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Author : Yan Bai
Publisher :
ISBN 13 :
Total Pages : 102 pages
Book Rating : 4.:/5 (373 download)
Download or read book Effect of Thermal Annealing on Arsenic Ion-implanted, Boron-doped Czochralski Silicon written by Yan Bai and published by . This book was released on 1997 with total page 102 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jingwei Miao
Publisher :
ISBN 13 :
Total Pages : 92 pages
Book Rating : 4.:/5 (368 download)
Download or read book Thermal Annealing of Laser-shocked Silicon written by Jingwei Miao and published by . This book was released on 1996 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kuang-yao Lo
Publisher :
ISBN 13 :
Total Pages : 16 pages
Book Rating : 4.:/5 (422 download)
Download or read book Study on the Rapid Thermal Annealing Process of Low-energy Arsenic and Phosphorous Ion-implanted Silicon by Reflective Second Harmonic Generation written by Kuang-yao Lo and published by . This book was released on 2005 with total page 16 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 1256 pages
Book Rating : 4.3/5 (91 download)
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1973 with total page 1256 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 752 pages
Book Rating : 4.:/5 (3 download)
Download or read book Energy Research Abstracts written by and published by . This book was released on 1988 with total page 752 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Effect of Thermal Annealing in Boron Implanted, Laser Annealed Silicon written by and published by . This book was released on 1978 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron microscopy and x-ray techniques have been used to investigate dislocation generation, precipitation of dopants and intrinsic defects, and the relaxation of unidirectional strains after thermal annealing of boron implanted, laser annealed silicon. It is shown that the number density of dislocations created near the interface after thermal annealing is small and therefore the unidirectional nature of the contraction in the dopes layer is essentially retained. A small number density of defect clusters (mostly vacancy dislocation loops, average size 20A) was also observed after thermal annealing at 1000°C. Boron depth profile changes, as determined by secondary ion mass spectroscopy, indicated an increase in boron concentration near the surface in addition to the expected broadening of profiles after thermal annealing.
Author : Judy Lynn Hoyt
Publisher :
ISBN 13 :
Total Pages : 225 pages
Book Rating : 4.:/5 (386 download)
Download or read book The Application of Rapid Thermal Annealing to Arsenic Implanted Single-crystal and Polycrystalline Silicon written by Judy Lynn Hoyt and published by . This book was released on 1987 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 676 pages
Book Rating : 4.:/5 (31 download)
Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1985 with total page 676 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 1948 pages
Book Rating : 4.3/5 (243 download)
Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 1948 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Peter Pichler
Publisher : Springer Science & Business Media
ISBN 13 : 3709105978
Total Pages : 576 pages
Book Rating : 4.7/5 (91 download)
Download or read book Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon written by Peter Pichler and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 576 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.
Author :
Publisher :
ISBN 13 :
Total Pages : 1058 pages
Book Rating : 4.3/5 (91 download)
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1058 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Chi-Chien Ho
Publisher :
ISBN 13 :
Total Pages : 186 pages
Book Rating : 4.:/5 (145 download)
Download or read book Rapid thermal Annealing of ion implanted silicon written by Chi-Chien Ho and published by . This book was released on 1986 with total page 186 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Effect of Ramp Rate and Annealing Temperature on Boron Transient Diffusion in Implanted Silicon written by and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: We present results of recent kinetic Monte Carlo simulations of the effect of annealing time and ramp rate on boron transient enhanced diffusion (BTED) in low energy ion implanted silicon. The simulations use a database of defect and dopant energetics derived from first principle calculations. We discuss the complete atomistic details of defect and dopant clustering during the anneals, and the dependence of boron TED on ramp rate. The simulations provide a complete time history of the evolution of the active boron fraction during the anneal for a wide variety of conditions. We also studied the lateral spreading of the boron during the annealing for two different conditions, furnace anneal and ramp anneal.
Author : Hiroyuki Kinoshita
Publisher :
ISBN 13 :
Total Pages : 220 pages
Book Rating : 4.:/5 (312 download)
Download or read book Physics and modeling of boron diffusion, activation, and evolution of extended defects and point defects during rapid thermal annealing of ion implanted silicon written by Hiroyuki Kinoshita and published by . This book was released on 1993 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Stanford University. Stanford Electronics Laboratories
Publisher :
ISBN 13 :
Total Pages : 118 pages
Book Rating : 4.F/5 ( download)
Download or read book A Theoretical Approach to the Calculation of Annealed Impurity Profiles of Ion Implanted Boron Into Silicon written by Stanford University. Stanford Electronics Laboratories and published by . This book was released on 1977 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt: A multi-stream diffusion model is proposed for te calculation of the annealing behavior of boron that is ion implanted into silicon at room temperature and subsequently annealed. This model is capable of predicting both the redistribution and the electrical activation of boron during the anneal, as a realistic model should. The calculated results compare very samples that are implanted at room temperature with boron in the dose range from 10 to the 14 power to 10 to the 16th power ions/sq cm and subsequently annealed in the temperature range from 800 C to 1000 C. This range of dose and annealing conditions includes both the typical applications of ion implantation as it is applied in the fabrication of devices nad the unconventional cases of high dose implants and low temperature annealing. (Author).
Author : O. W. Holland
Publisher :
ISBN 13 :
Total Pages : 26 pages
Book Rating : 4.:/5 (177 download)
Download or read book Characteristics of Rapid Thermal Annealing in Ion Implanted Silicon written by O. W. Holland and published by . This book was released on 1984 with total page 26 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 988 pages
Book Rating : 4.:/5 (319 download)
Download or read book INIS Atomindex written by and published by . This book was released on 1988 with total page 988 pages. Available in PDF, EPUB and Kindle. Book excerpt:
