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A Study Of Low Pressure Chemical Vapor Deposition Of Copper From Hexafluoracetylacetonate Copperi Compounds For Applications In Integrated Circuits
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Book Synopsis A Study of Low Pressure Chemical Vapor Deposition of Copper from (hexafluoracetylacetonate) Copper(I) Compounds for Applications in Integrated Circuits by : Ajay Jain
Download or read book A Study of Low Pressure Chemical Vapor Deposition of Copper from (hexafluoracetylacetonate) Copper(I) Compounds for Applications in Integrated Circuits written by Ajay Jain and published by . This book was released on 1993 with total page 162 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition for Microelectronics by : Arthur Sherman
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Book Synopsis Low Pressure Chemical Vapor Deposition of Copper Films from CU(I)(HFAC)(TMVS) by : Wei-Shang King
Download or read book Low Pressure Chemical Vapor Deposition of Copper Films from CU(I)(HFAC)(TMVS) written by Wei-Shang King and published by . This book was released on 1995 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : Srinivasan Sivaram
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Book Synopsis Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds by : Mehul B. Naik
Download or read book Experiments and Models for the Chemical Vapor Deposition of Copper from Copper(I) and Copper(II) Compounds written by Mehul B. Naik and published by . This book was released on 1995 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Download or read book EUROCVD 15 written by Anjana Devi and published by The Electrochemical Society. This book was released on 2005 with total page 1128 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : M. L. Hitchman
Download or read book Chemical Vapor Deposition written by M. L. Hitchman and published by Academic Press. This book was released on 1993-04-13 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Book Synopsis Principles of Chemical Vapor Deposition by : D.M. Dobkin
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Book Synopsis Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors by : Patrick Michael Jeffries
Download or read book Chemical Vapor Deposition of Copper, Copper (I) Oxide, and Silver from Metal-organic Precursors written by Patrick Michael Jeffries and published by . This book was released on 1992 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-organic chemical vapor deposition (MOCVD) from the tetrameric precursor copper(I) tert-butoxide, (Cu(O-t-Bu)) $\sb4$, results in the deposition of pure copper(I) oxide whiskers at 510 K and of copper metal with $\sim$2% oxygen contamination at 670 K. Quantitative analyses of the gaseous byproducts generated during the deposition, electron energy loss spectroscopy, and temperature programmed desorption experiments indicate that copper(I) oxide is formed by an elimination mechanism and copper metal is formed by deoxygenation of an initially deposited copper(I) oxide phase. New volatile monomeric Cu$\sp{\rm II}$ alkoxides have been synthesized with the general formula Cu(OR)$\sb2$L, where OR is OCH(CF$\sb3)\sb2$ or OC(CH$\sb3$)(CF$\sb3)\sb2$ and L is a bidentate amine. These compounds were prepared by the reaction of Cu(OMe)$\sb2$ with HOR and the amine in diethyl ether. The degree of distortion from square planar geometry for these compounds was measured by EPR spectroscopy, UV-vis spectroscopy, and X-ray crystallography. At 570 K, these compounds are MOCVD precursors for the deposition of pure copper metal. The surface chemistry of copper(I) and copper(II) $\beta$-diketonate complexes has been examined under ultrahigh vacuum conditions on copper single crystals by temperature programmed desorption studies, electron energy loss spectroscopy, infrared spectroscopy, and Auger spectroscopy. Above 200 K, the $\beta$-diketonate ligands migrate from the adsorbed copper compound to the copper surface. At $\sim$375 K, the ligands begin to fragment to give trifluoromethyl and ketenylidene surface species. Decarbonylation of the ketenylidene groups at $\sim$525 K leads to a carbon overlayer. Silver films have been prepared by MOCVD from (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ at 550 K. Studies of the deposition mechanism reveal that (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ initially deposits AgF by an elimination reaction and AgF then loses fluorine to produce silver metal. The crystal structure of (CF$\sb3$CF = C(CF$\sb3$)Ag) $\sb4$ was determined and shows that the compound is a tetramer that consists of a square plane of silver atoms in which each edge is bridged by a perfluorobutenyl ligand. The ruthenium alkyl complexes (Li(tmed)) $\sb2$(($\eta\sp4$-C$\sb 7$H$\sb8$)RuMe$\sb4$) and (Li(tmed)) $\sb2(\eta\sp5$-C$\sb8$H$\sb{11}$)RuMe$\sb4$) have also been prepared and characterized.
Book Synopsis Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 by : David Hodul
Download or read book Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing: Volume 146 written by David Hodul and published by . This book was released on 1989-11-03 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Chemical Vapor Deposition for Microelectronics by : Arthur Sherman
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by . This book was released on 1987 with total page 215 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Analysis of Low Pressure Chemical Vapor Deposition Processes by : Karl Frederick Roenigk
Download or read book Analysis of Low Pressure Chemical Vapor Deposition Processes written by Karl Frederick Roenigk and published by . This book was released on 1987 with total page 726 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper by : Tony Ping-chen Chiang
Download or read book Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper written by Tony Ping-chen Chiang and published by . This book was released on 1996 with total page 324 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition System for Polysilicon by : Gary L. Allman
Download or read book Low Pressure Chemical Vapor Deposition System for Polysilicon written by Gary L. Allman and published by . This book was released on 1977 with total page 46 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Luminous Chemical Vapor Deposition and Interface Engineering by : Hirotsugu Yasuda
Download or read book Luminous Chemical Vapor Deposition and Interface Engineering written by Hirotsugu Yasuda and published by CRC Press. This book was released on 2004-11-30 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science. The book comprises four parts. Part 1 describes the fundamental difference between glow discharge of an inert gas and that of an organic vapor, from which the concepts of Luminous Gas Phase derive. Part 2 explores the various ways of practicing Luminous Vapor Disposition and Treatment depending on the type and nature of substrates. Part 3 covers some very important aspects of surface and interface that could not have been seen clearly without results obtained by application of LCVD. Part 4 offers some examples of interface engineering that show very unique aspects of LCVD interface engineering in composite materials, biomaterial surface and corrosion protection by the environmentally benign process. Timely and up-to-date, the book provides broad coverage of the complex relationships involved in the interface between a gas/solid, liquid/solid, and a solid/solid. The author presents a new perspective on low-pressure plasma and describes key aspects of the surface and interface that could not be shown without the results obtained by LCVD technologies. Features Provides broad coverage of complex relationships involved in interface between a gas/solid, a liquid/solid, and a solid/solid Addresses the importance of the initial step of creating electrical glow discharge Describes the principles of creating chemically reactive species and their growth in the luminous gas phase Focuses on the nature of surface-state of solid and on the creation of imperturbable surface-state by the contacting phase or environment, which is vitally important in creating biocompatible surface, providing super corrosion protection of metals by environmentally benign processes, etc. Offers examples on how to use LCVD in the interface engineering process Presents a new view on low-pressure (low-temperature) plasma and emphasizes the importance of luminous gas phase and chemical reactions that occur in the phase About the author: Dr. Yasuda is one of the pioneers who explored low-pressure plasma for surface modification of materials and deposition of nano films as barrier and perm-selective membranes in the late 1960s. He obtained his PhD in physical and polymer chemistry working on transport properties of gases and vapors in polymers at State University of New York, College of Environmental Science and Forestry at Syracuse, NY. He has over 300 publications in refereed journals and books, and is currently a Professor Emeritus of Chemical Engineering, and Director, Center for Surface Science & Plasma Technology, University of Missouri-Columbia, and is actively engaged in research on the subjects covered by this book.
Book Synopsis Low-pressure chemical vapor deposition of metallization materials by : Rikhit Arora
Download or read book Low-pressure chemical vapor deposition of metallization materials written by Rikhit Arora and published by . This book was released on 1990 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
