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Author : N. W. Cheung
Publisher :
ISBN 13 :
Total Pages : 393 pages
Book Rating : 4.:/5 (476 download)
Download or read book Ion Beam Processing of Advanced Electronic Materials written by N. W. Cheung and published by . This book was released on 1989 with total page 393 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : N. W. Cheung
Publisher : Mrs Proceedings
ISBN 13 :
Total Pages : 434 pages
Book Rating : 4.3/5 (91 download)
Download or read book Ion Beam Processing of Advanced Electronic Materials: Volume 147 written by N. W. Cheung and published by Mrs Proceedings. This book was released on 1989 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Papers presented at the Symposium on Ion Beam Processing of Advanced Electronic Materials.
Author :
Publisher :
ISBN 13 :
Total Pages : 1044 pages
Book Rating : 4.3/5 (129 download)
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Research Council (U.S.). Panel on Materials Science
Publisher :
ISBN 13 :
Total Pages : 60 pages
Book Rating : 4.:/5 (41 download)
Download or read book Advanced Processing of Electronic Materials in the United States and Japan written by National Research Council (U.S.). Panel on Materials Science and published by . This book was released on 1986 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 892 pages
Book Rating : 4.:/5 (31 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 892 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Richard B. Fair
Publisher : Academic Press
ISBN 13 : 0323139809
Total Pages : 441 pages
Book Rating : 4.3/5 (231 download)
Download or read book Rapid Thermal Processing written by Richard B. Fair and published by Academic Press. This book was released on 2012-12-02 with total page 441 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Author : Badih El-Kareh
Publisher : Springer Science & Business Media
ISBN 13 : 1461522099
Total Pages : 605 pages
Book Rating : 4.4/5 (615 download)
Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Author : Steven C. Moss
Publisher : Cambridge University Press
ISBN 13 : 9781107412361
Total Pages : 510 pages
Book Rating : 4.4/5 (123 download)
Download or read book Ion Beam Synthesis and Processing of Advanced Materials: written by Steven C. Moss and published by Cambridge University Press. This book was released on 2014-06-05 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: The nonequilibrium processes associated with ion-solid interactions offer a great potential to synthesize and modify advanced materials. Recent progress in ion beam synthesis and processing has allowed the development of advanced materials with properties designed and tailored specifically for their applications. The design and interpretation of experimental work is supported by modeling and predictive simulations, both from the atomistic and the nonequilibrium thermodynamics viewpoints. This book focuses on those properties of advanced materials that are uniquely suited to modification and improvement by ion beans, eg, electrical, optical, magnetic and structural properties, surface hardness, and nanofabrication. Topics include: fundamentals and defect kinetics; materials with novel electrical, optical and magnetic properties; ion-beam-induced slicing and focused ion beam applications; metastable phases, plastic flow and patterning of surfaces; surface modification (hardness and texture); ion beam synthesis of nanostructures and thin layers; ion-solid interactions for optoelectronics/photonics and microelectronic materials and semiconductor and electronic materials.
Author : P. Misaelides
Publisher : Springer Science & Business Media
ISBN 13 : 9401584591
Total Pages : 668 pages
Book Rating : 4.4/5 (15 download)
Download or read book Application of Particle and Laser Beams in Materials Technology written by P. Misaelides and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 668 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their qUality. This volume includes most of the lectures and contributions delivered at the NATO-funded Advanced Study Institute "Application of Particle and Laser Beams in Materials Technology", which was held in Kallithea, Chalkidiki, in Northern Greece, from the 8th to the 21st of May, 1994 and attended by 73 participants from 21 countries. The aim of this ASI was to provide to the participants an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale were presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection.
Author :
Publisher :
ISBN 13 :
Total Pages : 848 pages
Book Rating : 4.:/5 (31 download)
Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1989 with total page 848 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : G. R. Srinivasan
Publisher :
ISBN 13 :
Total Pages : 826 pages
Book Rating : 4.:/5 (31 download)
Download or read book Proceedings of the Second International Symposium on Process Physics and Modeling in Semiconductor Technology written by G. R. Srinivasan and published by . This book was released on 1991 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Isao Yamada
Publisher : CRC Press
ISBN 13 : 1498711766
Total Pages : 260 pages
Book Rating : 4.4/5 (987 download)
Download or read book Materials Processing by Cluster Ion Beams written by Isao Yamada and published by CRC Press. This book was released on 2015-08-20 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
Author : Sorab K. Ghandhi
Publisher : John Wiley & Sons
ISBN 13 : 0471580058
Total Pages : 870 pages
Book Rating : 4.4/5 (715 download)
Download or read book VLSI Fabrication Principles written by Sorab K. Ghandhi and published by John Wiley & Sons. This book was released on 1994-03-31 with total page 870 pages. Available in PDF, EPUB and Kindle. Book excerpt: Fully updated with the latest technologies, this edition covers thefundamental principles underlying fabrication processes forsemiconductor devices along with integrated circuits made fromsilicon and gallium arsenide. Stresses fabrication criteria forsuch circuits as CMOS, bipolar, MOS, FET, etc. These diversetechnologies are introduced separately and then consolidated intocomplete circuits. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment.
Author : Shiban Tiku
Publisher : CRC Press
ISBN 13 : 9814669318
Total Pages : 550 pages
Book Rating : 4.8/5 (146 download)
Download or read book III-V Integrated Circuit Fabrication Technology written by Shiban Tiku and published by CRC Press. This book was released on 2016-04-27 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt: GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III–V processing, with emphasis on HBTs. It is aimed at practicing engineers and graduate students and engineers new to the field of III–V semiconductor IC processing. The book’s primary purpose is to discuss all aspects of processing of active and passive devices, from crystal growth to backside processing, including lithography, etching, and film deposition.
Author : Ralph Müller
Publisher : BoD – Books on Demand
ISBN 13 : 3839610745
Total Pages : 248 pages
Book Rating : 4.8/5 (396 download)
Download or read book Ion Implantation for High-Efficiency Silicon Solar Cells. written by Ralph Müller and published by BoD – Books on Demand. This book was released on 2017-01-12 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: The profitability of the whole photovoltaic system can be effectively increased by the use of advanced silicon solar cells with a higher conversion efficiency potential and new technologies are needed to keep the fabrication effort low. Ion implantation allows for single side and even patterned doping of silicon wafers, so this technique could help to simplify the process chain of complex high-efficiency silicon solar cells. In this thesis, the suitability of ion implantation for the fabrication of modern solar cells was investigated. The implantation of mass-separated boron or phosphorus ions and subsequent furnace annealing was used to study the charge carrier recombination due to implantation defects and obtain doping profiles for an evaluation at the device level. Furthermore, novel process sequences combining ion implantation and furnace diffusion for the simplified doping of back-junction back-contact cells were developed and evaluated with respect to the influence of a reverse breakdown and a weak front-side doping on the solar cell performance.
Author :
Publisher : Academic Press
ISBN 13 : 9780080864426
Total Pages : 300 pages
Book Rating : 4.8/5 (644 download)
Download or read book Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physiochemical Characterization written by and published by Academic Press. This book was released on 1997-05-23 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer afterhigh temperature annealing. Electrical and Physicochemical Characterization focuses on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented. Provides basic knowledge of ion implantation-induced defects Focuses on physical mechanisms of defect annealing Utilizes electrical and physico-chemical characterization tools for processed semiconductors Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination
Author :
Publisher :
ISBN 13 :
Total Pages : 228 pages
Book Rating : 4.M/5 ( download)
Download or read book Advanced Materials and Processing written by and published by . This book was released on 1992 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt:
