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Charge Neutralization Apparatus For Ion Implantation System
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Book Synopsis Ion Implantation Technology - 94 by : S. Coffa
Download or read book Ion Implantation Technology - 94 written by S. Coffa and published by Newnes. This book was released on 1995-05-16 with total page 1031 pages. Available in PDF, EPUB and Kindle. Book excerpt: The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Book Synopsis Ion Implantation: Basics to Device Fabrication by : Emanuele Rimini
Download or read book Ion Implantation: Basics to Device Fabrication written by Emanuele Rimini and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.
Book Synopsis Ion Implantation Technology - 92 by : D.F. Downey
Download or read book Ion Implantation Technology - 92 written by D.F. Downey and published by Elsevier. This book was released on 2012-12-02 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
Book Synopsis Official Gazette of the United States Patent and Trademark Office by :
Download or read book Official Gazette of the United States Patent and Trademark Office written by and published by . This book was released on 1999 with total page 1540 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Implantation: Equipment and Techniques by : H. Ryssel
Download or read book Ion Implantation: Equipment and Techniques written by H. Ryssel and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Fourth International Conference on Ion Implantation: Equipment and Tech niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.
Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 1720 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Book Synopsis Ion Implantation Techniques by : H. Ryssel
Download or read book Ion Implantation Techniques written by H. Ryssel and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.
Book Synopsis Ion Implantation Science and Technology by : J.F. Ziegler
Download or read book Ion Implantation Science and Technology written by J.F. Ziegler and published by Elsevier. This book was released on 2012-12-02 with total page 509 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Book Synopsis Handbook of Ion Sources by : Bernhard Wolf
Download or read book Handbook of Ion Sources written by Bernhard Wolf and published by CRC Press. This book was released on 2017-07-12 with total page 560 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2692 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis ASM Materials Engineering Dictionary by : Joseph R. Davis
Download or read book ASM Materials Engineering Dictionary written by Joseph R. Davis and published by ASM International. This book was released on 1992-01-01 with total page 590 pages. Available in PDF, EPUB and Kindle. Book excerpt: The 10,000 entries (arranged from A to Z) are supplemeted by hundreds of figures (approximately 700) & tables (more than 150) that clearly demonstrate the principles & concepts behind important manufacturing processes, illustrate the important structures, or provide representative compositional & property data for a wide variety of ferrous & nonferrous materials, plastics, ceramics, composites (resin-metal-carbon-&-cermaic-matrix) & adhesives. "Technical Briefs" provide encyclopedic-type coverage for some 64 key material groups. Each Technical Brief contains a "Recommended Reading" list to guide the user to additional information. Published by ASM International (tm), Materials Park, OH 44073.
Book Synopsis Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams by : Efim Oks
Download or read book Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams written by Efim Oks and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt: The NATO-sponsored Advanced Research Workshop (ARW) on "Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams" was held at the Baikal Dunes Resort, Lake Baikal, Russia, on June 24-28, 2002. Participants were from NATO countries Belgium, Czech Republic, Germany, Poland, Turkey and the USA, and from NATO partner countries Bulgaria, Russia, Ukraine and Uzbekistan. The goal of the meeting was to bring together researchers involved in novel applications of plasmas and ion/electron beams formed from vacuum arc discharges, especially in less conventional or emerging scientific areas such as new perspectives on vacuum arc phenomena, generation of high charge state metal ions, heavy ion accelerator injection, multi-layer thin film synthesis, biological applications, generation of high-current high-density electron beams, and more. It was our hope that the meeting would engender new research directions and help to establish new collaborations, prompt new thinking for research and technology applications of vacuum arc science, and in general foster development of the field. The Workshop was a great success, as was clearly felt by all of the attendees. The small number of participants at the meeting tended to encourage a high level of closeness and communication between individuals. The location, a small resort on the western side of Lake Baikal in the vicinity of Irkutsk, was ideal - the isolated location, small and quiet, was excellent and was most conducive to discussion among individuals and small groups quite apart from the formal presentations.
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 888 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma and Fusion Science by : B. Raneesh
Download or read book Plasma and Fusion Science written by B. Raneesh and published by CRC Press. This book was released on 2018-01-03 with total page 469 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this new book, an interdisciplinary and international team of experts provides an exploration of the emerging plasma science that is poised to make the plasma technology a reality in the manufacturing sector. The research presented here will stimulate new ideas, methods, and applications in the field of plasma science and nanotechnology. Plasma technology applications are being developed that could impact the global market for power, electronics, mineral, and other fuel commodities. Currently, plasma science is described as a revolutionary discipline in terms of its possible impact on industrial applications. It offers potential solutions to many problems using emerging techniques. In this book the authors provide a broad overview of recent trends in field plasma science and nanotechnology. Divided into several parts, Plasma and Fusion Science: From Fundamental Research to Technological Applications explores some basic plasma applications and research, space and atmospheric plasma, nuclear fusion, and laser plasma and industrial applications of plasma. A wide variety of cutting-edge topics are covered, including: • basic plasma physics • computer modeling for plasma • exotic plasma (including dusty plasma) • industrial plasma applications • laser plasma • nuclear fusion technology • plasma diagnostics • plasma processing • pulsed power • space astrophysical plasma • plasma and nanotechnology Pointing to current and possible future developments in plasma science and technology, the diverse research presented here will be valuable for researchers, scientists, industry professionals, and others involved in the revolutionary field of plasma and fusion science.
Book Synopsis Ion Beams in Nanoscience and Technology by : Ragnar Hellborg
Download or read book Ion Beams in Nanoscience and Technology written by Ragnar Hellborg and published by Springer Science & Business Media. This book was released on 2009-11-09 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt: Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1976-06 with total page 1216 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion Impantation Technology by : Karen J. Kirkby
Download or read book Ion Impantation Technology written by Karen J. Kirkby and published by American Institute of Physics. This book was released on 2006-12-04 with total page 690 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
