Growth of III-nitride Thin Films and Heterostructures by Gas-source Molecular Beam Epitaxy

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ISBN 13 :
Total Pages : 220 pages
Book Rating : 4.:/5 (454 download)

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Book Synopsis Growth of III-nitride Thin Films and Heterostructures by Gas-source Molecular Beam Epitaxy by : Li-Kang Li

Download or read book Growth of III-nitride Thin Films and Heterostructures by Gas-source Molecular Beam Epitaxy written by Li-Kang Li and published by . This book was released on 2000 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Study of III -Nitrides Heterostructures Grown by Molecular Beam Epitaxy

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Publisher : LAP Lambert Academic Publishing
ISBN 13 : 9783844392678
Total Pages : 124 pages
Book Rating : 4.3/5 (926 download)

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Book Synopsis Study of III -Nitrides Heterostructures Grown by Molecular Beam Epitaxy by : Che Woei Chin

Download or read book Study of III -Nitrides Heterostructures Grown by Molecular Beam Epitaxy written by Che Woei Chin and published by LAP Lambert Academic Publishing. This book was released on 2011-05 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: Various techniques have been used to grow III-nitride heterostructures including metalorganic vapor deposition, hydride vapor epitaxy and molecular beam epitaxy (MBE). Among these techniques, MBE presents a number of advantages such as precise control of layer thickness and composition. MBE is a highly sophisticated system which thin film quality is sensitive to the growth parameters. From the literature, a systematic growth procedure has not been well-documented. This book presents an in depth understanding of MBE growth mechanism which is essential for thin film quality improvement. Detailed study on the growth mechanism allows the acquisition of the fundamental knowledge in growing precise optoelectronics device structures. This book focuses on the study of III-nitride thin films grown by MBE on various aspects, supported by analysis using a variety of structural and optical characterization techniques. The book starts with the introduction of the MBE architecture, follows by the detailed growth procedures. The characterization and analysis of various III-nitride thin films grown on Si and sapphire will be presented in the last part of the book.

Growth and Characterization of M-plane III-nitride Thin Films Heterostructure by Plasma-assisted Molecular Beam Epitaxy

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (115 download)

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Book Synopsis Growth and Characterization of M-plane III-nitride Thin Films Heterostructure by Plasma-assisted Molecular Beam Epitaxy by : 雨樵·林

Download or read book Growth and Characterization of M-plane III-nitride Thin Films Heterostructure by Plasma-assisted Molecular Beam Epitaxy written by 雨樵·林 and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Gas Source Molecular Beam Epitaxy

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Publisher :
ISBN 13 : 9780387565408
Total Pages : 0 pages
Book Rating : 4.5/5 (654 download)

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Book Synopsis Gas Source Molecular Beam Epitaxy by : M. B. Panish

Download or read book Gas Source Molecular Beam Epitaxy written by M. B. Panish and published by . This book was released on 1993 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Molecular Beam Epitaxy

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Publisher : Elsevier
ISBN 13 : 0128121378
Total Pages : 790 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis Molecular Beam Epitaxy by : Mohamed Henini

Download or read book Molecular Beam Epitaxy written by Mohamed Henini and published by Elsevier. This book was released on 2018-06-27 with total page 790 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and ‘how to’ on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. Condenses the fundamental science of MBE into a modern reference, speeding up literature review Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community

Growth Kinetics of III-V Semiconductor Thin Films by Molecular Beam Epitaxy with Gas Sources

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Publisher :
ISBN 13 :
Total Pages : 214 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Growth Kinetics of III-V Semiconductor Thin Films by Molecular Beam Epitaxy with Gas Sources by : Bingwen Liang

Download or read book Growth Kinetics of III-V Semiconductor Thin Films by Molecular Beam Epitaxy with Gas Sources written by Bingwen Liang and published by . This book was released on 1993 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Molecular Beam Epitaxy Growth and Characterization of ZnO-based Layers and Heterostructures

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Publisher : Cuvillier Verlag
ISBN 13 : 386727701X
Total Pages : 143 pages
Book Rating : 4.8/5 (672 download)

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Book Synopsis Molecular Beam Epitaxy Growth and Characterization of ZnO-based Layers and Heterostructures by : Abdelhamid Abdelrehim Mahmoud Elshaer

Download or read book Molecular Beam Epitaxy Growth and Characterization of ZnO-based Layers and Heterostructures written by Abdelhamid Abdelrehim Mahmoud Elshaer and published by Cuvillier Verlag. This book was released on 2008 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Conventional and Pendeo-epitaxial Growth of III-nitride Thin Films by Molecular Beam and Metalorganic Vapor Phase Techniques

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ISBN 13 :
Total Pages : 366 pages
Book Rating : 4.:/5 (428 download)

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Book Synopsis Conventional and Pendeo-epitaxial Growth of III-nitride Thin Films by Molecular Beam and Metalorganic Vapor Phase Techniques by : Kevin James Linthicum

Download or read book Conventional and Pendeo-epitaxial Growth of III-nitride Thin Films by Molecular Beam and Metalorganic Vapor Phase Techniques written by Kevin James Linthicum and published by . This book was released on 1999 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Epitaxial Growth of III-Nitride Compounds

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Publisher : Springer
ISBN 13 : 3319766414
Total Pages : 228 pages
Book Rating : 4.3/5 (197 download)

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Book Synopsis Epitaxial Growth of III-Nitride Compounds by : Takashi Matsuoka

Download or read book Epitaxial Growth of III-Nitride Compounds written by Takashi Matsuoka and published by Springer. This book was released on 2018-04-17 with total page 228 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents extensive information on the mechanisms of epitaxial growth in III-nitride compounds, drawing on a state-of-the-art computational approach that combines ab initio calculations, empirical interatomic potentials, and Monte Carlo simulations to do so. It discusses important theoretical aspects of surface structures and elemental growth processes during the epitaxial growth of III-nitride compounds. In addition, it discusses advanced fundamental structural and electronic properties, surface structures, fundamental growth processes and novel behavior of thin films in III-nitride semiconductors. As such, it will appeal to all researchers, engineers and graduate students seeking detailed information on crystal growth and its application to III-nitride compounds.

III-Nitride Electronic Devices

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Publisher : Academic Press
ISBN 13 : 0128175443
Total Pages : 540 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis III-Nitride Electronic Devices by : Rongming Chu

Download or read book III-Nitride Electronic Devices written by Rongming Chu and published by Academic Press. This book was released on 2019-10 with total page 540 pages. Available in PDF, EPUB and Kindle. Book excerpt: III-Nitride Electronic Devices, Volume 102, emphasizes two major technical areas advanced by this technology: radio frequency (RF) and power electronics applications. The range of topics covered by this book provides a basic understanding of materials, devices, circuits and applications while showing the future directions of this technology. Specific chapters cover Electronic properties of III-nitride materials and basics of III-nitride HEMT, Epitaxial growth of III-nitride electronic devices, III-nitride microwave power transistors, III-nitride millimeter wave transistors, III-nitride lateral transistor power switch, III-nitride vertical devices, Physics-Based Modeling, Thermal management in III-nitride HEMT, RF/Microwave applications of III-nitride transistor/wireless power transfer, and more. Presents a complete review of III-Nitride electronic devices, from fundamental physics, to applications in two key technical areas - RF and power electronics Outlines fundamentals, reviews state-of-the-art circuits and applications, and introduces current and emerging technologies Written by a panel of academic and industry experts in each field

Study of III-nitride Growth Kinetics by Molecular-beam Epitaxy

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (858 download)

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Book Synopsis Study of III-nitride Growth Kinetics by Molecular-beam Epitaxy by : Michael William Moseley

Download or read book Study of III-nitride Growth Kinetics by Molecular-beam Epitaxy written by Michael William Moseley and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Since the initial breakthroughs in structural quality and p-type conductivity in GaN during the late 1980s, the group-III nitride material system has attracted an enormous amount of interest because of its properties and applications in both electronics and optoelectronics. Although blue light-emitting diodes have been commercialized based on this success, much less progress has been made in ultraviolet emitters, green emitters, and photovoltaics. This lack of development has been attributed to insufficient structural and electrical material quality, which is directly linked to the growth of the material. The objective of this work is to expand the understanding of III-nitride growth towards the improvement of current device capabilities and the facilitation of novel device designs. :Group-III nitride thin films are grown by molecular-beam epitaxy in a pulsed, metal-rich environment. The growths of nitride binaries and ternaries are observed in situ by transient reflection high-energy electron diffraction (RHEED) intensities, which respond to the behavior of atoms on the growing surface. By analyzing and interpreting these RHEED signatures, a comprehensive understanding of nitride thin film growth is obtained. :The growth kinetics of unintentionally doped GaN by metal-rich MBE are elucidated, and a novel method of in situ growth rate measurement is discovered. This technique is expanded to InN, highlighting the similarity in molecular-beam epitaxy growth kinetics between III-nitride binaries. The growth of Mg-doped GaN is then explored to increase Mg incorporation and electrical activation. The growth of InxGa1-xN alloys are investigated with the goal of eliminating phase separation, which enables single-phase material for use in photovoltaics. Finally, the growth of unintentionally doped and Mg-doped AlGaN is investigated towards higher efficiency light emitting diodes. :These advancements in the understanding of III-nitride growth will address several critical problems and enable devices relying on consistent growth in production, single-phase material, and practical hole concentrations in materials with high carrier activation energies.

III-V Nitrides

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Publisher :
ISBN 13 :
Total Pages : 1290 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis III-V Nitrides by : Fernando A. Ponce

Download or read book III-V Nitrides written by Fernando A. Ponce and published by . This book was released on 1997 with total page 1290 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Growth and Applications of Epitaxial Transition Metal Nitride Thin Film Heterostructures

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Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (14 download)

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Book Synopsis Growth and Applications of Epitaxial Transition Metal Nitride Thin Film Heterostructures by : John Gilbert Wright

Download or read book Growth and Applications of Epitaxial Transition Metal Nitride Thin Film Heterostructures written by John Gilbert Wright and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Continued improvements in the efficiency and speed of computation and telecommunication requires leveraging the properties of novel materials and materials interfaces. Superconductivity, a phenomenon that until now has not seen widespread application in microelectronic devices, appears poised for extensive implementation in technologies such as single flux quantum (SFQ) digital logic and Josephson junction-based quantum computing. The development of these technologies requires addressing outstanding materials challenges, such as realizing new materials and devices to enable improvements such as increased circuit density for SFQ circuits and low microwave noise Josephson junctions for enhanced coherence time superconducting qubits. Furthermore, while the existing nitride semiconductor materials have enabled new applications in optoelectronics, power electronics, and RF electronics, the ability to integrate these materials in epitaxial structures containing metallic and superconducting thin film materials creates new dimensions in the design space of semiconductor devices, allowing for the creation of novel devices. With these goals in mind, we have pursued the integration of metallic and superconducting transition metal nitrides, such as NbN and TiN, with III-N semiconductors (AlN, GaN, InN). Firstly, we have studied the growth and properties of NbN and TiN films grown by molecular beam epitaxy. We demonstrate that exceptionally high quality epitaxial thin films of NbN can be grown, and that tuning of the growth variables, such as elemental fluxes and substrate temperature, can control the structural phase and superconducting properties of the resultant NbN films. We demonstrate, for the first-time, phase pure beta-Nb2N thin films of the hexagonal crystal structure, and examine their superconducting and structural properties. Additionally, to better understand the electronic properties of both NbN and NbN/III-N interfaces, we examine the electronic interface between GaN and NbN using both Schottky barrier diodes and SX-ARPES, presenting the k-resolved imaging of the electronic states at this technologically interesting materials interface. To enable the realization of hybrid metal-semiconductor nitride devices, a detailed study of the growth of AlN and GaN on NbN is performed. We demonstrate that lattice misfit, surface energy mismatch, and chemical compatibility all present challenges to the realization of these heterostructures. Through the development of new growth strategies, we overcome these issues and demonstrate the growth of high crystal quality epitaxial AlN thin films grown on NbN. Finally, we utilize these films and heterostructures to fabricate several devices. We demonstrate the utilization of ultra-thin epitaxial NbN to fabricate superconducting nanowire single photon detectors (SNSPD). Utilizing the piezoelectric properties of AlN and the metallic properties of NbN, we fabricate epitaxial bulk acoustic wave (BAW) resonators. Finally, using NbN films as superconducting electrodes and an AlN film as a wide band gap semiconductor, we examine the properties of MBE grown NbN/AlN/NbN Josephson junctions.

Molecular Beam Epitaxy

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Publisher : John Wiley & Sons
ISBN 13 : 111935501X
Total Pages : 510 pages
Book Rating : 4.1/5 (193 download)

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Book Synopsis Molecular Beam Epitaxy by : Hajime Asahi

Download or read book Molecular Beam Epitaxy written by Hajime Asahi and published by John Wiley & Sons. This book was released on 2019-04-15 with total page 510 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers both the fundamentals and the state-of-the-art technology used for MBE Written by expert researchers working on the frontlines of the field, this book covers fundamentals of Molecular Beam Epitaxy (MBE) technology and science, as well as state-of-the-art MBE technology for electronic and optoelectronic device applications. MBE applications to magnetic semiconductor materials are also included for future magnetic and spintronic device applications. Molecular Beam Epitaxy: Materials and Applications for Electronics and Optoelectronics is presented in five parts: Fundamentals of MBE; MBE technology for electronic devices application; MBE for optoelectronic devices; Magnetic semiconductors and spintronics devices; and Challenge of MBE to new materials and new researches. The book offers chapters covering the history of MBE; principles of MBE and fundamental mechanism of MBE growth; migration enhanced epitaxy and its application; quantum dot formation and selective area growth by MBE; MBE of III-nitride semiconductors for electronic devices; MBE for Tunnel-FETs; applications of III-V semiconductor quantum dots in optoelectronic devices; MBE of III-V and III-nitride heterostructures for optoelectronic devices with emission wavelengths from THz to ultraviolet; MBE of III-V semiconductors for mid-infrared photodetectors and solar cells; dilute magnetic semiconductor materials and ferromagnet/semiconductor heterostructures and their application to spintronic devices; applications of bismuth-containing III–V semiconductors in devices; MBE growth and device applications of Ga2O3; Heterovalent semiconductor structures and their device applications; and more. Includes chapters on the fundamentals of MBE Covers new challenging researches in MBE and new technologies Edited by two pioneers in the field of MBE with contributions from well-known MBE authors including three Al Cho MBE Award winners Part of the Materials for Electronic and Optoelectronic Applications series Molecular Beam Epitaxy: Materials and Applications for Electronics and Optoelectronics will appeal to graduate students, researchers in academia and industry, and others interested in the area of epitaxial growth.

Heteroepitaxy of Semiconductors

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Publisher : CRC Press
ISBN 13 : 1482254360
Total Pages : 660 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Heteroepitaxy of Semiconductors by : John E. Ayers

Download or read book Heteroepitaxy of Semiconductors written by John E. Ayers and published by CRC Press. This book was released on 2016-10-03 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the past ten years, heteroepitaxy has continued to increase in importance with the explosive growth of the electronics industry and the development of a myriad of heteroepitaxial devices for solid state lighting, green energy, displays, communications, and digital computing. Our ever-growing understanding of the basic physics and chemistry underlying heteroepitaxy, especially lattice relaxation and dislocation dynamic, has enabled an ever-increasing emphasis on metamorphic devices. To reflect this focus, two all-new chapters have been included in this new edition. One chapter addresses metamorphic buffer layers, and the other covers metamorphic devices. The remaining seven chapters have been revised extensively with new material on crystal symmetry and relationships, III-nitride materials, lattice relaxation physics and models, in-situ characterization, and reciprocal space maps.

Handbook of Nitride Semiconductors and Devices, Materials Properties, Physics and Growth

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Publisher : John Wiley & Sons
ISBN 13 : 3527628460
Total Pages : 1311 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Handbook of Nitride Semiconductors and Devices, Materials Properties, Physics and Growth by : Hadis Morkoç

Download or read book Handbook of Nitride Semiconductors and Devices, Materials Properties, Physics and Growth written by Hadis Morkoç and published by John Wiley & Sons. This book was released on 2009-07-30 with total page 1311 pages. Available in PDF, EPUB and Kindle. Book excerpt: The three volumes of this handbook treat the fundamentals, technology and nanotechnology of nitride semiconductors with an extraordinary clarity and depth. They present all the necessary basics of semiconductor and device physics and engineering together with an extensive reference section. Volume 1 deals with the properties and growth of GaN. The deposition methods considered are: hydride VPE, organometallic CVD, MBE, and liquid/high pressure growth. Additionally, extended defects and their electrical nature, point defects, and doping are reviewed.

Chemical Abstracts

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ISBN 13 :
Total Pages : 2668 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Chemical Abstracts by :

Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2668 pages. Available in PDF, EPUB and Kindle. Book excerpt: