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Plasma Processing Of Materials At The Atomic Scale
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Book Synopsis Material Research in Atomic Scale by Mössbauer Spectroscopy by : Miroslav Mashlan
Download or read book Material Research in Atomic Scale by Mössbauer Spectroscopy written by Miroslav Mashlan and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 369 pages. Available in PDF, EPUB and Kindle. Book excerpt: Mössbauer spectroscopy is uniquely able to probe hyperfine interactions by looking at the short-range order of resonant atoms. Materials containing an appropriate isotope as one of their constituent atoms, such as iron or tin, are readily investigated. But even materials that do not contain Mössbauer-active atoms can be investigated if the probe atoms are incorporated in minor quantities (ca. 0.1 at.-%) to act as molecular-level indicators. These 35 papers collected here represent a state-of-the-art description of Mössbauer spectroscopy techniques applied to advanced materials. The topics covered comprise investigations of nanomaterials, nanoparticles, and quasicrystals, artificially structured materials as well as applications of Mössbauer spectroscopy in chemistry, mineralogy and metallurgy. The main aim of is the dissemination of information on research and recent developments of the method in materials science as obtained in leading Mössbauer laboratories.
Book Synopsis Principles of Plasma Discharges and Materials Processing by : Michael A. Lieberman
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2024-10-15 with total page 837 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Author :National Academies of Sciences Engineering and Medicine Publisher : ISBN 13 :9780309677608 Total Pages :291 pages Book Rating :4.6/5 (776 download)
Book Synopsis Plasma Science by : National Academies of Sciences Engineering and Medicine
Download or read book Plasma Science written by National Academies of Sciences Engineering and Medicine and published by . This book was released on 2021-02-28 with total page 291 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Science and Engineering transforms fundamental scientific research into powerful societal applications, from materials processing and healthcare to forecasting space weather. Plasma Science: Enabling Technology, Sustainability, Security and Exploration discusses the importance of plasma research, identifies important grand challenges for the next decade, and makes recommendations on funding and workforce. This publication will help federal agencies, policymakers, and academic leadership understand the importance of plasma research and make informed decisions about plasma science funding, workforce, and research directions.
Book Synopsis Plasma-Surface Interactions and Processing of Materials by : O. Auciello
Download or read book Plasma-Surface Interactions and Processing of Materials written by O. Auciello and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Book Synopsis Plasma Processing of Nanomaterials by : R. Mohan Sankaran
Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Book Synopsis Electron Beams in a Plasma by : Evgeniy G. Shustin
Download or read book Electron Beams in a Plasma written by Evgeniy G. Shustin and published by Cambridge Scholars Publishing. This book was released on 2024-05-21 with total page 115 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains information on scientific research and applications of a very diverse field of low temperature plasma physics – the interaction of electron beams with plasma and, as a consequence of this interaction, a beam plasma discharge. It contains detailed descriptions of the history of the relevant research, a review of experimental research of properties of the low-temperature plasma with an electron beam and beam plasma discharge, and presents the main results of beam plasma interaction theory. Most of the book is devoted to descriptions of applications of the plasma with a beam and beam plasma discharge in a variety of fields; from studies of the physics of near-Earth space using active geophysical experiments to the development of materials technologies for micro- and nanoelectronics and designs of plasma-filled electronic devices. This book will be useful as an introduction to this field for undergraduate and graduate students specializing in plasma physics, as well as for other specialists in various fields of physics and technologies.
Author :Ricardo d'Agostino Publisher :Springer Science & Business Media ISBN 13 :9780792348597 Total Pages :554 pages Book Rating :4.3/5 (485 download)
Book Synopsis Plasma Processing of Polymers by : Ricardo d'Agostino
Download or read book Plasma Processing of Polymers written by Ricardo d'Agostino and published by Springer Science & Business Media. This book was released on 1997-11-30 with total page 554 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers, Acquafredda di Maratea, Italy, May 19-June 2, 1996
Book Synopsis Plasma Processing of Semiconductors by : Paul Williams
Download or read book Plasma Processing of Semiconductors written by Paul Williams and published by Springer Science & Business Media. This book was released on 1997-05-31 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Book Synopsis Handbook of Adhesive Technology, Revised and Expanded by : Antonio Pizzi
Download or read book Handbook of Adhesive Technology, Revised and Expanded written by Antonio Pizzi and published by CRC Press. This book was released on 2003-08-06 with total page 1060 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Adhesive Technology, Second Edition exceeds the ambition of its bestselling forerunner by reexamining the mechanisms driving adhesion, categories of adhesives, techniques for bond formation and evaluation, and major industrial applications. Integrating modern technological innovations into adhesive preparation and application, this greatly expanded and updated edition comprises a total of 26 different adhesive groupings, including three new classes. The second edition features ten new chapters, a 40-page list of resources on adhesives, and abundant figures, tables, equations.
Book Synopsis Physical Chemistry of Semiconductor Materials and Processes by :
Download or read book Physical Chemistry of Semiconductor Materials and Processes written by and published by John Wiley & Sons. This book was released on 2015-10-12 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of solid state devices began a little more than a century ago, with the discovery of the electrical conductivity of ionic solids. Today, solid state technologies form the background of the society in which we live. The aim of this book is threefold: to present the background physical chemistry on which the technology of semiconductor devices is based; secondly, to describe specific issues such as the role of defects on the properties of solids, and the crucial influence of surface properties; and ultimately, to look at the physics and chemistry of semiconductor growth processes, both at the bulk and thin-film level, together with some issues relating to the properties of nano-devices. Divided into five chapters, it covers: Thermodynamics of solids, including phases and their properties and structural order Point defects in semiconductors Extended defects in semiconductors and their interactions with point defects and impurities Growth of semiconductor materials Physical chemistry of semiconductor materials processing With applications across all solid state technologies,the book is useful for advanced students and researchers in materials science, physics, chemistry, electrical and electronic engineering. It is also useful for those in the semiconductor industry.
Book Synopsis Atomic Force Microscopy by : Victor Bellitto
Download or read book Atomic Force Microscopy written by Victor Bellitto and published by BoD – Books on Demand. This book was released on 2012-03-23 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: With the advent of the atomic force microscope (AFM) came an extremely valuable analytical resource and technique useful for the qualitative and quantitative surface analysis with sub-nanometer resolution. In addition, samples studied with an AFM do not require any special pretreatments that may alter or damage the sample and permits a three dimensional investigation of the surface. This book presents a collection of current research from scientists throughout the world that employ atomic force microscopy in their investigations. The technique has become widely accepted and used in obtaining valuable data in a wide variety of fields. It is impressive to see how, in a short time period since its development in 1986, it has proliferated and found many uses throughout manufacturing, research and development.
Book Synopsis Handbook of Semiconductors by : Ram K. Gupta
Download or read book Handbook of Semiconductors written by Ram K. Gupta and published by CRC Press. This book was released on 2024-07-10 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides readers with state-of-the-art knowledge of established and emerging semiconducting materials, their processing, and the fabrication of chips and microprocessors. In addition to covering the fundamentals of these materials, it details the basics and workings of many semiconducting devices and their role in modern electronics and explores emerging semiconductors and their importance in future devices. • Provides readers with latest advances in semiconductors. • Covers diodes, transistors, and other devices using semiconducting materials. • Covers advances and challenges in semiconductors and their technological applications. • Discusses fundamentals and characteristics of emerging semiconductors for chip manufacturing. This book provides directions to scientists, engineers, and researchers in materials engineering and related disciplines to help them better understand the physics, characteristics, and applications of modern semiconductors.
Book Synopsis Plasma Diagnostics by : Orlando Auciello
Download or read book Plasma Diagnostics written by Orlando Auciello and published by Academic Press. This book was released on 2013-10-22 with total page 349 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment.Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject.short version, TJE_Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject.
Book Synopsis Guide To Semiconductor Engineering by : Jerzy Ruzyllo
Download or read book Guide To Semiconductor Engineering written by Jerzy Ruzyllo and published by World Scientific. This book was released on 2020-03-10 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Guide to Semiconductor Engineering is concerned with semiconductor materials, devices and process technologies which in combination constitute an enabling force behind the growth of our technical civilization. This book was conceived and written keeping in mind those who need to learn about semiconductors, who are professionally associated with select aspects of this technical domain and want to see it in a broader context, or for those who are simply interested in state-of-the-art semiconductor engineering. In its coverage of semiconductor properties, materials, devices, manufacturing technology, and characterization methods, this Guide departs from textbook-style, monothematic in-depth discussions of each topic. Instead, it considers the entire broad field of semiconductor technology and identifies synergistic interactions within various areas in one concise volume. It is a holistic approach to the coverage of semiconductor engineering which distinguishes this Guide among other books concerned with semiconductors related issues.
Book Synopsis Low Temperature Plasma Technology by : Paul K. Chu
Download or read book Low Temperature Plasma Technology written by Paul K. Chu and published by CRC Press. This book was released on 2013-07-15 with total page 497 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.
Book Synopsis Advancements in AI and IoT for Chip Manufacturing and Defect Prevention by : Rupal Jain
Download or read book Advancements in AI and IoT for Chip Manufacturing and Defect Prevention written by Rupal Jain and published by CRC Press. This book was released on 2024-11-25 with total page 152 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is essential reading for semiconductor professionals seeking to expand their knowledge on silicon processes, understand the significance of defect prevention, and explore methods for optimizing processes by reducing defects using AI and IoT technologies. In the dynamic landscape of semiconductor manufacturing, the focus on processes and defect prevention stands paramount. Traditional approaches have yielded valuable insights, yet the emergence of Artificial Intelligence (AI) and Internet of Things (IoT) technologies heralds a new era in defect prevention strategies. Engineers specializing in AI and machine learning, interdisciplinary researchers, and early graduates aspiring to enter the semiconductor industry will also find this book invaluable. Meticulously crafted, this book provides concise, yet insightful content tailored to today's fast-paced readers. It emphasizes semiconductors, manufacturing processes, and defect prevention, offering a comprehensive understanding of these critical areas. The integration of AI and IoT in chip manufacturing defect prevention represents a groundbreaking advancement. Targeting semiconductor engineers, researchers, technology professionals, and students, this book serves as a valuable resource for understanding the interplay between semiconductors, manufacturing processes, defects, and the transformative potential of AI and IoT integration. Practical tools for failure analysis and parameter control are provided, along with hypothetical use cases and theoretical applications that inspire innovation. Through interdisciplinary insights, this book charts a course toward a future where semiconductor manufacturing defects are minimized, productivity is maximized, and innovation thrives at the intersection of technology and industry.
Book Synopsis Defects in Two-Dimensional Materials by : Rafik Addou
Download or read book Defects in Two-Dimensional Materials written by Rafik Addou and published by Elsevier. This book was released on 2022-02-14 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Defects in Two-Dimensional Materials addresses the fundamental physics and chemistry of defects in 2D materials and their effects on physical, electrical and optical properties. The book explores 2D materials such as graphene, hexagonal boron nitride (h-BN) and transition metal dichalcogenides (TMD). This knowledge will enable scientists and engineers to tune 2D materials properties to meet specific application requirements. The book reviews the techniques to characterize 2D material defects and compares the defects present in the various 2D materials (e.g. graphene, h-BN, TMDs, phosphorene, silicene, etc.). As two-dimensional materials research and development is a fast-growing field that could lead to many industrial applications, the primary objective of this book is to review, discuss and present opportunities in controlling defects in these materials to improve device performance in general or use the defects in a controlled way for novel applications. Presents the theory, physics and chemistry of 2D materials Catalogues defects of 2D materials and their impacts on materials properties and performance Reviews methods to characterize, control and engineer defects in 2D materials
