The Chemistry of Metal CVD

Download The Chemistry of Metal CVD PDF Online Free

Author :
Publisher : John Wiley & Sons
ISBN 13 : 3527615849
Total Pages : 562 pages
Book Rating : 4.5/5 (276 download)

DOWNLOAD NOW!


Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas

Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.

Chemical Vapor Deposition of Copper

Download Chemical Vapor Deposition of Copper PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 196 pages
Book Rating : 4.:/5 (132 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper by : Johnny Yit-Siang Boey

Download or read book Chemical Vapor Deposition of Copper written by Johnny Yit-Siang Boey and published by . This book was released on 1998 with total page 196 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper Thin Films

Download Chemical Vapor Deposition of Copper Thin Films PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 266 pages
Book Rating : 4.:/5 (132 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper Thin Films by : Raman Thiruvenkatachari

Download or read book Chemical Vapor Deposition of Copper Thin Films written by Raman Thiruvenkatachari and published by . This book was released on 2000 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper Thin Films

Download Chemical Vapor Deposition of Copper Thin Films PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 286 pages
Book Rating : 4.:/5 (267 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper Thin Films by : Wing-Cheong Gilbert Lai

Download or read book Chemical Vapor Deposition of Copper Thin Films written by Wing-Cheong Gilbert Lai and published by . This book was released on 1991 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper Thin Films

Download Chemical Vapor Deposition of Copper Thin Films PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.:/5 (286 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper Thin Films by : Reginald Bernard Little

Download or read book Chemical Vapor Deposition of Copper Thin Films written by Reginald Bernard Little and published by . This book was released on 1992 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Chemistry of Metal CVD

Download The Chemistry of Metal CVD PDF Online Free

Author :
Publisher : Wiley-VCH
ISBN 13 :
Total Pages : 570 pages
Book Rating : 4.3/5 (91 download)

DOWNLOAD NOW!


Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas

Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by Wiley-VCH. This book was released on 1994-09-13 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.

Chemical Vapor Deposition of Copper Films

Download Chemical Vapor Deposition of Copper Films PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 368 pages
Book Rating : 4.:/5 (382 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper Films by : Narendra Shamkant Borgharkar

Download or read book Chemical Vapor Deposition of Copper Films written by Narendra Shamkant Borgharkar and published by . This book was released on 1997 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors

Download Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 294 pages
Book Rating : 4.:/5 (279 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors by : Patrick Michael Jeffries

Download or read book Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors written by Patrick Michael Jeffries and published by . This book was released on 1992 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-organic chemical vapor deposition (MOCVD) from the tetrameric precursor copper(I) tert-butoxide, (Cu(O-t-Bu)) $\sb4$, results in the deposition of pure copper(I) oxide whiskers at 510 K and of copper metal with $\sim$2% oxygen contamination at 670 K. Quantitative analyses of the gaseous byproducts generated during the deposition, electron energy loss spectroscopy, and temperature programmed desorption experiments indicate that copper(I) oxide is formed by an elimination mechanism and copper metal is formed by deoxygenation of an initially deposited copper(I) oxide phase. New volatile monomeric Cu$\sp{\rm II}$ alkoxides have been synthesized with the general formula Cu(OR)$\sb2$L, where OR is OCH(CF$\sb3)\sb2$ or OC(CH$\sb3$)(CF$\sb3)\sb2$ and L is a bidentate amine. These compounds were prepared by the reaction of Cu(OMe)$\sb2$ with HOR and the amine in diethyl ether. The degree of distortion from square planar geometry for these compounds was measured by EPR spectroscopy, UV-vis spectroscopy, and X-ray crystallography. At 570 K, these compounds are MOCVD precursors for the deposition of pure copper metal. The surface chemistry of copper(I) and copper(II) $\beta$-diketonate complexes has been examined under ultrahigh vacuum conditions on copper single crystals by temperature programmed desorption studies, electron energy loss spectroscopy, infrared spectroscopy, and Auger spectroscopy. Above 200 K, the $\beta$-diketonate ligands migrate from the adsorbed copper compound to the copper surface. At $\sim$375 K, the ligands begin to fragment to give trifluoromethyl and ketenylidene surface species. Decarbonylation of the ketenylidene groups at $\sim$525 K leads to a carbon overlayer. Silver films have been prepared by MOCVD from (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ at 550 K. Studies of the deposition mechanism reveal that (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ initially deposits AgF by an elimination reaction and AgF then loses fluorine to produce silver metal. The crystal structure of (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ was determined and shows that the compound is a tetramer that consists of a square plane of silver atoms in which each edge is bridged by a perfluorobutenyl ligand. The ruthenium alkyl complexes (Li(tmed)) $\sb2$(($\eta\sp4$-C$\sb 7$H$\sb8$)RuMe$\sb4$) and (Li(tmed)) $\sb2(\eta\sp5$-C$\sb8$H$\sb{11}$)RuMe$\sb4$) have also been prepared and characterized.

The Low Temperature Chemical Vapor Deposition of Copper Using Atom Reactions

Download The Low Temperature Chemical Vapor Deposition of Copper Using Atom Reactions PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 122 pages
Book Rating : 4.:/5 (115 download)

DOWNLOAD NOW!


Book Synopsis The Low Temperature Chemical Vapor Deposition of Copper Using Atom Reactions by : Peter S. Locke

Download or read book The Low Temperature Chemical Vapor Deposition of Copper Using Atom Reactions written by Peter S. Locke and published by . This book was released on 1996 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper and Copper Oxides

Download Chemical Vapor Deposition of Copper and Copper Oxides PDF Online Free

Author :
Publisher : LAP Lambert Academic Publishing
ISBN 13 : 9783659199820
Total Pages : 96 pages
Book Rating : 4.1/5 (998 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper and Copper Oxides by : Jorge Ramírez-Ortiz

Download or read book Chemical Vapor Deposition of Copper and Copper Oxides written by Jorge Ramírez-Ortiz and published by LAP Lambert Academic Publishing. This book was released on 2012-08 with total page 96 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) is a very versatile process widely used in the production of thin solid films and surface coating. It is also used to produce powders, fibers and monolithic components. In addition, the majority of chemical elements in the periodic table has been deposited, as well as compounds such as carbides, nitrides, oxides, intermetallic and many others. Chemical vapor deposition has been a critical technology in silicon microelectronics processes, fabrication of thin films of metals, semiconductors, and insulators. With increasing packing density in microelectronic devices, copper is used as an interconnecting metal due to its superior electrical conductivity and excellent resistance against electromigration. One of the advantages of chemcial vapor deposition is that selective deposition onto one surface, often defined as the growth surface, in the presence of another surface, often defined as non-growth surface is possible. The high optical absorption coefficient and low cost of production of Cu2O thin films have they made good candidates for electrochromic devices, solar cells and oxygen sensors.

Precursors for Copper Chemical Vapor Deposition

Download Precursors for Copper Chemical Vapor Deposition PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (61 download)

DOWNLOAD NOW!


Book Synopsis Precursors for Copper Chemical Vapor Deposition by : Muna BuFaroosha

Download or read book Precursors for Copper Chemical Vapor Deposition written by Muna BuFaroosha and published by . This book was released on 2002 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper

Download Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 324 pages
Book Rating : 4.:/5 (415 download)

DOWNLOAD NOW!


Book Synopsis Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper by : Tony Ping-chen Chiang

Download or read book Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper written by Tony Ping-chen Chiang and published by . This book was released on 1996 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2).

Download Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 69 pages
Book Rating : 4.:/5 (115 download)

DOWNLOAD NOW!


Book Synopsis Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). by : Do-Heyoung Kim

Download or read book Studies of Chemical Vapor Deposition of Copper with Cu(HFA)(sub 2). written by Do-Heyoung Kim and published by . This book was released on 1990 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate

Download Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 12 pages
Book Rating : 4.:/5 (256 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate by : D. Temple

Download or read book Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate written by D. Temple and published by . This book was released on 1990 with total page 12 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds

Download Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 280 pages
Book Rating : 4.:/5 (115 download)

DOWNLOAD NOW!


Book Synopsis Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds by : Mehul B. Naik

Download or read book Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds written by Mehul B. Naik and published by . This book was released on 1995 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition

Download Chemical Vapor Deposition PDF Online Free

Author :
Publisher : ASM International
ISBN 13 : 161503224X
Total Pages : 477 pages
Book Rating : 4.6/5 (15 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition by : Jong-Hee Park

Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition of Copper Metal Using Cu(hfac)2 Alcohol Adducts

Download Chemical Vapor Deposition of Copper Metal Using Cu(hfac)2 Alcohol Adducts PDF Online Free

Author :
Publisher :
ISBN 13 :
Total Pages : 210 pages
Book Rating : 4.:/5 (448 download)

DOWNLOAD NOW!


Book Synopsis Chemical Vapor Deposition of Copper Metal Using Cu(hfac)2 Alcohol Adducts by : Hui Fan

Download or read book Chemical Vapor Deposition of Copper Metal Using Cu(hfac)2 Alcohol Adducts written by Hui Fan and published by . This book was released on 2000 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: