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Improving The Electrical Properties Of In Situ Doped Silicon Films Grown By Remote Plasma Enhanced Chemical Vapor Deposition
Download Improving The Electrical Properties Of In Situ Doped Silicon Films Grown By Remote Plasma Enhanced Chemical Vapor Deposition full books in PDF, epub, and Kindle. Read online Improving The Electrical Properties Of In Situ Doped Silicon Films Grown By Remote Plasma Enhanced Chemical Vapor Deposition ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Improving the electrical properties of in situ doped silicon films grown by remote plasma-enhanced chemical vapor deposition by : Pablo Munguia
Download or read book Improving the electrical properties of in situ doped silicon films grown by remote plasma-enhanced chemical vapor deposition written by Pablo Munguia and published by . This book was released on 1994 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis In situ B-doped Si epitaxial films grown by remote plasma-enhanced chemical vapor deposition by : Joel Thornton Irby
Download or read book In situ B-doped Si epitaxial films grown by remote plasma-enhanced chemical vapor deposition written by Joel Thornton Irby and published by . This book was released on 1992 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Characterization of the electrical properties of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition by : Rajan Sharma
Download or read book Characterization of the electrical properties of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition written by Rajan Sharma and published by . This book was released on 1996 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis In situ P-doped epitaxial films grown by remote plasma-enhanced chemical vapor deposition by : Sunil Thomas
Download or read book In situ P-doped epitaxial films grown by remote plasma-enhanced chemical vapor deposition written by Sunil Thomas and published by . This book was released on 1993 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Masters Theses in the Pure and Applied Sciences by : Wade H. Shafer
Download or read book Masters Theses in the Pure and Applied Sciences written by Wade H. Shafer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 38 (thesis year 1993) a total of 13,787 thesis titles from 22 Canadian and 164 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 38 reports theses submitted in 1993, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.
Book Synopsis Plasma Deposition of Amorphous Silicon-Based Materials by : Pio Capezzuto
Download or read book Plasma Deposition of Amorphous Silicon-Based Materials written by Pio Capezzuto and published by Elsevier. This book was released on 1995-10-10 with total page 339 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Book Synopsis Plasma Enhanced Chemical Vapor Deposition of In-situ Doped Epitaxial Silicon from Silane at Low Temperatures by : James Hartfiel Comfort
Download or read book Plasma Enhanced Chemical Vapor Deposition of In-situ Doped Epitaxial Silicon from Silane at Low Temperatures written by James Hartfiel Comfort and published by . This book was released on 1988 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Ceramic Abstracts written by and published by . This book was released on 1998 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition by : Rong-Zhen Qian
Download or read book Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition written by Rong-Zhen Qian and published by . This book was released on 1993 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Electrical & Electronics Abstracts by :
Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 2240 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1994 with total page 892 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition of Thin Film Materials for Electronic and Magnetic Applications by : Ning Li
Download or read book Chemical Vapor Deposition of Thin Film Materials for Electronic and Magnetic Applications written by Ning Li and published by . This book was released on 2011 with total page 152 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) has been employed to pursue high quality thin film growth for four different materials with excellent electronic or magnetic properties for certain device applications. The relationship between CVD processing conditions and various thin film properties has been systematically studied. Plasma enhanced atomic layer deposition (PEALD) is a special type of CVD technique and can be used for the deposition of very thin (few nanometers) and highly conformal thin films. PEALD of hafnium nitride (HfN) thin film is studied by using tetrakis (dimethylamido) hafnium (IV) (TDMAH) and hydrogen plasma. Prior to thin film deposition, TDMAH adsorption and reaction on hydrogenated Si(100) surface has been investigated by in-situ ATR-FTIR. It has been found that between 100°C and 150°C surface adsorbed TDMAH molecules start to decompose based on the ß-hydride elimination mechanism. The decomposition species on the surface has been found hard to desorb at 150°C, which can contaminate the thin film if the purging/pumping time is insufficient. Uniform and moderately conductive HfNxCy films are deposited on hydrogen terminated Si(100) and thermally grown SiO2 (on Si) substrates by PEALD process. The dependence of thin film resistivity on plasma power is found to be related to the change of surface chemical composition. In vacuo XPS depth profile analysis showed the existence of hafnium carbide phase, which to a certain degree can improve the film conductivity. Direct liquid injection chemical vapor deposition (DLI-CVD) has been utilized for epitaxial growth of nickel ferrite (NiFe2O4), lithium ferrite (LiFe5O8) and barium titanate (BaTiO3) films on various lattice match substrates. For the deposition of nickel ferrite, anhydrous Ni(acac)2 and Fe(acac)3 (acac = acetylacetonate) are used as precursor sources dissolved in N, N-dimethyl formamide (DMF) for the DLI vaporizer system. Epitaxial nickel ferrite films of stoichiometric composition are obtained in the temperature range of 500-800 °C on both MgO(100) and MgAl2O4(100). Film morphology is found to be dependent on the deposition temperature with atomically smooth films being obtained for deposition temperature of 600 and 700 ðC. Magnetic measurements reveal an increase in the saturation magnetization for the films with increasing growth temperature, which correlates well with the trend for improved epitaxial growth. Nickel ferrite films deposited on MgAl2O4 (100) at 800ðC exhibit saturation magnetization very close to the bulk value of 300 emu/cm3. Out-of-plane FMR measurement shows the narrowest FMR line width of ~160 Oe for films deposited at 600°C. For lithium ferrite deposition, anhydrous Li(acac) and Fe(acac)3 are dissolved in DMF in a molar ratio of 1:5. Epitaxial growth of lithium ferrite films on MgO(100) are observed in the temperature range of 500°C to 800°C. The as grown films show increasing saturation magnetization with increasing deposition temperature due to the improved degree of crystal texture. For barium titanate thin film deposition, Ba(hfa)2*tetraglyme and Ti(thd)2(OPri)2 are dissolved in toluene in a molar ratio of 1:1. Epitaxial growth of barium titanate on MgO(100) has been found at the temperature of 750°C. Film with a thickness of ~500 nm has a relatively large roughness of ~20 nm. Small amount of F elements, which exists in Ba-F bonds, has been detected in the thin film by XPS.
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1420 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Energy Research Abstracts written by and published by . This book was released on 1993 with total page 490 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma Deposition of Amorphous Silicon-based Materials by : Giovanni Bruno
Download or read book Plasma Deposition of Amorphous Silicon-based Materials written by Giovanni Bruno and published by . This book was released on 1995 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author :Wilfried G. J. H. M. van Sark Publisher :Springer Science & Business Media ISBN 13 :3642222757 Total Pages :588 pages Book Rating :4.6/5 (422 download)
Book Synopsis Physics and Technology of Amorphous-Crystalline Heterostructure Silicon Solar Cells by : Wilfried G. J. H. M. van Sark
Download or read book Physics and Technology of Amorphous-Crystalline Heterostructure Silicon Solar Cells written by Wilfried G. J. H. M. van Sark and published by Springer Science & Business Media. This book was released on 2011-11-16 with total page 588 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today’s solar cell multi-GW market is dominated by crystalline silicon (c-Si) wafer technology, however new cell concepts are entering the market. One very promising solar cell design to answer these needs is the silicon hetero-junction solar cell, of which the emitter and back surface field are basically produced by a low temperature growth of ultra-thin layers of amorphous silicon. In this design, amorphous silicon (a-Si:H) constitutes both „emitter“ and „base-contact/back surface field“ on both sides of a thin crystalline silicon wafer-base (c-Si) where the electrons and holes are photogenerated; at the same time, a-Si:H passivates the c-Si surface. Recently, cell efficiencies above 23% have been demonstrated for such solar cells. In this book, the editors present an overview of the state-of-the-art in physics and technology of amorphous-crystalline heterostructure silicon solar cells. The heterojunction concept is introduced, processes and resulting properties of the materials used in the cell and their heterointerfaces are discussed and characterization techniques and simulation tools are presented.
Book Synopsis Plasma-enhanced Chemical Vapor Deposition of Silicon Oxynitrides by : Joseph Edward Schoenholtz
Download or read book Plasma-enhanced Chemical Vapor Deposition of Silicon Oxynitrides written by Joseph Edward Schoenholtz and published by . This book was released on 1986 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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