Morphological and Structural Modification of Silicon, Titanium and Iron Oxides by Plasma Enhanced Chemical Vapor Deposition for Solar Water Splitting

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (112 download)

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Book Synopsis Morphological and Structural Modification of Silicon, Titanium and Iron Oxides by Plasma Enhanced Chemical Vapor Deposition for Solar Water Splitting by : Myeongwhun Pyeon

Download or read book Morphological and Structural Modification of Silicon, Titanium and Iron Oxides by Plasma Enhanced Chemical Vapor Deposition for Solar Water Splitting written by Myeongwhun Pyeon and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma Electrolytic Oxidation (PEO) Coatings

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Publisher : MDPI
ISBN 13 : 3036505520
Total Pages : 172 pages
Book Rating : 4.0/5 (365 download)

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Book Synopsis Plasma Electrolytic Oxidation (PEO) Coatings by : Marta Mohedano

Download or read book Plasma Electrolytic Oxidation (PEO) Coatings written by Marta Mohedano and published by MDPI. This book was released on 2021-06-02 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma electrolytic oxidation (PEO), also known as micro-arc oxidation (MAO), functionalizes surfaces, improving the mechanical, thermal, and corrosion performance of metallic substrates, along with other tailored properties (e.g., biocompatibility, catalysis, antibacterial response, self-lubrication, etc.). The extensive field of applications of this technique ranges from structural components, in particular, in the transport sector, to more advanced fields, such as bioengineering. The present Special Issue covers the latest advances in PEO‐coated light alloys for structural (Al, Mg) and biomedical applications (Ti, Mg), with 10 research papers and 1 review from leading research groups around the world.

Plasma-enhanced Chemical Vapor Deposition of Titanium Silicide

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ISBN 13 :
Total Pages : 312 pages
Book Rating : 4.:/5 (29 download)

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Book Synopsis Plasma-enhanced Chemical Vapor Deposition of Titanium Silicide by : Edwin Earl Cervantes

Download or read book Plasma-enhanced Chemical Vapor Deposition of Titanium Silicide written by Edwin Earl Cervantes and published by . This book was released on 1985 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Enhancing the Photoelectrochemical Water Splitting Characteristics of Titanium and Tungsten Oxide Based Materials Via Doping and Sensitization

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ISBN 13 :
Total Pages : 602 pages
Book Rating : 4.:/5 (948 download)

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Book Synopsis Enhancing the Photoelectrochemical Water Splitting Characteristics of Titanium and Tungsten Oxide Based Materials Via Doping and Sensitization by : Ruchi Gakhar

Download or read book Enhancing the Photoelectrochemical Water Splitting Characteristics of Titanium and Tungsten Oxide Based Materials Via Doping and Sensitization written by Ruchi Gakhar and published by . This book was released on 2015 with total page 602 pages. Available in PDF, EPUB and Kindle. Book excerpt: To better utilize solar energy for clean energy production, efforts are needed to overcome the natural diurnal variation and the diffuse nature of sunlight. Photoelectrochemical (PEC) hydrogen generation by water splitting is a promising approach to harvest solar energy. Hydrogen gas is a clean and high energy capacity fuel. However, the solar-to-hydrogen conversion efficiency is determined mainly by the properties of the materials employed as photoanodes. Improving the power-conversion efficiency of PEC water splitting requires the design of inexpensive and efficient photoanodes that have strong visible light absorption, fast charge separation, and lower charge recombination rate. In the present study, PEC characteristics of various semiconducting photoelectrodes such as TiO2, WO3 and CuWO4 were investigated. Due to the inherent wide gap, such metal oxides absorb only ultraviolet radiation. Since ultraviolet radiation only composes of 4% of the sun's spectrum, the wide band gap results in lower charge collection and efficiency. Thus to improve optical absorption and charge separation, it is necessary to modify the band gap with low band gap materials.The two approaches followed for modification of band gap are doping and sensitization. Here, TiO2 and WO3 based photoanodes were sensitized with ternary quantum dots, while doping was the primary method utilized to investigate the modification of the band gap of CuWO4. The first part of this dissertation reports the synthesis of ternary quantum dot - sensitized titania nanotube array photoelectrodes. Ternary quantum dots with varying band gaps and composition (MnCdSe, ZnCdSe and CdSSe) were tethered to the surface of TiO2 nanotubes using successive ionic layer adsorption and reaction (SILAR) technique. The stoichiometry of ternary quantum dots was estimated to beMn0.095Cd0.95Se, Zn0.16Cd0.84Se and CdS0.54Se0.46. The effect of varying number of sensitization cycles and annealing temperature on optical and photoelectrochemical properties of prepared photoanodes were studied. The absorption properties and surface morphology of the sensitized tubes was analyzed using UV-visible spectroscopy and scanning electron microscopy. The phase composition was determined using X-Ray diffraction and X-ray photoelectron spectroscopy techniques. Electrodes were also evaluated for their stability using inductively coupled plasma optical emission spectrometry. Results show that the sensitization of TiO2 nanotubes with MnCdSe (8.79 mA/cm2), ZnCdSe (12.70 mA/cm2) and CdSSe (15.58 mA/cm2) resulted in up to a 30 fold increase in photocurrent compared to unsensitized nanotubes (0.4 mA/cm2). In the second part, the application of WO3 as photoanode for water splitting was explored. The porous thin films of WO3 films were sensitized with ternary quantum dots (ZnCdSe) using the SILAR technique. The structural, surface morphological and optical properties of the sensitized WO3 thin films were studied. PEC characteristics of the sensitized films were found to be 120 fold increase (8.53 mA/cm2) in comparison to that of unmodified WO3 films (0.07 mA/cm2). In the last part of this dissertation, CuWO4 was investigated as the potential photoanode material. The band gap of CuWO4 was estimated using density functional theory (DFT) calculations. The band structure was obtained using the first-principles plane wave self-consistent field (pwscf) method and the effect of nickel dopant on the band gap and optical properties of CuWO4 was evaluated. Theoretical calculations showed that doping led to a decrease in band gap. The validity of the theoretical approach was evaluated by experimentally synthesizing Ni-doped CuWO4 electrodes. Experimental results showed that the band gap indeed decreases when CuWO4 was doped with Ni, and thus validated the DFT approach. Ternary quantum dots were found to increase the PEC activity of TiO2 and WO3 based photoelectrodes by 120 fold. In addition, a method of computing band gap of semiconductor using DFT modeling was developed and validated with experimental results.

Surface Modifications and Growth of Titanium Dioxide for Photo-Electrochemical Water Splitting

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Publisher : Springer
ISBN 13 : 3319342290
Total Pages : 366 pages
Book Rating : 4.3/5 (193 download)

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Book Synopsis Surface Modifications and Growth of Titanium Dioxide for Photo-Electrochemical Water Splitting by : John Alexander

Download or read book Surface Modifications and Growth of Titanium Dioxide for Photo-Electrochemical Water Splitting written by John Alexander and published by Springer. This book was released on 2016-05-21 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: This outstanding thesis provides a wide-ranging overview of the growth of titanium dioxide thin films and its use in photo-electrochemicals such as water splitting. The context for water splitting is introduced with the theory of semiconductor-liquid junctions, which are dealt with in detail. In particular plasmonic enhancement of TiO2 by the addition of gold nanoparticles is considered in depth, including a thorough and critical review of the literature, which discusses the possible mechanisms that may be at work. Plasmonic enhancement is demonstrated with gold nanoparticles on Nb-doped TiO2. Finally, the use of temperature and pressure to control the phase and morphology of thin films grown by pulsed laser deposition is presented.

Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane

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ISBN 13 :
Total Pages : 274 pages
Book Rating : 4.:/5 (651 download)

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Book Synopsis Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane by : Zhongping Jin

Download or read book Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane written by Zhongping Jin and published by . This book was released on 2005 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Photoelectrochemical Water Splitting

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Publisher : Springer Science & Business Media
ISBN 13 : 1461482984
Total Pages : 130 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Photoelectrochemical Water Splitting by : Zhebo Chen

Download or read book Photoelectrochemical Water Splitting written by Zhebo Chen and published by Springer Science & Business Media. This book was released on 2013-08-28 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book outlines many of the techniques involved in materials development and characterization for photoelectrochemical (PEC) – for example, proper metrics for describing material performance, how to assemble testing cells and prepare materials for assessment of their properties, and how to perform the experimental measurements needed to achieve reliable results towards better scientific understanding. For each technique, proper procedure, benefits, limitations, and data interpretation are discussed. Consolidating this information in a short, accessible, and easy to read reference guide will allow researchers to more rapidly immerse themselves into PEC research and also better compare their results against those of other researchers to better advance materials development. This book serves as a “how-to” guide for researchers engaged in or interested in engaging in the field of photoelectrochemical (PEC) water splitting. PEC water splitting is a rapidly growing field of research in which the goal is to develop materials which can absorb the energy from sunlight to drive electrochemical hydrogen production from the splitting of water. The substantial complexity in the scientific understanding and experimental protocols needed to sufficiently pursue accurate and reliable materials development means that a large need exists to consolidate and standardize the most common methods utilized by researchers in this field.

Plasma Enhanced Chemical Vapor Deposition of Titanium Oxide Thin Films for Dielectric Applicaitons

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ISBN 13 :
Total Pages : 298 pages
Book Rating : 4.:/5 (811 download)

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Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Titanium Oxide Thin Films for Dielectric Applicaitons by : Wenli Yang

Download or read book Plasma Enhanced Chemical Vapor Deposition of Titanium Oxide Thin Films for Dielectric Applicaitons written by Wenli Yang and published by . This book was released on 2006 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride

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ISBN 13 :
Total Pages : 118 pages
Book Rating : 4.:/5 (827 download)

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Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride by : William H. Ritchie

Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Silicon Nitride written by William H. Ritchie and published by . This book was released on 1986 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma Enhanced Chemical Vapor Deposition of Silicon Oxycarbide Thin Films

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ISBN 13 :
Total Pages : 230 pages
Book Rating : 4.:/5 (36 download)

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Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Silicon Oxycarbide Thin Films by : Gina Marie Buccellato

Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Oxycarbide Thin Films written by Gina Marie Buccellato and published by . This book was released on 1992 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma-enhanced Chemical Vapor Deposition of Silicon Dioxide

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Publisher :
ISBN 13 : 9789036531306
Total Pages : 186 pages
Book Rating : 4.5/5 (313 download)

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Book Synopsis Plasma-enhanced Chemical Vapor Deposition of Silicon Dioxide by : Arjen Boogaard

Download or read book Plasma-enhanced Chemical Vapor Deposition of Silicon Dioxide written by Arjen Boogaard and published by . This book was released on 2011 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma Enhanced Chemical Vapor Deposition of Silicon Epitaxial Layers

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ISBN 13 :
Total Pages : 13 pages
Book Rating : 4.:/5 (224 download)

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Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Silicon Epitaxial Layers by : Rafael Reif

Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Epitaxial Layers written by Rafael Reif and published by . This book was released on 1984 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films

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ISBN 13 :
Total Pages : 8 pages
Book Rating : 4.:/5 (125 download)

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Book Synopsis Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films by : DW. Hess

Download or read book Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films written by DW. Hess and published by . This book was released on 1983 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (

Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films with Nanocrystalline Inclusions

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ISBN 13 :
Total Pages : 138 pages
Book Rating : 4.:/5 (626 download)

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Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films with Nanocrystalline Inclusions by : Siri Suzanne Thompson

Download or read book Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Thin Films with Nanocrystalline Inclusions written by Siri Suzanne Thompson and published by . This book was released on 2003 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Investigations of Surface Interactions and Deposition Mechanisms in Plasma Enhanced Chemical Vapor Deposition of Silicon-based Materials

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ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (437 download)

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Book Synopsis Investigations of Surface Interactions and Deposition Mechanisms in Plasma Enhanced Chemical Vapor Deposition of Silicon-based Materials by : Patrick R. McCurdy

Download or read book Investigations of Surface Interactions and Deposition Mechanisms in Plasma Enhanced Chemical Vapor Deposition of Silicon-based Materials written by Patrick R. McCurdy and published by . This book was released on 1999 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source

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ISBN 13 :
Total Pages : 108 pages
Book Rating : 4.:/5 (248 download)

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Book Synopsis Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source by : Giridhar Nallapati

Download or read book Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride and Oxynitride Films Using Disilane as Silicon Source written by Giridhar Nallapati and published by . This book was released on 1999 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Low Temperature Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Microcrystalline Silicon on Organic and Inorganic Substrates

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ISBN 13 :
Total Pages : 222 pages
Book Rating : 4.:/5 (414 download)

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Book Synopsis Low Temperature Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Microcrystalline Silicon on Organic and Inorganic Substrates by : Christopher G. Makosiej

Download or read book Low Temperature Plasma Enhanced Chemical Vapor Deposition of Silicon Oxide and Microcrystalline Silicon on Organic and Inorganic Substrates written by Christopher G. Makosiej and published by . This book was released on 1999 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt: