Growth and Characterization of Beta-silicon Carbide Thin Films

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ISBN 13 :
Total Pages : 308 pages
Book Rating : 4.:/5 (299 download)

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Book Synopsis Growth and Characterization of Beta-silicon Carbide Thin Films by : Bagher Bahavar

Download or read book Growth and Characterization of Beta-silicon Carbide Thin Films written by Bagher Bahavar and published by . This book was released on 1993 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Growth and Characterization of Beta Silicon Carbide ([beta]-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor

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ISBN 13 :
Total Pages : 170 pages
Book Rating : 4.:/5 (3 download)

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Book Synopsis The Growth and Characterization of Beta Silicon Carbide ([beta]-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor by : Kenneth George Irvine

Download or read book The Growth and Characterization of Beta Silicon Carbide ([beta]-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor written by Kenneth George Irvine and published by . This book was released on 1992 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Growth and Characterization of Beta Silicon Carbide (β-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor

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ISBN 13 :
Total Pages : 170 pages
Book Rating : 4.:/5 (133 download)

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Book Synopsis The Growth and Characterization of Beta Silicon Carbide (β-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor by : Kenneth George Irvine

Download or read book The Growth and Characterization of Beta Silicon Carbide (β-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor written by Kenneth George Irvine and published by . This book was released on 1992 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Epitaxial growth, doping and characterization of monocrystalline beta silicon-carbide thin films and fabriation of electronic devices

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Total Pages : pages
Book Rating : 4.:/5 (256 download)

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Book Synopsis Epitaxial growth, doping and characterization of monocrystalline beta silicon-carbide thin films and fabriation of electronic devices by : Hyeong Joon Kim

Download or read book Epitaxial growth, doping and characterization of monocrystalline beta silicon-carbide thin films and fabriation of electronic devices written by Hyeong Joon Kim and published by . This book was released on 1986 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Epitaxial Growth, Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic Devices

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ISBN 13 :
Total Pages : 544 pages
Book Rating : 4.:/5 (146 download)

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Book Synopsis Epitaxial Growth, Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic Devices by : Hyeong Joon Kim

Download or read book Epitaxial Growth, Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic Devices written by Hyeong Joon Kim and published by . This book was released on 1985 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Epitaxial Growth, Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic

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ISBN 13 :
Total Pages : 272 pages
Book Rating : 4.:/5 (314 download)

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Book Synopsis Epitaxial Growth, Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic by : Hyeong Joon Kim

Download or read book Epitaxial Growth, Doping and Characterization of Monocrystalline Beta Silicon Carbide Thin Films and Fabrication of Electronic written by Hyeong Joon Kim and published by . This book was released on 1985 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition

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ISBN 13 :
Total Pages : 278 pages
Book Rating : 4.:/5 (323 download)

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Book Synopsis Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition by : JiPing Li

Download or read book Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition written by JiPing Li and published by . This book was released on 1994 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Electron Optical Studies of Heteroepitaxial Growth of Beta Silicon Carbide Layers Through Molten Metal Intermediates

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ISBN 13 :
Total Pages : 30 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Electron Optical Studies of Heteroepitaxial Growth of Beta Silicon Carbide Layers Through Molten Metal Intermediates by : Joseph J. Comer

Download or read book Electron Optical Studies of Heteroepitaxial Growth of Beta Silicon Carbide Layers Through Molten Metal Intermediates written by Joseph J. Comer and published by . This book was released on 1970 with total page 30 pages. Available in PDF, EPUB and Kindle. Book excerpt: Beta silicon carbide has the potential of becoming an important semiconductor device material for hazardous military environments such as high temperature and radiation. This report is concerned with a study of the growth of thin single crystal films of beta silicon carbide through molten metal intermediates. Thin films of nickel, cobalt, chromium and iron were deposited by vacuum deposition on to the (0001) faces of single crystals of alpha silicon carbide. Then heteroepitaxial layers of beta silicon carbide were deposited through the molten metal films by the hydrogen reduction of methyltrichlorosilane. The deposited films were studied by electron microscopy, electron diffraction and electron beam microprobe analysis to determine the growth mechanism and to arrive at optimum conditions for heteroepitaxial growth. From the results obtained it was concluded that nickel and cobalt were equally effective in promoting epitaxial growth. Films of nickel only 20A in thickness were as effective as those up to 300A. Results with chromium and iron were disappointing for different reasons. Chromium did not etch the substrate surface uniformly because of poor wetting. With iron, whisker growth of beta silicon carbide occurred at the surface. Although in many respects the growth of mechanism resembled that of the vapor-liquid-solid method, certain differences were observed which make the actual growth mechanism using nickel and cobalt films still uncertain. (Author).

Growth, Processing and Characterization of Beta-silicon Carbide Single Crystals

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ISBN 13 :
Total Pages : 49 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Growth, Processing and Characterization of Beta-silicon Carbide Single Crystals by : Robert W. Bartlett

Download or read book Growth, Processing and Characterization of Beta-silicon Carbide Single Crystals written by Robert W. Bartlett and published by . This book was released on 1967 with total page 49 pages. Available in PDF, EPUB and Kindle. Book excerpt: Epitaxial vapor deposition of beta-silicon carbide on (111) beta-silicon carbide platelets and diborane doping were used to grow p-type layers on n-type substrates. Etching and thin film metallizing procedures were developed for silicon carbide, a chlorine-oxygen gas etch at 900 degrees C being used. Specific surface characteristics of solution-grown crystals, epitaxial crystals, and crystals etched in various fluids were correlated with crystal polarity. (Author).

Chemical Vapor Deposition, Characterization and Device Development of Monocrystalline Beta- and Alpha(6H)-silicon Carbide Thin Films

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ISBN 13 :
Total Pages : 366 pages
Book Rating : 4.:/5 (197 download)

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Book Synopsis Chemical Vapor Deposition, Characterization and Device Development of Monocrystalline Beta- and Alpha(6H)-silicon Carbide Thin Films by : Hua-shuang Kong

Download or read book Chemical Vapor Deposition, Characterization and Device Development of Monocrystalline Beta- and Alpha(6H)-silicon Carbide Thin Films written by Hua-shuang Kong and published by . This book was released on 1988 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Growth and Characterization of Polycrystalline Silicon and Microcrystalline Silicon Carbide Thin Films Using ECR-PECVD

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ISBN 13 :
Total Pages : 138 pages
Book Rating : 4.:/5 (414 download)

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Book Synopsis Growth and Characterization of Polycrystalline Silicon and Microcrystalline Silicon Carbide Thin Films Using ECR-PECVD by : Bryan Kent Oliver

Download or read book Growth and Characterization of Polycrystalline Silicon and Microcrystalline Silicon Carbide Thin Films Using ECR-PECVD written by Bryan Kent Oliver and published by . This book was released on 1999 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: On the other hand, with He dilution at 15 mTorr the percent crystallinity obtained was also 86%, with decreasing crystallinity at lower pressures. We found that a dilution consisting of a 50%-50% mixture of H2-He, which allows a high ion bombardment deposition from the helium that is also benefited by the hydrogen etching effect, did not compromise the quality of the films. This plasma selection produced about 84% crystalline films, independent of the pressure setting. X-ray diffraction reveals the dominant crystal textures are 111 and 220 orientations, with 220 preferential growth at higher deposition pressures. The CH4/SiH4 flow ratio was found critical to the formation of microcrystalline SiC.

Single Crystal Epitaxy and Characterization of Beta-Silicon Carbide

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ISBN 13 :
Total Pages : 33 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Single Crystal Epitaxy and Characterization of Beta-Silicon Carbide by : Robert F. Davis

Download or read book Single Crystal Epitaxy and Characterization of Beta-Silicon Carbide written by Robert F. Davis and published by . This book was released on 1980 with total page 33 pages. Available in PDF, EPUB and Kindle. Book excerpt: The project involves the development of low pressure chemical vapor deposition and r-f sputtering techniques for the synthesis of single crystal thin films of beta-SiC. The CVD apparatus is being produced in-house and a detailed description of the design is provided herein. Theoretical CVD phase diagrams of the Si-C-H system are also being produced as a function of Si/Si+C and total pressure. Both reactive sputtering of Si in CH4 and normal sputtering of a SiC target are being readied. (Author).

Growth and Characterization of Silicon Carbide Thin Films Using a Nontraditional Hollow Cathode Sputtering Technique

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ISBN 13 : 9781124124155
Total Pages : pages
Book Rating : 4.1/5 (241 download)

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Book Synopsis Growth and Characterization of Silicon Carbide Thin Films Using a Nontraditional Hollow Cathode Sputtering Technique by : James Huguenin-Love

Download or read book Growth and Characterization of Silicon Carbide Thin Films Using a Nontraditional Hollow Cathode Sputtering Technique written by James Huguenin-Love and published by . This book was released on 2010 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Growth and Characterization of Beta-silicon Carbide Single Crystals

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ISBN 13 :
Total Pages : 25 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Growth and Characterization of Beta-silicon Carbide Single Crystals by : Frank A. Halden

Download or read book Growth and Characterization of Beta-silicon Carbide Single Crystals written by Frank A. Halden and published by . This book was released on 1965 with total page 25 pages. Available in PDF, EPUB and Kindle. Book excerpt: Changes in crystal size and morphology were obtained by modifying the process for growing crystals of betasilicon carbide from solution in carbon-saturated melts. Well developed laths and plates were grown under conditions favoring dendritic growth mechanisms (low thermal gradient with moderate stirring). Polyhedral crystals grew under high thermal gradient conditions when high velocity stirring was employed. Three-dimensionaltype growth was also produced from a 73 wt percent ironsilicon alloy under conditions that normally produce lath-type growth. Uncorrected electron mobilities of 700 to 1000 sq cm/v-sec were measured at room temperature, and a few preliminary Hall measurements were made over the temperature range from 77 to 300 K. (Author).

Amorphous Silicon Carbide Thin Films

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ISBN 13 : 9781613247747
Total Pages : 0 pages
Book Rating : 4.2/5 (477 download)

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Book Synopsis Amorphous Silicon Carbide Thin Films by : Mariana Amorim Fraga

Download or read book Amorphous Silicon Carbide Thin Films written by Mariana Amorim Fraga and published by . This book was released on 2011 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon carbide (SiC) has been described as a suitable semiconductor material to use in MEMS and electronic devices for harsh environments. In recent years, many developments in SiC technology as bulk growth, materials processing, electronic devices and sensors have been shown. Moreover, some studies show the synthesis, characterisation and processing of crystalline SiC films. However, few works have investigated the potential of amorphous silicon carbide (a-SiC) thin films for sensors applications. This book presents fundamentals of amorphous silicon carbide thin films and their applications in piezoresistive sensors for high temperature applications.

Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals

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ISBN 13 :
Total Pages : 112 pages
Book Rating : 4.:/5 (227 download)

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Book Synopsis Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals by : William R. Harding

Download or read book Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals written by William R. Harding and published by . This book was released on 1970 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: The report summarizes the development program in the growth of large high purity beta silicon carbide crystals. Conditions for stable beta growth were partially established. Beta silicon carbide can be grown in the region of 2000-2200C and 28-42 microns pressure. Within this region, large beta crystals will grow by sublimation. Lang topographs of crystals were compared with etched surface structures and petrographic examination. Correlation among the results of these techniques was shown to exist. This analysis indicated the presence of large stacking faults within the structure as well as polytype intergrowths. Resistivity and Hall measurements were made with indications of highly compensated material. (Author).

Crystal Growth and Characterization of Silicon Carbide and Aluminum Nitride Films

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ISBN 13 :
Total Pages : 150 pages
Book Rating : 4.:/5 (279 download)

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Book Synopsis Crystal Growth and Characterization of Silicon Carbide and Aluminum Nitride Films by : Zhenjiang Yu

Download or read book Crystal Growth and Characterization of Silicon Carbide and Aluminum Nitride Films written by Zhenjiang Yu and published by . This book was released on 1993 with total page 150 pages. Available in PDF, EPUB and Kindle. Book excerpt: