC Press
ISBN 13 : 9780849347696
Total Pages : 348 pages
Book Rating : 4.3/5 (476 download)
Download or read book Surface Modeling Engineering written by Ram Kossowsky and published by CRC Press. This book was released on 1989-07-31 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt: These volumes present the general parctitioners in engineering with a comprehensive discussion of technological surfaces, their interactions with environments, and the various modification techniques available to improve their performance. In each subject, applications to metals, ceramics, and polymers are emphasized. The interactions with the environment are described: corrosion (chemical), friction and waer (mechanical), and bioreactivity (physiological). Reviews of major modification schemes such as chemical vapor deposition, physical vapor deposition, laser beam interactions, chemical infusion, and ion implantation are presented. In summary, reviews of applications of the modification techniques to optimize the performances of structural components, tools, electronic devices, and implantable medical devices, manufactured out of metals, ceramic, and polymers, are described.
