Fundamental Growth Processes on Different Gallium Arsenide Surfaces in Metal Organic Vapor Phase Epitaxy

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Book Synopsis Fundamental Growth Processes on Different Gallium Arsenide Surfaces in Metal Organic Vapor Phase Epitaxy by : Markus Pristovsek

Download or read book Fundamental Growth Processes on Different Gallium Arsenide Surfaces in Metal Organic Vapor Phase Epitaxy written by Markus Pristovsek and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Fundamental Growth Processes on Different Gallium Arsenid Surfaces in Metal Organic Vapor Phase Epitaxy

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ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.:/5 (916 download)

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Book Synopsis Fundamental Growth Processes on Different Gallium Arsenid Surfaces in Metal Organic Vapor Phase Epitaxy by :

Download or read book Fundamental Growth Processes on Different Gallium Arsenid Surfaces in Metal Organic Vapor Phase Epitaxy written by and published by . This book was released on 2001 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metal Organic Vapor Phase Epitaxy Growth Mechanisms of Gallium Antimonide and Compositional Grading in Pseudomorphic Gallium Arsenide Antimonide Films

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ISBN 13 :
Total Pages : 196 pages
Book Rating : 4.:/5 (89 download)

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Book Synopsis Metal Organic Vapor Phase Epitaxy Growth Mechanisms of Gallium Antimonide and Compositional Grading in Pseudomorphic Gallium Arsenide Antimonide Films by : Brian Edmund Hawkins

Download or read book Metal Organic Vapor Phase Epitaxy Growth Mechanisms of Gallium Antimonide and Compositional Grading in Pseudomorphic Gallium Arsenide Antimonide Films written by Brian Edmund Hawkins and published by . This book was released on 2004 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Gallium-arsenide Metalorganic Chemical Vapor Deposition with Alkyl Arsenic Sources

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ISBN 13 :
Total Pages : 212 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Gallium-arsenide Metalorganic Chemical Vapor Deposition with Alkyl Arsenic Sources by : Dietrich W. Vook

Download or read book Gallium-arsenide Metalorganic Chemical Vapor Deposition with Alkyl Arsenic Sources written by Dietrich W. Vook and published by . This book was released on 1989 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:

A Study of Dopant Incorporation Into Gallium Arsenide Grown by Metal-orgnic Vapor Phase Epitaxy

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ISBN 13 :
Total Pages : 636 pages
Book Rating : 4.:/5 (89 download)

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Book Synopsis A Study of Dopant Incorporation Into Gallium Arsenide Grown by Metal-orgnic Vapor Phase Epitaxy by : Joan Marie Redwing

Download or read book A Study of Dopant Incorporation Into Gallium Arsenide Grown by Metal-orgnic Vapor Phase Epitaxy written by Joan Marie Redwing and published by . This book was released on 1994 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Organometallic Vapor-Phase Epitaxy

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Publisher : Elsevier
ISBN 13 : 0323139175
Total Pages : 417 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Organometallic Vapor-Phase Epitaxy by : Gerald B. Stringfellow

Download or read book Organometallic Vapor-Phase Epitaxy written by Gerald B. Stringfellow and published by Elsevier. This book was released on 2012-12-02 with total page 417 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and the special structures required for device applications. In addition, a comprehensive summary detailing the OMVPE results observed to date in a wide range of III-V and II-VI semiconductors is provided. This includes a comparison of results obtained through the use of other epitaxial techniques such as molecular beam epitaxy (MBE), liquid-phase epitaxy (LPE), and vapor phase epitaxy using halide transport.

Metal Organic Vapour Phase Epitaxy for the Growth of III-V Semiconductor Structures

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ISBN 13 :
Total Pages : 172 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis Metal Organic Vapour Phase Epitaxy for the Growth of III-V Semiconductor Structures by : Maarten Reinier Leys

Download or read book Metal Organic Vapour Phase Epitaxy for the Growth of III-V Semiconductor Structures written by Maarten Reinier Leys and published by . This book was released on 1990 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metalorganic Vapor Phase Epitaxy (MOVPE)

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Publisher : John Wiley & Sons
ISBN 13 : 111931304X
Total Pages : 584 pages
Book Rating : 4.1/5 (193 download)

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Book Synopsis Metalorganic Vapor Phase Epitaxy (MOVPE) by : Stuart Irvine

Download or read book Metalorganic Vapor Phase Epitaxy (MOVPE) written by Stuart Irvine and published by John Wiley & Sons. This book was released on 2019-08-27 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).

Influence of Impurities as Surfactants on the Growth of Gallium Nitride Thin Film by Metal Organic Vapor Phase Epitaxy

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ISBN 13 :
Total Pages : 649 pages
Book Rating : 4.:/5 (58 download)

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Book Synopsis Influence of Impurities as Surfactants on the Growth of Gallium Nitride Thin Film by Metal Organic Vapor Phase Epitaxy by : Ling Zhang

Download or read book Influence of Impurities as Surfactants on the Growth of Gallium Nitride Thin Film by Metal Organic Vapor Phase Epitaxy written by Ling Zhang and published by . This book was released on 2002 with total page 649 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Crystal Growth

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Publisher : Elsevier
ISBN 13 : 0444593764
Total Pages : 1216 pages
Book Rating : 4.4/5 (445 download)

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Book Synopsis Handbook of Crystal Growth by : Tatau Nishinaga

Download or read book Handbook of Crystal Growth written by Tatau Nishinaga and published by Elsevier. This book was released on 2014-11-04 with total page 1216 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume IAHandbook of Crystal Growth, 2nd Edition (Fundamentals: Thermodynamics and Kinetics) Volume IA addresses the present status of crystal growth science, and provides scientific tools for the following volumes: Volume II (Bulk Crystal Growth) and III (Thin Film Growth and Epitaxy). Volume IA highlights thermodynamics and kinetics. After historical introduction of the crystal growth, phase equilibria, defect thermodynamics, stoichiometry, and shape of crystal and structure of melt are described. Then, the most fundamental and basic aspects of crystal growth are presented, along with the theories of nucleation and growth kinetics. In addition, the simulations of crystal growth by Monte Carlo, ab initio-based approach and colloidal assembly are thoroughly investigated. Volume IBHandbook of Crystal Growth, 2nd Edition (Fundamentals: Transport and Stability) Volume IB discusses pattern formation, a typical problem in crystal growth. In addition, an introduction to morphological stability is given and the phase-field model is explained with comparison to experiments. The field of nanocrystal growth is rapidly expanding and here the growth from vapor is presented as an example. For the advancement of life science, the crystal growth of protein and other biological molecules is indispensable and biological crystallization in nature gives many hints for their crystal growth. Another subject discussed is pharmaceutical crystal growth. To understand the crystal growth, in situ observation is extremely powerful. The observation techniques are demonstrated. Volume IA Explores phase equilibria, defect thermodynamics of Si, stoichiometry of oxides and atomistic structure of melt and alloys Explains basic ideas to understand crystal growth, equilibrium shape of crystal, rough-smooth transition of step and surface, nucleation and growth mechanisms Focuses on simulation of crystal growth by classical Monte Carlo, ab-initio based quantum mechanical approach, kinetic Monte Carlo and phase field model. Controlled colloidal assembly is presented as an experimental model for crystal growth. Volume IIB Describes morphological stability theory and phase-field model and comparison to experiments of dendritic growth Presents nanocrystal growth in vapor as well as protein crystal growth and biological crystallization Interprets mass production of pharmaceutical crystals to be understood as ordinary crystal growth and explains crystallization of chiral molecules Demonstrates in situ observation of crystal growth in vapor, solution and melt on the ground and in space

Epitaxial Growth of Gallium Arsenide Materials and Devices of Metalorganic Chemical Vapor Deposition

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ISBN 13 :
Total Pages : 352 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Epitaxial Growth of Gallium Arsenide Materials and Devices of Metalorganic Chemical Vapor Deposition by : Vilnis Guntis Kreismanis

Download or read book Epitaxial Growth of Gallium Arsenide Materials and Devices of Metalorganic Chemical Vapor Deposition written by Vilnis Guntis Kreismanis and published by . This book was released on 1984 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metalorganic Vapor Phase Epitaxy (MOVPE)

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Publisher : John Wiley & Sons
ISBN 13 : 1119313015
Total Pages : 582 pages
Book Rating : 4.1/5 (193 download)

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Book Synopsis Metalorganic Vapor Phase Epitaxy (MOVPE) by : Stuart Irvine

Download or read book Metalorganic Vapor Phase Epitaxy (MOVPE) written by Stuart Irvine and published by John Wiley & Sons. This book was released on 2019-10-07 with total page 582 pages. Available in PDF, EPUB and Kindle. Book excerpt: Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).

Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV

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Publisher : The Electrochemical Society
ISBN 13 : 9781566773195
Total Pages : 526 pages
Book Rating : 4.7/5 (731 download)

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Book Synopsis Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV by : Electrochemical Society. High Temperature Materials Division

Download or read book Fundamental Gas-phase and Surface Chemistry of Vapor-phase Deposition II and Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 2001 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Growth of Epitaxial Gallium Arsenide by the Vapor Phase Process

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Publisher :
ISBN 13 :
Total Pages : 202 pages
Book Rating : 4.:/5 (132 download)

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Book Synopsis Growth of Epitaxial Gallium Arsenide by the Vapor Phase Process by : James E. Stangel (CAPT, USAF.)

Download or read book Growth of Epitaxial Gallium Arsenide by the Vapor Phase Process written by James E. Stangel (CAPT, USAF.) and published by . This book was released on 1972 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metal-organic Chemical Vapor Epitaxy of GaN on Si(111) for Optoelectronic Applications

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ISBN 13 :
Total Pages : 13 pages
Book Rating : 4.:/5 (44 download)

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Book Synopsis Metal-organic Chemical Vapor Epitaxy of GaN on Si(111) for Optoelectronic Applications by : Alain E. Kaloyeros

Download or read book Metal-organic Chemical Vapor Epitaxy of GaN on Si(111) for Optoelectronic Applications written by Alain E. Kaloyeros and published by . This book was released on 1998 with total page 13 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature growth of gallium nitride on silicon via vapor phase epitaxy was investigated. The use of different nitrogen and gallium sources was explored. The gallium nitride deposition process was optimized by varying surface preparation, seed and buffer layer growth, and annealing conditions. Films were extensively characterized via X-ray diffraction, Rutherford backscatter, atomic force microscopy, X-ray photoemission spectroscopy, and Auger electron spectroscopy. Optimized growth rates of 60-120 A/min were achieved at 0.8 torr pressure, with 1:1 gallium to nitride ratio to within 0.1%. Films were hexagonal and polycrystalline with 3 nitride bi-layer buffers, with annealing, allowed stoichiometric gallium nitride growth of up to 6000 A, but the temperatures used were not high enough to deposit epitaxial gallium nitride.

Characterization of Gallium Arsenide and Indium Gallium Arsenide on Gallium Arsenide (001) Films Grown by Metalorganic Vapor-phase Epitaxy

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ISBN 13 :
Total Pages : 120 pages
Book Rating : 4.:/5 (418 download)

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Book Synopsis Characterization of Gallium Arsenide and Indium Gallium Arsenide on Gallium Arsenide (001) Films Grown by Metalorganic Vapor-phase Epitaxy by : Byung-kwon Han

Download or read book Characterization of Gallium Arsenide and Indium Gallium Arsenide on Gallium Arsenide (001) Films Grown by Metalorganic Vapor-phase Epitaxy written by Byung-kwon Han and published by . This book was released on 1997 with total page 120 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Growth of Gallium Arsenide by Organometallic Vapor Phase Epitaxy Using Diethylgallium Chloride and Arsine

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ISBN 13 :
Total Pages : 73 pages
Book Rating : 4.:/5 (115 download)

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Book Synopsis The Growth of Gallium Arsenide by Organometallic Vapor Phase Epitaxy Using Diethylgallium Chloride and Arsine by : Thomas W. Krygowski

Download or read book The Growth of Gallium Arsenide by Organometallic Vapor Phase Epitaxy Using Diethylgallium Chloride and Arsine written by Thomas W. Krygowski and published by . This book was released on 1993 with total page 73 pages. Available in PDF, EPUB and Kindle. Book excerpt: