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Author :
Publisher :
ISBN 13 :
Total Pages : 780 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advances in Resist Technology and Processing written by and published by . This book was released on 2006 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Klaus D. Sattler
Publisher : CRC Press
ISBN 13 : 1420075519
Total Pages : 782 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Author : Rasit Onur Topaloglu
Publisher : Bentham Science Publishers
ISBN 13 : 1608050742
Total Pages : 200 pages
Book Rating : 4.6/5 (8 download)
Download or read book Recent Topics on Modeling of Semiconductor Processes, Devices, and Circuits written by Rasit Onur Topaloglu and published by Bentham Science Publishers. This book was released on 2011-09-09 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Author : D. Harame
Publisher : The Electrochemical Society
ISBN 13 : 1607685434
Total Pages : 1042 pages
Book Rating : 4.6/5 (76 download)
Download or read book SiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices written by D. Harame and published by The Electrochemical Society. This book was released on with total page 1042 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 688 pages
Book Rating : 4.F/5 ( download)
Download or read book Advances in Resist Technology and Processing XXI written by and published by . This book was released on 2004 with total page 688 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Rajiv Kohli
Publisher : William Andrew
ISBN 13 : 0323431720
Total Pages : 214 pages
Book Rating : 4.3/5 (234 download)
Download or read book Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning written by Rajiv Kohli and published by William Andrew. This book was released on 2016-11-04 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. - Provides a comprehensive coverage of innovations in surface cleaning - Written by established experts in the surface cleaning field, presenting an authoritative resource - Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process
Author :
Publisher :
ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing III written by and published by . This book was released on 1986 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Elsa Reichmanis
Publisher :
ISBN 13 :
Total Pages : 640 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing VI written by Elsa Reichmanis and published by . This book was released on 1989 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Aránzazu del Campo
Publisher : John Wiley & Sons
ISBN 13 : 3527633464
Total Pages : 562 pages
Book Rating : 4.5/5 (276 download)
Download or read book Generating Micro- and Nanopatterns on Polymeric Materials written by Aránzazu del Campo and published by John Wiley & Sons. This book was released on 2011-04-08 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: New micro and nanopatterning technologies have been developed in the last years as less costly and more flexible alternatives to phtolithograpic processing. These technologies have not only impacted on recent developments in microelectronics, but also in emerging fields such as disposable biosensors, scaffolds for tissue engineering, non-biofouling coatings, high adherence devices, or photonic structures for the visible spectrum. This handbook presents the current processing methods suitable for the fabrication of micro- and nanostructured surfaces made out of polymeric materials. It covers the steps and materials involved, the resulting structures, and is rounded off by a part on applications. As a result, chemists, material scientists, and physicists gain a critical understanding of this topic at an early stage of its development.
Author : Eitan N. Shauly
Publisher : CRC Press
ISBN 13 : 1000631354
Total Pages : 831 pages
Book Rating : 4.0/5 (6 download)
Download or read book Design Rules in a Semiconductor Foundry written by Eitan N. Shauly and published by CRC Press. This book was released on 2022-11-30 with total page 831 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.
Author : Xing-Hong Zhang
Publisher : John Wiley & Sons
ISBN 13 : 3527823808
Total Pages : 482 pages
Book Rating : 4.5/5 (278 download)
Download or read book Sulfur-Containing Polymers written by Xing-Hong Zhang and published by John Wiley & Sons. This book was released on 2021-03-23 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt: A must-have resource to the booming field of sulfur-containing polymers Sulfur-Containing Polymers is a state-of-the-art text that offers a synthesis of the various sulfur-containing polymers from low-cost sulfur resources such as elemental sulfur, carbon disulfide (CS2), carbonyl sulfide (COS) and mercaptan. With contributions from noted experts on the topic, the book presents an in-depth understanding of the mechanisms related to the synthesis of sulfur-containing polymers. The book also includes a review of the various types of sulfur-containing polymers, such as: poly(thioester)s, poly(thioether)s and poly(thiocarbonate)s and poly(thiourethane)s with linear or hyperbranched (dendrimer) architectures. The expert authors provide the fundamentals on the structure-property relationship and applications of sulfur-containing polymers. Designed to be beneficial for both research and application-oriented chemists and engineers, the book contains the most recent research and developments of sulfur-containing polymers. This important book: Offers the first comprehensive handbook on the topic Contains state-of-the-art research on synthesis of sulfur containing polymers from low-cost sulfur-containing compounds Examines the synthesis, mechanism, structure properties, and applications of various types of sulful-containing polymers Includes contributions from well-known experts Written for polymer chemists, materials scientists, chemists in industry, biochemists, and chemical engineers, Sulfur-Containing Polymers offers a groundbreaking text to the field with inforamtion on the most recent research.
Author : M. J. Bowden
Publisher :
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (318 download)
Download or read book Advances in Resist Technology and Processing IV written by M. J. Bowden and published by . This book was released on 1987 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : Elsevier
ISBN 13 : 0080945074
Total Pages : 409 pages
Book Rating : 4.0/5 (89 download)
Download or read book written by and published by Elsevier. This book was released on with total page 409 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Meyyappan
Publisher : The Electrochemical Society
ISBN 13 : 9781566771368
Total Pages : 366 pages
Book Rating : 4.7/5 (713 download)
Download or read book Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1997 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Andre Batako
Publisher : Springer Nature
ISBN 13 : 3030905322
Total Pages : 788 pages
Book Rating : 4.0/5 (39 download)
Download or read book Advances in Manufacturing Processes, Intelligent Methods and Systems in Production Engineering written by Andre Batako and published by Springer Nature. This book was released on 2022-04-19 with total page 788 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book forms an excellent basis for the development of intelligent manufacturing system for Industry 4.0, digital and distributed manufacturing, and factories for future. This book of new developments and advancement in intelligent control and optimization system for production engineering serves as a good companion to scholars, manufacturing companies, and RTO to improve the efficiency of production systems.
Author : Massimo Rudan
Publisher : Springer Nature
ISBN 13 : 3030798275
Total Pages : 1680 pages
Book Rating : 4.0/5 (37 download)
Download or read book Springer Handbook of Semiconductor Devices written by Massimo Rudan and published by Springer Nature. This book was released on 2022-11-10 with total page 1680 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.
Author : V.V. Krongauz
Publisher : Springer Science & Business Media
ISBN 13 : 1461517672
Total Pages : 414 pages
Book Rating : 4.4/5 (615 download)
Download or read book Processes in Photoreactive Polymers written by V.V. Krongauz and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 414 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of photosensitive materials in general and photoreactive polymers in particular is responsible for major advances in the information, imaging, and electronic industries. Computer parts manufacturing, information storage, and book and magazine publishing all depend on photoreactive polymer systems. The photo-and radiation-induced processes in polymers are also active areas of research. New information on the preparation and properties of com mercially available photosensitive systems is constantly being acquired. The recent demand for environmentally safe solvent-free and water-soluble materials also motivated changes in the composition of photopolymers and photoresists. The interest in holographic recording media for head-up displays, light scanners, and data recording stimulated development of reconfigurable and visible light sensitive materials. Photoconductive polymerizable coatings are being tested in electrostatic proofing and color printing. The list of available initiators, poly meric binders, and other coating ingredients is continually evolving to respond to the requirements of low component loss (low diffusivity) and the high rate of photochemical reactions.
