In Situ Electron and Tunneling Microscopy of Dynamic Processes: Volume 404

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ISBN 13 :
Total Pages : 250 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis In Situ Electron and Tunneling Microscopy of Dynamic Processes: Volume 404 by : Renu Sharma

Download or read book In Situ Electron and Tunneling Microscopy of Dynamic Processes: Volume 404 written by Renu Sharma and published by . This book was released on 1996-08-26 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron microscopy techniques are among the most powerful methods for characterization of materials, with the ability to reveal both the atomic-scale structure and composition. This information may be used to elucidate macroscopic properties or to optimize materials synthesis and processing. Instrumentation and techniques for dynamic in situ experiments are undergoing rapid development and have recently been applied to a wide range of problems. This book focuses on time-resolved electron microscopy (including diffraction and spectroscopy), as well as novel instrumentation for temperature and pressure control. In addition to discussing the application of electron microscopy techniques to the in situ study of the kinetics, thermodynamics and mechanisms of reaction, the book also explores their utility as efficient methods of optimizing processing conditions. Imaging techniques featured include: scanning tunneling microscopy, high-resolution electron microscopy, dark field transmission and reflection electron microscopy, Lorentz microscopy, electron holography, scanning and low-energy electron microscopy and photoemission electron microscopy

In-Situ Microscopy in Materials Research

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Publisher : Springer Science & Business Media
ISBN 13 : 1461562155
Total Pages : 345 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis In-Situ Microscopy in Materials Research by : Pratibha L. Gai

Download or read book In-Situ Microscopy in Materials Research written by Pratibha L. Gai and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 345 pages. Available in PDF, EPUB and Kindle. Book excerpt: 2. High Temperature UHV-STM System 264 3. Hydrogen Desorption Process on Si (111) Surface 264 4. (7x7) - (1 xl) Phase Transition on Si (111) Surface 271 Step Shifting under dc Electric Fields 275 5. 6. Conclusions 280 Acknowledgements and References 281 12. DYNAMIC OBSERVATION OF VORTICES IN SUPERCONDUCTORS USING ELECTRON WAVES 283 by Akira Tonomura 1. Introduction 283 2. Experimental Method 284 2. 1 Interference Microscopy 284 2. 2 Lorentz Microscopy 287 Observation of Superconducting Vortices 288 3. 3. 1 Superconducting Vortices Observed by Interference Microscopy 288 3. 1. 1 Profile Mode 288 3. 1. 2 Transmission Mode 291 3. 2 Superconducting Vortices Observed by Lorentz Microscopy 293 3. 3 Observation of Vortex Interaction with Pinning Centers 294 3. 3. 1 Surface Steps 295 3. 3. 2 Irradiated Point Defects 296 4. Conclusion 298 References 299 13. TEM STUDIES OF SOME STRUCTURALLY FLEXIBLE SOLIDS AND THEIR ASSOCIATED PHASE TRANSFORMATIONS 301 by Ray L. Withers and John G. Thompson 1. Introduction 301 2. Tetrahedrally Comer-Connected Framework Structures 302 3. Tetragonal a-PbO 311 4. Compositionally Flexible Anion-Deficient Fluorites and the "Defect Fluorite" to C-type Sesquioxide Transition 320 5. Summary and Conclusions 327 Acknowledgements and References 327 Author Index 331 Subject Index 333 List of Contributors A. ASEEV Institute of Semiconductor Physics, Russian Academy of Sciences Novosibirsk, 630090, pr. ac. , Lavrentjeva 13, RUSSIA E. BAUER Department of Physics and Astronomy, Arizona State University Tempe, AZ 85287-1504, U. S. A. G. H.

In situ electron and tunneling microscopy of dynamic processes : symposium held November 27-30, 1995, Boston, Massachusetts

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ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (96 download)

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Book Synopsis In situ electron and tunneling microscopy of dynamic processes : symposium held November 27-30, 1995, Boston, Massachusetts by : Renu Sharma

Download or read book In situ electron and tunneling microscopy of dynamic processes : symposium held November 27-30, 1995, Boston, Massachusetts written by Renu Sharma and published by . This book was released on 1996 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Transmission Electron Microscopy

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Publisher : Springer
ISBN 13 : 3319266519
Total Pages : 543 pages
Book Rating : 4.3/5 (192 download)

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Book Synopsis Transmission Electron Microscopy by : C. Barry Carter

Download or read book Transmission Electron Microscopy written by C. Barry Carter and published by Springer. This book was released on 2016-08-24 with total page 543 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text is a companion volume to Transmission Electron Microscopy: A Textbook for Materials Science by Williams and Carter. The aim is to extend the discussion of certain topics that are either rapidly changing at this time or that would benefit from more detailed discussion than space allowed in the primary text. World-renowned researchers have contributed chapters in their area of expertise, and the editors have carefully prepared these chapters to provide a uniform tone and treatment for this exciting material. The book features an unparalleled collection of color figures showcasing the quality and variety of chemical data that can be obtained from today’s instruments, as well as key pitfalls to avoid. As with the previous TEM text, each chapter contains two sets of questions, one for self assessment and a second more suitable for homework assignments. Throughout the book, the style follows that of Williams & Carter even when the subject matter becomes challenging—the aim is always to make the topic understandable by first-year graduate students and others who are working in the field of Materials Science Topics covered include sources, in-situ experiments, electron diffraction, Digital Micrograph, waves and holography, focal-series reconstruction and direct methods, STEM and tomography, energy-filtered TEM (EFTEM) imaging, and spectrum imaging. The range and depth of material makes this companion volume essential reading for the budding microscopist and a key reference for practicing researchers using these and related techniques.

Metastable Phases and Microstructures: Volume 400

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ISBN 13 :
Total Pages : 392 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Metastable Phases and Microstructures: Volume 400 by : Rüdiger Bormann

Download or read book Metastable Phases and Microstructures: Volume 400 written by Rüdiger Bormann and published by . This book was released on 1996-07-25 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials with metastable structures and microstructures have been used with success to create unusual structural and functional properties and property combinations. Highly nonequilibrium technologies for creating metastable materials have been devised which allow materials to be prepared far away from the thermodynamic equilibrium. Using these methods, materials can now be designed to possess specific properties tailored to fit an application, rather than fitting an application to the properties of available materials. However, as these materials are metastable with respect to structural and compositional changes under temperature, there is great concern for understanding and controlling their limitations. This book features both fundamental as well as applied aspects of the subject by stressing the structure/property relationships, the conditions for stability of these materials, and the requirements for technological applications. In addition to the synthesis, processing, characterization, properties, and applications of such materials, attention is also focused on the modelling of structures, phenomena and processes. Topics include: synthesis and processing; thermodynamic and kinetics; phase transformations and properties and applications.

Optoelectronic Materials: Volume 417

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ISBN 13 :
Total Pages : 450 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Optoelectronic Materials: Volume 417 by : Eric D. Jones

Download or read book Optoelectronic Materials: Volume 417 written by Eric D. Jones and published by . This book was released on 1996-07-02 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: While the effects of spontaneous ordering or composition modulation on the properties of semiconductors and optoelectronic devices have been studied with great interest over the past several years, an understanding of the physics and chemistry of these two related phenomena is still in its infancy. This book brings together researchers from around the world to address issues concerning the physics, chemistry and growth parameters for spontaneous ordering and composition modulation. Developments in the use of artificial patterning to obtain new structured materials on a microscopic scale are featured. Advances in characterization techniques are also presented. Topics include: spontaneous ordering; self-assembled structures and quantum dots; self-organized epitaxial structures; composition modulation studies and optoelectronic materials.

Diagnostic Techniques for Semiconductor Materials Processing: Volume 406

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ISBN 13 :
Total Pages : 616 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Diagnostic Techniques for Semiconductor Materials Processing: Volume 406 by : Stella W. Pang

Download or read book Diagnostic Techniques for Semiconductor Materials Processing: Volume 406 written by Stella W. Pang and published by . This book was released on 1996-03-18 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of Si- and compound semiconductor-based devices involves a number of steps ranging from material growth to pattern definition by lithography, and ultimately, pattern transfer by etching/deposition. The key to device manufacturing, however, is reproducibility, low cost and high yield. Diagnostic techniques allow correlation between processing and actual device performance to be established. Researchers from universities, industry and government come together in this book to examine the advances in diagnostic techniques that provide critical information on structural, optical and electrical properties of semiconductor devices, as well as monitoring techniques for equipment/processes for control and feedback. The overriding goal is for rapid, accurate materials characterization, both in situ and ex situ. Topics include: in situ diagnostics; proximal probe microscopies; optical probes of devices and device properties; spectroscopic ellipsometry/structural diagnostics; and material analysis - X-ray techniques, strain measurements and passivation.

Applications of Synchrotron Radiation to III: Volume 437

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ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Applications of Synchrotron Radiation to III: Volume 437 by : Louis J. Terminello

Download or read book Applications of Synchrotron Radiation to III: Volume 437 written by Louis J. Terminello and published by . This book was released on 1996-12-03 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt: As third-generation synchrotron facilities are constructed and go online in both the United States and around the world, increasingly more applications of synchrotron radiation will be realized. Both basic and applied research possibilities are manyfold, and include studies of solid surfaces and interfaces, electronic materials, metal oxides, glasses, thin films, superconductors, polymers, alloys, multilayer metal systems and intermetallic compounds. In addition, the combination of synchrotron-based spectroscopic techniques, with ever increasing high-resolution microscopy, allows researchers to study very small domains of materials in an attempt to understand their chemical and electronic properties. This book from MRS focuses on the various types of information that can be obtained from synchrotron-related techniques in order to expand the use of this unique and powerful experimental approach to materials research. Topics include: structure of reduced dimensional materials; magnetic materials; microscopy, topography and tomography; X-ray probes of solids; and materials characterization with X-ray absorption.

Compound Semiconductor Electronics and Photonics: Volume 421

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ISBN 13 :
Total Pages : 480 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Compound Semiconductor Electronics and Photonics: Volume 421 by : R. J. Shul

Download or read book Compound Semiconductor Electronics and Photonics: Volume 421 written by R. J. Shul and published by . This book was released on 1996-10-14 with total page 480 pages. Available in PDF, EPUB and Kindle. Book excerpt: III-V semiconductors have continued to find new applications in optical data transmission, full-color displays, automotive electronics and personal communication systems. Complex epitaxial growth, processing, device design and circuit architecture are all necessary for realization of these elements. This book brings together the diverse group of scientists and researchers that are required to develop the next-generation devices. The wide bandgap nitrides, GaN, AlN, InN and their alloys are featured. The commercial availability of blue- and green-light-emitting diodes based on the InGaN/AlGaN system, and the recent announcement of pulsed operation of a laser diode, have stimulated interest in the growth, characterization and processing of these materials. Potential applications in high-temperature/high-power electronics appear promising because of the good transport properties of these nitrides. Topics include: growth and characterization; photonics and processing; electronics and processing; wide bandgap semiconductors and novel devices and processing.

Amorphous Silicon Technology 1996: Volume 420

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ISBN 13 :
Total Pages : 946 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Amorphous Silicon Technology 1996: Volume 420 by : Michael Hack

Download or read book Amorphous Silicon Technology 1996: Volume 420 written by Michael Hack and published by . This book was released on 1996-12-31 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book from the highly successful series on amorphous-silicon science and devices reflects the increasing range of applications for a-Si technology. Advances in solar cells incorporating microcrystalline silicon absorber layers are discussed, and a new manufacturing facility for amorphous-silicon-based tandem solar cells is highlighted. Progress towards realizing both higher resolution and improved visibility in active-matrix liquid crystal displays is featured. And while work on raising the deposition rate for amorphous-silicon transistors is also outlined, it is expected that advances in devices and manufacturing will be accelerated when several fundamental puzzles regarding amorphous silicon's structure and optoelectronic properties are resolved. Topics include: solar cells; thin-film transistors and flat-panel displays; sensors, detectors and novel devices; device physics; deposition technologies; studies of growth processes; hydrogen and structure a-Si:H; defects and equilibration in a-Si:H; fundamental issues in defect processes; transport and recombination processes; thin films for photovoltaic and related device applications.

Covalent Ceramics III: Volume 410

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ISBN 13 :
Total Pages : 512 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Covalent Ceramics III: Volume 410 by : Aloysius F. Hepp

Download or read book Covalent Ceramics III: Volume 410 written by Aloysius F. Hepp and published by . This book was released on 1996-08-14 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: In years prior, there has been considerable research activity in an exciting class of materials - non-oxide covalent ceramics. These nitrides, carbides, sulfides and related materials have found a wide range of use, from electronics to aerospace/defense, optical sensors and devices, and mechanical/structural applications. In this book, the third in a continuing series, chemists, physicists, ceramists and materials scientists and engineers from around the world come together to share research and highlight recent advances in non-oxide materials. In contrast to its predecessors, the focus of the volume is less on production and fabrication, and more on applications and properties. Topics include: non-oxides for electronics and optoelectronics; preparation of bulk non-oxide ceramics; science of covalent ceramics - bonding, structure and microstructure; fabrication of covalent ceramic thin films; and technology of covalent ceramics - surfaces, composites and processing.

Amorphous Silicon Technology

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ISBN 13 :
Total Pages : 946 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Amorphous Silicon Technology by :

Download or read book Amorphous Silicon Technology written by and published by . This book was released on 1996 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Thermodynamics and Kinetics of Phase Transformations: Volume 398

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ISBN 13 :
Total Pages : 714 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Thermodynamics and Kinetics of Phase Transformations: Volume 398 by : James S. Im

Download or read book Thermodynamics and Kinetics of Phase Transformations: Volume 398 written by James S. Im and published by . This book was released on 1996-09-10 with total page 714 pages. Available in PDF, EPUB and Kindle. Book excerpt: The emphasis of this book is on the quantitative analysis of transformation kinetics, integrated with thermodynamics. Solidification is a success story for quantitative kinetics analysis. The work reported concentrates on phase selection under extreme processing - large undercooling or ultrarapid quenching - of the liquid. Theoretical treatments are concerned mainly with the analysis of morphological instabilities during directional solidification at more conventional rates. The coverage of particle-beam effects is distinguished by the materials studied: alkali halides, minerals, semiconductors and metals. The thermodynamics of interfaces are a particular focus, especially in connection with the solid-state formation of amorphous phases. A highlight of the book is the coverage of the Johnson-Mehl-Avrami-Kolmogorov analysis of overall transformation kinetics. This venerable treatment is revisited and new insights and limitations are explored. Topics include: transformations in undercooled liquids; directional solidification; particle beam-induced transformations; interfaces - thermodynamics and reactions; amorphous materials - structure and transformations; solid-state transformations and ordering and phase separation.

Flat Panel Display Materials II: Volume 424

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ISBN 13 :
Total Pages : 544 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Flat Panel Display Materials II: Volume 424 by : Miltiadis K. Hatalis

Download or read book Flat Panel Display Materials II: Volume 424 written by Miltiadis K. Hatalis and published by . This book was released on 1997-02-12 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The proceedings of a symposium held April 1996, in San Francisco, California. The field is experiencing a rapid growth which currently is expanding from portable computer applications to include display applications for desktop computers and a wide array of consumer and industrial products. Seventy-six contributions are divided into six sections covering amorphous silicon thin-film transistor materials, polycrystalline silicon thin-film transistor materials, liquid crystal display materials, transparent conducting oxides, field emission display materials, and other emissive display materials. Annotation copyrighted by Book News, Inc., Portland, OR

Electrically Based Microstructural Characterization

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ISBN 13 :
Total Pages : 488 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Electrically Based Microstructural Characterization by :

Download or read book Electrically Based Microstructural Characterization written by and published by . This book was released on 1995 with total page 488 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Scientific Basis for Nuclear Waste Management XIX: Volume 412

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Publisher :
ISBN 13 :
Total Pages : 968 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Scientific Basis for Nuclear Waste Management XIX: Volume 412 by : Materials Research Society. Meeting

Download or read book Scientific Basis for Nuclear Waste Management XIX: Volume 412 written by Materials Research Society. Meeting and published by . This book was released on 1996-04-03 with total page 968 pages. Available in PDF, EPUB and Kindle. Book excerpt: Safe and effective management of nuclear waste provides a broad range of challenges for materials science. Waste processing, waste form and engineered barrier properties, interactions between engineered and geological systems, radiation effects, chemistry and transport of waste species, and long-term predictions of repository performance are just some of the scientific problems facing modern society. This book, the nineteenth in a very successful series from MRS, offers an international and interdisciplinary perspective on the issues, and features developments in both fundamental and applied areas. Topics include: excess plutonium dispositioning; spent nuclear fuel; glass waste forms; ceramic and crystalline waste forms; cement waste forms; waste processing; waste container materials; speciation and sorption; bentonite barriers; flow and transport; repository site characterization; natural analogs and performance assessment.

Materials Reliability in Microelectronics VI: Volume 428

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ISBN 13 :
Total Pages : 616 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Materials Reliability in Microelectronics VI: Volume 428 by : William F. Filter

Download or read book Materials Reliability in Microelectronics VI: Volume 428 written by William F. Filter and published by . This book was released on 1996-11-18 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: MRS books on materials reliability in microelectronics have become the snapshot of progress in this field. Reduced feature size, increased speed, and larger area are all factors contributing to the continual performance and functionality improvements in integrated circuit technology. These same factors place demands on the reliability of the individual components that make up the IC. Achieving increased reliability requires an improved understanding of both thin-film and patterned-feature materials properties and their degradation mechanisms, how materials and processes used to fabricate ICs interact, and how they may be tailored to enable reliability improvements. This book focuses on the physics and materials science of microelectronics reliability problems rather than the traditional statistical, accelerated electrical testing aspects. Studies are grouped into three large sections covering electromigration, gate oxide reliability and mechanical stress behavior. Topics include: historical summary; reliability issues for Cu metallization; characterization of electromigration phenomena; modelling; microstructural evolution and influences; oxide and device reliability; thin oxynitride dielectrics; noncontact diagnostics; stress effects in thin films and interconnects and microbeam X-ray techniques for stress measurements.