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Author : F. Roozeboom
Publisher : The Electrochemical Society
ISBN 13 : 1607686724
Total Pages : 281 pages
Book Rating : 4.6/5 (76 download)
Download or read book Atomic Layer Deposition Applications 11 written by F. Roozeboom and published by The Electrochemical Society. This book was released on 2015 with total page 281 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R R Bowker Publishing
Publisher : R. R. Bowker
ISBN 13 : 9780835229852
Total Pages : 5273 pages
Book Rating : 4.2/5 (298 download)
Download or read book Ulrich's International Periodicals Directory written by R R Bowker Publishing and published by R. R. Bowker. This book was released on 1989-09-01 with total page 5273 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Reza Ghodssi
Publisher : Springer Science & Business Media
ISBN 13 : 0387473181
Total Pages : 1211 pages
Book Rating : 4.3/5 (874 download)
Download or read book MEMS Materials and Processes Handbook written by Reza Ghodssi and published by Springer Science & Business Media. This book was released on 2011-03-18 with total page 1211 pages. Available in PDF, EPUB and Kindle. Book excerpt: MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.
Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author : Saroj Rout
Publisher : Springer
ISBN 13 : 3319522191
Total Pages : 126 pages
Book Rating : 4.3/5 (195 download)
Download or read book Active Metamaterials written by Saroj Rout and published by Springer. This book was released on 2017-01-21 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the theoretical background, experimental methods and implementation details to engineer for communication and imaging application, terahertz devices using metamaterials, in mainstream semiconductor foundry processes. This book will provide engineers and physicists an authoritative reference to construct such devices with minimal background. The authors describe the design and construction of electromagnetic (EM) devices for terahertz frequencies (108-1010 cycles/sec) using artificial materials that are a fraction of the wavelength of the incident EM wave, resulting in an effective electric and magnetic properties (permittivity and permeability) that are unavailable in natural materials.
Author : Shimeng Yu
Publisher : Springer Nature
ISBN 13 : 3031020308
Total Pages : 71 pages
Book Rating : 4.0/5 (31 download)
Download or read book Resistive Random Access Memory (RRAM) written by Shimeng Yu and published by Springer Nature. This book was released on 2022-06-01 with total page 71 pages. Available in PDF, EPUB and Kindle. Book excerpt: RRAM technology has made significant progress in the past decade as a competitive candidate for the next generation non-volatile memory (NVM). This lecture is a comprehensive tutorial of metal oxide-based RRAM technology from device fabrication to array architecture design. State-of-the-art RRAM device performances, characterization, and modeling techniques are summarized, and the design considerations of the RRAM integration to large-scale array with peripheral circuits are discussed. Chapter 2 introduces the RRAM device fabrication techniques and methods to eliminate the forming process, and will show its scalability down to sub-10 nm regime. Then the device performances such as programming speed, variability control, and multi-level operation are presented, and finally the reliability issues such as cycling endurance and data retention are discussed. Chapter 3 discusses the RRAM physical mechanism, and the materials characterization techniques to observe the conductive filaments and the electrical characterization techniques to study the electronic conduction processes. It also presents the numerical device modeling techniques for simulating the evolution of the conductive filaments as well as the compact device modeling techniques for circuit-level design. Chapter 4 discusses the two common RRAM array architectures for large-scale integration: one-transistor-one-resistor (1T1R) and cross-point architecture with selector. The write/read schemes are presented and the peripheral circuitry design considerations are discussed. Finally, a 3D integration approach is introduced for building ultra-high density RRAM array. Chapter 5 is a brief summary and will give an outlook for RRAM’s potential novel applications beyond the NVM applications.
Author : Harry J. Levinson
Publisher : SPIE Press
ISBN 13 : 9780819456601
Total Pages : 446 pages
Book Rating : 4.4/5 (566 download)
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author : R. Mohan Sankaran
Publisher : CRC Press
ISBN 13 : 1439866775
Total Pages : 417 pages
Book Rating : 4.4/5 (398 download)
Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Author :
Publisher :
ISBN 13 :
Total Pages : 286 pages
Book Rating : 4.:/5 (321 download)
Download or read book Toxicological Profile for Chlordane written by and published by . This book was released on 1994 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : Academic Press
ISBN 13 : 008054293X
Total Pages : 268 pages
Book Rating : 4.0/5 (85 download)
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
Author : Shien-Kuei Liaw
Publisher : River Publishers
ISBN 13 : 8793379277
Total Pages : 260 pages
Book Rating : 4.7/5 (933 download)
Download or read book Green Photonics and Smart Photonics written by Shien-Kuei Liaw and published by River Publishers. This book was released on 2016-06-27 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years, many efforts have been devoted in the study, development and application of Green Photonics and Smart Photonics. This book presents recent advances, both theoretical and applications, reflecting the cutting-edge technologies and research achievements within these research fields. Green Photonics intend to develop photonics technologies that can conserve energy, reduce pollution and create renewable energy. Light emitting diodes (LEDs) and solar cells with the characteristics of sustainable and low energy consumption are addressed in this book. The term of Smart Photonics reflect intelligence of optical and optoelectronic components with high sensitivity, fast response time and/or compact size. The book explores various aspects of smart photonics including fiber sensors, optoelectronic devices and waveguide devices. The chapters in this edited book are written by researchers who presented quality papers at the 2015 International Symposium of Next-Generation Electronics (ISNE 2015), which was held in Taipei, Taiwan. The ISNE 2015 provided a common forum in the areas of opto-electron devices, photonics, integrated circuits, and microelectronic systems and technologies. The technical program consisted of 5 plenary talks, 23 invited talks and more than 250 contributed oral and poster presentations. After a rigorous review process, the ISNE 2015 technical program committee has selected 10 outstanding presentations and invited the authors to prepare extended chapters for inclusion in this book. Of the 10 chapters, five focus on the subject of green photonics, and the others cover smart photonics.
Author : Raghu Murali
Publisher : Springer Science & Business Media
ISBN 13 : 1461405483
Total Pages : 271 pages
Book Rating : 4.4/5 (614 download)
Download or read book Graphene Nanoelectronics written by Raghu Murali and published by Springer Science & Business Media. This book was released on 2012-03-09 with total page 271 pages. Available in PDF, EPUB and Kindle. Book excerpt: Graphene has emerged as a potential candidate to replace traditional CMOS for a number of electronic applications; this book presents the latest advances in graphene nanoelectronics and the potential benefits of using graphene in a wide variety of electronic applications. The book also provides details on various methods to grow graphene, including epitaxial, CVD, and chemical methods. This book serves as a spring-board for anyone trying to start working on graphene. The book is also suitable to experts who wish to update themselves with the latest findings in the field.
Author : National Academies of Sciences Engineering and Medicine
Publisher :
ISBN 13 : 9780309677608
Total Pages : 291 pages
Book Rating : 4.6/5 (776 download)
Download or read book Plasma Science written by National Academies of Sciences Engineering and Medicine and published by . This book was released on 2021-02-28 with total page 291 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Science and Engineering transforms fundamental scientific research into powerful societal applications, from materials processing and healthcare to forecasting space weather. Plasma Science: Enabling Technology, Sustainability, Security and Exploration discusses the importance of plasma research, identifies important grand challenges for the next decade, and makes recommendations on funding and workforce. This publication will help federal agencies, policymakers, and academic leadership understand the importance of plasma research and make informed decisions about plasma science funding, workforce, and research directions.
Author : Hans Christian Öttinger
Publisher : John Wiley & Sons
ISBN 13 : 0471727911
Total Pages : 651 pages
Book Rating : 4.4/5 (717 download)
Download or read book Beyond Equilibrium Thermodynamics written by Hans Christian Öttinger and published by John Wiley & Sons. This book was released on 2005-05-13 with total page 651 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beyond Equilibrium Thermodynamics fills a niche in the market by providing a comprehensive introduction to a new, emerging topic in the field. The importance of non-equilibrium thermodynamics is addressed in order to fully understand how a system works, whether it is in a biological system like the brain or a system that develops plastic. In order to fully grasp the subject, the book clearly explains the physical concepts and mathematics involved, as well as presenting problems and solutions; over 200 exercises and answers are included. Engineers, scientists, and applied mathematicians can all use the book to address their problems in modelling, calculating, and understanding dynamic responses of materials.
Author : Stephen K. Cusick
Publisher : McGraw Hill Professional
ISBN 13 : 125964183X
Total Pages : 561 pages
Book Rating : 4.2/5 (596 download)
Download or read book Commercial Aviation Safety, Sixth Edition written by Stephen K. Cusick and published by McGraw Hill Professional. This book was released on 2017-05-12 with total page 561 pages. Available in PDF, EPUB and Kindle. Book excerpt: Up-To-Date Coverage of Every Aspect of Commercial Aviation Safety Completely revised edition to fully align with current U.S. and international regulations, this hands-on resource clearly explains the principles and practices of commercial aviation safety—from accident investigations to Safety Management Systems. Commercial Aviation Safety, Sixth Edition, delivers authoritative information on today's risk management on the ground and in the air. The book offers the latest procedures, flight technologies, and accident statistics. You will learn about new and evolving challenges, such as lasers, drones (unmanned aerial vehicles), cyberattacks, aircraft icing, and software bugs. Chapter outlines, review questions, and real-world incident examples are featured throughout. Coverage includes: • ICAO, FAA, EPA, TSA, and OSHA regulations • NTSB and ICAO accident investigation processes • Recording and reporting of safety data • U.S. and international aviation accident statistics • Accident causation models • The Human Factors Analysis and Classification System (HFACS) • Crew Resource Management (CRM) and Threat and Error Management (TEM) • Aviation Safety Reporting System (ASRS) and Flight Data Monitoring (FDM) • Aircraft and air traffic control technologies and safety systems • Airport safety, including runway incursions • Aviation security, including the threats of intentional harm and terrorism • International and U.S. Aviation Safety Management Systems
Author : John F. Watts
Publisher : John Wiley & Sons
ISBN 13 : 1119417643
Total Pages : 320 pages
Book Rating : 4.1/5 (194 download)
Download or read book An Introduction to Surface Analysis by XPS and AES written by John F. Watts and published by John Wiley & Sons. This book was released on 2019-08-27 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Author : Francisco L. Tabarés
Publisher : Nova Science Publishers
ISBN 13 : 9781624176340
Total Pages : 0 pages
Book Rating : 4.1/5 (763 download)
Download or read book Lithium written by Francisco L. Tabarés and published by Nova Science Publishers. This book was released on 2013 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithium is a chemical element with unique properties. Its applications in todays world are countless, from psychiatry to cell phones, and we are still far from exploiting all the exotic signatures of this amazing metal. Even so, the reader will find here a good sample of what is being investigated at present in the field of lithium chemistry and future applications in the new energy supply concepts.
