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Download or read book Application of Chemical-mechanical Polishing to Planarization of Surface-micromachined Devices written by and published by . This book was released on 1996 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 6 pages
Book Rating : 4.:/5 (683 download)
Download or read book Application of Chemical-mechanical Polishing to Planarization of Surface-micromachined Devises written by and published by . This book was released on 1996 with total page 6 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical-Mechanical Polishing (CMP) has emerged as an enabling technology for manufacturing multi-level metal interconnects used in high-density Integrated Circuits (IC). In this work we present extension of CMP from sub-micron IC manufacturing to fabrication of complex surface-micromachined Micro-ElectroMechanical Systems (MEMS). This planarization technique alleviates processing problems associated with fabrication of multi-level polysilicon structures, eliminates design constraints linked with non-planar topography, and provides an avenue for integrating different process technologies. We discuss the CMP process and present examples of the use of CMP in fabricating MEMS devices such as microengines, pressures sensors, and proof masses for accelerometers along with its use for monolithically integrating MEMS devices with microelectronics.
Author : Edward Augustus Freeman
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (638 download)
Download or read book The History of the Norman Conquest of England: The preliminary history to the election of Eadward the Confessor written by Edward Augustus Freeman and published by . This book was released on 1870 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Henry G. Hughes
Publisher : The Electrochemical Society
ISBN 13 : 9781566772068
Total Pages : 286 pages
Book Rating : 4.7/5 (72 download)
Download or read book Proceedings of the Symposium on Microstructures and Microfabricated Systems IV written by Henry G. Hughes and published by The Electrochemical Society. This book was released on 1998 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yuzhuo Li
Publisher : John Wiley & Sons
ISBN 13 : 9780470180891
Total Pages : 760 pages
Book Rating : 4.1/5 (88 download)
Download or read book Microelectronic Applications of Chemical Mechanical Planarization written by Yuzhuo Li and published by John Wiley & Sons. This book was released on 2007-12-04 with total page 760 pages. Available in PDF, EPUB and Kindle. Book excerpt: An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.
Author : Soon Kang Huang
Publisher :
ISBN 13 :
Total Pages : 172 pages
Book Rating : 4.:/5 (347 download)
Download or read book Chemical-mechanical Polishing written by Soon Kang Huang and published by . This book was released on 1996 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Robert Osiander
Publisher : CRC Press
ISBN 13 : 1420027743
Total Pages : 400 pages
Book Rating : 4.4/5 (2 download)
Download or read book MEMS and Microstructures in Aerospace Applications written by Robert Osiander and published by CRC Press. This book was released on 2018-10-03 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt: The promise of MEMS for aerospace applications has been germinating for years, and current advances bring the field to the very cusp of fruition. Reliability is chief among the challenges limiting the deployment of MEMS technologies in space, as the requirement of zero failure during the mission is quite stringent for this burgeoning field. MEMS and Microstructures in Aerospace Applications provides all the necessary tools to overcome these obstacles and take MEMS from the lab bench to beyond the exosphere. The book begins with an overview of MEMS development and provides several demonstrations of past and current examples of MEMS in space. From this platform, the discussion builds to fabrication technologies; the effect of space environmental factors on MEMS devices; and micro technologies for space systems, instrumentation, communications, thermal control, guidance navigation and control, and propulsion. Subsequent chapters explore factors common to all of the described systems, such as MEMS packaging, handling and contamination control, material selection for specific applications, reliability practices for design and application, and assurance practices. Edited and contributed by an outstanding team of leading experts from industry, academia, and national laboratories, MEMS and Microstructures in Aerospace Applications illuminates the path toward qualifying and integrating MEMS devices and instruments into future space missions and developing innovative satellite systems.
Author :
Publisher :
ISBN 13 :
Total Pages : 460 pages
Book Rating : 4.3/5 (91 download)
Download or read book Micromachined Devices and Components written by and published by . This book was released on 1998 with total page 460 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Use of Chemical Mechanical Polishing in Micromachining written by and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A process for removing topography effects during fabrication of micromachines. A sacrificial oxide layer is deposited over a level containing functional elements with etched valleys between the elements such that the sacrificial layer has sufficient thickness to fill the valleys and extend in thickness upwards to the extent that the lowest point on the upper surface of the oxide layer is at least as high as the top surface of the functional elements in the covered level. The sacrificial oxide layer is then polished down and planarized by chemical-mechanical polishing. Another layer of functional elements is then formed upon this new planarized surface.
Author : James J. Allen
Publisher : CRC Press
ISBN 13 : 1420027751
Total Pages : 492 pages
Book Rating : 4.4/5 (2 download)
Download or read book Micro Electro Mechanical System Design written by James J. Allen and published by CRC Press. This book was released on 2005-07-08 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: It is challenging at best to find a resource that provides the breadth of information necessary to develop a successful micro electro mechanical system (MEMS) design. Micro Electro Mechanical System Design is that resource. It is a comprehensive, single-source guide that explains the design process by illustrating the full range of issues involved,
Author : S. V. Babu
Publisher :
ISBN 13 :
Total Pages : 304 pages
Book Rating : 4.:/5 (318 download)
Download or read book Chemical-Mechanical Polishing - Fundamentals and Challenges: Volume 566 written by S. V. Babu and published by . This book was released on 2000-02-10 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Zhaoying Zhou
Publisher : Springer Science & Business Media
ISBN 13 : 3642182933
Total Pages : 1011 pages
Book Rating : 4.6/5 (421 download)
Download or read book Microsystems and Nanotechnology written by Zhaoying Zhou and published by Springer Science & Business Media. This book was released on 2012-08-30 with total page 1011 pages. Available in PDF, EPUB and Kindle. Book excerpt: “Microsystems and Nanotechnology” presents the latest science and engineering research and achievements in the fields of microsystems and nanotechnology, bringing together contributions by authoritative experts from the United States, Germany, Great Britain, Japan and China to discuss the latest advances in microelectromechanical systems (MEMS) technology and micro/nanotechnology. The book is divided into five parts – the fundamentals of microsystems and nanotechnology, microsystems technology, nanotechnology, application issues, and the developments and prospects – and is a valuable reference for students, teachers and engineers working with the involved technologies. Professor Zhaoying Zhou is a professor at the Department of Precision Instruments & Mechanology , Tsinghua University , and the Chairman of the MEMS & NEMS Society of China. Dr. Zhonglin Wang is the Director of the Center for Nanostructure Characterization, Georgia Tech, USA. Dr. Liwei Lin is a Professor at the Department of Mechanical Engineering, University of California at Berkeley, USA.
Author : Toshiro Doi
Publisher : William Andrew
ISBN 13 : 1437778593
Total Pages : 330 pages
Book Rating : 4.4/5 (377 download)
Download or read book Advances in CMP Polishing Technologies written by Toshiro Doi and published by William Andrew. This book was released on 2011-12-06 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt: CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan
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Publisher :
ISBN 13 :
Total Pages : 10 pages
Book Rating : 4.:/5 (684 download)
Download or read book Planarization Techniques for MEMS written by and published by . This book was released on 1996 with total page 10 pages. Available in PDF, EPUB and Kindle. Book excerpt: Planarization techniques such as chemical-mechanical polishing (CMP) have emerged as enabling technologies for the manufacturing of multi- level metal interconnects used in high-density Integrated Circuits (IC). An overview of general planarization techniques for MicroElectroMechanical Systems (MEMS) and, in particular, the extension of CMP from sub-micron IC manufacturing to the fabrication of complex surface-micromachined MEMS will be presented. Planarization technique alleviates processing problems associated with fabrication of multi-level polysilicon structures, eliminates design constraints linked with non-planar topography, and provides an avenue for integrating different process technologies. The CMP process and present examples of the use of CMP in fabricating MEMS devices such as microengines, pressure sensors, and proof masses for accelerometers along with its use for monolithically integrating MEMS devices with microelectronics are presented.
Author : Sudipta Seal
Publisher : The Electrochemical Society
ISBN 13 : 9781566774048
Total Pages : 370 pages
Book Rating : 4.7/5 (74 download)
Download or read book Chemical Mechanical Planarization VI written by Sudipta Seal and published by The Electrochemical Society. This book was released on 2003 with total page 370 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Robert Tyson
Publisher : CRC Press
ISBN 13 : 082474165X
Total Pages : 337 pages
Book Rating : 4.8/5 (247 download)
Download or read book Adaptive Optics Engineering Handbook written by Robert Tyson and published by CRC Press. This book was released on 1999-11-10 with total page 337 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook supplies analytical tools for the design and development of adaptive optics systems to enhance their ability to adjust for atmospheric turbulence, optical fabrication errors, thermally induced distortions, and laser device aberrations. It provides recommendations for selecting, testing and installing a wavefront compensation system.
Author :
Publisher :
ISBN 13 :
Total Pages : 5 pages
Book Rating : 4.:/5 (684 download)
Download or read book The Integration of Surface Micromachined Devices with Optoelectronics written by and published by . This book was released on 1998 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sandia National Laboratories has a substantial effort in development of microelectromechanical system (MEMS) technologies. This miniaturization capability can lead to low-cost, small, high-performance systems-on-a-chip, and have many applications ranging from advanced military systems to large-volume commercial markets like automobiles, rf or land-based communications networks and equipment, or commercial electronics. One of the key challenges in realization of the microsystem is integration of several technologies including digital electronics; analog and rf electronics, optoelectronics, sensors and actuators, and advanced packaging technologies. In this work they describe efforts in integrating MEMS and optoelectronic or photonic functions and the fabrication constraints on both system components. the MEMS technology used in this work are silicon surface-machined systems fabricated using the SUMMiT (Sandia Ultraplanar Multilevel MEMS Technology) process developed at Sandia. This process includes chemical-mechanical polishing as an intermediate planarization step to allow the use of 4 or 5 levels of polysilicon.
