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Low Pressure Chemical Vapor Deposition Of Silicon Dioxide Below 500c By The Pyrolysis Of Diethylsilane In Oxygen
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Book Synopsis Low Pressure Chemical Vapor Deposition of Silicon Dioxide Below 500C̊ by the Pyrolysis of Diethylsilane in Oxygen by : James Douglas Patterson
Download or read book Low Pressure Chemical Vapor Deposition of Silicon Dioxide Below 500C̊ by the Pyrolysis of Diethylsilane in Oxygen written by James Douglas Patterson and published by . This book was released on 1990 with total page 68 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition by : Theodore M. Besmann
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Dioxide Deposition at 100 C Using Vacuum Ultraviolet Light by : J. Marks
Download or read book Silicon Dioxide Deposition at 100 C Using Vacuum Ultraviolet Light written by J. Marks and published by . This book was released on 1988 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films of silicon dioxide are used extensively as insulators in the fabrication of many semiconductor devices. Silicon dioxide films deposited by chemical vapor deposition typically require temperatures near 800 C. However, some processes, such as the fabrication of devices with multilevel aluminum interconnects, require deposition temperatures below 350 C. Several techniques that have been developed for low-temperature deposition of silicon dioxide include plasma-assisted deposition, low-pressure chemical vapor deposition, and photo-assisted chemical vapor deposition. Some photochemical deposition reaction use Hg vapor as a photochemical catalyst to decompose nitrous oxide in the pressure of silane. Films deposited with these reactions have been found to have adhesion problems, and tend to be in completely oxidized. Several other deposition reactions using photodissociation of molecular oxygen or disilane have been reported. (jes).
Book Synopsis Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen by : Sung-Jun Lee
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen written by Sung-Jun Lee and published by . This book was released on 1996 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition of Silicon Dioxide and Phosphosilicate Glass Thin Films by : Vijayalakshmi Venkatesan
Download or read book Low Pressure Chemical Vapor Deposition of Silicon Dioxide and Phosphosilicate Glass Thin Films written by Vijayalakshmi Venkatesan and published by . This book was released on 1996 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition of Silicon Dioxide from Tetraethylorthosilicate by : Frank Allen Shemansky
Download or read book Low Pressure Chemical Vapor Deposition of Silicon Dioxide from Tetraethylorthosilicate written by Frank Allen Shemansky and published by . This book was released on 1991 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :Electrochemical Society. High Temperature Materials Division Publisher :The Electrochemical Society ISBN 13 :9781566771788 Total Pages :1686 pages Book Rating :4.7/5 (717 download)
Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Dioxide at High Temperatures by : Ara Philipossian
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Dioxide at High Temperatures written by Ara Philipossian and published by . This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : John Milton Blocher
Download or read book Chemical Vapor Deposition written by John Milton Blocher and published by . This book was released on 1970 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition by : Sutham Niyomwas
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition written by Sutham Niyomwas and published by . This book was released on 1997 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII by : Ram Ekwal Sah
Download or read book Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII written by Ram Ekwal Sah and published by The Electrochemical Society. This book was released on 2005 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films by :
Download or read book Low Temperature Atmospheric Pressure Chemical Vapor Deposition of Group 14 Oxide Films written by and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Depositions of high quality SiO[sub 2] and SnO[sub 2] films from the reaction of homoleptic amido precursors M(NMe[sub 2])4 (M = Si, Sn) and oxygen were carried out in an atmospheric pressure chemical vapor deposition r. The films were deposited on silicon, glass and quartz substrates at temperatures of 250 to 450C. The silicon dioxide films are stoichiometric (O/Si = 2.0) with less than 0.2 atom % C and 0.3 atom % N and have hydrogen contents of 9 [plus-minus] 5 atom %. They are deposited with growth rates from 380 to 900 [angstrom]/min. The refractive indexes of the SiO[sub 2] films are 1.46, and infrared spectra show a possible Si-OH peak at 950 cm[sup [minus]1]. X-Ray diffraction studies reveal that the SiO[sub 2] film deposited at 350C is amorphous. The tin oxide films are stoichiometric (O/Sn = 2.0) and contain less than 0.8 atom % carbon, and 0.3 atom % N. No hydrogen was detected by elastic recoil spectroscopy. The band gap for the SnO[sub 2] films, as estimated from transmission spectra, is 3.9 eV. The resistivities of the tin oxide films are in the range 10[sup [minus]2] to 10[sup [minus]3] [Omega]cm and do not vary significantly with deposition temperature. The tin oxide film deposited at 350C is cassitterite with some (101) orientation.
Book Synopsis Silicon Nitride and Silicon Dioxide Thin Insulating Films by :
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by and published by . This book was released on 2001 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition by : Yangchin Shih
Download or read book Silicon Selective Epitaxial Growth by Low Pressure Chemical Vapor Deposition written by Yangchin Shih and published by . This book was released on 1994 with total page 394 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electrical evaluation of the process dependence of polysilicon and silicon dioxide films deposited in the low pressure chemical vapor deposition process by : Bikas Maiti
Download or read book Electrical evaluation of the process dependence of polysilicon and silicon dioxide films deposited in the low pressure chemical vapor deposition process written by Bikas Maiti and published by . This book was released on 1990 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition of Polysilicon by :
Download or read book Low Pressure Chemical Vapor Deposition of Polysilicon written by and published by . This book was released on 1977 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The low pressure chemical vapor deposition of polycrystalline silicon was studied to define the controlling process parameters and the requirements for commercial implementation. Silane and silane-nitrogen mixtures were utilized as source gases in a tubular reactor containing parallel disk substrates oriented with surface normals in the direction of flow. The results of the study showed that the deposition reaction is surface kinetic reaction controlled over the range of temperature studied, 600 to 700°C, that the reaction is first order with respect to silane, and with an activation energy of 1.33 x 105 J/g mole. A gradient in temperature along the reactor tube is sufficient to compensate for reactant depletion and to produce a uniform deposition rate.
Book Synopsis Low Pressure Chemical Vapor Deposition of Silicon Nitride Films from Tridimethylaminosilane by : Xin Lin
Download or read book Low Pressure Chemical Vapor Deposition of Silicon Nitride Films from Tridimethylaminosilane written by Xin Lin and published by . This book was released on 1995 with total page 242 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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