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Author : A. Golanski
Publisher :
ISBN 13 :
Total Pages : 742 pages
Book Rating : 4.F/5 ( download)
Download or read book Photon, Beam and Plasma Enhanced Processing, 1987 written by A. Golanski and published by . This book was released on 1987 with total page 742 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : I.W. Boyd
Publisher : Elsevier
ISBN 13 : 0444596658
Total Pages : 482 pages
Book Rating : 4.4/5 (445 download)
Download or read book Beam Processing and Laser Chemistry written by I.W. Boyd and published by Elsevier. This book was released on 1990-02-01 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field.
Author : Ian W. Boyd
Publisher : Springer Science & Business Media
ISBN 13 : 3642831362
Total Pages : 328 pages
Book Rating : 4.6/5 (428 download)
Download or read book Laser Processing of Thin Films and Microstructures written by Ian W. Boyd and published by Springer Science & Business Media. This book was released on 2013-03-08 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.
Author : Y. Pauleau
Publisher : Springer Science & Business Media
ISBN 13 : 9781402005244
Total Pages : 392 pages
Book Rating : 4.0/5 (52 download)
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2002-04-30 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001
Author : J. J. Ritsko
Publisher :
ISBN 13 :
Total Pages : 268 pages
Book Rating : 4.:/5 (2 download)
Download or read book Proceedings of the Symposium on Laser Processes for Microelectronic Applications written by J. J. Ritsko and published by . This book was released on 1988 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Arthur N. Chester
Publisher : Springer Science & Business Media
ISBN 13 : 1468458957
Total Pages : 280 pages
Book Rating : 4.4/5 (684 download)
Download or read book Optoelectronics for Environmental Science written by Arthur N. Chester and published by Springer Science & Business Media. This book was released on 2013-03-08 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: As we enter the nineties, there is worldwide awareness that the future of all mankind is inexorably linked by the world we share, and its response to man's activities. Lasers and the optical sciences have brought powerful tools to measure and understand our environment. LIDAR (laser radar) and laser fluorescence allow us to measure atmospheric and oceanic pollutants, as well as industrial emissions, from many kilometers distance. And a variety of sensitive laser-based spectroscopic techniques permit the accurate analysis of heavy metals and other trace elements in the environment. In September 1989, an international group of scientists me.t in Erice, Sicily, for the 14th Course of the International School of Quant~ Electronics. This Course was devoted to "Optoelectronics for Envi~onmental Science", and was ably directed by Prof. V. S. Letokhov of the USSR Institute of Spectroscopy and Prof. A. M. Scheggi of the C.N.R. Electro magnetic Waves Institute, Florence, Italy. This book gives the proceedings of that conference, which covered not only basic tutorial papers but also reports on the latest research results. The first half of this volume describes the techniques used for direct "In-Situ Measurements" of the environment. In "Techniques and Programs", four chapters and one extended abstract give tutorial discussions of the most important remote sensing techniques: LIDAR, laser fluorescence, and optical fiber sensors, plus a description of the Italian program in this area.
Author : R.A. Levy
Publisher : Springer Science & Business Media
ISBN 13 : 9401134308
Total Pages : 284 pages
Book Rating : 4.4/5 (11 download)
Download or read book Novel Silicon Based Technologies written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 284 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon, as an electronic substrate, has sparked a technological revolution that has allowed the realization of very large scale integration (VLSI) of circuits on a chip. These 6 fingernail-sized chips currently carry more than 10 components, consume low power, cost a few dollars, and are capable of performing data processing, numerical computations, and signal conditioning tasks at gigabit-per-second rates. Silicon, as a mechanical substrate, promises to spark another technological revolution that will allow computer chips to come with the eyes, ears, and even hands needed for closed-loop control systems. The silicon VLSI process technology which has been perfected over three decades can now be extended towards the production of novel structures such as epitaxially grown optoelectronic GaAs devices, buried layers for three dimensional integration, micromechanical mechanisms, integrated photonic circuits, and artificial neural networks. This book begins by addressing the processing of electronic and optoelectronic devices produced by using lattice mismatched epitaxial GaAs films on Si. Two viable technologies are considered. In one, silicon is used as a passive substrate in order to take advantage of its favorable properties over bulk GaAs; in the other, GaAs and Si are combined on the same chip in order to develop IC configurations with improved performance and increased levels of integration. The relationships between device operation and substrate quality are discussed in light of potential electronic and optoelectronic applications.
Author : R. Van Overstraeten
Publisher : Springer Science & Business Media
ISBN 13 : 9400929331
Total Pages : 321 pages
Book Rating : 4.4/5 (9 download)
Download or read book Photovoltaic Power Generation written by R. Van Overstraeten and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: Amorphous silicon PV panel mass production will require to mas ter plasma chemical deposition in terms of large sizes, cost, maintenance and all other problems related to industrialization. Since plasma deposition is a novel technique, the development of all this production related know how involves a considerable technical research effort. The major problems related to the design of a production deposi tion machine are the following - deposition should be uniform on very large area substrate (typical dimension 1 meter) ; - the deposited amorphous silicon should have good electronic properties (density of state of the order or less than 16 3 10 cm /eV) and very low impurities concentrations (for exam ple oxygen atomic concentration should idealy be less than 0. 01 %) ; - the film stress should be limited, the density of ponctual defects (particulates) should remain reasonable (less than 2 per 100 cm ) ; - dopant level control should be stable and efficient ; - silane consumption should remain reasonably efficient - financial cost being important the machine productivity should be high hence deposition rate optimized ; - downtime due to maintenance should be reduced to a minimum. We present here some results on the R&D effort addressed to the above mentioned problems. An original single chamber was designed. This machine will be made available on the market for R&D purposes by a process machine company. Finally the maintenance problem is considered. Plasma cleaning based on a fluorine containing etchant gases is studied and evaluated. 2.
Author : Lucien D. Laude
Publisher :
ISBN 13 :
Total Pages : 176 pages
Book Rating : 4.3/5 (91 download)
Download or read book Laser Assisted Processing written by Lucien D. Laude and published by . This book was released on 1989 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ian W. Boyd
Publisher :
ISBN 13 :
Total Pages : 556 pages
Book Rating : 4.F/5 ( download)
Download or read book Photochemical Processing of Electronic Materials written by Ian W. Boyd and published by . This book was released on 1992 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book reflects the state of the art in the field of photoprocessing. In addition to providing an introduction and review of many key areas of interest, it targets potential future applications of the technique, and realistically discusses problems that have yet to be solved. The individual chapters have been written by internationally recognized experts and the combination provides a unique and knowledgeable text. Although the basic scientific fundamentals are briefly addressed, the volume concentrates strongly on applications and as such should appeal to applied research scientists as well as students and engineers in the field, and those in managerial or funding positions in technology. Topics include: UV lens design Laser lithography Photonucleation Excimer laser development Processors for direct writing Laser ablation (polymers and superconductors) Laser doping, etching, deposition, and growth
Author : Ian W. Boyd
Publisher : North Holland
ISBN 13 :
Total Pages : 560 pages
Book Rating : 4.F/5 ( download)
Download or read book Laser Surface Processing and Characterization written by Ian W. Boyd and published by North Holland. This book was released on 1992 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
Author : James E. Griffiths
Publisher :
ISBN 13 :
Total Pages : 164 pages
Book Rating : 4.3/5 (91 download)
Download or read book Monitoring and Control of Plasma-enhanced Processing of Semiconductors written by James E. Griffiths and published by . This book was released on 1989 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gary S. Was
Publisher :
ISBN 13 :
Total Pages : 952 pages
Book Rating : 4.3/5 (91 download)
Download or read book Phase Formation and Modification by Beam-Solid Interactions: Volume 235 written by Gary S. Was and published by . This book was released on 1992-04-10 with total page 952 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : A. Wayne Johnson
Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 680 pages
Book Rating : 4.3/5 (91 download)
Download or read book Laser- and Particle-Beam Chemical Processes on Surfaces: Volume 129 written by A. Wayne Johnson and published by Mrs Proceedings. This book was released on 1989-11-20 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : D. M. Mattox
Publisher : Cambridge University Press
ISBN 13 : 0080946585
Total Pages : 947 pages
Book Rating : 4.0/5 (89 download)
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Author : Jean-Pierre Nougier
Publisher :
ISBN 13 :
Total Pages : 868 pages
Book Rating : 4.:/5 (318 download)
Download or read book ESSDERC 88 written by Jean-Pierre Nougier and published by . This book was released on 1988 with total page 868 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Rajendra Singh
Publisher :
ISBN 13 :
Total Pages : 218 pages
Book Rating : 4.3/5 (91 download)
Download or read book Rapid Isothermal Processing written by Rajendra Singh and published by . This book was released on 1990 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt:
