Read Books Online and Download eBooks, EPub, PDF, Mobi, Kindle, Text Full Free.
Download Physico Chemical Study Of The Focused Electron Beam Induced Deposition Process full books in PDF, epub, and Kindle. Read online Physico Chemical Study Of The Focused Electron Beam Induced Deposition Process ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Author : Tristan Bret
Publisher :
ISBN 13 :
Total Pages : 220 pages
Book Rating : 4.:/5 (427 download)
Download or read book Physico-chemical Study of the Focused Electron Beam Induced Deposition Process written by Tristan Bret and published by . This book was released on 2005 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ivo Utke
Publisher : OUP USA
ISBN 13 : 0199734216
Total Pages : 830 pages
Book Rating : 4.1/5 (997 download)
Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by OUP USA. This book was released on 2012-05 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Author : Anthony Dominic Garetto
Publisher :
ISBN 13 :
Total Pages : 121 pages
Book Rating : 4.:/5 (166 download)
Download or read book Electron Beam Induced Chemistry written by Anthony Dominic Garetto and published by . This book was released on 2007 with total page 121 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: chemical vapor deposition, nanofabrication, electron beam induced deposition, Electron Beam Induced Chemistry.
Author : Toivo T. Kodas
Publisher : John Wiley & Sons
ISBN 13 : 3527615849
Total Pages : 562 pages
Book Rating : 4.5/5 (276 download)
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Author : Frances M. Ross
Publisher : Cambridge University Press
ISBN 13 : 1107116570
Total Pages : 529 pages
Book Rating : 4.1/5 (71 download)
Download or read book Liquid Cell Electron Microscopy written by Frances M. Ross and published by Cambridge University Press. This book was released on 2017 with total page 529 pages. Available in PDF, EPUB and Kindle. Book excerpt: 2.6.2 Electrodes for Electrochemistry
Download or read book Electron Beam Induced Chemistry written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The purpose of this research has been to investigate the mechanisms and develop techniques for electron beam induced chemistry. Applications for electron beam chemistry include repair and fabrication of lithographic masks, integrated circuit repair and rewiring, nanofabrication of functional nanoscale tools and scanned probe microscopy tips and damage free transmission electron microscope sample preparation. The use of hydrocarbon contamination as a precursor has been investigated and complex three dimensional nanostructures have been successfully fabricated. Accelerating voltage and scan speed can be used to control the morphology of the deposits. The development and implementation of an internal precursor reservoir and introduction device that is transferable to various scanning electron microscope and focused ion beam instruments has been performed. The effects of beam and scan parameters on the deposition efficiency of carbon structures utilizing a phenanthrene precursor has been investigated. Deposition efficiency is maximized for low beam current, large scan areas exposed for short times using the experimental conditions in this work. However, the use of a focused ion beam provides a significantly higher deposition efficiency (over 45 times) than that of an electron beam.
Author : Bharat Bhushan
Publisher : Springer Science & Business Media
ISBN 13 : 3540740805
Total Pages : 512 pages
Book Rating : 4.5/5 (47 download)
Download or read book Applied Scanning Probe Methods VIII written by Bharat Bhushan and published by Springer Science & Business Media. This book was released on 2007-12-20 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
Author : Ivo Utke
Publisher : Oxford University Press
ISBN 13 : 0199920990
Total Pages : 830 pages
Book Rating : 4.1/5 (999 download)
Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by Oxford University Press. This book was released on 2012-03-05 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Download or read book Electron Beam Physical Vapor Deposition Through Tungsten written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: High temperature alloys for application to power generation and aircraft engine gas turbine components are presently at their performance limits. New alloys that use intermetallic matrix composites (IMCs) offer a path to higher efficiency engines. Cost-effective synthesis of these revolutionary materials will depend on the development of more efficient processing techniques. Electron beam physical vapor deposition (EB-PVD), enhanced by refractory element addition, offers a key to both increased deposition rate and composition control for these demanding new materials. Initial results with tungsten-assisted EB-PVD had been so dramatic that it became important to investigate the mechanism of this process and to determine the ease with which it could be implemented in EB-PVD machines of different design. The research presented in this report investigates the effects of refractory metal addition on electron beam physical vapor deposition (EB-PVD) of Ni-base alloys containing Co, Cr and Al. Experiments were conducted in which W, Nb, Ta, Mo, or Re was added to pure Ni or Ni-base alloy evaporation pools to study the effects that the various refractory elements had on evaporation rate and the composition control of the deposit. These experiments employed three distinctly different sets of evaporation equipment, so that the effects of processing variables could also be examined. Deposit compositions, deposition rates, and evaporation pool compositions were evaluated in order to determine the effects of refractory addition on the evaporation process. The relationship between deposit properties such as deposition rate, chemistry, and microstructure, and processing parameters such as applied power, electron beam pattern frequency, beam focus, and height of the liquid pool in the crucible were also investigated.
Author :
Publisher :
ISBN 13 :
Total Pages : 200 pages
Book Rating : 4.:/5 (635 download)
Download or read book Experimental, Theoretical, and Device Application Development of Nanoscale Focused Electron-beam-induced Deposition written by and published by . This book was released on 2005 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: To elucidate the effects of beam heating in electron beam-induced deposition (EBID), a Monte-Carlo electron-solid interaction model has been employed to calculate the energy deposition profiles in bulk and nanostructured SiO2. Using these profiles, a finite element model was used to predict the nanostructure tip temperatures for standard experimental EBID conditions. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial. This heat source can subsequently limit the EBID growth by thermally reducing the mean stay time of the precursor gas. Temperature dependent EBID growth experiments qualitatively verified the results of the electron beam-heating model. Additionally, experimental trends for the growth rate as a function of deposition time supported the conclusion that electron beam-induced heating can play a major role in limiting the EBID growth rate of SiO2 nanostructures. In an EBID application development, two approaches to maskless, direct-write lithography using electron beam-induced deposition (EBID) to produce ultra-thin masking layers were investigated. A single layer process used directly written SiO[subscript x] features deposited from a tetraethoxysilane (TEOS) precursor vapor as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern--directly written by EBID tungsten from WF6 precursor--was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. As a result, patterns were successfully transferred into silicon, but only to a minimal depth. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of an oxygen plasma dry development. A brief refractory descum plasma etch was implemented to remove the peripheral tungsten contamination prior to the development process. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain minimal linewidths, which enabled patterning of [sim] 35 nm lines. Additionally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration. Damaged or missing carbon nanofiber (CNF) emitters are very common in these prototype devices, so there is a need for a deterministic repair process. Relatively carbon-free, high aspect ratio tungsten nanofibers were deposited from a WF6 precursor in a gated cathode and a damaged triode (DEAL) device. The I-V response of the devices during vacuum FE testing indicated stable, cold field emission from the EBID cathodes. The field emission threshold voltage was shown to decrease from -130 V to -90 V after a short initiation period. Finally, lithography was performed using the repaired device to write a series of lines in PMMA with variable focus voltage. Successful focusing of the beam with increased focus voltage was evident in the patterned and developed PMMA. The I-V and lithography results were comparable to CNF-based DEAL devices indicating a successful repair technique.
Author : Marcel Winhold
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (951 download)
Download or read book Focused Electron-beam-induced Deposition written by Marcel Winhold and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : University of Cambridge
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (595 download)
Download or read book Focused Electron Beam Induced Chemistry and Its Application in Microelectronics written by University of Cambridge and published by . This book was released on 1994 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Willem Frederik van Dorp
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (842 download)
Download or read book Sub-10 Nm Focused Electron Beam Induced Deposition written by Willem Frederik van Dorp and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Young Ryong Choi
Publisher :
ISBN 13 :
Total Pages : 143 pages
Book Rating : 4.:/5 (833 download)
Download or read book Studies of the Mechanism of Electron Beam Induced Deposition (EBID) written by Young Ryong Choi and published by . This book was released on 2006 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt: The controlled deposition of metals resulting from the passage of an ion beam through an atmosphere of a suitable precursor gas is a well-established procedure for micro scale materials manipulation. While the ion beam technique is rapid and reliable it has the disadvantage that the beam itself can ablate and contaminate the target with Gallium or other materials, and the fact that ion optics are less widely accessible than electron optical columns. We have therefore been investigating the theory and practice of depositing metal using an electron beam and variety of precursor gases. The aim of this work is to develop techniques that can be applied to the repair of the optical, ultra-violet (UV) and extreme ultra-violet (EUV) masks used in high performance photo-lithography. This thesis is concentrated on electron beam induced deposition (EBID) performed in a commercial Scanning Electron Microscope (SEM). For EBID experiments, we have developed a gas injection system for the specimen chamber of a standard SEM which is able to control the pressure and the delivery flow rate of gas for experiment. Studies of factors that control the properties of the deposition - such as the electron-gas interactions, the effects of gas pressure, and the temperature of the substrate - have been made and experiments to determine the fundamental mechanisms of EBID - such as which types of electrons are responsible for the initial interaction event with the precursor - have been carried out and analyzed and systematically studied to determine the optimum conditions for the practical application of the EBID approach. Finally the practical applications of the EBID have been applied to repair of masks.
Author : Aleksandra Szkudlarek
Publisher :
ISBN 13 :
Total Pages : 139 pages
Book Rating : 4.:/5 (892 download)
Download or read book Surface Kinetics Fundamentals of Focused-electron-beam-induced-deposition written by Aleksandra Szkudlarek and published by . This book was released on 2014 with total page 139 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : José María de Teresa
Publisher :
ISBN 13 : 9780750326087
Total Pages : 0 pages
Book Rating : 4.3/5 (26 download)
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Author : Oddur Ingólfsson
Publisher : CRC Press
ISBN 13 : 0429602766
Total Pages : 274 pages
Book Rating : 4.4/5 (296 download)
Download or read book Low-Energy Electrons written by Oddur Ingólfsson and published by CRC Press. This book was released on 2019-04-23 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.
