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Metal Organic Chemical Vapor Deposition Of Cerium Oxide Gallium Indium Oxide And Magnesium Oxide Thin Films
Download Metal Organic Chemical Vapor Deposition Of Cerium Oxide Gallium Indium Oxide And Magnesium Oxide Thin Films full books in PDF, epub, and Kindle. Read online Metal Organic Chemical Vapor Deposition Of Cerium Oxide Gallium Indium Oxide And Magnesium Oxide Thin Films ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Metal-organic Chemical Vapor Deposition of Cerium Oxide, Gallium-indium-oxide, and Magnesium Oxide Thin Films by : Nikki Lynn Edleman
Download or read book Metal-organic Chemical Vapor Deposition of Cerium Oxide, Gallium-indium-oxide, and Magnesium Oxide Thin Films written by Nikki Lynn Edleman and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The synthesis and characterization of a new magnesium MOCVD precursor, Mg(dpm)2(TMEDA) is detailed. It is shown that the donating ligand TMEDA prevents oligomerization and subsequent volatility depression as observed in the commonly used [Mg(dpm)2]2. The superiority of Mg(dpm)2(TMEDA) as an MOCVD precursor is explicitly demonstrated by growth of epitaxial MgO thin films on single-crystal SrTiO3 substrates.
Book Synopsis Metal-organic Chemical Vapor Deposition of Indium Oxide Based Transparent Conducting Oxide Thin Films by : Jun Ni
Download or read book Metal-organic Chemical Vapor Deposition of Indium Oxide Based Transparent Conducting Oxide Thin Films written by Jun Ni and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Four novel diamine adducts of bis(hexafluoroacetylacetonato)zinc [Zn(hfa)2·(diamine)] can be synthesized in a single step reaction. Single crystal x-ray diffraction studies reveal monomeric, six-coordinate structures. The thermal stabilities and vapor phase transport properties of these complexes are considerably greater than those of conventional solid/liquid zinc metal-organic chemical vapor deposition (MOCVD) precursors. Of the four complexes, bis(1,1,1,5,5,5-hexafluoro-2,4-pentadionato)(N,N '-diethylethylenediamine)zinc [Zn(hfa)2 ( N,N'-DEA)], is particularly effective in the growth of thin films of the transparent conducting oxide Zn- and Sn-doped In2O3 (ZITO) due to its superior volatility and low melting point of 64°C.
Book Synopsis Metal Organic Chemical Vapor Deposition of Indium Oxide for Ozone Sensing by : Chunyu Wang
Download or read book Metal Organic Chemical Vapor Deposition of Indium Oxide for Ozone Sensing written by Chunyu Wang and published by . This book was released on 2010 with total page 153 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2002 with total page 712 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 892 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metal Organic Chemical Vapor Deposition of Oxide Films for Advanced Applications by :
Download or read book Metal Organic Chemical Vapor Deposition of Oxide Films for Advanced Applications written by and published by . This book was released on 2000 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Transparent and conductive films, well known for their historical roles in solar cells and displays, are receiving renewed attention due to the need for increased performance requirements and for advanced applications that are being developed. While there are many methods to deposit thin films, Metal Organic Chemical Vapor Deposition (MOCVD) is of particular importance for producing high quality films over large areas in a manufacturing mode. Important features of MOCVD include excellent conformality of deposited films, elimination of pinhole type defects, the absence of radiation process induced damage, and low particle counts. Over the past several years, we have devoted our efforts to developing and advancing the MOCVD process and systems technology, primarily using Rotating Disk Reactors (RDRs), and advancing the breadth of deposited oxide materials for several applications. The deposition technology, which will be reviewed, has been scaled from a 5 deposition diameter through to 12 diameter. We have found that MOCVD has been able to produce a wide range of oxide materials under a variety of processing conditions and that the technology is readily scalable. Systems technology, processing parameters and results for MOCVD of transparent (visible and IR) and conductive oxides will be reviewed. Advanced materials development and applications such as production of luminescent or p-type ZnO and related oxides, development of amorphous, polycrystalline and single crystal films and applicability in photovoltaics, LEDs or lasers, detectors, and others will also be addressed.
Book Synopsis The Deposition of Chromium Oxide Thin Films by Metallo-organic Chemical Vapor Deposition by : Sanghamitra Baral
Download or read book The Deposition of Chromium Oxide Thin Films by Metallo-organic Chemical Vapor Deposition written by Sanghamitra Baral and published by . This book was released on 1990 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Epitaxial Oxide Thin Films Grown by Solid Source Metal-organic Chemical Vapor Deposition by : Zihong Lu
Download or read book Epitaxial Oxide Thin Films Grown by Solid Source Metal-organic Chemical Vapor Deposition written by Zihong Lu and published by . This book was released on 1995 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis On the Synthesis and Chemical Vapour Deposition of Group 13 Precursors Towards Metal Oxide Thin Films by : L. G. Bloor
Download or read book On the Synthesis and Chemical Vapour Deposition of Group 13 Precursors Towards Metal Oxide Thin Films written by L. G. Bloor and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Various routes towards novel chlorogallium bis(alkoxides) and heteroleptic gallium alkoxides have been investigated. Compounds of the type, [GaCl(OR2)2] and [Ga(OR2)2(OR')] (R = CH2CH2NMe2, CH2CH2NEt2, CH2CH2CH2NMe2; R' = Me, Et, iPr, tBu), were synthesised using air sensitive methods and analysed by a variety of techniques. The chlorogallium bis(alkoxides) showed diastereotopic NMR splitting and in depth 1H NMR studies and DFT calculations were carried out on [GaCl(OCH2CH2CH2NMe2)2] to investigate the in situ ring conversion mechanism. Thermogravimetric analysis was employed to study the decomposition characteristics of the compounds, which were then used as single-source precursors towards gallium oxide thin films using aerosol-assisted chemical vapour deposition (AACVD). Amorphous, transparent films of Ga2O3 were deposited at 450 °C onto glass and quartz substrates. Subsequent annealing at 1000 °C gave crystalline films. Nitrogen-doped indium oxide films were deposited by AACVD via the in situ reaction of [In{NtBu(SiMe3)}3] and three equivalents of HOCH2CH2NMe2. The resultant films had a range of morphologies depending on solvent and temperature employed during the deposition. The cubic phase In2O3 films deposited had band gaps of ~2.9 eV suggesting nitrogen incorporation. These films were tested on steel and titanium substrates for their visible light water-splitting properties. Films were tested for their hydrogen production but limited activity as a photocatalyst was observed in the visible region. However, In2O3 nanoparticles produced using a solvothermal method and Ti- and Ta-doped In2O3 thin films grown via AACVD were tested for their gas sensing properties. Sensors were tested against reducing oxidising gases. The In2O3 nanoparticles showed the highest response to all gases, in particular ethanol. In2O3:Ta also showed a significant response to ethanol and smaller responses to other gases. Overall, novel precursors have been used as single-source precursors to main group oxide thin films, which were deposited via AACVD. Photocatalytic and gas sensing applications of these films have been explored.
Book Synopsis Thin Film Metal-Oxides by : Shriram Ramanathan
Download or read book Thin Film Metal-Oxides written by Shriram Ramanathan and published by Springer Science & Business Media. This book was released on 2009-12-03 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
Book Synopsis Metalorganic Vapor Phase Epitaxy (MOVPE) by : Stuart Irvine
Download or read book Metalorganic Vapor Phase Epitaxy (MOVPE) written by Stuart Irvine and published by John Wiley & Sons. This book was released on 2019-09-04 with total page 907 pages. Available in PDF, EPUB and Kindle. Book excerpt: Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).
Book Synopsis Precursors for Metal Organic Chemical Vapor Deposition (MOCVD) of ZrO_1tn2 and HfO_1tn2 Thin Films as Gate Dielectrics in Complementary Metal Oxide Semiconductor (CMOS) Devices by :
Download or read book Precursors for Metal Organic Chemical Vapor Deposition (MOCVD) of ZrO_1tn2 and HfO_1tn2 Thin Films as Gate Dielectrics in Complementary Metal Oxide Semiconductor (CMOS) Devices written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metal-organic Chemical Vapor Deposition of Electronic Ceramics by :
Download or read book Metal-organic Chemical Vapor Deposition of Electronic Ceramics written by and published by . This book was released on 1996 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition (CVD) of Transition Metal and Metal Oxide Thin Films by :
Download or read book Chemical Vapor Deposition (CVD) of Transition Metal and Metal Oxide Thin Films written by and published by . This book was released on 1999 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Incorporation of Indium Into Ε-gallium Oxide Epitaxial Thin Films Grown Via Mist Chemical Vapour Deposition for Bandgap Engineering by :
Download or read book Incorporation of Indium Into Ε-gallium Oxide Epitaxial Thin Films Grown Via Mist Chemical Vapour Deposition for Bandgap Engineering written by and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II: Volume 415 by : Seshu B. Desu
Download or read book Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II: Volume 415 written by Seshu B. Desu and published by . This book was released on 1996-02-28 with total page 290 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of high-performance ceramic materials in microelectronics holds the potential for the development of a wide range of novel, high-value products. For example, ferroelectric ceramic capacitors are key to the development of high-density ferroelectric nonvolatile memory (FRAM). High-dielectric constant para-electric capacitors are potentially useful for the production of high-density dynamic random access memory (DRAM) and for decoupling capacitors in high-speed microprocessors. Electro-optic materials are useful as waveguides, tunable filters and switches in advance communication applications. Researchers come together in this book to discuss both the application of metal-organic chemical vapor deposited (MOCVD) materials to microelectronics and the 'nuts and bolts' of the technique. A wide variety of opto-electronic, superconducting, ferroelectric and other advanced ceramic materials are discussed. Problems of dealing with low-volatility precursors, design of new precursors, and characterization of CVD processes are addressed. Topics include: nonoxide ceramics; precursor chemistry and delivery; process analysis and characterization; and oxide ceramics.
Book Synopsis Oxide Ultrathin Films by : Gianfranco Pacchioni
Download or read book Oxide Ultrathin Films written by Gianfranco Pacchioni and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt: A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: Synthesis and Preparation of Oxide Ultrathin Films Characterization Tools of Oxide Ultrathin Films Ordered Oxide Nanostructures on Metal Surfaces Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit Silica and High-K Dielectrics Thin Films in Microelectronics Oxide Passive Films and Corrosion Protection Oxide Films as Catalytic Materials and as Models of Real Catalysts Oxide Films in Spintronics Oxide Ultrathin Films in Solid Oxide Fuel Cells Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials Oxide Ultrathin Films in Sensor Applications Ferroelectricity in Ultrathin Film Capacitors Titania Thin Films in Biocompatible Materials and Medical Implants Oxide Nanowires for New Chemical Sensor Devices
