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Author : S. Kar
Publisher : The Electrochemical Society
ISBN 13 : 1607682575
Total Pages : 504 pages
Book Rating : 4.6/5 (76 download)
Download or read book Physics and Technology of High-k Materials 9 written by S. Kar and published by The Electrochemical Society. This book was released on 2011 with total page 504 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society (United States). Dielectric Science and Technology Division
Publisher : ECS Transactions
ISBN 13 : 9781566779036
Total Pages : 492 pages
Book Rating : 4.7/5 (79 download)
Download or read book Physics and Technology of High-K Materials 9 written by Electrochemical Society (United States). Dielectric Science and Technology Division and published by ECS Transactions. This book was released on 2011-10 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issue of ECS Transactions will cover diverse aspects of high permittivity and other dielectric materials including their physics, processing, characterization, and applications in nano-electronics and photonics. Special emphasis will be given on high mobility channels including Ge, GeSi, GaAs, InGaAs, InP, GaSb, InGaSb, GaN, and AlGaN channels. Other chapters include new transistor concepts, new memory and gate dielectrics, dielectric deposition and processing, characterization, defects, traps, and reliability, and resistive switching.
Author : Samares Kar
Publisher : The Electrochemical Society
ISBN 13 : 1566778220
Total Pages : 621 pages
Book Rating : 4.5/5 (667 download)
Download or read book Physics and Technology of High-k Materials 8 written by Samares Kar and published by The Electrochemical Society. This book was released on 2010-10 with total page 621 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issue of ECS Transactions will cover comprehensively all the aspects of high-k material physics and technology: Diverse High Mobility Substrates, High-k Materials, Metal Gate Electrode Materials, Deposition Techniques, Bulk Material Properties, Flat-Band Voltage Issues and Control, Interfaces, Gate Stack Reliability, Electrical, Chemical, and Physical Chatracterization, Novel Applications, High-k and Diverse Insulators for Photonics, High-k Processing/ Manufacturing.
Author : Samares Kar
Publisher : The Electrochemical Society
ISBN 13 : 1566775701
Total Pages : 676 pages
Book Rating : 4.5/5 (667 download)
Download or read book Physics and Technology of High-k Gate Dielectrics 5 written by Samares Kar and published by The Electrochemical Society. This book was released on 2007 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author :
Publisher :
ISBN 13 : 9781607681724
Total Pages : 605 pages
Book Rating : 4.6/5 (817 download)
Download or read book Physics and Technology of High-k Materials 8 written by and published by . This book was released on 2010 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Samares Kar
Publisher : The Electrochemical Society
ISBN 13 : 9781566774055
Total Pages : 512 pages
Book Rating : 4.7/5 (74 download)
Download or read book Physics and Technology of High-k Gate Dielectrics II written by Samares Kar and published by The Electrochemical Society. This book was released on 2004 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.
Author : Gang He
Publisher : John Wiley & Sons
ISBN 13 : 3527646361
Total Pages : 560 pages
Book Rating : 4.5/5 (276 download)
Download or read book High-k Gate Dielectrics for CMOS Technology written by Gang He and published by John Wiley & Sons. This book was released on 2012-08-10 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Author : Samares Kar
Publisher : The Electrochemical Society
ISBN 13 : 1566775035
Total Pages : 565 pages
Book Rating : 4.5/5 (667 download)
Download or read book Physics and Technology of High-k Gate Dielectrics 4 written by Samares Kar and published by The Electrochemical Society. This book was released on 2006 with total page 565 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher : Springer Science & Business Media
ISBN 13 : 3642365353
Total Pages : 515 pages
Book Rating : 4.6/5 (423 download)
Download or read book High Permittivity Gate Dielectric Materials written by Samares Kar and published by Springer Science & Business Media. This book was released on 2013-06-25 with total page 515 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
Author : S. Kar
Publisher : The Electrochemical Society
ISBN 13 : 1566776511
Total Pages : 550 pages
Book Rating : 4.5/5 (667 download)
Download or read book Physics and Technology of High-k Gate Dielectrics 6 written by S. Kar and published by The Electrochemical Society. This book was released on 2008-10 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt: The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher :
ISBN 13 :
Total Pages : 330 pages
Book Rating : 4.3/5 (91 download)
Download or read book Physics and Technology of High-k Gate Dielectrics I written by Samares Kar and published by . This book was released on 2003 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Howard Huff
Publisher : Springer Science & Business Media
ISBN 13 : 9783540210818
Total Pages : 740 pages
Book Rating : 4.2/5 (18 download)
Download or read book High Dielectric Constant Materials written by Howard Huff and published by Springer Science & Business Media. This book was released on 2005 with total page 740 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Author : C. Claeys
Publisher : The Electrochemical Society
ISBN 13 : 1607682613
Total Pages : 429 pages
Book Rating : 4.6/5 (76 download)
Download or read book ULSI Process Integration 7 written by C. Claeys and published by The Electrochemical Society. This book was released on 2011 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Shubham Tayal
Publisher : CRC Press
ISBN 13 : 1000438783
Total Pages : 176 pages
Book Rating : 4.0/5 (4 download)
Download or read book High-k Materials in Multi-Gate FET Devices written by Shubham Tayal and published by CRC Press. This book was released on 2021-09-16 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt: High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level. Provides basic knowledge about FET devices Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies Discusses fabrication and characterization of high-k materials Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures Offers detailed application of high-k materials for advanced FET devices Considers future research directions This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.
Author : Tibor Grasser
Publisher : Springer Science & Business Media
ISBN 13 : 1461479096
Total Pages : 805 pages
Book Rating : 4.4/5 (614 download)
Download or read book Bias Temperature Instability for Devices and Circuits written by Tibor Grasser and published by Springer Science & Business Media. This book was released on 2013-10-22 with total page 805 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a single-source reference to one of the more challenging reliability issues plaguing modern semiconductor technologies, negative bias temperature instability. Readers will benefit from state-of-the art coverage of research in topics such as time dependent defect spectroscopy, anomalous defect behavior, stochastic modeling with additional metastable states, multiphonon theory, compact modeling with RC ladders and implications on device reliability and lifetime.
Author : Yoon Soo Park
Publisher : World Scientific
ISBN 13 : 9814487082
Total Pages : 400 pages
Book Rating : 4.8/5 (144 download)
Download or read book Frontiers in Electronics written by Yoon Soo Park and published by World Scientific. This book was released on 2003-01-29 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: The 2002 Workshop on Frontiers in Electronics was the third in the series of WOFE workshops. Over 70 leading experts from academia, industry, and government agencies reported on the most recent developments in their fields and exchanged views on future trends and directions of the electronics and photonics industry. The issues they addressed ranged from system-on-chip to DNA doping, from ultrathin SOI to electrotextiles, from photonics integration on the ULSI platform to wide band gap semiconductor devices and solid state lighting. The rapid pace of electronic technology evolution compels a merger of different technical areas, and WOFE-02 provided a unique opportunity for cross-fertilization of the emerging fields of microelectronics, photonics, and nanoelectronics. The workshop was informal and stimulated provocative views, visionary outlooks, and discussions on controversial issues. Contents:Optical Wave Propagation in Periodic Structures (A Yariv & S Mookherjea)MEMS Technology for Advanced Telecommunication Applications (H-G Lee et al.)Low Temperature Physics at Room Temperature in Water: Charge Inversion in Chemical and Biological Systems (A Yu Grosberg et al.)Materials for Strained Silicon Devices (P M Mooney)System-on-Chip Integration (R R Doering)Nanoelectronics: Some Current Aspects and Prospects (R Hull et al.)Electrotextiles (E Ethridge & D Urban)System Impact of Silicon Carbide Power Devices (B Ozpineci et al.)Hot-Phonon Limited Electron Energy Relaxation in AIN/GaN (A Matulionis et al.)Polar-Optical Phonon Enhancement of Harmonic Generation in Schottky Diodes (B Gelmont et al.)Environmental Sensing of Chemical and Biological Warfare Agents in the THz Region (A C Samuels et al.)Thermal Management in Optoelectronics (D K Johnstone)Spectral Response Measurements of Short Wave Infrared Detectors (SWIR) (T F Refaat et al.)Full-Chip Power-Supply Noise: The Effect of On-Chip Power-Rail Inductance (C W Fok & D L Pulfrey)Quantum Dot Superlattices in a Constant Electric Field: Localization and Bloch Oscillations (R A Suris & I A Dmitriev)and other papers Readership: Scientists, engineers and graduate students working in the area of microelectronics, semiconductor materials and devices. Keywords:Microelectronics;Nanoelectronics;Integrated Circuits;Nanostructures;Solid State Lighting;Semiconductors
Author : Niladri Pratap Maity
Publisher : CRC Press
ISBN 13 : 1000517764
Total Pages : 246 pages
Book Rating : 4.0/5 (5 download)
Download or read book High-k Gate Dielectric Materials written by Niladri Pratap Maity and published by CRC Press. This book was released on 2020-12-18 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.
