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Author : Elisée Rastefano
Publisher :
ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.:/5 (119 download)
Download or read book Deposition of Silicon Dioxide Films by Rf Sputtering written by Elisée Rastefano and published by . This book was released on 1978 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : I. H. Pratt
Publisher :
ISBN 13 :
Total Pages : 46 pages
Book Rating : 4.:/5 (227 download)
Download or read book Preparation of Thin-film Silicon Dioxide by Rf Sputtering written by I. H. Pratt and published by . This book was released on 1968 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt: The results of a study on the deposition of thin-film silicon dioxide by RF sputtering are discussed. The dielectric source material was quartz which was sputtered and deposited onto aluminum electrodes and counterelectroded to complete the metal-oxide-metal capacitive structures. Depositions were conducted at pressures from 1-20 x 10 to the -3 power torr utilizing a triode type sputtering system wherein the processes of ionization of the gas and bombardment of the material are separated essentially. An electron beam is used to ionize the gas and produce the plasma. Application of an RF voltage (13.560 MHz) to a conducting plate placed behind the dielectric (quartz) plate translates the RF power by displacement current through the insulating source material. Interaction of RF voltage and plasma results in the establishment of a dc field between source and plasma which allows for the sputtering of the insulator. The capacitors were utilized to evaluate the dielectric, the device characteristics, and related process parameters. The effect of gas sputtering pressure, magnetic field strength, source-to-substrate distance, and power density on the rate of deposition is shown. Increased film thickness uniformity over a 3 in x 3 in area by optimum substrate positioning is indicated. Dielectric constant, dissipation factor, dielectric breakdown strength, insulation resistance, heat treatment, capacitance and dissipation factor over the range 400 Hz to 5 MHz, and effect of coating on thin-film resistive elements are reported. (Author).
Author : Kris Koorosh Vossough
Publisher :
ISBN 13 :
Total Pages : 94 pages
Book Rating : 4.:/5 (59 download)
Download or read book Reactive Plasma Sputter Deposition of Silicon Oxide written by Kris Koorosh Vossough and published by . This book was released on 1998 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : C. A. T. Salama
Publisher :
ISBN 13 :
Total Pages : 5 pages
Book Rating : 4.:/5 (719 download)
Download or read book Rf Sputtered Aluminum Oxide Films on Silicon written by C. A. T. Salama and published by . This book was released on 1970 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical and electrical properties of aluminum oxide films deposited on silicon by rf sputtering from an alumina target in an argon atmosphere were investigated as a function of sputtering power density in the range from 0.5 to 3 W/sq cm. The deposition rates ranged from 20 to 80 A/min. The density, index of refraction, and dielectric constant of the films increased while the etch rate decreased with increasing power density. The surface charge at the aluminum oxide-silicon interface was typically larger than 10 to the 12th. This charge increased with increasing sputtering power density and could be reduced to 7-8 x 10 to the 11th e/sq cm by annealing. The films exhibited trapping instabilities at room temperature but no polarization was observed under biastemperature stress. The characteristics of composite layers of thermally grown silicon dioxide and sputtered aluminum oxide layers on silicon were also investigated and found to exhibit low surface charge densities, no hysteresis, and a 'contact potential' as well as charge stored at the interface between the two insulators. (Author).
Author : Consolidated Vacuum Corporation
Publisher :
ISBN 13 :
Total Pages : 122 pages
Book Rating : 4.:/5 (318 download)
Download or read book Symposium on the Deposition of Thin Films by Sputtering written by Consolidated Vacuum Corporation and published by . This book was released on 1966 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kiyotaka Wasa
Publisher : William Andrew
ISBN 13 : 1437734839
Total Pages : 658 pages
Book Rating : 4.4/5 (377 download)
Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-11-20 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Author : Jaydeep Sarkar
Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 614 pages
Book Rating : 4.8/5 (155 download)
Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Author : Shigeru Hayakawa
Publisher : William Andrew Publishing
ISBN 13 : 9780815512806
Total Pages : 304 pages
Book Rating : 4.5/5 (128 download)
Download or read book Handbook of Sputter Deposition Technology written by Shigeru Hayakawa and published by William Andrew Publishing. This book was released on 1992-01-01 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Author : I. H. Pratt
Publisher :
ISBN 13 :
Total Pages : 42 pages
Book Rating : 4.:/5 (227 download)
Download or read book Dielectric Characteristics of Rf Sputtered Oxide Films written by I. H. Pratt and published by . This book was released on 1969 with total page 42 pages. Available in PDF, EPUB and Kindle. Book excerpt: Results of a study on the deposition of thin-film dielectrics by RF sputtering are discussed. Source materials were silicon dioxide, aluminum oxide, tantalum oxide, and hafnium oxide, each of which was deposited onto metal electrodes and counterelectroded to complete the metal oxide metal capacitor structures for evaluation purposes. Depositions were conducted normally at 0.002 torr pressure utilizing a triode type sputtering system. Comparative rates of deposition of the dielectric materials ranged from 60 to 225 A/min for the maximum available power. The deposited films were amorphous in structure, although crystallites were dispersed in the hafnium oxide. Generally, the films displayed electrical and physical characteristics comparable to their counterparts formed by other processes, indicating that the sputtering process has the potential for translating the source materials to the substrates in a form suitable for thin-film dielectric applications. Yield study results are included in terms of non-shortened capacitors and their capability to withstand predetermined dielectric field strengths as a function of electrode areas ranging from 200 to 30,000 sq mil. (Author).
Author : Rocco John Parro (III.)
Publisher :
ISBN 13 :
Total Pages : 124 pages
Book Rating : 4.:/5 (63 download)
Download or read book He Mechanical Properties of Amorphous Silicon Carbide Films Deposited by Pecvd and Rf Sputtering for Application as a Structural Layer in Microbridge-Based Rf Mems written by Rocco John Parro (III.) and published by . This book was released on 2010 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: The purpose of this thesis was to characterize the relevant mechanical properties of amorphous silicon carbide in order to evaluate its application to microbridge-based RF MEMS switches. For the study, Young's modulus and residual stress were determined by load deflection testing of bulk micromachined thin film diaphragms of SiC deposited by plasma-enhanced chemical vapor deposition (PECVD) and radio-frequency magnetron sputtering. The effects of film thickness, a silicon or silicon dioxide substrate material, and metallization with chromium and gold on the values of Young's modulus and residual stress were quantified for 300 and 500 nm-thick PECVD SiC films annealed at 450 @C. For bi-layered, 500 nm-thick sputtered SiC films on silicon, the effects of thermal annealing at 350@C and 450@C on the values of Young's modulus, residual stress, and Poisson's ratio were determined.
Author : Diederik Depla
Publisher : Springer Science & Business Media
ISBN 13 : 3540766642
Total Pages : 584 pages
Book Rating : 4.5/5 (47 download)
Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Author : Klaus K. Schuegraf
Publisher : William Andrew
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.3/5 (91 download)
Download or read book Handbook of Thin-film Deposition Processes and Techniques written by Klaus K. Schuegraf and published by William Andrew. This book was released on 1988 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.
Author : Ali M. A. Qudah
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (599 download)
Download or read book The Effect of Deposition Conditions on the Properties of RF Sputtered Silicon Films written by Ali M. A. Qudah and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Krishna Seshan
Publisher : William Andrew
ISBN 13 : 0128123125
Total Pages : 472 pages
Book Rating : 4.1/5 (281 download)
Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2018-02-23 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics
Author : Mort
Publisher : CRC Press
ISBN 13 : 1351092715
Total Pages : 310 pages
Book Rating : 4.3/5 (51 download)
Download or read book Plasma Deposited Thin Films written by Mort and published by CRC Press. This book was released on 2018-05-04 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt: In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.
Author : Maurice H. Francombe
Publisher : Academic Press
ISBN 13 : 0080925138
Total Pages : 343 pages
Book Rating : 4.0/5 (89 download)
Download or read book Plasma Sources for Thin Film Deposition and Etching written by Maurice H. Francombe and published by Academic Press. This book was released on 2013-10-22 with total page 343 pages. Available in PDF, EPUB and Kindle. Book excerpt: This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency" sources may be viewed and compared; outlines key elements of source design affecting processing results; and highlights areas where additional research and development are needed Chapter Two reviews and analyzes the main types of electron cyclotron resonance (ECR) plasma sources suitable for ECR PACVD of thin films, mainly ECR sources using magnet coils Chapter Three examines the benefits and limitations of the new technique, unbalanced magnetron sputtering (UBM), along with the motivation for its development, the basic principles of its operation and commercial applications, and some speculations regarding the future of UBM technology Chapter Four describes general phenomena observed in connection with particle formation in thin film processing plasmas; discusses particles in PECVD plasmas, sputtering plasmas, and RIE plasmas; presents an overview of the theoretical modeling of various aspects of particles in processing plasmas; examines issues of equipment design affecting particle formation; and concludes with remarks about the implications of this work for the control of process-induced particle contamination
Author : M. Jamal Deen
Publisher : The Electrochemical Society
ISBN 13 : 9781566771375
Total Pages : 610 pages
Book Rating : 4.7/5 (713 download)
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by M. Jamal Deen and published by The Electrochemical Society. This book was released on 1997 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt:
