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Plasma Diagnostics Discharge Parameters And Chemistry
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Book Synopsis Plasma Diagnostics by : Orlando Auciello
Download or read book Plasma Diagnostics written by Orlando Auciello and published by Academic Press. This book was released on 2013-10-22 with total page 470 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.
Book Synopsis Cold Plasma in Food and Agriculture by : NN Misra
Download or read book Cold Plasma in Food and Agriculture written by NN Misra and published by Academic Press. This book was released on 2016-07-15 with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. - Examines the topic of cold plasma technology for food applications - Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality - Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods - Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field
Book Synopsis Dry Etching for VLSI by : A.J. van Roosmalen
Download or read book Dry Etching for VLSI written by A.J. van Roosmalen and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Book Synopsis Film Deposition by Plasma Techniques by : Mitsuharu Konuma
Download or read book Film Deposition by Plasma Techniques written by Mitsuharu Konuma and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Book Synopsis Plasma Processing of Semiconductors by : P.F. Williams
Download or read book Plasma Processing of Semiconductors written by P.F. Williams and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Book Synopsis Handbook of Nanophysics by : Klaus D. Sattler
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 912 pages. Available in PDF, EPUB and Kindle. Book excerpt: The field of nanoscience was pioneered in the 1980s with the groundbreaking research on clusters, which later led to the discovery of fullerenes. Handbook of Nanophysics: Clusters and Fullerenes focuses on the fundamental physics of these nanoscale materials and structures. Each peer-reviewed chapter contains a broad-based introduction and enhances
Book Synopsis Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing by : M. Meyyappan
Download or read book Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1995 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Encyclopedia of Plasma Technology - Two Volume Set by : J. Leon Shohet
Download or read book Encyclopedia of Plasma Technology - Two Volume Set written by J. Leon Shohet and published by CRC Press. This book was released on 2016-12-12 with total page 1654 pages. Available in PDF, EPUB and Kindle. Book excerpt: Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Book Synopsis Lecture Notes on Principles of Plasma Processing by : Francis F. Chen
Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Book Synopsis Atmospheric Pressure Plasma by : Anton Nikiforov
Download or read book Atmospheric Pressure Plasma written by Anton Nikiforov and published by BoD – Books on Demand. This book was released on 2019-04-24 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
Book Synopsis Non-Equilibrium Air Plasmas at Atmospheric Pressure by : K.H. Becker
Download or read book Non-Equilibrium Air Plasmas at Atmospheric Pressure written by K.H. Becker and published by CRC Press. This book was released on 2004-11-29 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atmospheric-pressure plasmas continue to attract considerable research interest due to their diverse applications, including high power lasers, opening switches, novel plasma processing applications and sputtering, EM absorbers and reflectors, remediation of gaseous pollutants, excimer lamps, and other noncoherent light sources. Atmospheric-pressure plasmas in air are of particular importance as they can be generated and maintained without vacuum enclosure and without any additional feed gases. Non-Equilibrium Air Plasmas at Atmospheric Pressure reviews recent advances and applications in the generation and maintenance of atmospheric-pressure plasmas. With contributions from leading international researchers, the coverage includes advances in atmospheric-pressure plasma source development, diagnostics and characterization, air plasma chemistry, modeling and computational techniques, and an assessment of the status and prospects of atmospheric-pressure air plasma applications. The extensive application sections make this book attractive for practitioners in many fields where technologies based on atmospheric-pressure air plasmas are emerging.
Book Synopsis Advance Elements of Laser Circuits and Systems by : Ofer Aluf
Download or read book Advance Elements of Laser Circuits and Systems written by Ofer Aluf and published by Springer Nature. This book was released on 2021-03-09 with total page 1235 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book on Advance Elements of Laser circuits and systems Nonlinearity applications in engineering addresses two separate engineering and scientific areas, and presents advanced analysis methods for Laser circuits and systems that cover a broad range of engineering and scientific applications. The book analyzed Laser circuits and systems as linear and nonlinear dynamical systems and there limit cycles, bifurcation, and limit cycle stability by using nonlinear dynamic theory. Further, it discussed a broad range of bifurcations related to Laser systems and circuits, starting from laser system differential equations and their bifurcations, delay differential equations (DDEs) are a function of time delays, delay dependent parameters, followed by phase plane analysis, limit cycles and their bifurcations, chaos, iterated maps, period doubling. It combines graphical information with analytical analysis to effectively study the local stability of Laser systems models involving delay dependent parameters. Specifically, the stability of a given steady state is determined by the graphs of some functions of which can be expressed explicitly. The Laser circuits and systems are Laser diode circuits, MRI system Laser diode circuitry, Electron-photon exchanges into VCSEL, Ti: Sapphire laser systems, Ion channel and long-wavelength lasers, Solid state lasers, Solid state laser controlled by semiconductor devices, microchip solid-state laser, Q-switched diode-pumped solid-state laser, Nd:YAG, Mid-Infrared and Q-switched microchip lasers, Gas laser systems, copper vapor laser (CVL) circuitry, Dual-wavelength laser systems, Dual-wavelength operation of a Ti:sapphire laser, Diode-pumped Q-switched Nd:YVO4 yellow laser, Asymmetric dual quantum well lasers, Tm3+-doped silica fibre lasers, Terahertz dual-wavelength quantum cascade laser. The Book address also the additional areas, Laser X guiding system, Plasma diagnostics, Laser Beam shaping, Jitter and crosstalk, Plasma mirror systems, and High power Laser/Target diagnostic system optical elements. The book is unique in its emphasis on practical and innovative engineering and scientific applications. All conceptual Laser circuits are innovative and can be broadly implemented in many engineering applications. The dynamics of Laser circuits and systems provides several ways to use them in a variety of applications covering wide areas. This book is aimed at electrical and electronics engineers, students and researchers in physics as well. It is also aimed for research institutes in lasers and plasma physics and gives good comprehensive in laser and plasma systems. In each chapter, the concept is developed from basic assumptions up to the final engineering and scientific outcomes. The scientific background is explained at basic and advance levels and closely integrated with mathematical theory. Many examples are presented in this book and it is also ideal for intermediate level courses at graduate level studies. It is also ideal for engineer who has not had formal instruction in nonlinear dynamics, but who now desires to fill the gap between innovative Laser circuits/systems and advance mathematical analysis methods
Book Synopsis Plasma Technologies for Textiles by : Roshan Shishoo
Download or read book Plasma Technologies for Textiles written by Roshan Shishoo and published by Elsevier. This book was released on 2007-02-21 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma technologies present an environmentally-friendly and versatile way of treating textile materials in order to enhance a variety of properties such as wettability, liquid repellency, dyeability and coating adhesion. Recent advances made in commercially viable plasma systems have greatly increased the potential of using plasma technology in industrial textile finishing. This pioneering book provides an essential guide to both the technology and science related to plasmas and its practical applications in the textile industry.The first part of the book discusses the science and technology behind plasmas. Chapters give detailed and comprehensive descriptions on the characteristics of plasmas and methods of control and treatment in the processing of textiles. Both low pressure cold plasma and atmospheric pressure cold plasma processes are described as well as the diagnosis and control of plasma parameters in plasma generating reactors. A chapter is devoted to the use of plasma technology to achieve nanoscale treatment of textile surfaces. The second part of the book concentrates on specific applications of plasma technologies. Chapters cover treatments for water and oil repellency of textiles, engineering of biomedical textiles and woollen finishing techniques through the use of plasma technologies. Further chapters cover the modification of fibres for use in composites and the potential use of plasma technologies for the finishing of fabrics made of man made fibres. The final chapter in the book gives a comprehensive analysis of the surface chemical and physical characterisation of plasma treated fabrics.Written by a distinguished international team of experts, Plasma technologies for textiles is an invaluable reference for researchers, scientists and technologists alike. - Summarises both the science and technology of plasma processing, and its practical applications - Discusses how plasma technology improves textile properties such as wettability and liquid repelling - An invaluable reference for researchers, scientists and technologists
Book Synopsis Diamond and Diamond-like Films and Coatings by : Robert E. Clausing
Download or read book Diamond and Diamond-like Films and Coatings written by Robert E. Clausing and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 894 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond films grown by activated chemical vapor deposition have superlative thermal, mechanical, optical, and electronic properties combined with a very high degree of chemical inertness to most environments. These properties, together with the ability to fabricate films and shapes of considerable size, promise an exciting new material with many applications. Some applications are on the verge of commercialization but many await a few more technological developments. Diamond-like films are already employed in both commercial and military applications. The popular press, as well as the scientific and technological and industrial communities, are increasingly interested in the potential for future development of these materials. Although there are many technical papers and review articles published, there is no Single comprehensive introduction to these technologies. The Scientific Affairs Division of NATO recognized the need and the future importance of these technologies and authorized an Advanced Study Institute on diamond and diamond-like films. NATO Advanced Study Institutes are high level teaching activities at which a carefully defined subject is presented in a systematic and coherently structured program. The subject is treated in considerable depth by lecturers eminent in their fields and of international standing. The presentations are made to students who are scientists in the field or who possess an advanced general scientific background.
Book Synopsis Plasma Spectroscopy by : Takashi Fujimoto
Download or read book Plasma Spectroscopy written by Takashi Fujimoto and published by Clarendon Press. This book was released on 2004-06-17 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.
Book Synopsis Plasma Processing for VLSI by : Norman G. Einspruch
Download or read book Plasma Processing for VLSI written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
Book Synopsis Nonthermal Plasma Chemistry and Physics by : Jurgen Meichsner
Download or read book Nonthermal Plasma Chemistry and Physics written by Jurgen Meichsner and published by CRC Press. This book was released on 2012-11-13 with total page 566 pages. Available in PDF, EPUB and Kindle. Book excerpt: In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.
