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Author : Brian Thomas McDermott
Publisher :
ISBN 13 :
Total Pages : 304 pages
Book Rating : 4.:/5 (229 download)
Download or read book Application of Atomic Layer Epitaxy to the Growth of III-V Compounds written by Brian Thomas McDermott and published by . This book was released on 1990 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : T. Suntola
Publisher : Springer
ISBN 13 :
Total Pages : 200 pages
Book Rating : 4.:/5 (45 download)
Download or read book Atomic Layer Epitaxy written by T. Suntola and published by Springer. This book was released on 1989-10-31 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a detailed study of the Atomic Layer Epitaxy technique (ALE), its development, current and potential applications. The rapid development of coating technologies over the last 25 years has been instrumental in generating interest and expertise in thin films of materials, and indeed the market for thin film coatings is currently £3 billion with projected annual growth of 20 to 30% [1]. ALE is typical of thin-film processes in that problems in the processing or preparation of good quality epitaxial films have been overcome, resulting in better performance, novel applications of previously unsuitable materials, and the development of new devices. Many materials exhibit interesting and novel properties when prepared as thin films and doped. Vapour-deposited coatings and films are used extensively in the semiconductor and related industries for making single devices, integrated circuits, microwave hybrid integrated circuits, compact discs, solar reflective glazing, fibre optics, photo voltaic cells, sensors, displays, and many other products in general, everyday use. The ALE technique was developed by a research team led by Tuomo Suntola, working for Instrumentarium Oy in Finland. The key members of this team were lorma Antson, Arto Pakkala and Sven Lindfors. In 1977, the research team moved from Instrumentarium to Lohja Corporation, where they continued the development of ALE and were granted a patent in the same year. By 1980, the technique was sufficiently advanced that they were producing flat-screen electroluminescent displays based on a manganese-doped zinc sulphide layer.
Author : Paul D. Dapkus
Publisher :
ISBN 13 :
Total Pages : 27 pages
Book Rating : 4.:/5 (227 download)
Download or read book Atomic Layer Epitaxy of III-V Compounds written by Paul D. Dapkus and published by . This book was released on 1986 with total page 27 pages. Available in PDF, EPUB and Kindle. Book excerpt: This program is intended to develop a process for the growth of GaAs and related compounds by Atomic Layer Epitaxy (ALE). The program involves fundamental studies of gas phase kinetics of the organometallic and hydrides to be used in the process as well as surface reaction studies to determine the surface of various organometallics. We have chosen in this program to effect ALE growth in a dense H2 atmosphere. We believe that the reactivity of H2 is important to the removal, by hydrogenation, of the alkyl radicals from the growing surface. To better understand the process we are pursuing fundamental information in two areas. First, basic measurements of the reactivity band reaction products of organometallics and hydrides and of photogenerated species with compound semiconductor surfaces are being undertaken that will determine the feasibility of using photoactivation and in thermal catalytic reactions in the gas phase to accomplish ALE. Second, epitaxial growth experiments are being performed to determine the feasibility of an ALE process employing photodecomposition of surface absorbed species as well as thermal catalytic reactions.
Author : Anthony C. Jones
Publisher : John Wiley & Sons
ISBN 13 : 3527614621
Total Pages : 352 pages
Book Rating : 4.5/5 (276 download)
Download or read book CVD of Compound Semiconductors written by Anthony C. Jones and published by John Wiley & Sons. This book was released on 2008-11-20 with total page 352 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical growth methods of electronic materials are the keystone of microelectronic device processing. This book discusses the applications of metalorganic chemistry for the vapor phase deposition of compound semiconductors. Vapor phase methods used for semiconductor deposition and the materials properties that make the organometallic precursors useful in the electronics industry are discussed for a variety of materials. Topics included: * techniques for compound semiconductor growth * metalorganic precursors for III-V MOVPE * metalorganic precursors for II-VI MOVPE * single-source precursors * chemical beam epitaxy * atomic layer epitaxy Several useful appendixes and a critically selected, up-to-date list of references round off this practical handbook for materials scientists, solid-state and organometallic chemists, and engineers.
Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)
Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author : Steven P. DenBaars
Publisher :
ISBN 13 :
Total Pages : 251 pages
Book Rating : 4.:/5 (227 download)
Download or read book Atomic Layer Epitaxy of III-V Compound Semiconductors by Thermal and Laser-Assisted Metalorganic Chemical Vapor Deposition written by Steven P. DenBaars and published by . This book was released on 1988 with total page 251 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic Layer Epitaxy (ALE) is a promising variation of conventional vapor phase epitaxy which achieves uniform growth of ultra-thin epitaxial layers by a self-limiting monolayer by monolayer deposition process. By developing a new regime of metalorganic chemical vapor deposition (MOCVD) growth, in which saturated surface reactions control the growth, it is possible to alternately deposit monolayers of column III and column V elements so that only one monolayer of the III-V compound semiconductor is deposited in every cycle of the deposition. In this thesis, ALE growth of single crystal GaAs, as well as AlAs and GaAs/AlGaAs heterostructures and devices is demonstrated. We have been able to grow extremely uniform ultra-thin epitaxial layers and quantum wells (QWs) with thickness variations of less than one monolayer per cm over an entire sample in an optimized reactor using ALE. The observed dependence of the growth rate on temperature and trimethylgallium flux is modeled by first order adsorption kinetics utilizing measured reaction rate constants. The low temperature photoluminescence (PL) of ALE grown GaAs QW's exhibit narrow line intrinsic luminescence with linewidths comparable to the best reported values by conventional MOCVD. (jhd).
Author : Electrochemical Society. High Temperature Materials Division
Publisher :
ISBN 13 :
Total Pages : 1296 pages
Book Rating : 4.E/5 ( download)
Download or read book Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 written by Electrochemical Society. High Temperature Materials Division and published by . This book was released on 1987 with total page 1296 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Thomas Wächtler
Publisher : Thomas Waechtler
ISBN 13 : 3941003178
Total Pages : 247 pages
Book Rating : 4.9/5 (41 download)
Download or read book Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices written by Thomas Wächtler and published by Thomas Waechtler. This book was released on 2010 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : H.E. Rúda
Publisher : Springer Science & Business Media
ISBN 13 : 1461534860
Total Pages : 424 pages
Book Rating : 4.4/5 (615 download)
Download or read book Widegap II–VI Compounds for Opto-electronic Applications written by H.E. Rúda and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is intended for readers desiring a comprehensive analysis of the latest developments in widegap II-VI materials research for opto-electronic applications and basic insight into the fundamental underlying principles. Therefore, it is hoped that this book will serve two purposes. Firstly, to educate newcomers to this exciting area of physics and technology and, secondly, to provide specialists with useful references and new insights in related areas of II-VI materials research. The motivation for preparing this book originated from the need for a current review of this fertile and important field. A primary goal of this book is therefore to present an eclectic synthesis of these sometimes diverse fields of investigation. This book consists of three main sections, namely (1) Growth and Properties, (2) Materials Characterization and (3) Devices. Part One presents an overall perspective of the state of the art in the preparation of the widegap II-VI materials. Part Two concentrates on current topics pertinent to the characterization of these materials from the unique perspective of each of the authors. Part Three focuses on advances in the opto-electronic applications of these materials. The material in this section runs the gamut from addressing recent advances in device areas which date back to some of the earliest reported research in these materials, to tackling some quite new and exciting future directions.
Author : Hajime Asahi
Publisher : John Wiley & Sons
ISBN 13 : 1119355001
Total Pages : 512 pages
Book Rating : 4.1/5 (193 download)
Download or read book Molecular Beam Epitaxy written by Hajime Asahi and published by John Wiley & Sons. This book was released on 2019-01-30 with total page 512 pages. Available in PDF, EPUB and Kindle. Book excerpt: Covers both the fundamentals and the state-of-the-art technology used for MBE Written by expert researchers working on the frontlines of the field, this book covers fundamentals of Molecular Beam Epitaxy (MBE) technology and science, as well as state-of-the-art MBE technology for electronic and optoelectronic device applications. MBE applications to magnetic semiconductor materials are also included for future magnetic and spintronic device applications. Molecular Beam Epitaxy: Materials and Applications for Electronics and Optoelectronics is presented in five parts: Fundamentals of MBE; MBE technology for electronic devices application; MBE for optoelectronic devices; Magnetic semiconductors and spintronics devices; and Challenge of MBE to new materials and new researches. The book offers chapters covering the history of MBE; principles of MBE and fundamental mechanism of MBE growth; migration enhanced epitaxy and its application; quantum dot formation and selective area growth by MBE; MBE of III-nitride semiconductors for electronic devices; MBE for Tunnel-FETs; applications of III-V semiconductor quantum dots in optoelectronic devices; MBE of III-V and III-nitride heterostructures for optoelectronic devices with emission wavelengths from THz to ultraviolet; MBE of III-V semiconductors for mid-infrared photodetectors and solar cells; dilute magnetic semiconductor materials and ferromagnet/semiconductor heterostructures and their application to spintronic devices; applications of bismuth-containing III–V semiconductors in devices; MBE growth and device applications of Ga2O3; Heterovalent semiconductor structures and their device applications; and more. Includes chapters on the fundamentals of MBE Covers new challenging researches in MBE and new technologies Edited by two pioneers in the field of MBE with contributions from well-known MBE authors including three Al Cho MBE Award winners Part of the Materials for Electronic and Optoelectronic Applications series Molecular Beam Epitaxy: Materials and Applications for Electronics and Optoelectronics will appeal to graduate students, researchers in academia and industry, and others interested in the area of epitaxial growth.
Author : Takashi Hariu
Publisher : World Scientific
ISBN 13 : 9789971508395
Total Pages : 356 pages
Book Rating : 4.5/5 (83 download)
Download or read book Low Temperature Epitaxial Growth of Semiconductors written by Takashi Hariu and published by World Scientific. This book was released on 1991 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
Author : Marian A. Herman
Publisher : Springer Science & Business Media
ISBN 13 : 3662070642
Total Pages : 530 pages
Book Rating : 4.6/5 (62 download)
Download or read book Epitaxy written by Marian A. Herman and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 530 pages. Available in PDF, EPUB and Kindle. Book excerpt: In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates, e.g. processes in which atoms of the growing film mimic the arrangement of the atoms of the substrate. Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review. A large part of this book focuses on the problems of heteroepitaxy. The most important epitaxial growth techniques which are currently widely used in basic research as well as in manufacturing processes of devices are presented and discussed in detail.
Author :
Publisher : Academic Press
ISBN 13 : 0128043377
Total Pages : 360 pages
Book Rating : 4.1/5 (28 download)
Download or read book 2D Materials written by and published by Academic Press. This book was released on 2016-06-24 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt: 2D Materials contains the latest information on the current frontier of nanotechnology, the thinnest form of materials to ever occur in nature. A little over 10 years ago, this was a completely unknown area, not thought to exist. However, since then, graphene has been isolated and acclaimed, and a whole other class of atomically thin materials, dominated by surface effects and showing completely unexpected and extraordinary properties has been created. This book is ideal for a variety of readers, including those seeking a high-level overview or a very detailed and critical analysis. No nanotechnologist can currently overlook this new class of materials. - Presents one of the first detailed books on this subject of nanotechnology - Contains contributions from a great line-up of authoritative contributors that bring together theory and experiments - Ideal for a variety of readers, including those seeking a high-level overview or a very detailed and critical analysis
Author :
Publisher : Academic Press
ISBN 13 : 0128010681
Total Pages : 192 pages
Book Rating : 4.1/5 (28 download)
Download or read book Advances in Photovoltaics: Part 4 written by and published by Academic Press. This book was released on 2015-06-25 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in Photovoltaics: Part Four provides valuable information on the challenges faced during the transformation of our energy supply system to more efficient, renewable energies. The volume discusses the topic from a global perspective, presenting the latest information on photovoltaics, a cornerstone technology. It covers all aspects of this important semiconductor technology, reflecting on the tremendous and dynamic advances that have been made on this topic since 1975, when the first book on solar cells—written by Harold J. Hovel of IBM—was published as volume 11 in the now famous series on Semiconductors and Semimetals. Readers will gain a behind the scenes look at the continuous and rapid scientific development that leads to the necessary price and cost reductions in global industrial mass-production. - Written by leading, internationally known experts on his topic - Provides an in-depth overview of the current status and perspectives of thin film PV technologies - Discusses the challenges faced during the transformation of our energy supply system to more efficient, renewable energies - Delves deep into photovoltaics, a cornerstone technolog
Author : Anthony C. Jones
Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)
Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Author : Osamu Wada
Publisher : Springer Science & Business Media
ISBN 13 : 1461526868
Total Pages : 464 pages
Book Rating : 4.4/5 (615 download)
Download or read book Optoelectronic Integration: Physics, Technology and Applications written by Osamu Wada and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 464 pages. Available in PDF, EPUB and Kindle. Book excerpt: As we approach the end of the present century, the elementary particles of light (photons) are seen to be competing increasingly with the elementary particles of charge (electrons/holes) in the task of transmitting and processing the insatiable amounts of infonnation needed by society. The massive enhancements in electronic signal processing that have taken place since the discovery of the transistor, elegantly demonstrate how we have learned to make use of the strong interactions that exist between assemblages of electrons and holes, disposed in suitably designed geometries, and replicated on an increasingly fine scale. On the other hand, photons interact extremely weakly amongst themselves and all-photonic active circuit elements, where photons control photons, are presently very difficult to realise, particularly in small volumes. Fortunately rapid developments in the design and understanding of semiconductor injection lasers coupled with newly recognized quantum phenomena, that arise when device dimensions become comparable with electronic wavelengths, have clearly demonstrated how efficient and fast the interaction between electrons and photons can be. This latter situation has therefore provided a strong incentive to devise and study monolithic integrated circuits which involve both electrons and photons in their operation. As chapter I notes, it is barely fifteen years ago since the first demonstration of simple optoelectronic integrated circuits were realised using m-V compound semiconductors; these combined either a laser/driver or photodetector/preamplifier combination.
Author :
Publisher : Academic Press
ISBN 13 : 008086452X
Total Pages : 593 pages
Book Rating : 4.0/5 (88 download)
Download or read book High Pressure Semiconductor Physics I written by and published by Academic Press. This book was released on 1998-09-09 with total page 593 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded.Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. Volumes 54 and 55 present contributions by leading researchers in the field of high pressure semiconductors. Edited by T. Suski and W. Paul, these volumes continue the tradition of well-known but outdated publications such as Brigman's The Physics of High Pressure (1931 and 1949) and High Pressure Physics and Chemistry edited by Bradley. Volumes 54 and 55 reflect the industrially important recent developments in research and applications of semiconductor properties and behavior under desirable risk-free conditions at high pressures. These developments include the advent of the diamond anvil cell technique and the availability of commercial pistoncylinder apparatus operating at high hydrostatic pressures. These much-needed books will be useful to both researchers and practitioners in applied physics, materials science, and engineering.
